EP3557333B1 - Procédé de fabrication d'un ressort moteur d'horlogerie - Google Patents

Procédé de fabrication d'un ressort moteur d'horlogerie Download PDF

Info

Publication number: EP3557333B1
Authority: EP; European Patent Office
Prior art keywords: mainspring; silicon; reducing atmosphere; thermally; etching
Prior art date: 2018-04-16
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Active

Application number

EP18167501.8A

Other languages

German (de)

English (en)

French (fr)

Other versions

EP3557333A1 (fr

Inventor

Sylvain Jeanneret

Frédéric Maier

Jean-Luc Bucaille

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Patek Philippe SA Geneve

Original Assignee

Patek Philippe SA Geneve

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2018-04-16

Filing date

2018-04-16

Publication date

2020-11-04

2018-04-16 Priority to EP18167501.8A priority Critical patent/EP3557333B1/fr

2018-04-16 Application filed by Patek Philippe SA Geneve filed Critical Patek Philippe SA Geneve

2018-12-18 Priority to JP2020556962A priority patent/JP7204776B2/ja

2018-12-18 Priority to EP18836894.8A priority patent/EP3781992B1/fr

2018-12-18 Priority to PCT/IB2018/060218 priority patent/WO2019202378A1/fr

2018-12-18 Priority to CN201880090643.6A priority patent/CN111801627B/zh

2018-12-18 Priority to US17/047,936 priority patent/US11796966B2/en

2019-03-22 Priority to TW108110063A priority patent/TWI793285B/zh

2019-10-23 Publication of EP3557333A1 publication Critical patent/EP3557333A1/fr

2020-11-04 Application granted granted Critical

2020-11-04 Publication of EP3557333B1 publication Critical patent/EP3557333B1/fr

Status Active legal-status Critical Current

2038-04-16 Anticipated expiration legal-status Critical

Links

238000000034 method Methods 0.000 title claims description 20
238000004519 manufacturing process Methods 0.000 title claims description 5
229910052710 silicon Inorganic materials 0.000 claims description 15
239000010703 silicon Substances 0.000 claims description 15
238000000137 annealing Methods 0.000 claims description 11
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 7
229910052814 silicon oxide Inorganic materials 0.000 claims description 7
238000005530 etching Methods 0.000 claims description 6
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 4
230000003647 oxidation Effects 0.000 claims description 4
238000007254 oxidation reaction Methods 0.000 claims description 4
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
229910052786 argon Inorganic materials 0.000 claims description 2
238000001312 dry etching Methods 0.000 claims description 2
239000001257 hydrogen Substances 0.000 claims description 2
229910052739 hydrogen Inorganic materials 0.000 claims description 2
238000001039 wet etching Methods 0.000 claims description 2
238000000708 deep reactive-ion etching Methods 0.000 claims 1
239000011261 inert gas Substances 0.000 claims 1
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 12
230000008569 process Effects 0.000 description 4
239000000463 material Substances 0.000 description 3
238000011282 treatment Methods 0.000 description 3
229910004298 SiO 2 Inorganic materials 0.000 description 2
229910045601 alloy Inorganic materials 0.000 description 2
239000000956 alloy Substances 0.000 description 2
230000008901 benefit Effects 0.000 description 2
239000013078 crystal Substances 0.000 description 2
230000007547 defect Effects 0.000 description 2
229910003460 diamond Inorganic materials 0.000 description 2
239000010432 diamond Substances 0.000 description 2
238000005240 physical vapour deposition Methods 0.000 description 2
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
230000002238 attenuated effect Effects 0.000 description 1
238000005452 bending Methods 0.000 description 1
229910052799 carbon Inorganic materials 0.000 description 1
238000005229 chemical vapour deposition Methods 0.000 description 1
239000002131 composite material Substances 0.000 description 1
230000007423 decrease Effects 0.000 description 1
238000000151 deposition Methods 0.000 description 1
230000008021 deposition Effects 0.000 description 1
238000004146 energy storage Methods 0.000 description 1
239000007789 gas Substances 0.000 description 1
229910052732 germanium Inorganic materials 0.000 description 1
GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
238000010438 heat treatment Methods 0.000 description 1
239000003999 initiator Substances 0.000 description 1
230000007246 mechanism Effects 0.000 description 1
239000007769 metal material Substances 0.000 description 1
239000005300 metallic glass Substances 0.000 description 1
229910052752 metalloid Inorganic materials 0.000 description 1
150000002738 metalloids Chemical class 0.000 description 1
230000007935 neutral effect Effects 0.000 description 1
230000001590 oxidative effect Effects 0.000 description 1
229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
238000003860 storage Methods 0.000 description 1
238000005482 strain hardening Methods 0.000 description 1
239000000126 substance Substances 0.000 description 1
238000004381 surface treatment Methods 0.000 description 1
239000012808 vapor phase Substances 0.000 description 1

