GB1452622A - Process for removing an exposed an developed photoresist layer - Google Patents

Process for removing an exposed an developed photoresist layer

Info

Publication number
GB1452622A
GB1452622A GB5383173A GB5383173A GB1452622A GB 1452622 A GB1452622 A GB 1452622A GB 5383173 A GB5383173 A GB 5383173A GB 5383173 A GB5383173 A GB 5383173A GB 1452622 A GB1452622 A GB 1452622A
Authority
GB
United Kingdom
Prior art keywords
photo
resist
nov
effected
container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB5383173A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of GB1452622A publication Critical patent/GB1452622A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • ing And Chemical Polishing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

1452622 Photo-resist removal HOECHST AG 20 Nov 1973 [22 Nov 1972] 53831/73 Heading G2X Developed photo-resist layer is removed from a substrate by successive immersion in (a) an aqueous alkaline solution and (b) an organic solvent, in either order. The immersion may be effected more than once and the substrate finally rinsed. The aqueous solution preferably contains 0À1-10 wt. per cent of alkali-metal hydroxide and the solvent is preferably a chlorinated hydrocarbon (e.g. methylene chloride) optionally mixed with a hydrocarbon. Both liquids preferably contain surfactants and the aqueous solution may also contain a buffer, corrosion inhibitor or water-miscible organic solvent. The removal may be effected in an apparatus comprising a container 1 with at least two compartments 2, 3 separated at least in their lower portions, at least one compartment containing two superposed liquid phases 6, 7, an outlet orifice 10 somewhat below the phase boundary, and inlet orifices 9, 11 in the region of the upper and lower phases. Liquid containing photo-resist particles is removed through orifice 10, allowed to decant in container 13 containing a filter 19 and then recycled through orifices 9, 11.
GB5383173A 1972-11-22 1973-11-20 Process for removing an exposed an developed photoresist layer Expired GB1452622A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19722257270 DE2257270A1 (en) 1972-11-22 1972-11-22 METHOD AND DEVICE FOR REMOVING AN EXPOSED AND DEVELOPED PHOTORESIS LAYER

Publications (1)

Publication Number Publication Date
GB1452622A true GB1452622A (en) 1976-10-13

Family

ID=5862453

Family Applications (1)

Application Number Title Priority Date Filing Date
GB5383173A Expired GB1452622A (en) 1972-11-22 1973-11-20 Process for removing an exposed an developed photoresist layer

Country Status (3)

Country Link
JP (1) JPS4984437A (en)
DE (1) DE2257270A1 (en)
GB (1) GB1452622A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54132031A (en) * 1978-04-05 1979-10-13 Okamura Corp Ignition plug free from carbon attachment
JPS5797534A (en) * 1980-12-10 1982-06-17 Mitsubishi Chem Ind Ltd Picture erasing agent for planographic printing plate
JPH067248B2 (en) * 1983-07-01 1994-01-26 松下電工株式会社 Method for manufacturing printed wiring board
DE3530282A1 (en) * 1985-08-24 1987-03-05 Hoechst Ag METHOD FOR DE-COATING LIGHT-CURED PHOTORESIS LAYERS

Also Published As

Publication number Publication date
DE2257270A1 (en) 1974-05-30
JPS4984437A (en) 1974-08-14

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee