EP3655369A1 - Easy maintenance glass - Google Patents
Easy maintenance glassInfo
- Publication number
- EP3655369A1 EP3655369A1 EP18739551.2A EP18739551A EP3655369A1 EP 3655369 A1 EP3655369 A1 EP 3655369A1 EP 18739551 A EP18739551 A EP 18739551A EP 3655369 A1 EP3655369 A1 EP 3655369A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- layer
- substrate according
- titanium dioxide
- coating
- glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000011521 glass Substances 0.000 title claims abstract description 36
- 238000012423 maintenance Methods 0.000 title description 4
- 239000000758 substrate Substances 0.000 claims abstract description 33
- 239000011248 coating agent Substances 0.000 claims abstract description 29
- 238000000576 coating method Methods 0.000 claims abstract description 29
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical group O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 38
- 238000010438 heat treatment Methods 0.000 claims description 17
- 239000004408 titanium dioxide Substances 0.000 claims description 16
- 230000004888 barrier function Effects 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- 229910052710 silicon Inorganic materials 0.000 claims description 8
- 238000005498 polishing Methods 0.000 claims description 7
- 239000010936 titanium Substances 0.000 claims description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 6
- 229910052783 alkali metal Inorganic materials 0.000 claims description 6
- 150000001340 alkali metals Chemical class 0.000 claims description 6
- 239000010703 silicon Substances 0.000 claims description 6
- 229910052718 tin Inorganic materials 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 230000008021 deposition Effects 0.000 claims description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 4
- 239000003513 alkali Substances 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- 230000008569 process Effects 0.000 claims description 3
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- 150000001247 metal acetylides Chemical class 0.000 claims description 2
- 150000004767 nitrides Chemical class 0.000 claims description 2
- -1 oxynitrides Chemical class 0.000 claims description 2
- 229910052709 silver Inorganic materials 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 239000010410 layer Substances 0.000 description 54
- 229910010413 TiO 2 Inorganic materials 0.000 description 15
- 238000010791 quenching Methods 0.000 description 8
- 230000000171 quenching effect Effects 0.000 description 8
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical group CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 8
- 238000012360 testing method Methods 0.000 description 7
- 239000000523 sample Substances 0.000 description 6
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 6
- 230000005540 biological transmission Effects 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 238000005259 measurement Methods 0.000 description 4
- 230000001699 photocatalysis Effects 0.000 description 4
- 239000002243 precursor Substances 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 230000004913 activation Effects 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 238000000197 pyrolysis Methods 0.000 description 3
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000004439 roughness measurement Methods 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- 239000002689 soil Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- JMXKSZRRTHPKDL-UHFFFAOYSA-N titanium ethoxide Chemical compound [Ti+4].CC[O-].CC[O-].CC[O-].CC[O-] JMXKSZRRTHPKDL-UHFFFAOYSA-N 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 230000003042 antagnostic effect Effects 0.000 description 1
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 210000000078 claw Anatomy 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003670 easy-to-clean Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000010079 rubber tapping Methods 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 239000005348 self-cleaning glass Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000004876 x-ray fluorescence Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3441—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising carbon, a carbide or oxycarbide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/75—Hydrophilic and oleophilic coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
- C03C2218/328—Partly or completely removing a coating
Definitions
- the field of the invention is that of glass substrates provided with a chemically and mechanically durable coating which gives them a certain hydrophilicity, a property making it possible to facilitate the maintenance of said substrates.
- Glass is a material widely used not only in architecture but also in the automobile or in interior applications such as mirrors, shower glasses, decoration, appliances ... There is a demand for the industry to offer substrates whose maintenance is facilitated in a sustainable manner over time.
- titanium dioxide especially in anatase form, when subjected to UV irradiation, has a photocatalytic effect that allows it to degrade organic soils that come into contact with it.
- EP1304366A1 and WO97 / 10186A1 widely present the various characteristics of this layer, its mode of operation and its methods of obtaining.
