GB1528015A - Electroless plating - Google Patents
Electroless platingInfo
- Publication number
- GB1528015A GB1528015A GB39713/75A GB3971375A GB1528015A GB 1528015 A GB1528015 A GB 1528015A GB 39713/75 A GB39713/75 A GB 39713/75A GB 3971375 A GB3971375 A GB 3971375A GB 1528015 A GB1528015 A GB 1528015A
- Authority
- GB
- United Kingdom
- Prior art keywords
- electroless plating
- colloid
- metal
- alkyl
- reducing agent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
1528015 Preparing dielectric substrate and electroless plating SURFACE TECHNOLOGY Inc 29 Sept 1975 [4 Oct 1974 26 Aug 1975] 39713/75 Heading C7F A dielectric substrate is prepared for electroless plating by (1) coating with a hydrous oxide colloid of a non-precious metal and (2) reducing the valency of said metal with a reducing agent. The substrate may be ABS, resin, or glass, preferably pre-etched in CrO 3 /H 2 SO 4 . The non-precious metal is preferably Co, Ni and/or Cu but may be Fe or Cr; the term "hydrous oxide" includes oxides and/or hydroxides or metallic nuclei with an oxidized outer surface; the colloid may contain a stabilizer which is a secondary colloid (a list is given) a polyalcohol or a sugar, or a surfactant, e.g. of the fluorinated type. The reducing agent may be dimethylamine borane, diethylhydroxylamine, an N-alkyl borazone, an N-alkyl borazole, borazene and/or borazine, or an alkali- or alkaline earth-metal borohydride; this may be contained in the subsequent electroless solution or in a separate solution; electroless plating with Cu, Ni or Co is described.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US51222474A | 1974-10-04 | 1974-10-04 | |
US05/607,506 US3993799A (en) | 1974-10-04 | 1975-08-26 | Electroless plating process employing non-noble metal hydrous oxide catalyst |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1528015A true GB1528015A (en) | 1978-10-11 |
Family
ID=27057493
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB39713/75A Expired GB1528015A (en) | 1974-10-04 | 1975-09-29 | Electroless plating |
Country Status (10)
Country | Link |
---|---|
US (1) | US3993799A (en) |
JP (1) | JPS5163464A (en) |
AU (1) | AU8543775A (en) |
BR (1) | BR7506436A (en) |
CA (1) | CA1081405A (en) |
DE (1) | DE2544381A1 (en) |
FR (1) | FR2287094A1 (en) |
GB (1) | GB1528015A (en) |
IT (1) | IT1043091B (en) |
NL (1) | NL7511350A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2143853A (en) * | 1983-07-21 | 1985-02-20 | Suisse Horlogerie Rech Lab | Deposition |
Families Citing this family (42)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4321285A (en) * | 1974-10-04 | 1982-03-23 | Surface Technology, Inc. | Electroless plating |
US5009965A (en) * | 1974-10-04 | 1991-04-23 | Nathan Feldstein | Colloidal compositions for electroless deposition |
US4136216A (en) * | 1975-08-26 | 1979-01-23 | Surface Technology, Inc. | Non-precious metal colloidal dispersions for electroless metal deposition |
US4338355A (en) * | 1975-10-23 | 1982-07-06 | Nathan Feldstein | Process using activated electroless plating catalysts |
US4087586A (en) * | 1975-12-29 | 1978-05-02 | Nathan Feldstein | Electroless metal deposition and article |
US4151311A (en) * | 1976-01-22 | 1979-04-24 | Nathan Feldstein | Post colloid addition of catalytic promoters to non noble metal principal catalytic compounds in electroless plating catalysts |
US4151313A (en) * | 1977-03-11 | 1979-04-24 | Hitachi, Ltd. | Method for production of printed circuits by electroless metal plating employing a solid solution of metal oxides of titanium, nickel, and antimony as a masking material |
US4233344A (en) * | 1978-07-20 | 1980-11-11 | Learonal, Inc. | Method of improving the adhesion of electroless metal deposits employing colloidal copper activator |
US4339476A (en) * | 1978-08-17 | 1982-07-13 | Nathan Feldstein | Dispersions for activating non-conductors for electroless plating |
US4258087A (en) * | 1978-08-17 | 1981-03-24 | Nathan Feldstein | Dispersions for activating non-conductors for electroless plating |
US4318940A (en) * | 1978-08-17 | 1982-03-09 | Surface Technology, Inc. | Dispersions for activating non-conductors for electroless plating |
US4278712A (en) * | 1978-08-31 | 1981-07-14 | Surface Technology, Inc. | Method for activating non-noble metal colloidal dispersion by controlled oxidation for electroless plating |
US4261747A (en) * | 1978-12-06 | 1981-04-14 | Nathan Feldstein | Dispersions for activating non-conductors for electroless plating |
DE3121015C2 (en) * | 1981-05-27 | 1986-12-04 | Friedr. Blasberg GmbH und Co KG, 5650 Solingen | Process for activating pickled surfaces and solution for carrying out the same |
US4762560A (en) * | 1982-09-27 | 1988-08-09 | Learonal, Inc. | Copper colloid and method of activating insulating surfaces for subsequent electroplating |
US4681630A (en) * | 1982-09-27 | 1987-07-21 | Learonal, Inc. | Method of making copper colloid for activating insulating surfaces |
JPS60120589A (en) * | 1983-12-02 | 1985-06-28 | 塩尻工業株式会社 | Method of producing printed circuit board |
