FR2977982B1 - Matrice de photodiodes ingaas - Google Patents

Matrice de photodiodes ingaas

Info

Publication number
FR2977982B1
FR2977982B1 FR1156290A FR1156290A FR2977982B1 FR 2977982 B1 FR2977982 B1 FR 2977982B1 FR 1156290 A FR1156290 A FR 1156290A FR 1156290 A FR1156290 A FR 1156290A FR 2977982 B1 FR2977982 B1 FR 2977982B1
Authority
FR
France
Prior art keywords
photodiod
ingaas
matrix
photodiod matrix
ingaas photodiod
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR1156290A
Other languages
English (en)
Other versions
FR2977982A1 (fr
Inventor
Yang Ni
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
New Imaging Technologies SAS
Original Assignee
New Imaging Technologies SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by New Imaging Technologies SAS filed Critical New Imaging Technologies SAS
Priority to FR1156290A priority Critical patent/FR2977982B1/fr
Priority to US14/131,897 priority patent/US9018727B2/en
Priority to EP12733733.5A priority patent/EP2732473A1/fr
Priority to PCT/EP2012/063596 priority patent/WO2013007753A1/fr
Priority to JP2014519537A priority patent/JP2014521216A/ja
Priority to CN201280034301.5A priority patent/CN103703573B/zh
Publication of FR2977982A1 publication Critical patent/FR2977982A1/fr
Application granted granted Critical
Publication of FR2977982B1 publication Critical patent/FR2977982B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14643Photodiode arrays; MOS imagers
    • H01L27/14654Blooming suppression
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/14609Pixel-elements with integrated switching, control, storage or amplification elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14643Photodiode arrays; MOS imagers
    • H01L27/14649Infrared imagers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14643Photodiode arrays; MOS imagers
    • H01L27/14649Infrared imagers
    • H01L27/1465Infrared imagers of the hybrid type
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14683Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14683Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
    • H01L27/14689MOS based technologies
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14683Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
    • H01L27/14694The active layers comprising only AIIIBV compounds, e.g. GaAs, InP
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/10Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
    • H01L31/101Devices sensitive to infrared, visible or ultraviolet radiation
    • H01L31/102Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier
    • H01L31/103Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier being of the PN homojunction type
    • H01L31/1035Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier being of the PN homojunction type the devices comprising active layers formed only by AIIIBV compounds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/184Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIIBV compounds, e.g. GaAs, InP
    • H01L31/1844Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIIBV compounds, e.g. GaAs, InP comprising ternary or quaternary compounds, e.g. Ga Al As, In Ga As P
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/186Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
    • H01L31/1868Passivation
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/544Solar cells from Group III-V materials
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Light Receiving Elements (AREA)
  • Solid State Image Pick-Up Elements (AREA)
FR1156290A 2011-07-11 2011-07-11 Matrice de photodiodes ingaas Expired - Fee Related FR2977982B1 (fr)

Priority Applications (6)

Application Number Priority Date Filing Date Title
FR1156290A FR2977982B1 (fr) 2011-07-11 2011-07-11 Matrice de photodiodes ingaas
US14/131,897 US9018727B2 (en) 2011-07-11 2012-07-11 InGaAs photodiode array
EP12733733.5A EP2732473A1 (fr) 2011-07-11 2012-07-11 Matrice de photodiodes ingaas
PCT/EP2012/063596 WO2013007753A1 (fr) 2011-07-11 2012-07-11 Matrice de photodiodes ingaas
JP2014519537A JP2014521216A (ja) 2011-07-11 2012-07-11 InGaAsフォトダイオード・アレイ
CN201280034301.5A CN103703573B (zh) 2011-07-11 2012-07-11 Ingaas光电二极管阵列

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1156290A FR2977982B1 (fr) 2011-07-11 2011-07-11 Matrice de photodiodes ingaas

Publications (2)

Publication Number Publication Date
FR2977982A1 FR2977982A1 (fr) 2013-01-18
FR2977982B1 true FR2977982B1 (fr) 2014-06-20

