GB1003378A - Monitoring the thickness of films being vacuum deposited - Google Patents

Monitoring the thickness of films being vacuum deposited

Info

Publication number
GB1003378A
GB1003378A GB1214264A GB1214264A GB1003378A GB 1003378 A GB1003378 A GB 1003378A GB 1214264 A GB1214264 A GB 1214264A GB 1214264 A GB1214264 A GB 1214264A GB 1003378 A GB1003378 A GB 1003378A
Authority
GB
United Kingdom
Prior art keywords
workpieces
thickness
chamber
vessel
deposited
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1214264A
Inventor
Stanley William Warren
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STC PLC
Original Assignee
Standard Telephone and Cables PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Standard Telephone and Cables PLC filed Critical Standard Telephone and Cables PLC
Priority to GB1214264A priority Critical patent/GB1003378A/en
Publication of GB1003378A publication Critical patent/GB1003378A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/542Controlling the film thickness or evaporation rate
    • C23C14/545Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods

Abstract

The thickness of thin films deposited from material heated in a rotating vessel on one or more stationary workpieces in a vacuum is monitored by detecting the film thickness deposited on a stationary workpiece, e.g. by directing a ligh beam on to it and measuring the beam after it has passed through or been reflected from the workpiece. As shown, a plurality of workpieces 4 are placed on a <PICT:1003378/C6-C7/1> stationary support 5 on legs 6 within a chamber 1 sealingly mounted on a base plate 2. A vessel 7 containing the material to be evaporated is carried by copper arms 8 and 9 mounted on a shaft, comprising copper core 10 and outer conductor 11 insulated by an intermediate layer 12, passing through the base plate 2. The chamber is evacuated, and the vessel is rotated by belt drive 15 driven by a motor 17 while it is heated by supplying current to conductors 10 and 11 via slip-ring assembly 14 so that material is deposited evenly on all the workpieces. The film thickness on one of the workpieces 4a is continously tested during deposition by passing a light beam 21 through pressure resistant windows 19 and 20, which may be in the base, sides or roof of the chamber. When the thickness has reached the desired value, deposition is terminated, e.g. by operating a shutter which interrupts the evaporant stream. The method may be applied to the manufacture of optical filters, semi-conductors or thin magnetic films.
GB1214264A 1964-03-23 1964-03-23 Monitoring the thickness of films being vacuum deposited Expired GB1003378A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB1214264A GB1003378A (en) 1964-03-23 1964-03-23 Monitoring the thickness of films being vacuum deposited

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1214264A GB1003378A (en) 1964-03-23 1964-03-23 Monitoring the thickness of films being vacuum deposited

Publications (1)

Publication Number Publication Date
GB1003378A true GB1003378A (en) 1965-09-02

Family

ID=9999114

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1214264A Expired GB1003378A (en) 1964-03-23 1964-03-23 Monitoring the thickness of films being vacuum deposited

Country Status (1)

Country Link
GB (1) GB1003378A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4121537A (en) * 1976-03-19 1978-10-24 Hitachi, Ltd. Apparatus for vacuum deposition
CN108728810A (en) * 2018-08-16 2018-11-02 广东振华科技股份有限公司 A kind of vacuum and low temperature magnetron sputtering coater

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4121537A (en) * 1976-03-19 1978-10-24 Hitachi, Ltd. Apparatus for vacuum deposition
CN108728810A (en) * 2018-08-16 2018-11-02 广东振华科技股份有限公司 A kind of vacuum and low temperature magnetron sputtering coater

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