Classifications

- G—PHYSICS
- G04—HOROLOGY
- G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
- G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
- G04D3/0069—Watchmakers' or watch-repairers' machines or tools for working materials for working with non-mechanical means, e.g. chemical, electrochemical, metallising, vapourising; with electron beams, laser beams
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B1/00—Driving mechanisms
- G04B1/10—Driving mechanisms with mainspring
- G04B1/14—Mainsprings; Bridles therefor
- G04B1/145—Composition and manufacture of the springs
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B17/00—Mechanisms for stabilising frequency
- G04B17/04—Oscillators acting by spring tension
- G04B17/06—Oscillators with hairsprings, e.g. balance
- G04B17/066—Manufacture of the spiral spring
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B21/00—Indicating the time by acoustic means
- G04B21/02—Regular striking mechanisms giving the full hour, half hour or quarter hour
- G04B21/06—Details of striking mechanisms, e.g. hammer, fan governor
- G—PHYSICS
- G04—HOROLOGY
- G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
- G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
- G04D3/0074—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment
- G04D3/0076—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment for components of driving mechanisms, e.g. mainspring
- G—PHYSICS
- G04—HOROLOGY
- G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
- G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
- G04D3/0074—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment
- G04D3/0089—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment for components of the regulating mechanism, e.g. coil springs
- G—PHYSICS
- G04—HOROLOGY
- G04F—TIME-INTERVAL MEASURING
- G04F7/00—Apparatus for measuring unknown time intervals by non-electric means
- G04F7/04—Apparatus for measuring unknown time intervals by non-electric means using a mechanical oscillator
- G04F7/08—Watches or clocks with stop devices, e.g. chronograph
- G04F7/0804—Watches or clocks with stop devices, e.g. chronograph with reset mechanisms