Family

ID=46506414

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1156290A Expired - Fee Related FR2977982B1 (fr) 2011-07-11 2011-07-11 Matrice de photodiodes ingaas

Country Status (5)

Country Link
US (1) US9018727B2 (fr)
EP (1) EP2732473A1 (fr)
JP (1) JP2014521216A (fr)
FR (1) FR2977982B1 (fr)
WO (1) WO2013007753A1 (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3001578B1 (fr) 2013-01-31 2015-04-03 New Imaging Technologies Sas Matrice de photodiode a zone dopee absorbant les charges
US9935151B2 (en) 2013-09-25 2018-04-03 Princeton Infrared Technologies, Inc. Low noise InGaAs photodiode array
JP2018078245A (ja) * 2016-11-11 2018-05-17 ソニーセミコンダクタソリューションズ株式会社 受光素子、受光素子の製造方法および電子機器
WO2018193747A1 (fr) 2017-04-19 2018-10-25 Sony Semiconductor Solutions Corporation Dispositif à semi-conducteur, son procédé de fabrication et appareil électronique
FR3069958B1 (fr) * 2017-08-03 2019-08-30 Thales Procede de fabrication ameliore d'un detecteur optique a base de photodiodes et dispositif associe
JP6909165B2 (ja) * 2018-01-15 2021-07-28 富士通株式会社 赤外線検出器、撮像素子、撮像システム、赤外線検出器の製造方法
JP7291082B2 (ja) 2018-01-23 2023-06-14 ソニーセミコンダクタソリューションズ株式会社 撮像装置
US10297708B1 (en) 2018-01-25 2019-05-21 The United States Of America, As Represented By The Secretary Of The Air Force Surface passivation for PhotoDetector applications
US20200052012A1 (en) * 2018-08-07 2020-02-13 Sensors Unlimited, Inc. Mesa trench etch with stacked sidewall passivation
JPWO2020059495A1 (ja) 2018-09-19 2021-09-24 ソニーセミコンダクタソリューションズ株式会社 撮像素子、半導体素子および電子機器
EP3869561A4 (fr) 2018-10-16 2022-01-05 Sony Semiconductor Solutions Corporation Élément semi-conducteur et son procédé de fabrication

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4396443A (en) 1982-01-18 1983-08-02 Bell Telephone Laboratories, Incorporated Reduction of leakage current in InGaAs diodes
US5053837A (en) 1987-09-16 1991-10-01 Sumitomo Electric Industries, Ltd. Ingaas/inp type pin photodiodes
US6555890B2 (en) * 2000-05-23 2003-04-29 Sensors Unlimited, Inc. Method for combined fabrication of indium gallium arsenide/indium phosphide avalanche photodiodes and p-i-n photodiodes
FR2819941B1 (fr) * 2001-01-25 2003-06-20 Get Int Element photoelectrique a tres grande dynamique de fonctionnement
US6891202B2 (en) 2001-12-14 2005-05-10 Infinera Corporation Oxygen-doped Al-containing current blocking layers in active semiconductor devices
US7115910B2 (en) * 2003-05-05 2006-10-03 Banpil Photonics, Inc. Multicolor photodiode array and method of manufacturing thereof
JP4103885B2 (ja) 2004-11-16 2008-06-18 住友電気工業株式会社 InP系受光素子の亜鉛固相拡散方法とInP系受光素子
US20100051809A1 (en) 2008-09-02 2010-03-04 Princeton Lightwave, Inc. Monolithic Dual Band Imager

Also Published As

Publication number Publication date
US20140217543A1 (en) 2014-08-07
CN103703573A (zh) 2014-04-02
US9018727B2 (en) 2015-04-28
WO2013007753A1 (fr) 2013-01-17
FR2977982A1 (fr) 2013-01-18
JP2014521216A (ja) 2014-08-25
EP2732473A1 (fr) 2014-05-21

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