FR2262813A1 - - Google Patents
Info
- Publication number
- FR2262813A1 FR2262813A1 FR7506415A FR7506415A FR2262813A1 FR 2262813 A1 FR2262813 A1 FR 2262813A1 FR 7506415 A FR7506415 A FR 7506415A FR 7506415 A FR7506415 A FR 7506415A FR 2262813 A1 FR2262813 A1 FR 2262813A1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2394074A JPS5534929B2 (ja) | 1974-02-28 | 1974-02-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2262813A1 true FR2262813A1 (ja) | 1975-09-26 |
FR2262813B1 FR2262813B1 (ja) | 1977-04-15 |
Family
ID=12124516
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7506415A Expired FR2262813B1 (ja) | 1974-02-28 | 1975-02-28 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS5534929B2 (ja) |
CA (1) | CA1060252A (ja) |
DE (1) | DE2508618C2 (ja) |
FR (1) | FR2262813B1 (ja) |
GB (1) | GB1505739A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0040470A2 (en) * | 1980-04-30 | 1981-11-25 | Minnesota Mining And Manufacturing Company | Aqueous developable photosensitive composition and printing plate |
FR2651337A1 (fr) * | 1989-08-31 | 1991-03-01 | Efi | Composition photosensible a base de condensat diazouique pour plaques offset. |
EP0699960A1 (de) * | 1994-08-29 | 1996-03-06 | Hoechst Aktiengesellschaft | Lichtempfindliches Gemisch |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS533216A (en) * | 1976-06-28 | 1978-01-12 | Fuji Photo Film Co Ltd | Diazo photosensitive composition |
JPS5498613A (en) * | 1978-01-09 | 1979-08-03 | Konishiroku Photo Ind Co Ltd | Photosensitive composition |
JPS55527A (en) * | 1978-06-16 | 1980-01-05 | Fuji Photo Film Co Ltd | Photosensitive planographic plate |
JPS5552054A (en) * | 1978-10-11 | 1980-04-16 | Konishiroku Photo Ind Co Ltd | Developing solution composition |
JPS564144A (en) * | 1979-06-23 | 1981-01-17 | Tokyo Ohka Kogyo Co Ltd | Photosensitive composition |
JPS5964396A (ja) * | 1982-10-05 | 1984-04-12 | Fuji Photo Film Co Ltd | 平版印刷版用版面保護剤 |
JPS60217356A (ja) * | 1984-04-13 | 1985-10-30 | Asahi Chem Ind Co Ltd | 感光性組成物 |
JP2550346B2 (ja) * | 1987-05-18 | 1996-11-06 | 光陽化学工業株式会社 | 平版製版用感光性組成物 |
JPH03125151A (ja) * | 1989-10-11 | 1991-05-28 | Konica Corp | 湿し水不要の感光性平版印刷版用現像液 |
JPH03148663A (ja) * | 1989-11-03 | 1991-06-25 | Konica Corp | 湿し水不要の感光性平版印刷版用現像液 |
JPH03148662A (ja) * | 1989-11-03 | 1991-06-25 | Konica Corp | 湿し水不要の感光性平版印刷版用現像液 |
JP2815332B2 (ja) * | 1995-12-18 | 1998-10-27 | 旭化成工業株式会社 | 感光性組成物の製造方法 |
JP4458389B2 (ja) | 2000-05-01 | 2010-04-28 | コダック株式会社 | 感光性組成物および感光性平版印刷版 |
JP4410714B2 (ja) | 2004-08-13 | 2010-02-03 | 富士フイルム株式会社 | 平版印刷版用支持体の製造方法 |
JP4499507B2 (ja) | 2004-08-23 | 2010-07-07 | コダック株式会社 | 平版印刷版原版 |
EP1712368B1 (en) | 2005-04-13 | 2008-05-14 | FUJIFILM Corporation | Method of manufacturing a support for a lithographic printing plate |
JP5165197B2 (ja) * | 2005-12-12 | 2013-03-21 | 岡本化学工業株式会社 | 平版印刷版用捨版およびその製造方法 |
EP2042339B1 (en) | 2007-09-26 | 2013-05-22 | FUJIFILM Corporation | Fountain solution composition for lithographic printing and heatset offset rotary printing process |
US20090081592A1 (en) | 2007-09-26 | 2009-03-26 | Fujifilm Corporation | Fountain solution composition for lithographic printing and heat-set offset rotary printing process |
JP2009083106A (ja) | 2007-09-27 | 2009-04-23 | Fujifilm Corp | 平版印刷版用版面保護剤及び平版印刷版の製版方法 |
JP2009208140A (ja) | 2008-03-06 | 2009-09-17 | Fujifilm Corp | 平版印刷版用アルミニウム合金板の製造方法、ならびに該製造方法により得られる平版印刷版用アルミニウム合金板および平版印刷版用支持体 |
JP2009234247A (ja) | 2008-03-07 | 2009-10-15 | Fujifilm Corp | 平版印刷用湿し水組成物及びヒートセットオフ輪印刷方法 |
JP5288268B2 (ja) | 2009-03-25 | 2013-09-11 | 富士フイルム株式会社 | 平版印刷用湿し水組成物及びヒートセットオフ輪印刷方法 |
JP5281130B2 (ja) | 2011-07-05 | 2013-09-04 | 富士フイルム株式会社 | 平版印刷用湿し水組成物 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2034654C2 (de) * | 1970-07-13 | 1982-08-26 | Hoechst Ag, 6000 Frankfurt | Negativ arbeitende Kopierlösung und deren Verwendung zur Herstellung von Druckplatten |
IT948621B (it) * | 1971-02-19 | 1973-06-11 | Howson Algraphy Ltd | Procedimento per produrre lastre da stampa litografica e lastre cosi ottenute |
-
1974
- 1974-02-28 JP JP2394074A patent/JPS5534929B2/ja not_active Expired
-
1975
- 1975-02-26 GB GB813175A patent/GB1505739A/en not_active Expired
- 1975-02-27 CA CA221,185A patent/CA1060252A/en not_active Expired
- 1975-02-27 DE DE19752508618 patent/DE2508618C2/de not_active Expired
- 1975-02-28 FR FR7506415A patent/FR2262813B1/fr not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0040470A2 (en) * | 1980-04-30 | 1981-11-25 | Minnesota Mining And Manufacturing Company | Aqueous developable photosensitive composition and printing plate |
EP0040470A3 (en) * | 1980-04-30 | 1982-02-10 | Minnesota Mining And Manufacturing Company | Aqueous developable photosensitive composition and printing plate |
FR2651337A1 (fr) * | 1989-08-31 | 1991-03-01 | Efi | Composition photosensible a base de condensat diazouique pour plaques offset. |
EP0699960A1 (de) * | 1994-08-29 | 1996-03-06 | Hoechst Aktiengesellschaft | Lichtempfindliches Gemisch |
Also Published As
Publication number | Publication date |
---|---|
GB1505739A (en) | 1978-03-30 |
DE2508618A1 (de) | 1975-09-04 |
DE2508618C2 (de) | 1984-01-26 |
FR2262813B1 (ja) | 1977-04-15 |
CA1060252A (en) | 1979-08-14 |
JPS5534929B2 (ja) | 1980-09-10 |
JPS50118802A (ja) | 1975-09-17 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |