ES2140569T3 - Procedimiento pvd para la deposicion de capas de material duro de varios componentes. - Google Patents

Procedimiento pvd para la deposicion de capas de material duro de varios componentes.

Info

Publication number
ES2140569T3
ES2140569T3 ES95102352T ES95102352T ES2140569T3 ES 2140569 T3 ES2140569 T3 ES 2140569T3 ES 95102352 T ES95102352 T ES 95102352T ES 95102352 T ES95102352 T ES 95102352T ES 2140569 T3 ES2140569 T3 ES 2140569T3
Authority
ES
Spain
Prior art keywords
deposition
layers
various components
hard material
pvd
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES95102352T
Other languages
English (en)
Inventor
Wolf-Dieter Dr Munz
Thuan-Thon Dipl-Ing Trinh
Antonius Petrus Arnol Hurkmans
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hauzer Holding BV
Original Assignee
Hauzer Holding BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hauzer Holding BV filed Critical Hauzer Holding BV
Application granted granted Critical
Publication of ES2140569T3 publication Critical patent/ES2140569T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

SE DESCRIBE UN PROCESO DE RECUBRIMIENTO PVD, DONDE SE ELABORAN CAPAS DE SUSTANCIAS ENDURECIDAS, COMPUESTAS DE NITRUROS O CARBONITRUROS DE LOS METALES TI, ZR, HF O DE ALEACIONES DE TIAL, ZRAL, HFAL, TIZR, TIZRAL, CON UN MAGNETRON (UBM) NO EQUILIBRADO. DURANTE UN ESPACIO DE TIEMPO DETERMINADO DEL PROCESO DE RECUBRIMIENTO SE SEPARA EL MATERIAL DE RECUBRIMIENTO ADICIONAL A PARTIR DE UNA EVAPORACION (KBE) DE DESCARGA DE ARCO CATODICO SOBRE LOS SUBSTRATOS A SER RECUBIERTOS.
ES95102352T 1994-02-21 1995-02-20 Procedimiento pvd para la deposicion de capas de material duro de varios componentes. Expired - Lifetime ES2140569T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE4405477A DE4405477A1 (de) 1994-02-21 1994-02-21 PVD-Verfahren zur Abscheidung von mehrkomponentigen Hartstoffschichten

Publications (1)

Publication Number Publication Date
ES2140569T3 true ES2140569T3 (es) 2000-03-01

Family

ID=6510761

Family Applications (1)

Application Number Title Priority Date Filing Date
ES95102352T Expired - Lifetime ES2140569T3 (es) 1994-02-21 1995-02-20 Procedimiento pvd para la deposicion de capas de material duro de varios componentes.

Country Status (5)

Country Link
EP (1) EP0668369B1 (es)
AT (1) ATE186335T1 (es)
DE (2) DE4405477A1 (es)
DK (1) DK0668369T3 (es)
ES (1) ES2140569T3 (es)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19609647A1 (de) * 1996-03-12 1997-09-18 Univ Sheffield Hartstoffschicht
EP1186681B1 (de) * 2000-09-05 2010-03-31 Oerlikon Trading AG, Trübbach Vakuumanlage mit koppelbarem Werkstückträger
AUPR353601A0 (en) * 2001-03-05 2001-03-29 Commonwealth Scientific And Industrial Research Organisation Deposition process
DE102007030735A1 (de) 2007-07-02 2009-01-08 Walter Ag Werkzeug mit mehrlagiger Metalloxidbeschichtung
CN101368260A (zh) 2007-09-14 2009-02-18 山特维克知识产权股份有限公司 用于在基底上沉积涂层的方法和设备
KR100977613B1 (ko) * 2008-03-26 2010-08-23 한전케이피에스 주식회사 고온용 부품의 윤활코팅장치
DE102010028558A1 (de) 2010-05-04 2011-11-10 Walter Ag PVD-Hybridverfahren zum Abscheiden von Mischkristallschichten
DE102012023260A1 (de) * 2012-11-29 2014-06-05 Oerlikon Trading Ag, Trübbach Verfahren zur Strukturierung von Schichtoberflächen und Vorrichtung dazu
EP2860285B1 (en) * 2013-10-14 2016-09-14 Rigas Tehniska universitate Method for increasing heat resistance of metallic articles
CN105887013A (zh) * 2016-06-12 2016-08-24 沈阳大学 用于镍钛根管锉表面改性的钛锆氮化金属物膜的制备方法
US20220162739A1 (en) 2019-03-15 2022-05-26 Nanofilm Technologies International Limited Improved coating processes

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5234561A (en) * 1988-08-25 1993-08-10 Hauzer Industries Bv Physical vapor deposition dual coating process
EP0404973A1 (de) * 1989-06-27 1991-01-02 Hauzer Holding B.V. Verfahren und Vorrichtung zur Beschichtung von Substraten
US5306407A (en) * 1989-06-27 1994-04-26 Hauzer Holding Bv Method and apparatus for coating substrates
DE4206110A1 (de) * 1992-02-27 1993-09-02 Hauzer Holding Mehrlagen-pvd-beschichtungsverfahren zur herstellung dekorativer und korrosionsschuetzender hartstoffoberflaechen
DE4331890A1 (de) * 1993-09-20 1995-03-23 Hauzer Techno Coating Europ B Verfahren zum Aufbringen einer Hartstoffbeschichtung auf Substrate sowie mit einer Hartstoffbeschichtung versehene Schneidwerkzeuge

Also Published As

Publication number Publication date
DE59507150D1 (de) 1999-12-09
EP0668369A1 (de) 1995-08-23
DK0668369T3 (da) 2000-02-07
EP0668369B1 (de) 1999-11-03
ATE186335T1 (de) 1999-11-15
DE4405477A1 (de) 1995-08-24

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