ES2181126T3 - Oxidos metalicos con la carga modificada y sistemas electrostatograficos que los incorporan. - Google Patents
Oxidos metalicos con la carga modificada y sistemas electrostatograficos que los incorporan.Info
- Publication number
- ES2181126T3 ES2181126T3 ES98301658T ES98301658T ES2181126T3 ES 2181126 T3 ES2181126 T3 ES 2181126T3 ES 98301658 T ES98301658 T ES 98301658T ES 98301658 T ES98301658 T ES 98301658T ES 2181126 T3 ES2181126 T3 ES 2181126T3
- Authority
- ES
- Spain
- Prior art keywords
- metal oxide
- charge
- electrostagraphical
- systems
- metal oxides
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
- C09C1/3081—Treatment with organo-silicon compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G9/00—Developers
- G03G9/08—Developers with toner particles
- G03G9/097—Plasticisers; Charge controlling agents
- G03G9/09708—Inorganic compounds
- G03G9/09716—Inorganic compounds treated with organic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G9/00—Developers
- G03G9/08—Developers with toner particles
- G03G9/097—Plasticisers; Charge controlling agents
- G03G9/09708—Inorganic compounds
- G03G9/09725—Silicon-oxides; Silicates
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/50—Agglomerated particles
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/80—Particles consisting of a mixture of two or more inorganic phases
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
- Y10T428/2991—Coated
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
- Y10T428/2991—Coated
- Y10T428/2993—Silicic or refractory material containing [e.g., tungsten oxide, glass, cement, etc.]
- Y10T428/2995—Silane, siloxane or silicone coating
Landscapes
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Inorganic Chemistry (AREA)
- Composite Materials (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Developing Agents For Electrophotography (AREA)
- Photoreceptors In Electrophotography (AREA)
- Dry Development In Electrophotography (AREA)
Abstract
LA PRESENTE INVENCION ESTA RELACIONADA CON UN OXIDO DE METAL CON LA CARGA MODIFICADA Y UNAS COMPOSICIONES DE TONER Y DESARROLLADOR QUE INCORPOREN EL MISMO. EL OXIDO DE METAL CON LA CARGA MODIFICADA CONTIENE UN OXIDO METALICO QUE TENGA ADEMAS UN SILAZANO CICLICO TRATADO, Y OPCIONALMENTE, UN SEGUNDO AGENTE DE TRATAMIENTO PARA IMPARTIR HIDROFOBICIDAD. SE HA ENCONTRADO QUE EL OXIDO DE METAL CON LA CARGA MODIFICADA PROPORCIONA UNOS ATRIBUTOS EFECTIVOS DE LIBRE FLUIDEZ A LA COMPOSICION DEL TONER O EL DESARROLLADOR, Y QUE ADEMAS PUEDE TENER INFLUENCIA SOBRE LAS CARACTERISTICAS DE CARGA DE LOS MISMOS.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/812,788 US5989768A (en) | 1997-03-06 | 1997-03-06 | Charge-modified metal oxides with cyclic silazane and electrostatographic systems incorporating same |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2181126T3 true ES2181126T3 (es) | 2003-02-16 |
Family
ID=25210627
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES98301658T Expired - Lifetime ES2181126T3 (es) | 1997-03-06 | 1998-03-06 | Oxidos metalicos con la carga modificada y sistemas electrostatograficos que los incorporan. |
Country Status (12)
Country | Link |
---|---|
US (2) | US5989768A (es) |
EP (1) | EP0863444B1 (es) |
JP (1) | JP4704526B2 (es) |
CN (1) | CN1186695C (es) |
AT (1) | ATE224068T1 (es) |
AU (1) | AU6342298A (es) |
DE (1) | DE69807764T2 (es) |
ES (1) | ES2181126T3 (es) |
HK (1) | HK1015896A1 (es) |
MY (1) | MY112360A (es) |
TW (1) | TW565751B (es) |
WO (1) | WO1998039690A1 (es) |
Families Citing this family (48)
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US6091476A (en) * | 1997-06-24 | 2000-07-18 | Nippon Shokubai Co., Ltd. | Liquid crystal display using spacers having hydrophobic inorganic particles attached to the spacer body |
