EP4003925A1 - Materiau comprenant un substrat muni d'un empilement a proprietes thermiques pour affichage tête haute - Google Patents
Materiau comprenant un substrat muni d'un empilement a proprietes thermiques pour affichage tête hauteInfo
- Publication number
- EP4003925A1 EP4003925A1 EP20743718.7A EP20743718A EP4003925A1 EP 4003925 A1 EP4003925 A1 EP 4003925A1 EP 20743718 A EP20743718 A EP 20743718A EP 4003925 A1 EP4003925 A1 EP 4003925A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- dielectric
- dielectric coating
- functional layer
- thickness
- optical thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 47
- 239000000463 material Substances 0.000 title claims abstract description 37
- 239000010410 layer Substances 0.000 claims abstract description 126
- 238000000576 coating method Methods 0.000 claims abstract description 83
- 239000002346 layers by function Substances 0.000 claims abstract description 81
- 229910052751 metal Inorganic materials 0.000 claims abstract description 16
- 239000002184 metal Substances 0.000 claims abstract description 16
- 229910052709 silver Inorganic materials 0.000 claims abstract description 8
- 239000004332 silver Substances 0.000 claims abstract description 8
- 239000011248 coating agent Substances 0.000 claims description 64
- 230000003287 optical effect Effects 0.000 claims description 60
- 230000004888 barrier function Effects 0.000 claims description 23
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 7
- 229910052726 zirconium Inorganic materials 0.000 claims description 7
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 abstract description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 20
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 20
- 230000005540 biological transmission Effects 0.000 description 18
- 230000000087 stabilizing effect Effects 0.000 description 16
- 230000000903 blocking effect Effects 0.000 description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- 229910052710 silicon Inorganic materials 0.000 description 11
- 239000010703 silicon Substances 0.000 description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 10
- 229910052786 argon Inorganic materials 0.000 description 10
- 239000003086 colorant Substances 0.000 description 10
- 239000011787 zinc oxide Substances 0.000 description 10
- 239000011521 glass Substances 0.000 description 9
- 239000012298 atmosphere Substances 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- 238000000137 annealing Methods 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 238000009736 wetting Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- -1 silicon nitrides Chemical class 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- 229910052718 tin Inorganic materials 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 230000001747 exhibiting effect Effects 0.000 description 3
- 230000010287 polarization Effects 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 239000004812 Fluorinated ethylene propylene Substances 0.000 description 2
- 239000002033 PVDF binder Substances 0.000 description 2
- 230000002745 absorbent Effects 0.000 description 2
- 239000002250 absorbent Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 230000001186 cumulative effect Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 229920000840 ethylene tetrafluoroethylene copolymer Polymers 0.000 description 2
- 230000014509 gene expression Effects 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 229920009441 perflouroethylene propylene Polymers 0.000 description 2
- 229920002493 poly(chlorotrifluoroethylene) Polymers 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920001707 polybutylene terephthalate Polymers 0.000 description 2
- 239000005023 polychlorotrifluoroethylene (PCTFE) polymer Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- CHJAYYWUZLWNSQ-UHFFFAOYSA-N 1-chloro-1,2,2-trifluoroethene;ethene Chemical group C=C.FC(F)=C(F)Cl CHJAYYWUZLWNSQ-UHFFFAOYSA-N 0.000 description 1
- OXBLVCZKDOZZOJ-UHFFFAOYSA-N 2,3-Dihydrothiophene Chemical compound C1CC=CS1 OXBLVCZKDOZZOJ-UHFFFAOYSA-N 0.000 description 1
- 229910000906 Bronze Inorganic materials 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- 229920001780 ECTFE Polymers 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229910003087 TiOx Inorganic materials 0.000 description 1
- 229910008651 TiZr Inorganic materials 0.000 description 1
- 238000004378 air conditioning Methods 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 239000006117 anti-reflective coating Substances 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004737 colorimetric analysis Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000005485 electric heating Methods 0.000 description 1
- QHSJIZLJUFMIFP-UHFFFAOYSA-N ethene;1,1,2,2-tetrafluoroethene Chemical group C=C.FC(F)=C(F)F QHSJIZLJUFMIFP-UHFFFAOYSA-N 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920002578 polythiourethane polymer Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
- ZVWKZXLXHLZXLS-UHFFFAOYSA-N zirconium nitride Chemical compound [Zr]#N ZVWKZXLXHLZXLS-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
- B32B17/10—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
- B32B17/10005—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing
- B32B17/10165—Functional features of the laminated safety glass or glazing
- B32B17/10174—Coatings of a metallic or dielectric material on a constituent layer of glass or polymer
- B32B17/1022—Metallic coatings
- B32B17/10229—Metallic layers sandwiched by dielectric layers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3639—Multilayers containing at least two functional metal layers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3649—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
- C03C17/366—Low-emissivity or solar control coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3681—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating being used in glazing, e.g. windows or windscreens
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
- C23C14/0652—Silicon nitride
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
- C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
- B32B17/10—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
- B32B17/10005—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing
- B32B17/10009—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the number, the constitution or treatment of glass sheets
- B32B17/10036—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the number, the constitution or treatment of glass sheets comprising two outer glass sheets
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/20—Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
- B32B2307/206—Insulating
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
- B32B2307/412—Transparent
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
- B32B2307/418—Refractive
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2605/00—Vehicles
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
Definitions
- the invention relates to a material, such as glazing, comprising a transparent substrate coated with a stack of thin layers comprising several functional layers which can act on solar radiation and / or infrared radiation.
