GB1105989A - Improvements in and relating to the evaporation of substances in vacuo - Google Patents

Improvements in and relating to the evaporation of substances in vacuo

Info

Publication number
GB1105989A
GB1105989A GB53526/66A GB5352666A GB1105989A GB 1105989 A GB1105989 A GB 1105989A GB 53526/66 A GB53526/66 A GB 53526/66A GB 5352666 A GB5352666 A GB 5352666A GB 1105989 A GB1105989 A GB 1105989A
Authority
GB
United Kingdom
Prior art keywords
support
substances
vacuo
evaporation
surrounding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB53526/66A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Balzers Patent und Beteiligungs AG
Original Assignee
Balzers Patent und Beteiligungs AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers Patent und Beteiligungs AG filed Critical Balzers Patent und Beteiligungs AG
Publication of GB1105989A publication Critical patent/GB1105989A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/28Vacuum evaporation by wave energy or particle radiation
    • C23C14/30Vacuum evaporation by wave energy or particle radiation by electron bombardment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Toxicology (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

<PICT:1105989/C6-C7/1> A device for the evaporation of substances in vacuo comprises a vaporizer support or trough 11 constructed as part of a partition wall electrically screening a region A, wherein means e.g. glow cathode 6 are arranged for heating the support by electron bonbardment, from a region B on the side of the support remote from the heating means and carrying the substances 12 to be vaporized. The partition wall may be formed of a cylindrical metal shell 5, surrounding an electrically insulating e.g. porcelain member 4, together with a refractory sheet 10 such as of W or Mo or graphite, carbide or oxide; alternatively (Fig. 2) the shell may be double-walled for internal cooling (20) surrounding an auxiliary Cu electrode (26), for focussing the electron beam emerging from the cathode (24). The support may be an exchangeable piece of foil, or movable by being made as a circular groove (40) Fig. 4, in a rotary disc (41) fed by a hopper (44).
GB53526/66A 1965-12-18 1966-11-30 Improvements in and relating to the evaporation of substances in vacuo Expired GB1105989A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1750165A CH452313A (en) 1965-12-18 1965-12-18 Device for the evaporation of substances in a vacuum

Publications (1)

Publication Number Publication Date
GB1105989A true GB1105989A (en) 1968-03-13

Family

ID=4425902

Family Applications (1)

Application Number Title Priority Date Filing Date
GB53526/66A Expired GB1105989A (en) 1965-12-18 1966-11-30 Improvements in and relating to the evaporation of substances in vacuo

Country Status (6)

Country Link
US (1) US3544763A (en)
CH (1) CH452313A (en)
DE (1) DE1521175B2 (en)
FR (1) FR1505169A (en)
GB (1) GB1105989A (en)
NL (1) NL6600952A (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BG20711A1 (en) * 1974-06-14 1975-12-20
US4094269A (en) * 1974-06-14 1978-06-13 Zlafop Pri Ban Vapor deposition apparatus for coating continuously moving substrates with layers of volatizable solid substances
US3996469A (en) * 1975-01-06 1976-12-07 Jersey Nuclear-Avco Isotopes, Inc. Floating convection barrier for evaporation source
US4048462A (en) * 1975-01-17 1977-09-13 Airco, Inc. Compact rotary evaporation source
DE2628765C3 (en) * 1976-06-26 1979-01-11 Leybold-Heraeus Gmbh & Co Kg, 5000 Koeln Apparatus for vapor deposition, in particular sublimable substances, in a vacuum by means of an electron beam source
FR2623819A1 (en) * 1987-11-26 1989-06-02 Thomson Csf Electron bombardment oven for vacuum evaporation
DE4016225C2 (en) * 1990-05-19 1997-08-14 Leybold Ag Series evaporator for vacuum deposition systems
DE4100541C1 (en) * 1991-01-10 1992-01-16 Plasco Dr. Ehrich Plasma-Coating Gmbh, 6501 Heidesheim, De

Also Published As

Publication number Publication date
US3544763A (en) 1970-12-01
FR1505169A (en) 1967-12-08
NL6600952A (en) 1967-06-19
DE1521175B2 (en) 1973-04-26
DE1521175A1 (en) 1969-07-31
CH452313A (en) 1968-05-31

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