GB1222461A - Method and apparatus for vapor deposition - Google Patents

Method and apparatus for vapor deposition

Info

Publication number
GB1222461A
GB1222461A GB36472/69A GB3647269A GB1222461A GB 1222461 A GB1222461 A GB 1222461A GB 36472/69 A GB36472/69 A GB 36472/69A GB 3647269 A GB3647269 A GB 3647269A GB 1222461 A GB1222461 A GB 1222461A
Authority
GB
United Kingdom
Prior art keywords
substrate
temperature
heated
radiant heat
heat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB36472/69A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Airco Inc
Original Assignee
Air Reduction Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Reduction Co Inc filed Critical Air Reduction Co Inc
Publication of GB1222461A publication Critical patent/GB1222461A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S65/00—Glass manufacturing
    • Y10S65/04—Electric heat

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

1,222,461. Coating by vapour deposition. AIR REDUCTION CO. Inc. July 21, 1969 [Aug.13, 1968], No.36472/69. Heading C7F. In a vacuum vapour deposition process, the substrate 11 is heated by radiant heat to a temperature less than the lesser of the deposit reemission temperature and the substrate melting temperature by a radiant heat source 13 whose temperature is above said re-emission temperature, which radiates heat from a total solid angle in steradians (as subtended at the substrate) of no greater than 4# times the fourth power of the absolute temperature of the substrate times the emissivity of the substrate divided by the fourth power of the absolute temperature of the source of radiated heat times the emissivity of the radiator. Molten metal, e.g. Fe, Co, Ni, Al, Ag, Cr, Bi or Mn, is evaporated by electron beam 23 from crucible 19 cooled by water ducts 21, and the substrate 11, which may be rotated, and may be Fe, Ni, Cu, Al, or Ti, is heated by radiant heat from W or Mo plate 13, which is itself heated by electron beam 34. Instead of plate 13, an electrically heated radiant heater consisting of spaced strips may be used.
GB36472/69A 1968-08-13 1969-07-21 Method and apparatus for vapor deposition Expired GB1222461A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US75225268A 1968-08-13 1968-08-13

Publications (1)

Publication Number Publication Date
GB1222461A true GB1222461A (en) 1971-02-17

Family

ID=25025536

Family Applications (1)

Application Number Title Priority Date Filing Date
GB36472/69A Expired GB1222461A (en) 1968-08-13 1969-07-21 Method and apparatus for vapor deposition

Country Status (4)

Country Link
US (1) US3560252A (en)
DE (1) DE1941254C3 (en)
FR (1) FR2015564A1 (en)
GB (1) GB1222461A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2134932A (en) * 1983-02-11 1984-08-22 Western Electric Co Substrate heating apparatus for molecular beam epitaxy

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3798055A (en) * 1968-12-13 1974-03-19 Airco Inc Vapor deposition process
US4023999A (en) * 1972-06-14 1977-05-17 Westinghouse Electric Corporation Formation of openings in dielectric sheet
US3951642A (en) * 1974-11-07 1976-04-20 General Electric Company Metallic coating powder containing Al and Hf
US4071638A (en) * 1974-11-07 1978-01-31 General Electric Company Method of applying a metallic coating with improved resistance to high temperature to environmental conditions
US4321310A (en) * 1980-01-07 1982-03-23 United Technologies Corporation Columnar grain ceramic thermal barrier coatings on polished substrates
US4321311A (en) * 1980-01-07 1982-03-23 United Technologies Corporation Columnar grain ceramic thermal barrier coatings
US4281030A (en) * 1980-05-12 1981-07-28 Bell Telephone Laboratories, Incorporated Implantation of vaporized material on melted substrates
EP0111611B1 (en) * 1982-10-28 1987-05-13 International Business Machines Corporation Method and apparatus for vacuum evaporation coating using an electron gun
DE3930832A1 (en) * 1989-09-15 1991-03-28 Nishibori Mineo DEVICE AND METHOD FOR COATING WORKPIECES BY ARCH DISCHARGING
WO1992014859A1 (en) * 1991-02-19 1992-09-03 Eifeler Werkzeuge Gmbh Process and device for reducing droplets during coating of surfaces with hard substances by a pvd process
KR100551980B1 (en) * 1997-11-03 2006-02-20 에이에스엠 아메리카, 인코포레이티드 Method and Apparatus of Processing Wafers with Low Mass Support
DE10102991C2 (en) 2000-02-19 2003-11-20 Ald Vacuum Techn Ag Device for heating a metal workpiece
DE502005006824D1 (en) * 2005-09-12 2009-04-23 Siemens Ag Method for coating a turbine blade
US8328945B2 (en) * 2010-03-12 2012-12-11 United Technologies Corporation Coating apparatus and method with indirect thermal stabilization
US9885123B2 (en) 2011-03-16 2018-02-06 Asm America, Inc. Rapid bake of semiconductor substrate with upper linear heating elements perpendicular to horizontal gas flow

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2134932A (en) * 1983-02-11 1984-08-22 Western Electric Co Substrate heating apparatus for molecular beam epitaxy

Also Published As

Publication number Publication date
DE1941254C3 (en) 1974-08-22
DE1941254A1 (en) 1970-06-18
DE1941254B2 (en) 1972-09-21
FR2015564A1 (en) 1970-04-30
US3560252A (en) 1971-02-02

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