- a material such as glazing
- the invention also relates to glazing comprising these materials as well as the use of such materials for manufacturing thermal insulation and / or solar protection glazing.
- the invention relates more specifically to such a material for making so-called “solar control” vehicle glazing, making it possible to reduce the air conditioning force and / or to prevent excessive overheating inside the vehicle passenger compartment, while allowing a display called "head up” or HUD for "Head Up Display” in English.
- the invention relates even more specifically to such a material for making such glazing units in which the solar control function is performed using a stack of thin layers comprising several functional metallic layers, this stack having over all of its thickness, a low electrical resistance such that the stack can be heated by applying an electric current available on board the vehicle, the current passing transversely to the thickness of the stack.
- Glazing and in particular laminated glazing comprising transparent substrates coated with a stack of thin layers comprising four metallic functional layers, each arranged between two dielectric coatings, have been proposed in order to improve solar protection, to obtain low resistance by square, while maintaining sufficient light transmission.
- These stacks are generally obtained by a succession of deposits carried out by cathodic sputtering possibly assisted by a magnetic field.
- the inventors have surprisingly discovered that by selecting the thicknesses of the four functional layers, it is possible to obtain a material capable of exhibiting the desired properties.
- the present invention is based on the use of a stack with four metallic functional layers (that is to say of a stack with exactly four metallic functional layers, no more, no less) whose respective thicknesses starting from the substrate carrier are particular in that the second, third and fourth functional layers each have a thickness greater than that of the first layer but less than double that of this first layer.
- the first subject of the invention is a material according to claim 1.
- This material comprises a transparent substrate coated on one side with a stack of thin layers comprising successively from said side an alternation:
- each dielectric coating comprising a dielectric layer or a dielectric assembly of layers
- each functional metal layer is disposed between two dielectric coatings.
- the physical thickness Ea1 of the first functional layer Agi is less than the physical thickness Ea2 of the second functional layer Ag2, with 0.60 ⁇ Ea1 / Ea2
- the physical thickness Ea1 of the first functional layer Agi is such as 8.00 £ Ea1 £ 13.00 nm, or even is such as 9.00 £ Ea1 £ 12.00 nm;
- the physical thickness Ea1 of the first functional layer Agi is less than the physical thickness Ea3 of the third functional layer Ag3, with 0.60 ⁇ Ea1 / Ea3
- the physical thickness Ea1 of the first functional layer Agi is less than the physical thickness Ea4 of the fourth functional layer Ag4, with 0.60 ⁇ Ea1 / Ea4 ⁇ 0.90, or even 0.70 £ Ea1 / Ea4 £ 0 , 85, or even £ 0.75 Ea1 / Ea4 £ 0.85.
- the material decreases the color intensity in s polarization reflection (L * (Ri65 °) ⁇ 15.0); the material does not increase the intensity of the p-polarization reflection color.