- EP1304366A1 and EP1366000A2 show that titanium dioxide, always under UV irradiation, also has a hydrophilic character which results in a very low angle of contact with water. This additional feature allows the formation of a flowing water film that facilitates the removal of residual soil deposited on the glass.
- the TiO 2 layer is also used to prevent fogging, a phenomenon which may be responsible for a significant loss of visibility.
- the effects and benefits of this oxide are therefore multiple and very interesting.
- the TiO 2 film can be deposited by gas phase pyrolysis (CVD), by wet (sol-gel) or by vapor deposition under vacuum (PVD). The last process is generally cold and provides an amorphous titanium dioxide layer which requires annealing to be crystallized.
- the crystalline phase obtained will be anatase or rutile, the former being generally preferred for its better photocatalytic activity.
- Sol-gel deposition generally results in a thicker and more porous layer, the preparation of which is also more complex.
- gas phase pyrolysis involves precursors which are degraded under the effect of the high temperature, to form a layer on the glass. This process can be performed directly online at the time of glass production, making this route particularly attractive and inexpensive. Especially since the resulting layer is a harder, denser layer with significant mechanical and chemical resistance properties. Such a layer may especially be used outdoors, without protective coating.
- the deposition temperature is very high and the " ⁇ 2 is obtained directly with a high degree of crystallization
- a layer obtained by CVD has a fairly high roughness.
- a hydrophilic coating based on " ⁇ 2 deposited by CVD has a roughness characterized by a R q of 7 to 10 nm. This roughness, which is generally preferred because it contributes to better photocatalytic activity and better hydrophilicity, is also responsible for a greater fouling by incrustation of dirt in the asperities of the surface, as well as a certain difficulty in unclogging these impurities.
- the object of the invention is in particular to overcome the drawbacks of the prior art by providing a substrate provided with a coating that exhibits good hydrophilicity and yet has a roughness that is low enough to prevent scale fouling and to facilitate removal. dirt. Such a coating must also be more resistant to scratching. In addition, the coating of the invention must be subjected to heat treatments such as quenching or bending, without its optical properties are deteriorated.
- the invention is an economical and easy to implement method for depositing a coating having a high hydrophilic character and exhibiting good chemical and mechanical durability.
- the invention relates to a glass substrate which comprises on one of its faces a hydrophilic coating.
- the substrate is preferably a substrate made of clear, extra-clear or colored glass, floated of the soda-lime-silica type, the thickness of which is between 0.2 and 20 mm.
- this hydrophilic coating comprises a first alkali metal barrier layer, preferentially deposited by CVD.
- This barrier layer is based on silicon and selected from oxides, nitrides, oxynitrides, carbides, silicon oxycarbides.
- the first layer is a stoichiometric layer of SiO 2 or a sub-stoichiometric silicon oxide with carbon and denoted SiO x C y .
- the alkali barrier layer is a layer of SiO x C y with a C / Si atomic ratio of between 0.10 and 0.60, preferably between 0.20 and 0.40.
- This first layer has a thickness of between 10 and 120 nm, preferably between 15 and 80 nm, even more preferably between 20 and 50 nm.
- this first layer is in direct contact with the substrate.
- the hydrophilic coating according to the invention comprises a second layer, this second layer having a hydrophilic character is preferably deposited by CVD on the first layer and preferably in direct contact therewith. According to a preferred embodiment this second layer is the last layer of the hydrophilic coating.
- the hydrophilic layer of the hydrophilic coating is selected from oxides of Ti, Sn, W, Zn, Si, Al, Ag, Co and mixtures of one or more of these oxides.
- the thickness of this hydrophilic layer is between 5 and 150 nm, preferably between 8 and 50 nm and even more preferably between 10 and 20 nm.
- the roughness R q of the hydrophilic coating is less than 3 nm, preferably less than 2 nm and even more preferably less than 1 nm.
