GB1003845A - Improvements in or relating to heating by means of electron beams - Google Patents

Improvements in or relating to heating by means of electron beams

Info

Publication number
GB1003845A
GB1003845A GB1694662A GB1694662A GB1003845A GB 1003845 A GB1003845 A GB 1003845A GB 1694662 A GB1694662 A GB 1694662A GB 1694662 A GB1694662 A GB 1694662A GB 1003845 A GB1003845 A GB 1003845A
Authority
GB
United Kingdom
Prior art keywords
crucible
coating
ceramic
molybdenum
tungsten
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1694662A
Inventor
Michael St John Burden
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GV Planer Ltd
Original Assignee
GV Planer Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GV Planer Ltd filed Critical GV Planer Ltd
Priority to GB1694662A priority Critical patent/GB1003845A/en
Publication of GB1003845A publication Critical patent/GB1003845A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Toxicology (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

In apparatus for coating by evaporation the crucible which heated by an electron beam (see Division H1) consists of electrically conductive ceramic-metal composition, e.g. alumina-molybdenum or thorium oxide-tungsten, or of ceramic in contact with an electrically conducting member or coating, e.g. a molybdenum or tungsten crucible may be provided with an inner alumina or boron nitride liner, or a metal coating may be sprayed on a ceramic crucible. The crucible may be supplied from a continuously advancing metal feed or from a hopper. Suitable materials for evaporation mentioned are gold, silicon, silicon monoxide, palladium, copper, silver, nickel, tin, antimony, lead, chromium, indium and also aluminium which however requires the use of a boron nitride insert in the crucible.
GB1694662A 1962-05-03 1962-05-03 Improvements in or relating to heating by means of electron beams Expired GB1003845A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB1694662A GB1003845A (en) 1962-05-03 1962-05-03 Improvements in or relating to heating by means of electron beams

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1694662A GB1003845A (en) 1962-05-03 1962-05-03 Improvements in or relating to heating by means of electron beams

Publications (1)

Publication Number Publication Date
GB1003845A true GB1003845A (en) 1965-09-08

Family

ID=10086514

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1694662A Expired GB1003845A (en) 1962-05-03 1962-05-03 Improvements in or relating to heating by means of electron beams

Country Status (1)

Country Link
GB (1) GB1003845A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3136465A1 (en) * 1981-09-15 1983-03-31 Siemens AG, 1000 Berlin und 8000 München Appliance and method for coating substrates by vapour deposition
FR2623819A1 (en) * 1987-11-26 1989-06-02 Thomson Csf Electron bombardment oven for vacuum evaporation
EP3012345A1 (en) * 2011-09-29 2016-04-27 Nitride Solutions Inc. Inorganic materials, methods and apparatus for making same, and uses thereof
CN115094389A (en) * 2022-07-11 2022-09-23 威科赛乐微电子股份有限公司 Method for electron beam evaporation plating of palladium

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3136465A1 (en) * 1981-09-15 1983-03-31 Siemens AG, 1000 Berlin und 8000 München Appliance and method for coating substrates by vapour deposition
FR2623819A1 (en) * 1987-11-26 1989-06-02 Thomson Csf Electron bombardment oven for vacuum evaporation
EP3012345A1 (en) * 2011-09-29 2016-04-27 Nitride Solutions Inc. Inorganic materials, methods and apparatus for making same, and uses thereof
CN115094389A (en) * 2022-07-11 2022-09-23 威科赛乐微电子股份有限公司 Method for electron beam evaporation plating of palladium
CN115094389B (en) * 2022-07-11 2023-12-29 威科赛乐微电子股份有限公司 Method for evaporating palladium by electron beam

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