- the geometric thickness Ea2 of the second functional layer Ag2 is between 12.0 and 15.0 nm;
- the geometric thickness Ea3 of the third functional layer Ag3 is between 13.0 and 16.0 nm;
- the geometric thickness Ea4 of the fourth functional layer Ag4 is between 13.0 and 16.0 nm;
- the cumulative geometric thickness of the four functional layers Agi, Ag2, Ag3 and Ag4 is between 45.0 and 65.0 nanometers, and preferably is between 50.0 and 60.0 nanometers;
- the optical thickness Eo1 of the first dielectric coating M1 is less than the optical thickness Eo2 of the second dielectric coating M2, with 0.40 ⁇ Eo1 / Eo2 ⁇ 0.90, or even 0.45 £ Eo1 / Eo2 £ 0.85 ;
- the optical thickness Eo1 of the first dielectric coating M1 is less than the optical thickness Eo3 of the third dielectric coating M3, with 0.40 ⁇ Eo1 / Eo3
- the optical thickness Eo1 of the first dielectric coating M1 is less than the optical thickness Eo4 of the fourth dielectric coating M4, with 0.35 ⁇ Eo1 / Eo4
- the optical thickness Eo5 of the fifth dielectric coating M5 is such that 0.50 ⁇ Eo1 / Eo5 ⁇ 1.50, or even 0.60 £ Eo1 / Eo5 £ 1.30;
- the physical thickness Ea2 of the second functional layer Ag2 is such that 0.80 ⁇ Ea2 / Ea3 ⁇ 1, 20, or even 0.90 £ Ea2 / Ea3 ⁇ 1, 10, or even 0.95 £ Ea2 / Ea3 £ 1 , 05 and; - the physical thickness Ea2 of the second functional layer Ag2 is such that 0.80 ⁇ Ea2 / Ea4 ⁇ 1, 20, or even 0.90 £ Ea2 / Ea4 ⁇ 1, 10, or even 0.95 £ Ea2 / Ea4 £ 1 , 05.
- the physical thickness Ea3 of the third functional layer Ag3 is preferably such that 0.80 ⁇ Ea3 / Ea4 ⁇ 1. 20, or even 0.90 £ Ea3 / Ea4 £ 1.10, or even 0.95 £ Ea3 / Ea4 £ 1.05.
- each dielectric coating M1, M2, M3, M4 and M5 comprises a high index dielectric layer with a refractive index at the wavelength of 550 nm equal to or greater than 2.2, and preferably comprises a high index dielectric barrier layer, each of which is based on silicon nitride and zirconium.
- the optical thickness of said high index dielectric layer preferably constitutes between 20% and 75% of the optical thickness of the dielectric coating in which it is located, or even between 25% and 70% of the optical thickness of the dielectric coating in which it is located.
- the optical thickness Eo2 of the second dielectric coating M2 is close to or identical to the optical thickness Eo3 of the third dielectric coating M3, with 0.80 ⁇ Eo2 / Eo3
- the optical thickness Eo2 of the second dielectric coating M2 is close to or identical to the optical thickness Eo4 of the fourth dielectric coating M4, with 0.80 ⁇ Eo2 / Eo4 ⁇ 1, 20, or even 0.90 £ Eo2 / Eo4 £ 1 , 10;
- the optical thickness Eo2 of the second dielectric coating M2 is greater than the optical thickness Eo5 of the fifth dielectric coating M5, with 1.30 ⁇ Eo2 / Eo5
- the optical thickness Eo3 of the third dielectric coating M3 is close to or identical to the optical thickness Eo4 of the fourth dielectric coating M4, with 0.80
- the optical thickness Eo3 of the third dielectric coating M3 is greater than the optical thickness Eo5 of the fifth dielectric coating M5, with 1, 20 ⁇ Eo3 / Eo5
- the optical thickness Eo4 of the fourth dielectric coating M4 is greater than the optical thickness Eo5 of the fifth dielectric coating M5, with 1.20 ⁇ Eo4 / Eo5 ⁇ 2.10, or even 1.30 £ Eo4 / Eo5 £ 1.90.
- Said four functional silver-based metal layers may be functional silver metal layers.
- the stack can comprise, or consist of, starting from the transparent substrate:
- a first dielectric coating M1 preferably comprising at least one dielectric layer having a barrier function and a dielectric layer having a wetting function
- a second dielectric coating M2 preferably comprising at least one dielectric layer having a barrier function and a dielectric layer having a wetting function
- a third dielectric coating M3 preferably comprising at least one dielectric layer with a barrier function and a dielectric layer with a wetting function
- a fourth dielectric coating M4 preferably comprising at least one dielectric layer having a barrier function and a dielectric layer having a wetting function
- a fifth dielectric coating M5 preferably comprising at least one dielectric layer with a barrier function.