Definitions

the present invention relates to a method of manufacturing a mainspring for a timepiece.
mainspring any spring, other than a spring exercising a simple return function, capable of storing energy to supply the operation of a mechanism.
a typical example of a mainspring is the barrel spring.
the barrel spring provides the energy to maintain the oscillator of the watch.
the barrel spring is housed in a barrel drum and provides its energy through a system of wheels and pinions which mesh with the barrel drum.
the space available for storing energy namely the volume of the barrel drum, is limited, especially in wristwatches, all the more so when the watch is thin.
the amount of energy that can be stored depends on this available space. This amount of energy is used to guarantee a certain running time of the watch.
the precision of the rate is determined by the frequency and the inertia of the oscillator. A high frequency and high inertia oscillator will have very good running precision but will require a significant energy input, which can penalize the running time. A compromise must therefore be made between the running time and the precision of the oscillator.
the amount of energy that can be stored is also related to the material from which the mainspring is made.
Nivaflex® an alloy based on Co, Ni, Cr and Fe developed by the company Vacuumschmelze GmbH & Co. KG. This alloy has the notable advantage of having a very high elastic limit, of about 3.7 GPa, given by work hardening and heat treatments, while retaining a part of ductility.
Silicon is a material increasingly used in watchmaking and which has many advantages.
its elastic limit and the ratio of its elastic limit squared to its modulus of elasticity ( ⁇ 2 / E) are too low to be able to store enough energy to supply the operation of a watch movement. This is why, in the patent CH 706020 , it is associated with diamond, but in practice this does not give complete satisfaction in terms of mechanical resistance.
the present invention aims to remedy these drawbacks, at least in part, and to this end proposes a method according to claim 1 or claim 2.
a first step consists in etching in a silicon wafer, preferably by deep reactive ionic etching (DRIE), a part having the desired shape, typically spiral, and substantially the desired dimensions of the mainspring.
DRIE deep reactive ionic etching
Silicon can be monocrystalline, polycrystalline or amorphous. If it is single crystal, its crystal orientation is preferably ⁇ 111 ⁇ so that its Young's modulus is isotropic. Polycrystalline silicon is preferred over silicon monocrystalline for its isotropy and greater mechanical strength.
the silicon used in the invention can also be doped or not.
a second step of the process consists in thermally oxidizing the part, typically at a temperature between 600 ° C and 1300 ° C, preferably between 800 ° C and 1200 ° C, so as to cover it with a layer of oxide.
silicon SiO 2
This silicon oxide layer is formed by consuming silicon, which pushes back the interface between silicon and silicon oxide and attenuates silicon surface defects.
the silicon oxide layer is removed, for example by wet etching, vapor phase etching or dry etching.
annealing treatment in English is carried out in a reducing atmosphere, preferably at a pressure strictly greater than 100 Torr and less than or equal to atmospheric pressure (760 Torr), but which may be of the order atmospheric pressure, and preferably at a temperature between 800 ° C and 1300 ° C.
the duration of the annealing treatment can be from a few minutes to several hours.
the reducing atmosphere can consist mainly or totally of hydrogen. It can also include argon or any other neutral gas.
the combination of the second, third and fourth stages gives the part remarkable mechanical properties for a mainspring. Chips and other defects liable to create the initiators of rupture are greatly reduced or even eliminated. The roughness of the surfaces is smoothed out. The wavelets created by the DRIE engraving on the sides of the part are attenuated or even eliminated. The edges are rounded, which decreases the stress concentrations. The tensile strength of silicon, corresponding to its elastic limit, is increased.
a silicon oxide layer (SiO 2 ) is formed on the part, making it possible to increase its mechanical strength.
This layer of silicon oxide can be formed by thermal oxidation, in the same way as in the second step, or by deposition, in particular chemical or physical vapor deposition (CVD, PVD). It is preferably formed over all or almost the entire surface of the part. Its thickness is for example a few micrometers.
said part is part of a batch of parts made from the same silicon wafer.
the part and the other parts of the batch are detached from the wafer.
the process according to the invention by virtue of the surface treatments described above, makes it possible to obtain motor springs reaching elastic limits in bending greater than 3 GPa and even being able to go up to 6 GPa.
the energy storage capacity ( ⁇ 2 / E) is increased.
the motor spring (s) obtained according to the method according to the invention can (can) comprise parts fulfilling additional functions with respect to the storage and return of energy, for example parts serving as a plug or flange as described in the patent CH 705368 .
the fourth step is implemented before the second step (thermal oxidation).

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Metallurgy (AREA)
Optics & Photonics (AREA)
Plasma & Fusion (AREA)
Manufacturing & Machinery (AREA)
Micromachines (AREA)
Springs (AREA)

EP18167501.8A 2018-04-16 2018-04-16 Procédé de fabrication d'un ressort moteur d'horlogerie Active EP3557333B1 (fr)

Priority Applications (7)

Application Number	Priority Date	Filing Date	Title
EP18167501.8A EP3557333B1 (fr)	2018-04-16	2018-04-16	Procédé de fabrication d'un ressort moteur d'horlogerie
EP18836894.8A EP3781992B1 (fr)	2018-04-16	2018-12-18	Procédé de fabrication d'un ressort horloger à base de silicium
PCT/IB2018/060218 WO2019202378A1 (fr)	2018-04-16	2018-12-18	Procede de fabrication d'un ressort horloger a base de silicium
CN201880090643.6A CN111801627B (zh)	2018-04-16	2018-12-18	硅基钟表弹簧的制造方法
JP2020556962A JP7204776B2 (ja)	2018-04-16	2018-12-18	シリコンベースの時計用バネの製作方法
US17/047,936 US11796966B2 (en)	2018-04-16	2018-12-18	Method for producing a silicon-based timepiece spring
TW108110063A TWI793285B (zh)	2018-04-16	2019-03-22	用於生產矽基時計彈簧的方法

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
EP18167501.8A EP3557333B1 (fr)	2018-04-16	2018-04-16	Procédé de fabrication d'un ressort moteur d'horlogerie

Publications (2)

Publication Number	Publication Date
EP3557333A1 EP3557333A1 (fr)	2019-10-23
EP3557333B1 true EP3557333B1 (fr)	2020-11-04

Family

ID=62002087

Family Applications (2)

Application Number	Title	Priority Date	Filing Date
EP18167501.8A Active EP3557333B1 (fr)	2018-04-16	2018-04-16	Procédé de fabrication d'un ressort moteur d'horlogerie
EP18836894.8A Active EP3781992B1 (fr)	2018-04-16	2018-12-18	Procédé de fabrication d'un ressort horloger à base de silicium

Family Applications After (1)

Application Number	Title	Priority Date	Filing Date
EP18836894.8A Active EP3781992B1 (fr)	2018-04-16	2018-12-18	Procédé de fabrication d'un ressort horloger à base de silicium

Country Status (6)

Country	Link
US (1)	US11796966B2 (ja)
EP (2)	EP3557333B1 (ja)
JP (1)	JP7204776B2 (ja)
CN (1)	CN111801627B (ja)
TW (1)	TWI793285B (ja)
WO (1)	WO2019202378A1 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
EP3882710A1 (fr)	2020-03-19	2021-09-22	Patek Philippe SA Genève	Procédé de fabrication d'un composant horloger à base de silicium
EP3889690A1 (fr) *	2020-03-31	2021-10-06	ETA SA Manufacture Horlogère Suisse	Cliquet d'arret pour mouvement d'horlogerie
EP4191346B1 (fr) *	2021-12-06	2024-06-26	The Swatch Group Research and Development Ltd	Protection antichoc d'un mécanisme résonateur à guidage flexible rotatif

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2018
- 2018-04-16 EP EP18167501.8A patent/EP3557333B1/fr active Active
- 2018-12-18 CN CN201880090643.6A patent/CN111801627B/zh active Active
- 2018-12-18 JP JP2020556962A patent/JP7204776B2/ja active Active
- 2018-12-18 US US17/047,936 patent/US11796966B2/en active Active
- 2018-12-18 EP EP18836894.8A patent/EP3781992B1/fr active Active
- 2018-12-18 WO PCT/IB2018/060218 patent/WO2019202378A1/fr unknown
2019
- 2019-03-22 TW TW108110063A patent/TWI793285B/zh active

Non-Patent Citations (1)

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Title
None *

Also Published As

Publication number	Publication date
TWI793285B (zh)	2023-02-21
EP3781992B1 (fr)	2022-05-04
US11796966B2 (en)	2023-10-24
CN111801627A (zh)	2020-10-20
JP2021521455A (ja)	2021-08-26
EP3557333A1 (fr)	2019-10-23
JP7204776B2 (ja)	2023-01-16
TW201944182A (zh)	2019-11-16
CN111801627B (zh)	2021-12-28
WO2019202378A1 (fr)	2019-10-24
EP3781992A1 (fr)	2021-02-24
US20210109483A1 (en)	2021-04-15

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