EP0848298A3 - Appareil d'exposition et procédés l'utilisant - Google Patents

Appareil d'exposition et procédés l'utilisant Download PDF

Info

Publication number
EP0848298A3
EP0848298A3 EP97122087A EP97122087A EP0848298A3 EP 0848298 A3 EP0848298 A3 EP 0848298A3 EP 97122087 A EP97122087 A EP 97122087A EP 97122087 A EP97122087 A EP 97122087A EP 0848298 A3 EP0848298 A3 EP 0848298A3
Authority
EP
European Patent Office
Prior art keywords
light
structural body
collecting system
supported
methods
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP97122087A
Other languages
German (de)
English (en)
Other versions
EP0848298A2 (fr
Inventor
O. Nikon Corp.Intell.Prop.Headquarters Tanitsu
Nikon Corp.Intell.Prop.Headquarters Sugiyama K.
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Publication of EP0848298A2 publication Critical patent/EP0848298A2/fr
Publication of EP0848298A3 publication Critical patent/EP0848298A3/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
EP97122087A 1996-12-13 1997-12-15 Appareil d'exposition et procédés l'utilisant Withdrawn EP0848298A3 (fr)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP35302296 1996-12-13
JP35302296 1996-12-13
JP353022/96 1996-12-13
JP9307953A JPH10229044A (ja) 1996-12-13 1997-10-22 露光装置および該露光装置を用いた半導体デバイスの製造方法
JP307953/97 1997-10-22
JP30795397 1997-10-22

Publications (2)

Publication Number Publication Date
EP0848298A2 EP0848298A2 (fr) 1998-06-17
EP0848298A3 true EP0848298A3 (fr) 2000-02-09

Family

ID=26565344

Family Applications (1)

Application Number Title Priority Date Filing Date
EP97122087A Withdrawn EP0848298A3 (fr) 1996-12-13 1997-12-15 Appareil d'exposition et procédés l'utilisant

Country Status (5)

Country Link
US (1) US5963306A (fr)
EP (1) EP0848298A3 (fr)
JP (1) JPH10229044A (fr)
KR (1) KR19980064410A (fr)
TW (1) TW379363B (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU8749798A (en) * 1997-08-29 1999-03-22 Nikon Corporation Temperature adjusting method and aligner to which this method is applied
TW479156B (en) * 1999-01-08 2002-03-11 Asm Lithography Bv Lithographic projection apparatus, method of controlling the position of a moveable table in a lithographic projection apparatus, integrated circuits device manufacturing method, and integrated circuits device made by the manufacturing method
KR20010102421A (ko) * 1999-02-26 2001-11-15 시마무라 테루오 노광장치, 리소그래피 시스템 및 반송방법 그리고디바이스 제조방법 및 디바이스
JP3495992B2 (ja) * 2001-01-26 2004-02-09 キヤノン株式会社 補正装置、露光装置、デバイス製造方法及びデバイス
KR20030036254A (ko) * 2001-06-13 2003-05-09 가부시키가이샤 니콘 주사노광방법 및 주사형 노광장치 그리고 디바이스 제조방법
EP1469347A1 (fr) * 2003-04-17 2004-10-20 ASML Netherlands B.V. Appareil de projection lithographique et méthode de fabrication d'un dispositif
US7889321B2 (en) * 2007-04-03 2011-02-15 Asml Netherlands B.V. Illumination system for illuminating a patterning device and method for manufacturing an illumination system

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4724466A (en) * 1986-01-17 1988-02-09 Matsushita Electric Industrial Co., Ltd. Exposure apparatus
US4851978A (en) * 1986-12-24 1989-07-25 Nikon Corporation Illumination device using a laser

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4939630A (en) * 1986-09-09 1990-07-03 Nikon Corporation Illumination optical apparatus
US4918583A (en) * 1988-04-25 1990-04-17 Nikon Corporation Illuminating optical device
FR2663130B1 (fr) * 1990-06-08 1994-12-09 Nippon Seiko Kk Dispositif d'exposition par projection.
GB2249189B (en) * 1990-10-05 1994-07-27 Canon Kk Exposure apparatus
JPH04369209A (ja) * 1991-06-17 1992-12-22 Nikon Corp 露光用照明装置
JPH08148407A (ja) * 1994-11-21 1996-06-07 Nikon Corp 照明光学装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4724466A (en) * 1986-01-17 1988-02-09 Matsushita Electric Industrial Co., Ltd. Exposure apparatus
US4851978A (en) * 1986-12-24 1989-07-25 Nikon Corporation Illumination device using a laser

Also Published As

Publication number Publication date
TW379363B (en) 2000-01-11
JPH10229044A (ja) 1998-08-25
KR19980064410A (ko) 1998-10-07
EP0848298A2 (fr) 1998-06-17
US5963306A (en) 1999-10-05

Similar Documents

Publication Publication Date Title
EP1128219A3 (fr) Méthode et appareil d' exposition
EP2341391A3 (fr) Objectif de projection pour un appareil d'exposition par projection
EP0867772A3 (fr) Système d'illumination et appareil d'exposition
EP0811881A3 (fr) Appareil et méthode d'exposition
DE59611251D1 (de) Mikrolithographie-Projektionsbelichtungsanlage mit radial-polarisations-drehender optischer Anordnung
EP1331519A3 (fr) Réglage d'exposition
EP1039511A4 (fr) Procede d'exposition par projection et graveur a projection
EP0811883A3 (fr) Appareil d'exposition et méthode de fabrication d'un dispositif en faisant usage
EP1336898A3 (fr) Appareil et procédé d'exposition, et procédé de fabrication de dispositifs utilisant les mêmes
EP0939341A3 (fr) Système d'illumination et appareil et méthode d'exposition
DE69326630T2 (de) Beleuchtungsvorrichtung für einen Projektionsbelichtungsapparat
KR900008299A (ko) 조명방법 및 그 장치와 투영식 노출방법 및 그 장치
EP0969327A3 (fr) Procédé d'expositions multiples
EP0987872A3 (fr) Système d'éclairage d'une ligne de balayage utilisant un réflecteur creux
TW359761B (en) Illuminating device and photographing apparatus
EP1122578A3 (fr) Système de balayage opto-mecanique
EP1109067A3 (fr) Dispositif d'illumination
EP0997768A3 (fr) Dispositif d'illumination et appareil d'affichage à projection
GB2299181B (en) Method for fabricating light exposure mask
EP1079253A4 (fr) Appareil et procede d'exposition a projection, et systeme optique reflechissant a refraction
EP0844532A3 (fr) Appareil d'exposition
EP0834772A3 (fr) Appareil d'exposition
EP1081553A3 (fr) Méthode d'exposition et appareil d'exposition par balayage
EP0153002A3 (fr) Dispositif pour contrôler la distribution de lumière dans les systèmes de visualisation de balayage linéaire
EP0848298A3 (fr) Appareil d'exposition et procédés l'utilisant

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

AK Designated contracting states

Kind code of ref document: A2

Designated state(s): DE FR GB NL

AX Request for extension of the european patent

Free format text: AL;LT;LV;MK;RO;SI

PUAL Search report despatched

Free format text: ORIGINAL CODE: 0009013

AK Designated contracting states

Kind code of ref document: A3

Designated state(s): AT BE CH DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE

AX Request for extension of the european patent

Free format text: AL;LT;LV;MK;RO;SI

17P Request for examination filed

Effective date: 20000707

17Q First examination report despatched

Effective date: 20000816

AKX Designation fees paid

Free format text: DE FR GB NL

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

18D Application deemed to be withdrawn

Effective date: 20001228