- the invention further relates to a glazing comprising at least one material as described above.
- a glazing comprising at least one material as described above.
- Such glazing is preferably in the form of laminated glazing.
- a dielectric coating within the meaning of the invention preferably does not include any absorbent, metallic or nitrided layer at all.
- the refractive indices are measured at a wavelength of 550 nm.
- the factors of light transmission T L and light reflection R LS were measured under illuminant A with a field of view of 2 ° or according to illuminant D65 at 10 ° Observer according to the indications below.
- the thicknesses mentioned in this document without further details are physical, or even real or geometric, thicknesses called Ep for the dielectric layers and Ea for the functional metal layers and are expressed in nanometers.
- the refractive index being a dimensionless value, it can be considered that the unit of the optical thickness is the same as that chosen for the physical thickness. In the present description, the unit chosen for the thicknesses is the nanometer, unless otherwise indicated. If a dielectric coating is composed of several dielectric layers, the optical thickness of the dielectric coating corresponds to the sum of the optical thicknesses of the different dielectric layers constituting the dielectric coating.
- the substrate according to the invention is considered to be laid horizontally.
- the stack of thin layers is deposited above and in contact with the substrate.
- the meaning of the expressions “above” and “below” and “lower” and “upper” is to be considered in relation to this orientation.
- the expressions “above” and “below” do not necessarily mean that two layers and / or coatings are placed in contact with one another.
- a layer is deposited “in contact” with another layer or a coating, this means that there cannot be one (or more) layer (s) interposed between these. two coats (or coat and coating).
- first” / “first”, “second”, “third”, “fourth” and “fifth” for the functional layers or the dielectric coatings are defined starting from the substrate carrying the stacking and with reference to layers or coatings of the same function.
- the functional layer closest to the substrate is the first functional layer
- the next one away from the substrate is the second functional layer, etc.
- the stack is deposited by cathode sputtering assisted by a magnetic field (magnetron process).
- all the layers of the stack are deposited by cathodic sputtering assisted by a magnetic field.
- Blocking layers can be present in the stack according to the invention. Their function is traditionally to protect the functional layers from possible degradation during the deposition of the anti-reflective coating. higher and / or during a possible high temperature heat treatment, of the annealing, bending and / or hardening type.
- the blocking layers are, for example, chosen from metal layers based on a metal or a metal alloy, metal nitride layers, metal oxide layers and metal oxynitride layers of one or more elements. chosen from titanium, nickel, chromium and niobium such as Ti, TiN, TiOx, Nb, NbN, Ni, NiN, Cr, CrN, NiCr, NiCrN or even NbNOx, NiCrOx.
- the geometric thickness of such layers is of the order of a few nanometers, generally less than 5 nanometers and most often close to a nanometer or even less than a nanometer.
- these blocking layers When these blocking layers are deposited in metallic, nitrided or oxynitrided form, these layers may undergo partial or total oxidation depending on their thickness and the nature of the layers which surround them, for example, at the time of deposition of the next layer or by oxidation. in contact with the underlying layer.
- the dielectric coatings satisfy one or more of the following conditions:
- the dielectric coatings comprise at least one dielectric layer based on an oxide or nitride of one or more elements chosen from silicon, titanium, zirconium, aluminum, tin, zinc, and / or
- At least one dielectric coating comprises at least one dielectric layer with a barrier function, and / or
- each of the dielectric coatings comprises at least one dielectric layer with a barrier function, and / or
- the dielectric layers with a barrier function are based on silicon and / or aluminum compounds chosen from oxides such as SiC> 2 and Al2O3 OR their mixture, silicon nitrides S13N4 and AIN or their mixture and oxynitures SiO x N y and AIO x N y or their mixture and / or
- the dielectric layers with a barrier function are based on compounds of silicon and / or aluminum optionally comprise at least one other element, such as aluminum, hafnium and zirconium, and / or
- At least one dielectric coating comprises at least one dielectric layer with a stabilizing function, and / or
- each dielectric coating comprises at least one dielectric layer with a stabilizing function, and / or
- the dielectric layers with a stabilizing function are preferably based on an oxide chosen from zinc oxide, tin oxide, zirconium oxide or a mixture of at least two of them, the dielectric layers with a stabilizing function are preferably based on crystalline oxide, in particular based on zinc oxide, optionally doped with at least one other element, such as aluminum, and / or
- each functional layer is above a dielectric coating, the upper layer of which is a dielectric layer with a stabilizing function, preferably based on zinc oxide and / or below a dielectric coating, the lower layer of which is a dielectric layer with a stabilizing function, preferably based on zinc oxide.