DE19756831A1 (de) * | 1997-12-19 | 1999-07-01 | Wacker Chemie Gmbh | Siliciumdioxid, das an seiner Oberfläche teil- oder vollständig silylierte Polykieselsäureketten trägt |
EP0971273B1 (en) * | 1998-07-06 | 2005-04-13 | Canon Kabushiki Kaisha | Toner, image forming method, and apparatus unit |
DE19857912A1 (de) * | 1998-12-16 | 2000-07-06 | Degussa | Toner und/oder Toner-Mischungen |
US6194481B1 (en) * | 1999-05-19 | 2001-02-27 | Board Of Regents Of The University Of Texas System | Mechanically strong and transparent or translucent composites made using zirconium oxide nanoparticles |
US6790476B1 (en) | 2000-05-23 | 2004-09-14 | Sandia Corporation | Method of adhesion between an oxide layer and a metal layer |
US6203960B1 (en) * | 2000-08-22 | 2001-03-20 | Xerox Corporation | Toner compositions |
WO2002074869A1 (en) * | 2001-03-15 | 2002-09-26 | Cabot Corporation | Corrosion-resistant coating composition |
US6777152B2 (en) * | 2001-03-30 | 2004-08-17 | Shin-Etsu Chemical Co., Ltd. | Electrostatic image developer |
DE10151478C1 (de) † | 2001-10-18 | 2003-03-13 | Wacker Chemie Gmbh | Mit Aminogruppen oberflächenmodifizierte Feststoffe, Verfahren zu deren Herstellung und deren Verwendung |
US6964936B1 (en) | 2003-03-06 | 2005-11-15 | Sandia Corporation | Method of making maximally dispersed heterogeneous catalysts |
GB0323054D0 (en) * | 2003-10-02 | 2003-11-05 | Microtherm Int Ltd | Microporous thermal insulation material |
US7169208B2 (en) * | 2004-06-10 | 2007-01-30 | Inco Limited | Method and composition for dispersing extra-fine nickel powder |
US7229735B2 (en) * | 2004-07-26 | 2007-06-12 | Xerox Corporation | Toner compositions |
US7811540B2 (en) * | 2004-10-20 | 2010-10-12 | Cabot Corporation | Method of preparing hydrophobic silica directly from an aqueous colloidal silica dispersion |
DE102004057997A1 (de) * | 2004-12-01 | 2006-06-08 | Wacker Chemie Ag | Metalloxide mit einer in einem weiten pH-Bereich permanenten positiven Oberflächenladung |
KR101172449B1 (ko) * | 2005-02-15 | 2012-08-07 | 엘지전자 주식회사 | 전자 종이 표시 장치용 입자 및 그 제조 방법 |
JP2007033583A (ja) * | 2005-07-25 | 2007-02-08 | Tomoegawa Paper Co Ltd | 電子写真用トナー |
JP4755553B2 (ja) * | 2005-09-15 | 2011-08-24 | 株式会社リコー | 非磁性トナー、並びに画像形成方法、画像形成装置及びプロセスカートリッジ |
US8062820B2 (en) * | 2006-05-12 | 2011-11-22 | Cabot Corporation | Toner composition and method of preparing same |
US8435474B2 (en) | 2006-09-15 | 2013-05-07 | Cabot Corporation | Surface-treated metal oxide particles |
US20080070146A1 (en) | 2006-09-15 | 2008-03-20 | Cabot Corporation | Hydrophobic-treated metal oxide |
US8455165B2 (en) * | 2006-09-15 | 2013-06-04 | Cabot Corporation | Cyclic-treated metal oxide |
US8202502B2 (en) | 2006-09-15 | 2012-06-19 | Cabot Corporation | Method of preparing hydrophobic silica |
US20090011352A1 (en) * | 2007-07-02 | 2009-01-08 | John Francis Cooper | Process for preparing novel composite imaging materials and novel composite imaging materials prepared by the process |
DE102007035951A1 (de) * | 2007-07-30 | 2009-02-05 | Evonik Degussa Gmbh | Oberflächenmodifizierte, pyrogen hergestellte Kieselsäuren |
DE102007035955A1 (de) * | 2007-07-30 | 2009-02-05 | Evonik Degussa Gmbh | Oberflächenmodifizierte, pyrogen hergestellte Kieselsäuren |
DE102007035952A1 (de) * | 2007-07-30 | 2009-04-09 | Evonik Degussa Gmbh | Oberflächenmodifizierte, pyrogen hergestellte Kieselsäuren |
DE102007035956A1 (de) * | 2007-07-30 | 2009-02-05 | Evonik Degussa Gmbh | Oberflächenmodifizierte, pyrogen hergestellte Kieselsäuren |
CN101809507B (zh) * | 2007-09-29 | 2012-10-10 | 日本瑞翁株式会社 | 静电图像显影用带正电性调色剂 |