- the coating of the invention is characterized by a water contact angle of not more than 10 °, preferably not more than 6 °, after being subjected to irradiation at 40 ° C for 30 minutes by means of UVA (340 nm) with a power of 40 W / m 2 .
- this hydrophilic layer is a TiO 2 layer whose thickness is between 5 and 150 nm, preferably between 8 and 50 nm and even more preferably between 10 and 20 nm.
- the TiO 2 layer is mainly obtained in anatase form.
- the TiO 2 layer may be doped, in particular with tin in Sn / Ti atomic percentages of less than 10%, preferably less than 5%.
- the invention also relates to the formation of a hydrophilic coating provided with a first alkali metal barrier layer and a second TiO 2 layer, the thickness of which is between 5 and 150 nm, preferably between 8 and 50 nm and even more preferably between 10 and 20 nm.
- the hydrophilic coating according to the invention has been polished after the deposition of all the layers, for example on a float line, so that its roughness decreases to reach roughness values R q of less than 3 nm, preferably less than 2 nm and even more preferably less than 1 nm.
- the coated glass substrate has undergone a heat treatment after polishing, such as, for example, quenching or bending.
- This heat treatment involves temperatures above 600 ° C and maintaining the substrate at these temperatures for times that are adapted to the thickness of the substrate according to a method well known to those skilled in the art.
- the silicon-based barrier layer may be deposited according to methods well known to those skilled in the art and described in the prior art, preferably on a glass production line. Alternatively it can also be deposited by any method well known to those skilled in the art.
- the TiO 2 layer is constituted by chemical vapor deposition, preferably on a glass production line, optionally following the barrier layer. It is obtained by pyrolysis of the precursors well known to those skilled in the art to produce such a layer.
- the precursors generally used there is titanium tetraisopropoxide (Ti [OCH (CH3) 2 ] 4 named thereafter TTIP), titanium tetrachloride (TiCl 4 ), titanium tetrabutoxide (Ti (OCH 2 CH 2 CH 2 CH 3 ) 4 ), titanium ethoxide (IV) (Ti (OC 2 H 5 ) 4 ) or any mixture of these precursors.
- the TTIP is sprayed above the glass either in the tin bath where the temperature of the glass is between 750 and 620 ° C, or at the beginning of the gallery where the glass is at a temperature between 620 and 550 ° C.
- the coating comprising the TiO 2 layer is then polished so as to reduce the roughness. In accordance with the knowledge of those skilled in the art, it has been shown that this polishing has a negative impact on the hydrophilicity of the coating.
- the inventors have observed that if the glass thus coated and polished is heat-treated, the TiO 2 layer regains its hydrophilic character as measured before polishing, while maintaining a lower roughness. This observation is contrary to the teaching of the prior art which shows that a layer of TiO 2 polished and therefore much less rough, has a poorer hydrophilicity. This quite surprising behavior thus makes it possible to obtain a coated glass substrate which has both a low roughness and a high hydrophilic character, thereby circumventing the limitations of the prior art.
- the glass substrates according to the invention can be part of a single or multiple glazing, it can be used for the automobile or in interior applications.
- the coated surface of the glazing is an exterior surface.
- contact angle we mean the angle made by the tangent to a drop of water with the surface of the substrate. Depending on the case, the contact angle was measured with or without prior activation by UV radiation. This activation of the hydrophilic character by UV irradiation is carried out at 40 ° C. for a period of 30 minutes by means of UVA with a power of 40 W / m2 (UVA-340 nm 40 W / m 2 , coming from a device Q.-Panel, from Q.-Lab Company, Cleveland, Ohio).
- the roughness R q is the root mean square of the height deviations z on the evaluation surface and measured with respect to the average height z.
- the measurements were carried out in intermittent contact mode (tapping mode) with a Bruker NCHV type probe, in antimony-doped silicon, with a stiffness k between 20 and 80 N / m, with a resonance frequency between 334 and 401 kHz. and whose nominal radius of the tip is 10 nm.
- the thicknesses of the indicated layers were determined by X-ray fluorescence (XRF) on the basis of a calibration curve. These are geometric or physical thicknesses.
- ⁇ * (AL * 2 + Aa * 2 + Ab * 2 ) 1/2
- AL * represents the difference between the colorimetric coordinates L * of the glazing before and after heat treatment
- Aa * represents the difference between the colorimetric coordinates a * of the glazing before and after heat treatment
- Ab * represents the difference between the colorimetric coordinates b * of the glazing before and after heat treatment
- the glazing according to the invention additionally has a colorimetric variation in reflection, on the coating side, AE * R c , such that:
- AE * RC (AL * R c 2 + Aa * Rc 2 + Ab * Rc 2 ) 1/2 is lower 3, preferably less than 2, when said glazing is subjected to a temperature of at least 630 ° C. and at most 670 ° C for 3 to 10 minutes.
- Table 1 provides the parameters used in the examples for producing coated glass samples according to the invention.
- the first layer, behind the migration of alkaline ions from the glass, and the second layer, hydrophilic are obtained by chemical vapor deposition directly on a clear soda-lime glass production line, advancing to a speed of 15 m / min and whose thickness is 4 mm.
- Examples 1 and 2 according to the invention have undergone a polishing step. Counterexamples 3 and 4 have not been polished.
- the titanium dioxide deposition is obtained by injection of TTIP and nitrogen via a second coating device above the glass at the entrance of the gallery where the glass is at a temperature of about 600 ° C.
- the titanium dioxide layer thus obtained is mainly in anatase form.
- Examples 1 to 4 obtained were then subjected to intense heat treatment (670 ° C for 200 s) and a set of analyzes were carried out to control their optical stability at said heat treatment.
- Tables 3 and 4 show that, in accordance with the objective of the invention, the optical parameters measured before and after quenching are preserved. Indeed, Examples 1 and 2 of coated glass according to the invention have in light transmission and reflection layer side optical parameters very satisfactory. It appears in particular that after heat treatment, the light transmission remains high and the light reflection on the layer side is less than 15%. The hue of the substrate coated in transmission and in reflection remains pleasant and corresponds to the market demand. The heat treatment did not substantially change the optical parameters.
- Table 3 Colorimetric parameters in light transmission before and after heat treatment.
- Table 4 colorimetric parameters in reflection on the front layer and after heat treatment.
- Table 5 shows the measured values of the contact angle with water for the different samples, polished or unpolished, before and after quenching, depending on whether or not the sample has been activated by UV irradiation.
- the UV irradiation is carried out at 40 ° C. for a period of 30 minutes by means of UVA with a power of 40 W / m 2 (UVA-340 nm, 40 W / m 2 , from Q.-Panel Company, Q.-Lab Company, Cleveland, Ohio).
- Angles of contact is carried out at 40 ° C. for a period of 30 minutes by means of UVA with a power of 40 W / m 2 (UVA-340 nm, 40 W / m 2 , from Q.-Panel Company, Q.-Lab Company, Cleveland, Ohio).
- Table 5 confirms that when the TiO 2 layer is polished, and therefore less rough, the hydrophilicity in general is less good.
- the contact angle with water after UV irradiation of 30 minutes is between 18 ° and 21 ° whereas the same irradiation on an unpolished sample makes it possible to reach a contact angle of the order of 6 °.
- the titanium dioxide layer behaves in the same way as unpolished TiO 2 layer. Indeed, it can clearly be seen that the polished TiO 2 layer and heat treated, when irradiated for 30 minutes has a contact angle of 5 °. This observation shows, against all odds, that a layer of polished titanium dioxide can recover very satisfactory hydrophilic values, after heat treatment.
- Table 6 provides information on Roughness measurements made on a polished and tempered sample and on an unpolished and tempered sample. The measurements confirm that the roughness of a sample after quenching remains lower.