- each dielectric coating consists of only one or more dielectric layers. Preferably, therefore, there is no absorbent layer in the dielectric coatings so as not to reduce the light transmission.
- the stacks of the invention can include dielectric layers with a barrier function.
- the term “dielectric layers with a barrier function” is understood to mean a layer made of a material capable of forming a barrier to the diffusion of oxygen and water at high temperature, originating from the ambient atmosphere or from the transparent substrate, towards the functional layer.
- the materials constituting the dielectric layer with a barrier function must therefore not undergo any chemical or structural modification at high temperature which would lead to a modification of their optical properties.
- the layer or layers with a barrier function are preferably also chosen from a material capable of forming a barrier to the material constituting the functional layer. The dielectric layers with a barrier function therefore allow the stack to undergo heat treatments of the annealing, tempering or bending type without too significant optical change.
- the stacks of the invention can comprise dielectric layers with a stabilizing function.
- stabilizing means that the nature of the layer is selected so as to stabilize the interface between the functional layer and this layer. This stabilization leads to reinforcing the adhesion of the functional layer to the layers which surround it, and in fact it will oppose the migration of its constituent material.
- the dielectric layer or layers with a stabilizing function can be in direct contact with a functional layer or separated by a blocking layer.
- the last dielectric layer of each dielectric coating located below a functional layer is a dielectric layer with a stabilizing function.
- a layer with a stabilizing function for example, based on zinc oxide below a functional layer, because it facilitates adhesion and crystallization of the functional silver-based layer and increases its quality and high temperature stability.
- a functional stabilizing layer for example, based on zinc oxide on top of a functional layer, in order to increase its adhesion and optimally oppose the diffusion on the side of. the stack opposite the substrate.
- the dielectric layer (s) with a stabilizing function can therefore be located above and / or below at least one functional layer or of each functional layer, either directly in contact with it or either separated by a blocking layer.
- each dielectric layer with a barrier function is separated from a functional layer by at least one dielectric layer with a stabilizing function.
- This dielectric layer with a stabilizing function may have a thickness of at least 4 nm, in particular a thickness of between 4 and 18 nm and better still of 8 to 15 nm.
- the transparent substrates according to the invention are preferably made of a rigid inorganic material, such as glass, or organic based on polymers (or on polymer).
- the organic transparent substrates according to the invention can also be made of polymer, rigid or flexible.
- polymers suitable according to the invention include, in particular:
- polyesters such as polyethylene terephthalate (PET), polybutylene terephthalate (PBT), polyethylene naphthalate (PEN);
- polyacrylates such as polymethyl methacrylate (PMMA);
- fluorinated polymers such as fluoroesters such as ethylene tetrafluoroethylene (ETFE), polyvinylidene fluoride (PVDF), polychlorotrifluoroethylene (PCTFE), chlorotrifluoroethylene ethylene (ECTFE), fluorinated ethylene-propylene copolymers (FEP);
- fluoroesters such as ethylene tetrafluoroethylene (ETFE), polyvinylidene fluoride (PVDF), polychlorotrifluoroethylene (PCTFE), chlorotrifluoroethylene ethylene (ECTFE), fluorinated ethylene-propylene copolymers (FEP);
- photocrosslinkable and / or photopolymerizable resins such as thiolene, polyurethane, urethane-acrylate, polyester-acrylate resins and
- the substrate is preferably a sheet of glass.
- the substrate is preferably transparent, colorless (it is then a clear or extra-clear glass) or colored, for example blue, gray or bronze.
- Glass is preferably of silico-soda-lime type, but it can also be of glass of borosilicate or alumino-borosilicate type.
- the substrate advantageously has at least one dimension greater than or equal to 1 m, or even 2 m and even 3 m.
- the thickness of the substrate generally varies between 0.6 mm and 2.1 mm.
