JPS57107026A - Heating mechanic for vacuum machine - Google Patents

Heating mechanic for vacuum machine

Info

Publication number
JPS57107026A
JPS57107026A JP18433880A JP18433880A JPS57107026A JP S57107026 A JPS57107026 A JP S57107026A JP 18433880 A JP18433880 A JP 18433880A JP 18433880 A JP18433880 A JP 18433880A JP S57107026 A JPS57107026 A JP S57107026A
Authority
JP
Japan
Prior art keywords
heater
substrate holder
substrate
film
vacuum chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18433880A
Other languages
Japanese (ja)
Inventor
Kuniharu Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP18433880A priority Critical patent/JPS57107026A/en
Publication of JPS57107026A publication Critical patent/JPS57107026A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates

Abstract

PURPOSE:To produce a film having a uniform characteristic on a substrate by a method wherein in an apparatus where a fixed film is formed on the substrate while the substrate is heated in a vacuum chamber by a heater, a lead wire of the heater integrating a substrate holder and the heater is led out externally. CONSTITUTION:When housing a sample substrate holder and a heater which can be rotated in a vacuum chamber which can be evacuated with the help of an evacuation system, the heater is buried in the substrate holder to constitute a seathed-type substrate holder and heater 11. Next, an end of the heater is led into the circumference of the substrate holder, and a sliding brush 32 is here contacted to achieve feeding of a steady current even while the substrate holder and heater 11 is revolving. With such a construction, variation of the temperature of the substrate holder itself can be limited within +1+ or -, and also sputtering of a heater component due to local heating does not happen, so the film with a uniform characteristic can be obtained.
JP18433880A 1980-12-25 1980-12-25 Heating mechanic for vacuum machine Pending JPS57107026A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18433880A JPS57107026A (en) 1980-12-25 1980-12-25 Heating mechanic for vacuum machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18433880A JPS57107026A (en) 1980-12-25 1980-12-25 Heating mechanic for vacuum machine

Publications (1)

Publication Number Publication Date
JPS57107026A true JPS57107026A (en) 1982-07-03

Family

ID=16151550

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18433880A Pending JPS57107026A (en) 1980-12-25 1980-12-25 Heating mechanic for vacuum machine

Country Status (1)

Country Link
JP (1) JPS57107026A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6081820A (en) * 1983-10-11 1985-05-09 Rohm Co Ltd Wafer mounting device for molecular beam epitaxial equipment
JPS6210266A (en) * 1985-07-06 1987-01-19 Kobe Steel Ltd Vapor deposition device
US5472592A (en) * 1994-07-19 1995-12-05 American Plating Systems Electrolytic plating apparatus and method
US6252202B1 (en) * 1998-02-10 2001-06-26 Jeneric/Pentron, Inc. Furnace for heat treatment of dental materials
CN102808164A (en) * 2011-05-31 2012-12-05 北京北方微电子基地设备工艺研究中心有限责任公司 Cavity device and substrate process unit with same
CN111979528A (en) * 2019-05-24 2020-11-24 东泰高科装备科技有限公司 Rotary supporting device and MOCVD system

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6081820A (en) * 1983-10-11 1985-05-09 Rohm Co Ltd Wafer mounting device for molecular beam epitaxial equipment
JPH0136978B2 (en) * 1983-10-11 1989-08-03 Rohm Kk
JPS6210266A (en) * 1985-07-06 1987-01-19 Kobe Steel Ltd Vapor deposition device
US5472592A (en) * 1994-07-19 1995-12-05 American Plating Systems Electrolytic plating apparatus and method
US6252202B1 (en) * 1998-02-10 2001-06-26 Jeneric/Pentron, Inc. Furnace for heat treatment of dental materials
CN102808164A (en) * 2011-05-31 2012-12-05 北京北方微电子基地设备工艺研究中心有限责任公司 Cavity device and substrate process unit with same
CN111979528A (en) * 2019-05-24 2020-11-24 东泰高科装备科技有限公司 Rotary supporting device and MOCVD system

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