- the product of the invention both smooth and hydrophilic, which makes it prone to get dirty, easy to clean and less scratch.
- the products obtained in accordance with the invention were subjected to the standardized test EN 1096-5 which evaluates the hydrophilic and self-cleaning properties.
- the test of this standard is a measurement of the veil on several samples subjected to a simulation of climatic conditions.
- the evaluation criterion is that the variation of the veil before and after the test ( ⁇ ) must be less than 1%.
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP17182370.1A EP3431455A1 (en) | 2017-07-20 | 2017-07-20 | Glass with easy maintenance |
PCT/EP2018/069336 WO2019016176A1 (en) | 2017-07-20 | 2018-07-17 | Easy maintenance glass |
Publications (1)
Publication Number | Publication Date |
---|---|
EP3655369A1 true EP3655369A1 (en) | 2020-05-27 |
Family
ID=59383485
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP17182370.1A Withdrawn EP3431455A1 (en) | 2017-07-20 | 2017-07-20 | Glass with easy maintenance |
EP18739551.2A Withdrawn EP3655369A1 (en) | 2017-07-20 | 2018-07-17 | Easy maintenance glass |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP17182370.1A Withdrawn EP3431455A1 (en) | 2017-07-20 | 2017-07-20 | Glass with easy maintenance |
Country Status (2)
Country | Link |
---|---|
EP (2) | EP3431455A1 (en) |
WO (1) | WO2019016176A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022050066A1 (en) * | 2020-09-04 | 2022-03-10 | Agc株式会社 | Glass article |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2677639B1 (en) * | 1991-06-14 | 1994-02-25 | Saint Gobain Vitrage Internal | TECHNIQUE FOR FORMING BY PYROLYSIS IN A GASEOUS WAY A COATING BASED ON OXYGEN AND SILICON. |
WO1996029375A1 (en) | 1995-03-20 | 1996-09-26 | Toto Ltd. | Method of photocatalytically making the surface of base material ultrahydrophilic, base material having ultrahydrophilic and photocatalytic surface, and process for producing said material |
FR2738813B1 (en) | 1995-09-15 | 1997-10-17 | Saint Gobain Vitrage | SUBSTRATE WITH PHOTO-CATALYTIC COATING |
JP3700358B2 (en) | 1996-12-18 | 2005-09-28 | 日本板硝子株式会社 | Antifogging and antifouling glass articles |
US20020155299A1 (en) * | 1997-03-14 | 2002-10-24 | Harris Caroline S. | Photo-induced hydrophilic article and method of making same |
FR2838735B1 (en) | 2002-04-17 | 2005-04-15 | Saint Gobain | SELF-CLEANING COATING SUBSTRATE |
EP1842835B1 (en) * | 2004-12-03 | 2017-06-21 | Cardinal CG Company | Hydrophilic coatings |
FR2971519A1 (en) * | 2011-02-16 | 2012-08-17 | Saint Gobain | METHOD FOR OBTAINING PHOTOCATALYTIC MATERIAL |
FR2979910B1 (en) * | 2011-09-13 | 2014-01-03 | Saint Gobain | PHOTOCATALYTIC MATERIAL AND GLAZING OR PHOTOVOLTAIC CELL COMPRISING THIS MATERIAL |
WO2014198543A1 (en) * | 2013-06-10 | 2014-12-18 | Agc Glass Europe | Glass substrate with low emissivity |
-
2017
- 2017-07-20 EP EP17182370.1A patent/EP3431455A1/en not_active Withdrawn
-
2018
- 2018-07-17 WO PCT/EP2018/069336 patent/WO2019016176A1/en unknown
- 2018-07-17 EP EP18739551.2A patent/EP3655369A1/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
EP3431455A1 (en) | 2019-01-23 |
WO2019016176A1 (en) | 2019-01-24 |
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