- the substrate can be flat or curved.
- the material that is to say the substrate coated with the stack, can undergo a heat treatment at high temperature such as annealing, for example by flash annealing such as laser or flame annealing, quenching and / or a crowning.
- the temperature of the heat treatment is greater than 400 ° C, preferably greater than 450 ° C, and better still greater than 500 ° C.
- the substrate coated with the stack can therefore be bent and / or tempered.
- the glazing of the invention is preferably in the form of laminated glazing and is in particular a laminated glazing for a HUD projector.
- a laminated glazing comprises at least one structure of the first substrate / sheet (s) / second substrate type.
- the stack of thin layers is positioned on at least one side of one of the substrates.
- the stack may be on the face of the first substrate in contact with the sheet, preferably polymer.
- the glazing according to the invention used as laminated glazing, preferably has the following optical characteristics:
- FIG. 1 illustrates a stacking structure according to the invention with four functional metal layers, this structure being deposited on a glass substrate 10, transparent;
- [fig. 5] has optical characteristics in a laminated configuration; and [fig. 6] presents the reference blank used for the conversion of the quantities X, Y, Z into L *, a *, b * as a function of the wavelength l, in nanometers.
- the stack illustrated in FIG. 1 is arranged on a substrate 10 and comprises only four functional metal layers 40, 80, 120, and 160. Each functional layer 40, 80, 120, 160 is placed between two dielectric coatings 20, 60, 100 , 140 and 180 so that:
- the first functional layer 40 starting from the substrate 10 is arranged between the dielectric coatings 20 and 60,
- the second functional layer 80 is placed between the dielectric coatings 60 and 100,
- the third functional layer 120 is arranged between the dielectric coatings 100 and 140, and
- the fourth functional layer 160 is placed between the dielectric coatings 140 and 180.
- These dielectric coatings 20, 60, 100, 140, 180 each comprise at least one dielectric layer 24, 27, 28; 62, 64, 66, 67, 68; 102, 104, 106, 107, 108; 142, 144, 146, 147, 148, 182, 186 and 187.
- the stack can also include:
- the last layer located above all the previous layers for example made of TiZr or of titanium and zirconium oxide.
- the thin film stacks defined below are deposited on clear soda-lime glass substrates with a thickness of 1.6 mm.
- the layers were deposited by sputtering (so-called “magnetron cathode sputtering”):
- the functional layers 40, 80, 120 and 160 are layers of silver (Ag), deposited from a metallic target in an atmosphere of 100% argon or krypton and a pressure of 3.10 -3 mbar,
- the blocking overlays 50, 90, 130 and 170 are metal layers made of an alloy of nickel and chromium (NiCr), deposited from a metal target with 80 atomic% Ni and 20 atomic% Cr, in a 100% Argon atmosphere and a pressure of 3.10 -3 mbar,
- the dielectric layers are:
- - barrier layers of average index 104, 144 and 187 which are each based on silicon nitride, doped with aluminum (“S13N4”) and which are deposited from a silicon target at 92% in weight of silicon and 8% by weight of aluminum, in an atmosphere of nitrogen and argon at 45% nitrogen and 55% argon and under pressure of 3.2.10 3 mbar,
- - high index barrier layers 24, 64, 106, 146 and 186 which are each based on silicon nitride and zirconium (“SiZrN”), and which are deposited from a silicon target at 83 atomic% of silicon and 17 atomic% of zirconium, in an atmosphere of nitrogen and argon at 45% nitrogen and 55% argon and a pressure of 3.2.10 3 mbar,
- a barrier layer of very high index 66 which is based on silicon and zirconium nitride (“SiZrN *”), and which is deposited from a silicon target with 73 atomic% silicon and 27% atomic zirconium, in an atmosphere of nitrogen and argon at 45% nitrogen and 55% argon and a pressure of 3.2.10 3 mbar,
- - smoothing layers 27, 67, 107 and 147 which are each located between a barrier layer and a wetting layer and which are each made of mixed oxide of zinc and tin (“SnZnO”) deposited from a metal target at 50% by weight of tin and 50% by weight of zinc, in an atmosphere of 30% argon and 70% oxygen and a pressure of 3.10 3 mbar
- - stabilizing layers 62, 102, 142 and 182 which are each located on and in contact with a blocking overlay and which are each made of zinc oxide doped aluminum (“ZnO") deposited from a ceramic target in an atmosphere of 100% Argon and a pressure of 3.10 -3 mbar.