US4847114A (en) * | 1984-01-26 | 1989-07-11 | Learonal, Inc. | Preparation of printed circuit boards by selective metallization |
US4759952A (en) * | 1984-01-26 | 1988-07-26 | Learonal, Inc. | Process for printed circuit board manufacture |
US4761304A (en) * | 1984-01-26 | 1988-08-02 | Learonal, Inc. | Process for printed circuit board manufacture |
US4952286A (en) * | 1987-07-10 | 1990-08-28 | Shipley Company Inc. | Electroplating process |
US5007990A (en) * | 1987-07-10 | 1991-04-16 | Shipley Company Inc. | Electroplating process |
US4895739A (en) * | 1988-02-08 | 1990-01-23 | Shipley Company Inc. | Pretreatment for electroplating process |
US5294370A (en) * | 1988-11-15 | 1994-03-15 | Hbt Holland Biotechnology B.V. | Selenium or tellurium elemental hydrosols and their preparation |
NL8900305A (en) * | 1989-02-08 | 1990-09-03 | Philips Nv | METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE |
JPH0379100A (en) * | 1989-08-22 | 1991-04-04 | Matsushita Electric Ind Co Ltd | Light transmission paste and precipitating method for metal copper using the same |
US4919768A (en) * | 1989-09-22 | 1990-04-24 | Shipley Company Inc. | Electroplating process |
US5147692A (en) * | 1990-05-08 | 1992-09-15 | Macdermid, Incorporated | Electroless plating of nickel onto surfaces such as copper or fused tungston |
JP2768390B2 (en) * | 1990-12-11 | 1998-06-25 | インターナショナル・ビジネス・マシーンズ・コーポレイション | Method of conditioning a substrate for electroless metal deposition |
US5164286A (en) * | 1991-02-01 | 1992-11-17 | Ocg Microelectronic Materials, Inc. | Photoresist developer containing fluorinated amphoteric surfactant |
DE4113262A1 (en) * | 1991-04-23 | 1992-10-29 | Siemens Ag | Electroless application of copper@ base coat to aluminium oxide ceramic substrate - by copper@ plating, selective varnishing, stripping and galvanic deposition of nickel@ and/or gold@, for prodn. of conducting strips |
DE4113263A1 (en) * | 1991-04-23 | 1992-10-29 | Siemens Ag | Copper@-coating of ceramic parts by electroless plating - used for metallisation of dielectric or coaxial resonators |
US5474798A (en) * | 1994-08-26 | 1995-12-12 | Macdermid, Incorporated | Method for the manufacture of printed circuit boards |
US6264851B1 (en) | 1998-03-17 | 2001-07-24 | International Business Machines Corporation | Selective seed and plate using permanent resist |
GB0118870D0 (en) * | 2001-08-02 | 2001-09-26 | Shipley Co Llc | A combined adhesion promotion and direct metallization process |
US7410893B2 (en) * | 2005-04-08 | 2008-08-12 | Hewlett-Packard Development Company, L.P. | System and method for depositing a seed layer |
WO2011072506A1 (en) * | 2009-12-17 | 2011-06-23 | Byd Company Limited | Surface metallizing method, method for preparing plastic article and plastic article made therefrom |
EP2610365B1 (en) | 2011-12-31 | 2020-02-26 | Rohm and Haas Electronic Materials LLC | Electroless plating method |
EP2610366A3 (en) | 2011-12-31 | 2014-07-30 | Rohm and Haas Electronic Materials LLC | Plating catalyst and method |
BR112014019005A8 (en) * | 2012-02-02 | 2017-07-11 | Nano Now Pty Ltd | METHOD; AND COATED MATERIAL |
EP3149222A4 (en) * | 2014-05-27 | 2018-06-06 | Auckland Uniservices Limited | Plating or coating method for producing metal-ceramic coating on a substrate |
JP6343787B1 (en) * | 2017-06-01 | 2018-06-20 | 石原ケミカル株式会社 | Copper colloid catalyst solution for electroless copper plating and electroless copper plating method |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3657003A (en) * | 1970-02-02 | 1972-04-18 | Western Electric Co | Method of rendering a non-wettable surface wettable |
US3925578A (en) * | 1971-07-29 | 1975-12-09 | Kollmorgen Photocircuits | Sensitized substrates for chemical metallization |
US3950570A (en) * | 1974-05-02 | 1976-04-13 | Western Electric Company, Inc. | Method of depositing a metal on a surface |
-
1975
- 1975-08-26 US US05/607,506 patent/US3993799A/en not_active Expired - Lifetime
- 1975-09-26 NL NL7511350A patent/NL7511350A/en unknown
- 1975-09-29 GB GB39713/75A patent/GB1528015A/en not_active Expired
- 1975-10-01 CA CA236,844A patent/CA1081405A/en not_active Expired
- 1975-10-02 FR FR7530140A patent/FR2287094A1/en not_active Withdrawn
- 1975-10-03 BR BR7506436*A patent/BR7506436A/en unknown
- 1975-10-03 DE DE19752544381 patent/DE2544381A1/en active Pending
- 1975-10-03 AU AU85437/75A patent/AU8543775A/en not_active Expired
- 1975-10-03 JP JP50119662A patent/JPS5163464A/en active Pending
- 1975-10-03 IT IT27918/75A patent/IT1043091B/en active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2143853A (en) * | 1983-07-21 | 1985-02-20 | Suisse Horlogerie Rech Lab | Deposition |
Also Published As
Publication number | Publication date |
---|---|
NL7511350A (en) | 1976-04-06 |
BR7506436A (en) | 1976-08-10 |
JPS5163464A (en) | 1976-06-01 |
FR2287094A1 (en) | 1976-04-30 |
IT1043091B (en) | 1980-02-20 |
US3993799A (en) | 1976-11-23 |
CA1081405A (en) | 1980-07-15 |
AU8543775A (en) | 1977-04-07 |
DE2544381A1 (en) | 1976-04-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
PCNP | Patent ceased through non-payment of renewal fee |