EP2231758A1 (en) * | 2007-12-21 | 2010-09-29 | Cabot Corporation | Filler system including densed fumed metal oxide |
JP5248155B2 (ja) * | 2008-03-20 | 2013-07-31 | 株式会社巴川製紙所 | 電子写真用トナー |
DE102008001437A1 (de) * | 2008-04-28 | 2009-10-29 | Evonik Degussa Gmbh | Oberflächenmodifizierte, superparamagnetische oxidische Partikel |
DE102008001433A1 (de) * | 2008-04-28 | 2009-10-29 | Evonik Degussa Gmbh | Hydrophobiertes Silicium-Eisen-Mischoxid |
WO2009139502A1 (ja) * | 2008-05-16 | 2009-11-19 | キヤノン株式会社 | 疎水性無機微粒子及びトナー |
EP2357157B1 (en) * | 2008-10-01 | 2020-03-11 | Nippon Aerosil Co., Ltd. | Hydrophobic silica fine particles and electrophotographic toner composition |
JP5353204B2 (ja) * | 2008-11-27 | 2013-11-27 | 日本ゼオン株式会社 | 静電荷像現像用トナー及び画像形成方法 |
JP4894876B2 (ja) * | 2009-03-25 | 2012-03-14 | 富士ゼロックス株式会社 | 静電荷像現像用トナー、トナーカートリッジ、プロセスカートリッジ及び画像形成装置 |
US8592114B2 (en) * | 2009-04-01 | 2013-11-26 | Zeon Corporation | Toner for developing electrostatic images |
US20110244382A1 (en) | 2010-04-06 | 2011-10-06 | Christopher Alyson M | Hydrophobic silica particles and method of producing same |
JP5722670B2 (ja) * | 2011-03-10 | 2015-05-27 | サカタインクス株式会社 | 非磁性静電荷像現像用トナー |
US8217087B1 (en) | 2011-04-26 | 2012-07-10 | Keller Companies, Inc. | Aerogel with reduced dust, static charge, and having reduced fluidity when in granular form |
JP2013092748A (ja) | 2011-10-26 | 2013-05-16 | Cabot Corp | 複合体粒子を含むトナー添加剤 |
US9921509B2 (en) | 2014-11-18 | 2018-03-20 | Esprix Technologies, Lp | Process for preparing novel composite charge control agents and novel composite charge control agents prepared by the process |
PL3178887T3 (pl) * | 2015-12-09 | 2018-11-30 | Evonik Degussa Gmbh | Krzemionka hydrofobowa do kompozycji tonera elektrofotograficznego |
CN105929646A (zh) * | 2016-06-16 | 2016-09-07 | 南京新天兴影像科技有限公司 | 一种高速静电复印机双组份显影用色调剂及其制备方法 |
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WO2023230251A1 (en) | 2022-05-27 | 2023-11-30 | Cabot Corporation | Aerogel composition for thermal insulation |
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-
1997
- 1997-03-06 US US08/812,788 patent/US5989768A/en not_active Expired - Lifetime
-
1998
- 1998-03-02 CN CNB988047551A patent/CN1186695C/zh not_active Expired - Lifetime
- 1998-03-02 AU AU63422/98A patent/AU6342298A/en not_active Abandoned
- 1998-03-02 WO PCT/US1998/003888 patent/WO1998039690A1/en active Application Filing
- 1998-03-04 TW TW087103122A patent/TW565751B/zh not_active IP Right Cessation
- 1998-03-05 MY MYPI98000957A patent/MY112360A/en unknown
- 1998-03-06 AT AT98301658T patent/ATE224068T1/de not_active IP Right Cessation
- 1998-03-06 EP EP98301658A patent/EP0863444B1/en not_active Expired - Lifetime
- 1998-03-06 JP JP05533998A patent/JP4704526B2/ja not_active Expired - Lifetime
- 1998-03-06 ES ES98301658T patent/ES2181126T3/es not_active Expired - Lifetime
- 1998-03-06 DE DE69807764T patent/DE69807764T2/de not_active Expired - Lifetime
- 1998-05-01 US US09/071,057 patent/US5900315A/en not_active Expired - Lifetime
-
1999
- 1999-03-09 HK HK99100948A patent/HK1015896A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
ATE224068T1 (de) | 2002-09-15 |
EP0863444B1 (en) | 2002-09-11 |
HK1015896A1 (en) | 1999-10-22 |
US5900315A (en) | 1999-05-04 |
AU6342298A (en) | 1998-09-22 |
WO1998039690A1 (en) | 1998-09-11 |
CN1254418A (zh) | 2000-05-24 |
EP0863444A1 (en) | 1998-09-09 |
JPH10330115A (ja) | 1998-12-15 |
MY112360A (en) | 2001-05-31 |
CN1186695C (zh) | 2005-01-26 |
DE69807764D1 (de) | 2002-10-17 |
DE69807764T2 (de) | 2003-05-15 |
JP4704526B2 (ja) | 2011-06-15 |
US5989768A (en) | 1999-11-23 |
TW565751B (en) | 2003-12-11 |
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