- ZnO zinc oxide doped aluminum
- the table in figure 2 thus lists the materials and the physical thicknesses Ep of each dielectric layer, the thicknesses Ea in nanometers of each metallic functional layer and the corresponding optical thickness Eo (in nanometers) of each dielectric coating as a function of their position with respect to the substrate carrying the stack (located at the very bottom of the table).
- the table in Figure 4 shows the main optical characteristics measured in the monolithic state, after annealing treatment at 650 ° C for 5 minutes and cooling in ambient air (20 ° C).
- the table in figure 5 lists the main optical characteristics measured when the coated substrates of the stacks are each part of a structural laminated glazing: interior 1.6 mm glass substrate / 0.76 mm PVB interlayer / substrate 2.1 mm glass exterior, the stack being positioned on the face of the interior substrate which faces the interlayer sheet.
- the illuminant used for this measurement corresponds to a HUD projector (to measure the quantities X, Y, Z which are then converted into L *, a *, b * using a reference white corresponding to the illuminant D65 at 2 ° observer) ; the selected illuminant is illustrated in Figure 6.
- Examples 1 and 2 are comparative examples outside the invention.
- Examples 3 and 4 are examples according to the invention.
- Example 1 follows the general teaching of the international patent application
- No. WO 2005/051858 because it comprises four functional layers of substantially identical thicknesses and all of the order of 14.0 nm plus or minus 0.5 nm.
- the thickness of the first functional layer over the thickness of each of the others is therefore of the order of 1.00 plus or minus 0.05, as can be seen in the first three lines of the table in FIG. 3.
- These thicknesses do not are not strictly identical because this example 1 has been the subject of an optimization to try to achieve a transmission light as high as possible, while achieving a low and satisfactory resistance per square, that is to say of the order of 0.70 ohm per square or less.
- the table of FIG. 4 shows that this monolithic light transmission is 73% and the table of FIG. 5 shows that this laminated light transmission is 70%, which is satisfactory.
- Example 2 follows another general lesson and comprises a first very thin functional layer and the following three substantially identical.
- the thickness of the first functional layer over the thickness of each of the others is of the order of 0.50 plus or minus 0.05, as can be seen in the first three lines of the table in FIG. 3.
- This example 2 also has is the subject of an optimization to try to achieve the highest possible light transmission, but the resistance per square obtained is not satisfactory: it is too higher than the maximum limit of 0.70 ohm per square set for allow efficient electric heating of the glazing by stacking thin layers.
- the table of FIG. 5 shows that the light transmission in laminate is 71%, which is satisfactory but that the intensity of the color in reflection of the HUD image, expressed by L * (Ri65 °) is also too high.
- the table in Figure 5 shows that the interior reflection color is far from target values with a * R , much greater than zero and too positive and b * R , much less than zero and too negative; the exterior reflection color is also far from the target values, a * Re much greater than zero and too positive and b * Re very less than zero and too negative.
- a glazing comprising a stack with three functional metallic layers which, in a laminated configuration, has a light transmission equal to or greater than 70%, a * T ⁇ 0.0, an exterior and interior reflection every time. two equal to or less than 15%, a * Re ⁇ 0.0, -12.0 ⁇ b * Re ⁇ 0.0, a * R , ⁇ 0.0, -15.0 ⁇ b * Ri ⁇ 0.0 and L * (Ri65 °) ⁇ 15.0.
- Examples 3 and 4 are thus satisfactory. They have a pleasant and very weak transmission coloration, preferably in the blue or blue-green range but very weak.
