FR2583572B1 - Procede et appareil pour fabriquer un film mince cristallin. - Google Patents
Procede et appareil pour fabriquer un film mince cristallin.Info
- Publication number
- FR2583572B1 FR2583572B1 FR868608724A FR8608724A FR2583572B1 FR 2583572 B1 FR2583572 B1 FR 2583572B1 FR 868608724 A FR868608724 A FR 868608724A FR 8608724 A FR8608724 A FR 8608724A FR 2583572 B1 FR2583572 B1 FR 2583572B1
- Authority
- FR
- France
- Prior art keywords
- manufacturing
- crystalline film
- thin crystalline
- thin
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/28—Controlling or regulating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/16—Heating of the molten zone
- C30B13/22—Heating of the molten zone by irradiation or electric discharge
- C30B13/24—Heating of the molten zone by irradiation or electric discharge using electromagnetic waves
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/60—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape characterised by shape
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Recrystallisation Techniques (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60130764A JPS61289617A (ja) | 1985-06-18 | 1985-06-18 | 薄膜単結晶の製造装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2583572A1 FR2583572A1 (fr) | 1986-12-19 |
FR2583572B1 true FR2583572B1 (fr) | 1990-05-11 |
Family
ID=15042097
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR868608724A Expired - Lifetime FR2583572B1 (fr) | 1985-06-18 | 1986-06-17 | Procede et appareil pour fabriquer un film mince cristallin. |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS61289617A (de) |
KR (1) | KR870000744A (de) |
DE (1) | DE3620300A1 (de) |
FR (1) | FR2583572B1 (de) |
GB (1) | GB2177256B (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2211210A (en) * | 1987-10-16 | 1989-06-28 | Philips Electronic Associated | A method of modifying a surface of a body using electromagnetic radiation |
WO1989004387A1 (en) * | 1987-11-13 | 1989-05-18 | Kopin Corporation | Improved zone melt recrystallization method and apparatus |
US5074952A (en) * | 1987-11-13 | 1991-12-24 | Kopin Corporation | Zone-melt recrystallization method and apparatus |
JPH01246829A (ja) * | 1988-03-28 | 1989-10-02 | Tokyo Electron Ltd | ビームアニール装置 |
DE3818504A1 (de) * | 1988-05-31 | 1991-01-03 | Fraunhofer Ges Forschung | Verfahren und vorrichtung fuer die kristallisation duenner halbleiterschichten auf einem substratmaterial |
DE3921038C2 (de) * | 1988-06-28 | 1998-12-10 | Ricoh Kk | Verfahren zur Herstellung eines Halbleitersubstrats bzw. Festkörperaufbaus |
US5459346A (en) * | 1988-06-28 | 1995-10-17 | Ricoh Co., Ltd. | Semiconductor substrate with electrical contact in groove |
US5173446A (en) * | 1988-06-28 | 1992-12-22 | Ricoh Company, Ltd. | Semiconductor substrate manufacturing by recrystallization using a cooling medium |
US5310446A (en) * | 1990-01-10 | 1994-05-10 | Ricoh Company, Ltd. | Method for producing semiconductor film |
US5338388A (en) * | 1992-05-04 | 1994-08-16 | Mitsubishi Denki Kabushiki Kaisha | Method of forming single-crystal semiconductor films |
US8183498B2 (en) * | 2006-05-01 | 2012-05-22 | Tcz, Llc | Systems and method for optimization of laser beam spatial intensity profile |
US8927898B2 (en) | 2006-05-01 | 2015-01-06 | Tcz, Llc | Systems and method for optimization of laser beam spatial intensity profile |
DE112008000934B4 (de) * | 2007-04-24 | 2022-10-27 | LIMO GmbH | Verfahren zur Umstrukturierung von Halbleiterschichten |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4155779A (en) * | 1978-08-21 | 1979-05-22 | Bell Telephone Laboratories, Incorporated | Control techniques for annealing semiconductors |
US4380864A (en) * | 1981-07-27 | 1983-04-26 | The United States Of America As Represented By The Secretary Of The Air Force | Method for providing in-situ non-destructive monitoring of semiconductors during laser annealing process |
-
1985
- 1985-06-18 JP JP60130764A patent/JPS61289617A/ja active Pending
-
1986
- 1986-06-12 KR KR1019860004670A patent/KR870000744A/ko not_active Application Discontinuation
- 1986-06-17 FR FR868608724A patent/FR2583572B1/fr not_active Expired - Lifetime
- 1986-06-17 GB GB08614683A patent/GB2177256B/en not_active Expired
- 1986-06-18 DE DE19863620300 patent/DE3620300A1/de not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
FR2583572A1 (fr) | 1986-12-19 |
KR870000744A (ko) | 1987-02-20 |
GB2177256A (en) | 1987-01-14 |
GB8614683D0 (en) | 1986-07-23 |
JPS61289617A (ja) | 1986-12-19 |
DE3620300A1 (de) | 1986-12-18 |
GB2177256B (en) | 1988-12-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB2173822B (en) | Thin film forming apparatus and method | |
EP0266178A3 (en) | Method and apparatus for forming a thin film | |
FR2563756B1 (fr) | Procede et appareil pour former un panneau de bout de recipient | |
PT84365A (fr) | Procede et appareil d:extrusion | |
FR2562528B1 (fr) | Procede pour decoller un film protecteur d'un objet mince et appareil pour sa mise en oeuvre | |
KR880700759A (ko) | 뚜껑 밀폐구 및 그 형성 방법 및 장치 | |
ES556591A0 (es) | Un metodo para obtener una pelicula orientada de capas multiples coextruidas | |
BE880949A (fr) | Procede et appareil de fabrication de fermetures a cursuer | |
FR2584651B1 (fr) | Procede et dispositif pour la realisation de films a parois ajourees | |
IT1152545B (it) | Apparecchio e metodo per la pallinatura a graniglia | |
FR2583572B1 (fr) | Procede et appareil pour fabriquer un film mince cristallin. | |
FR2563007B1 (fr) | Procede et appareil pour le dosage d'un microconstituant | |
FR2591535B1 (fr) | Procede et dispositif pour la fabrication de blocs de fiches autocollantes | |
FR2504505B1 (fr) | Procede et dispositif pour deposer des feuilles | |
BE850134A (fr) | Procede et dispositif de rainage d'un materiau plat et mince | |
BE851497A (fr) | Procede et appareil pour manipuler | |
FR2592396B1 (fr) | Procede pour former un film depose. | |
GB2205860B (en) | Apparatus for forming a thin film | |
FR2520522B1 (fr) | Appareil et procede d'holographie a multiplication de phase | |
FR2548157B1 (fr) | Procede et appareil de palettisation de paquets de feuilles | |
FR2505247B1 (fr) | Procede et appareil pour produire une feuille ou pellicule a orientation biaxiale | |
BE894745A (fr) | Dispositif medical et procede pour le fabriquer | |
IT8012430A0 (it) | Contenitore e metodo per la sua fabbricazione | |
FR2528359B1 (fr) | Appareillage et procede pour fabrication d'elements feuilletes | |
FR2500953B1 (fr) | Condensateur et procede et appareil pour sa fabrication |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |