GB1100682A - Improvements in opto-electronic semiconductor devices - Google Patents

Improvements in opto-electronic semiconductor devices

Info

Publication number
GB1100682A
GB1100682A GB3794763A GB3794763A GB1100682A GB 1100682 A GB1100682 A GB 1100682A GB 3794763 A GB3794763 A GB 3794763A GB 3794763 A GB3794763 A GB 3794763A GB 1100682 A GB1100682 A GB 1100682A
Authority
GB
United Kingdom
Prior art keywords
junction
layers
wafer
layer
alloyed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3794763A
Inventor
Julian Robert Anthony Beale
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Philips Components Ltd
Original Assignee
Mullard Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mullard Ltd filed Critical Mullard Ltd
Priority to GB3794763A priority Critical patent/GB1100682A/en
Priority to NL6410883A priority patent/NL6410883A/xx
Priority to CH1233664A priority patent/CH440479A/en
Priority to SE11453/64A priority patent/SE316835B/xx
Priority to BE653530A priority patent/BE653530A/xx
Priority to DE19641489181 priority patent/DE1489181A1/en
Priority to FR989487A priority patent/FR1409138A/en
Publication of GB1100682A publication Critical patent/GB1100682A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/12Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof structurally associated with, e.g. formed in or on a common substrate with, one or more electric light sources, e.g. electroluminescent light sources, and electrically or optically coupled thereto
    • H01L31/16Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof structurally associated with, e.g. formed in or on a common substrate with, one or more electric light sources, e.g. electroluminescent light sources, and electrically or optically coupled thereto the semiconductor device sensitive to radiation being controlled by the light source or sources
    • H01L31/167Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof structurally associated with, e.g. formed in or on a common substrate with, one or more electric light sources, e.g. electroluminescent light sources, and electrically or optically coupled thereto the semiconductor device sensitive to radiation being controlled by the light source or sources the light sources and the devices sensitive to radiation all being semiconductor devices characterised by potential barriers
    • H01L31/173Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof structurally associated with, e.g. formed in or on a common substrate with, one or more electric light sources, e.g. electroluminescent light sources, and electrically or optically coupled thereto the semiconductor device sensitive to radiation being controlled by the light source or sources the light sources and the devices sensitive to radiation all being semiconductor devices characterised by potential barriers formed in, or on, a common substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Electromagnetism (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Led Devices (AREA)
  • Junction Field-Effect Transistors (AREA)

Abstract

1,100,682. Semi-conductor devices. MULLARD Ltd. 6 Aug., 1964 [26 Sept., 1963], No. 37947/63. Heading HIK. In an opto-electronic semi-conductor device comprising four layers of alternate conductivity types, the junction between the first and second layers emits photons when forwardly biased and the minimum separation between this junction and the junction between the second and third layers is greater than a minority carrier diffusion length. As shown, Fig. 5, a wafer 11 of N-type GaAs doped with tellurium, has P-type surface layers 12, 13 produced by diffusing-in zinc. The thickness of layer 12 is reduced by etching and part of the new surface is masked and the exposed part of layer 12 is removed. Layer 13 is also reduced in thickness by etching, and pellets 14, 16 of bismuth-tin-platinum alloy are alloyed to regions 13 and 11 to form a rectifying and an ohmic connection respectively. A pellet 16 of bismuth-cadmium alloy is alloyed to region 12 to form an ohmic contact. A reflective coating 17 of aluminium is applied over contact 16 and layer 12, leads are attached to the alloyed contacts and the device is encapsulated. Layers 12, 11, 13 act as an opto-electronic transistor in which recombination radiation emitted by the forward biased junction between layers 11 and 12 produces electron-hole pairs at the reverse biased junction between layers 11 and 13. Layers 14, 13, 11 act as a junction transistor and if the sum of the current amplification factors of the two " transistors " exceeds unity the complete device operates as a high speed switch controlled by gate contact 15. In a second embodiment, Fig. 8, an N-type wafer of GaAs doped with tellurium and having P-type surface layers produced by vapour diffusion of zinc is attached to a glass plate using dental wax and the exposed P-type layer removed by grinding and etching. The wafer is reversed on the plate and the remaining P-type layer is reduced in thickness using the same method. The wafer is then divided into a plurality of wafers 22 and an annular cavity 24 is ultrasonically drilled through the P-type layer 23 of each wafer. A pellet 25 of bismuthtin alloy is alloyed to the wafer to form a rectifying contact and a ring 26 of bismuthsilver alloy and a pellet 27 of bismuth-tinplatinum alloy are alloyed to the wafer to form ohmic contacts. A silicon oxide layer 29 and a reflective layer 30 of aluminium are applied to the edges of the wafer. Leads are connected and the device encapsulated, cavity 24 being filled with a transparent lacquer through which the light emitted from the outer annular junction can pass to the co-planar inner junction. This device operates as in the first embodiment. The light receiving junction may also be a heterojunction, the material of the third region having a lower energy gap than that of the second region to decrease the photon absorption length. Suitable pairs of materials are gallium arsenide/gallium-indium arsenide and gallium arseno-phosphide/gallium arsenide. In a preferred embodiment the first and second regions are of the first material and the third and fourth regions are of the second material. Reference has been directed by the Comptroller to Specification 967,439.
GB3794763A 1963-09-26 1963-09-26 Improvements in opto-electronic semiconductor devices Expired GB1100682A (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
GB3794763A GB1100682A (en) 1963-09-26 1963-09-26 Improvements in opto-electronic semiconductor devices
NL6410883A NL6410883A (en) 1963-09-26 1964-09-18
CH1233664A CH440479A (en) 1963-09-26 1964-09-23 Semiconductor device
SE11453/64A SE316835B (en) 1963-09-26 1964-09-23
BE653530A BE653530A (en) 1963-09-26 1964-09-24
DE19641489181 DE1489181A1 (en) 1963-09-26 1964-09-25 Semiconductor device
FR989487A FR1409138A (en) 1963-09-26 1964-09-26 Semiconductor device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB3794763A GB1100682A (en) 1963-09-26 1963-09-26 Improvements in opto-electronic semiconductor devices
GB4755463 1963-12-02

Publications (1)

Publication Number Publication Date
GB1100682A true GB1100682A (en) 1968-01-24

Family

ID=26263643

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3794763A Expired GB1100682A (en) 1963-09-26 1963-09-26 Improvements in opto-electronic semiconductor devices

Country Status (6)

Country Link
BE (1) BE653530A (en)
CH (1) CH440479A (en)
DE (1) DE1489181A1 (en)
GB (1) GB1100682A (en)
NL (1) NL6410883A (en)
SE (1) SE316835B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1517537A (en) * 1975-07-16 1978-07-12 Post Office Lasers and photo-detectors

Also Published As

Publication number Publication date
NL6410883A (en) 1965-03-29
CH440479A (en) 1967-07-31
DE1489181A1 (en) 1969-05-14
BE653530A (en) 1965-03-24
SE316835B (en) 1969-11-03

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