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- Heat Sensitive Colour Forming Recording (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Instrument Panels (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1908683A FR3099413B1 (fr) | 2019-07-30 | 2019-07-30 | Materiau comprenant un substrat muni d’un empilement a proprietes thermiques pour affichage tête haute |
PCT/EP2020/071192 WO2021018861A1 (fr) | 2019-07-30 | 2020-07-28 | Materiau comprenant un substrat muni d'un empilement a proprietes thermiques pour affichage tête haute |
Publications (1)
Publication Number | Publication Date |
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EP4003925A1 true EP4003925A1 (fr) | 2022-06-01 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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EP20743718.7A Pending EP4003925A1 (fr) | 2019-07-30 | 2020-07-28 | Materiau comprenant un substrat muni d'un empilement a proprietes thermiques pour affichage tête haute |
Country Status (8)
Country | Link |
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US (1) | US20220250972A1 (zh) |
EP (1) | EP4003925A1 (zh) |
JP (1) | JP2022543004A (zh) |
KR (1) | KR20220043141A (zh) |
CN (1) | CN114127027A (zh) |
FR (1) | FR3099413B1 (zh) |
MX (1) | MX2022000810A (zh) |
WO (1) | WO2021018861A1 (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
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KR102589372B1 (ko) * | 2018-11-09 | 2023-10-16 | 쌩-고벵 글래스 프랑스 | p-편광 방사선을 갖는 헤드업 디스플레이(HUD)를 위한 프로젝션 장치 |
CN113682007A (zh) * | 2021-08-23 | 2021-11-23 | 福耀玻璃工业集团股份有限公司 | 具有透明导电层的夹层玻璃及其制备方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000294980A (ja) * | 1999-04-06 | 2000-10-20 | Nippon Sheet Glass Co Ltd | 透光性電磁波フィルタおよびその製造方法 |
DE10356357B4 (de) * | 2003-11-28 | 2010-05-06 | Von Ardenne Anlagentechnik Gmbh | Wärmebehandelbares Sonnen- und Wärmeschutzschichtsystem und Verfahren zu dessen Herstellung |
FR2862961B1 (fr) | 2003-11-28 | 2006-02-17 | Saint Gobain | Substrat transparent utilisable alternativement ou cumulativement pour le controle thermique, le blindage electromagnetique et le vitrage chauffant. |
US7508586B2 (en) * | 2006-04-14 | 2009-03-24 | Southwall Technologies, Inc. | Zinc-based film manipulation for an optical filter |
FR2928913B1 (fr) * | 2008-03-18 | 2011-05-20 | Saint Gobain | Substrat muni d'un empilement a proprietes thermiques |
US7713633B2 (en) * | 2008-05-27 | 2010-05-11 | Guardian Industries Corp. | EMI filter for plasma display panel |
US8147975B2 (en) * | 2008-08-21 | 2012-04-03 | Guardian Industries Corp. | Plasma display panel including frameless EMI filter, and/or method of making the same |
US9215760B2 (en) * | 2012-01-10 | 2015-12-15 | Saint-Gobain Glass France | Transparent pane with electrically conductive coating |
FR2985724B1 (fr) * | 2012-01-16 | 2014-03-07 | Saint Gobain | Substrat muni d'un empilement a proprietes thermiques comportant quatre couches fonctionnelles metalliques. |
US8940399B2 (en) * | 2012-10-04 | 2015-01-27 | Guardian Industries Corp. | Coated article with low-E coating having low visible transmission |
FR2999807B1 (fr) * | 2012-12-13 | 2015-01-02 | Saint Gobain | Support conducteur pour dispositif oled, ainsi que dispositif oled l'incorporant |
CA3014263A1 (en) * | 2016-05-17 | 2017-11-23 | Saint-Gobain Glass France | Head-up display system |
-
2019
- 2019-07-30 FR FR1908683A patent/FR3099413B1/fr active Active
-
2020
- 2020-07-28 KR KR1020227005492A patent/KR20220043141A/ko unknown
- 2020-07-28 MX MX2022000810A patent/MX2022000810A/es unknown
- 2020-07-28 EP EP20743718.7A patent/EP4003925A1/fr active Pending
- 2020-07-28 JP JP2022506285A patent/JP2022543004A/ja active Pending
- 2020-07-28 WO PCT/EP2020/071192 patent/WO2021018861A1/fr unknown
- 2020-07-28 US US17/630,444 patent/US20220250972A1/en active Pending
- 2020-07-28 CN CN202080053585.7A patent/CN114127027A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
JP2022543004A (ja) | 2022-10-07 |
FR3099413A1 (fr) | 2021-02-05 |
WO2021018861A1 (fr) | 2021-02-04 |
KR20220043141A (ko) | 2022-04-05 |
FR3099413B1 (fr) | 2021-10-29 |
US20220250972A1 (en) | 2022-08-11 |
CN114127027A (zh) | 2022-03-01 |
MX2022000810A (es) | 2022-02-16 |
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