FR2151130A1 - Photo mask mfr - eliminating defects by successive partial exposures - Google Patents
Photo mask mfr - eliminating defects by successive partial exposuresInfo
- Publication number
- FR2151130A1 FR2151130A1 FR7231319A FR7231319A FR2151130A1 FR 2151130 A1 FR2151130 A1 FR 2151130A1 FR 7231319 A FR7231319 A FR 7231319A FR 7231319 A FR7231319 A FR 7231319A FR 2151130 A1 FR2151130 A1 FR 2151130A1
- Authority
- FR
- France
- Prior art keywords
- photo
- mfr
- photo mask
- successive partial
- eliminating defects
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19712143737 DE2143737A1 (de) | 1971-09-01 | 1971-09-01 | Photoaetzverfahren |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2151130A1 true FR2151130A1 (en) | 1973-04-13 |
FR2151130B1 FR2151130B1 (de) | 1974-08-19 |
Family
ID=5818349
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7231319A Granted FR2151130A1 (en) | 1971-09-01 | 1972-08-29 | Photo mask mfr - eliminating defects by successive partial exposures |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS5133445B2 (de) |
DE (1) | DE2143737A1 (de) |
FR (1) | FR2151130A1 (de) |
IT (1) | IT963413B (de) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2375665A1 (fr) * | 1976-12-27 | 1978-07-21 | Ibm | Procede de lithographie par faisceau electronique |
EP0000571A1 (de) * | 1977-08-01 | 1979-02-07 | Hoechst Aktiengesellschaft | Verfahren zum Herstellen eines Originals |
EP0037936A2 (de) * | 1980-04-10 | 1981-10-21 | Siemens Aktiengesellschaft | Verfahren zur Herstellung gedruckter Leiterplatten |
EP0097903A2 (de) * | 1982-06-30 | 1984-01-11 | Kabushiki Kaisha Toshiba | Elektronenstrahl-Belichtungsverfahren |
EP0097831A2 (de) * | 1982-06-30 | 1984-01-11 | International Business Machines Corporation | Optischer Projektionsapparat und Verfahren zur Herstellung optischer Bilder |
EP0448735A1 (de) * | 1990-03-23 | 1991-10-02 | Ushio Denki Kabushiki Kaisha | Randbelichtungsverfahren für Halbleiterscheiben |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS501805A (de) * | 1973-05-14 | 1975-01-09 | ||
JPS5168772A (en) * | 1974-12-11 | 1976-06-14 | Matsushita Electronics Corp | Handotaisochino seizohoho |
JPS5348676A (en) * | 1976-10-15 | 1978-05-02 | Handotai Kenkyu Shinkokai | Method of forming pattern |
JPS5429976A (en) * | 1977-08-10 | 1979-03-06 | Nec Home Electronics Ltd | Manufacture of semiconductor device |
JPS5676531A (en) * | 1979-11-28 | 1981-06-24 | Fujitsu Ltd | Manufacture of semiconductor device |
JPS5749915A (en) * | 1980-09-10 | 1982-03-24 | Sumitomo Electric Ind Ltd | Image converting element |
JPS59232418A (ja) * | 1983-06-15 | 1984-12-27 | Sumitomo Electric Ind Ltd | 微細パタ−ン形成法 |
-
1971
- 1971-09-01 DE DE19712143737 patent/DE2143737A1/de active Pending
-
1972
- 1972-07-27 IT IT2747972A patent/IT963413B/it active
- 1972-08-11 JP JP8007972A patent/JPS5133445B2/ja not_active Expired
- 1972-08-29 FR FR7231319A patent/FR2151130A1/fr active Granted
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2375665A1 (fr) * | 1976-12-27 | 1978-07-21 | Ibm | Procede de lithographie par faisceau electronique |
EP0000571A1 (de) * | 1977-08-01 | 1979-02-07 | Hoechst Aktiengesellschaft | Verfahren zum Herstellen eines Originals |
EP0037936A2 (de) * | 1980-04-10 | 1981-10-21 | Siemens Aktiengesellschaft | Verfahren zur Herstellung gedruckter Leiterplatten |
EP0037936A3 (de) * | 1980-04-10 | 1983-08-17 | Siemens Aktiengesellschaft | Verfahren zur Herstellung gedruckter Leiterplatten |
EP0097903A2 (de) * | 1982-06-30 | 1984-01-11 | Kabushiki Kaisha Toshiba | Elektronenstrahl-Belichtungsverfahren |
EP0097831A2 (de) * | 1982-06-30 | 1984-01-11 | International Business Machines Corporation | Optischer Projektionsapparat und Verfahren zur Herstellung optischer Bilder |
EP0097903A3 (en) * | 1982-06-30 | 1985-10-23 | Kabushiki Kaisha Toshiba | Method of electron beam exposure |
EP0097831A3 (en) * | 1982-06-30 | 1986-05-07 | International Business Machines Corporation | Optical projection systems and methods of producing optical images |
US4644170A (en) * | 1982-06-30 | 1987-02-17 | Tokyo Shibaura Denki Kabushiki Kaisha | Method of electron beam exposure |
EP0448735A1 (de) * | 1990-03-23 | 1991-10-02 | Ushio Denki Kabushiki Kaisha | Randbelichtungsverfahren für Halbleiterscheiben |
Also Published As
Publication number | Publication date |
---|---|
JPS5133445B2 (de) | 1976-09-20 |
JPS4833908A (de) | 1973-05-15 |
FR2151130B1 (de) | 1974-08-19 |
IT963413B (it) | 1974-01-10 |
DE2143737A1 (de) | 1973-03-08 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |