EP0327311A2 - Fluide de revêtement pour la formation d'une couche d'oxyde - Google Patents
Fluide de revêtement pour la formation d'une couche d'oxyde Download PDFInfo
- Publication number
- EP0327311A2 EP0327311A2 EP89300927A EP89300927A EP0327311A2 EP 0327311 A2 EP0327311 A2 EP 0327311A2 EP 89300927 A EP89300927 A EP 89300927A EP 89300927 A EP89300927 A EP 89300927A EP 0327311 A2 EP0327311 A2 EP 0327311A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- coating
- och3
- forming
- oxide
- ch3si
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1212—Zeolites, glasses
Definitions
- This invention relates to a coating fluid for forming an oxide coating which is thermally stable and has good coating properties and a method for forming an oxide coating using the same.
- the present invention provides:
- a coating fluid for forming an oxide coating on a substrate which comprises a reaction product obtained by subjecting
- the present invention also provides a process for forming a coating oxide on a substrate which comprises a step of coating a coating fluid on a substrate, said coating fluid comprising a reaction product obtained by subjecting (A) a silane compound expressed by the formula RmSi(OR) 4-m wherein R represents an alkyl group of 1 to 4 carbon atoms or an aryl group and m represents an integer of 0 to 2 and (B) an organic metal compound expressed by the formula M(OR′) n wherein M represents a metal atom of magnesium, boron, phosphorus, zirconium, yttrium, titanium or barium, R′ represents an alkyl group of 1 to 4 carbon atoms or an aryl group and n represents a valence of the metal atom, to hydrolysis and condensation by the use of a catalyst in the presence of a solvent; a step of drying said coated substrate at a temperature of 50-200°C; and a step of calcining said dried coated substrate at a temperature of 400-
- the silane compound used in the present invention is expressed by the formula RmSi(OR) 4-m and its concrete examples are tetrafunctional silanes such as Si(OCH3)4, Si(OC2H5)4, Si(OC3H7), etc., trifunctional silanes such as CH3Si(OCH3)3, CH3Si(OC2H5)3, CH3Si(OC3H7)3, C2H5Si(OCH3)3, C6H5Si(OCH3)3, CH3Si(OC6H5)3, etc.
- tetrafunctional silanes such as Si(OCH3)4, Si(OC2H5)4, Si(OC3H7), etc.
- trifunctional silanes such as CH3Si(OCH3)3, CH3Si(OC2H5)3, CH3Si(OC3H7)3, C2H5Si(OCH3)3, C6H5Si(OCH3)3, CH3Si(OC6H5)3, etc.
- alkoxysilanes such as (CH3)2Si(OCH3)2, (CH3)2Si(OC2H5)2, (CH3)2Si(OC3H7)2, (C2H5)2Si(OCH3)2, (C6H5)2Si(OCH3)2, (CH3)2Si(OC6H5)2, etc.
- alkoxysilanes may be used singly or in admixture of two or more members thereof.
- the organic metal compound used in the present invention is expressed by the formula M(OR′) n and its concrete examples are B(O i-C3H7)3, Mg(OC3H7)2, P(O i-C3H7)3, Ti(O i-C3H7)4, Ti(OC6H5), etc. These metal compounds may be used singly or in admixture of two or more members thereof. Further, the above-mentioned R and R′ may be the same or different.
- the proportions of the silane compound and the organic metal compound used in the present invention it is preferred in the aspects of coating properties, carbon residue, etc. that the proportion of the silane compound be in the range of 70 to 90% by mol and that of the organic metal compound be in the range of 10 to 30% by mol.
- the silane compound is preferred to be a tetrafunctional silane Si(OR)4 singly or a mixture of 20 to 40% by mol of a tetrafunctional silane Si(OR)4, 20 to 60% by mol of a trifunctional silane RSi(OR)3 and 0 to 40% by mol of a bifunctional silane R2Si(OR)2.
- amide solvents such as N,N-dimethylformamides which do not react with alkyl groups or aryl groups, alcohol solvents which have the same carbon atoms as those of the alkyl or aryl group in the silane compound, etc. are preferably used in the aspect of coating properties. These solvents may be used in admixture.
- reaction catalyst used in the present invention are inorganic acids such as hydrochloric acid, sulfuric acid, phosphoric acid, boric acid, hydrofluoric acid, etc., oxides such as phosphorus pentoxide, boron oxide and organic acids such as oxalic acid, etc.
- the quantity of the catalyst added is preferably in the range of 0.1 to 5% by weight based on the total weight of the silane and the organic metal compound.
- the coating fluid of the present invention is obtained by subjecting the silane compound and the organic metal compound to hydrolysis and condensation by the use of a catalyst as described above in the presence of a solvent. Further, the thermal expansion coefficient of the oxide coating obtained using the resulting solution can be optinally varied by selecting the kind and quantity of the organic metal compound.
- the coating fluid is coated on the surface of a substrate such as silicon, glass, ceramics, aluminium, etc. by means of spinner, brush, spray, etc., followed by drying usually at 50 to 200°C, preferably 100 to 150°C and then calcining usually at 400 to 800°C, preferably 400 to 500°C.
- the oxide coating obtained using the coating fluid of the present invention is smaller in the carbon content than oxide coatings obtained using conventional silanol condensates, and an oxide of e.g. Mg, P, Zr, Y, Ti or Ba is contained there-n as a second component to form a reaction product with SiO2, whereby the resulting coating is thermally stable and good coating properties is obtained.
- an oxide of e.g. Mg, P, Zr, Y, Ti or Ba is contained there-n as a second component to form a reaction product with SiO2, whereby the resulting coating is thermally stable and good coating properties is obtained.
- Si(OCH3)4 (51g), CH3Si(OCH3)3 (45g), (CH3)2Si(OCH3)2 (12g), B(O i-C3H7)3 (31g) and Mg(OC3H7)2 (10g) were dissolved in a mixed solvent of N,N-dimethylformamide (160g) and methanol (40g), followed by adding to the solution, a solution (55g) of oxalic acid (0.6g) in water and subjecting the mixture to hydrolysis and condensation to prepare a solution of the reaction product.
- This solution was coated on a Si wafer by means of a spinner at 3,000 rpm, followed by drying at 150°C for one hour and then calcining in an electric oven at 400°C for one hour to obtain a colorless, transparent silica coating without any crack.
- the coating thickness of the silica coating was measured by means of a surface roughness meter (TALYSTEP, trademark of product made by RANK TAYLOR HOBSON Co. LTD.) to give 0.7 ⁇ m. Further, when the inflared absorption spectra of the coating was measured by means of an inflared spectrophotometer, absorptions cf Mg-O and B-O bonds were observed besides Si-O-Si absorption; thus it was confirmed that the coating was a complete oxide coating. Further, when the oxide coating was treated by means of a barrel type oxygen plasma ashing device (PR-501A, tradename of product made by Yamato Kagaku Co. LTD.) at 400W for 20 minutes, no crack was observed in the coating.
- PR-501A barrel type oxygen plasma ashing device
- thermophysical tester TMA 8,150 type, tradename of product made by Rigaku Denki Co. LTD.
- Si(OC2H5)4 (145g), P(OC3H7)3 (41g) and Mg(OC3H7)2 (14g) were dissolved in ethyl alcohol (300g), followed by adding to the solution, a solution (66g) of oxalic acid (0.8g) in water and subjecting the mixture to hydrolysis and condensation to prepare a solution of the reaction product.
- Example 2 When the solution was coated onto a Si wafer, followed by drying and calcining under the same conditions as in Example 1 to obtain a colorless, transparent silica coating having a coating thickness of 0.5 ⁇ m and no crack. Further, when coating of the above solution was carried out on a Si wafer having an aluminum pattern deposited thereon under the same conditions as in Example 1, a colorless, transparent oxide coating without any crack was obtained.
- Si(OC2H5)4(69g), CH3Si(OC2H5)3 (59g), (CH3)2Si(OC2H5)2 (31g) and B(O i-C3H7)3 (31g) were dissolved in a mixed solvent of ethanol (26g) and N,N-dimethylformamide (105g), followed by adding to the solution, a solution of oxalic acid (0.6g) in water (56g) and subjecting the mixture to hydrolysis and condensation to prepare a solution of the reaction product.
- Si(OCH3)4 (51g), CH3Si(OCH3)3 (30g), C6H5Si(OCH3)3 (22g), (CH3)2Si(OCH3)2 (12g), B(O i-C3H7)3 (31g) and Mg(OC3H7)2 (10g) were dissolved in diethylene glycol diethyl ether (200g), followed by adding to the solution, a solution (55g) of phosphoric acid (0.5g) in water and subjecting the mixture to hydrolysis and condensation to prepare a solution of the reaction product.
- This solution was coated on a Si wafer and a Si wafer having an aluminum pattern deposited thereon, followed by drying and calcining under the same conditions as in Example 1 to obtain a colorless, transparent oxide coating having a coating thickness of 0.8 ⁇ m without any crack.
- Si(OC2H5)4 35g was dissolved in a mixed solvent of ethanol (64g) and ethyl acetate (26g), followed by adding to the solution, a solution of oxalic acid (0.5g) in water (12g), followed by subjecting the mixture to hydrolysis and condensation to prepare a silanol oligomer solution.
- Si(OCH3)4 (17g), CH3Si(OCH3)3 (25g) and (CH3)2Si(OCH3)2 (5g) were dissolved in a mixed solvent of N,N-dimethylformamide (48g) and methanol (6g), followed by adding to the solution, a solution of phosphoric acid (0.5g) in water (20g) and subjecting the mixture to hydrolysis and condensation to prepare a silanol oligomer solution.
- the coating fluid for forming an oxide coating of the present invention is thermally stable and superior in the coating properties; hence cracks do not occur in the oxide coating of even about 1.5 ⁇ m or more formed on the surface of a substrate using the coating fluid.
- the coating fluid for forming an oxide coating of the present invention is effective for coating electronic parts, particularly coating for step-covering on multilevel inter connection of semiconductors, planarizing the element surface of magnetic bubble domain memory, etc.
- the present invention aims to provide a coating fluid for forming an oxide coating having overcome the above-mentioned drawbacks of the prior art and having a good thermal stability and superior coating properties.
- the inventors of the present Invention have made extensive research in order to achieve the above-mentioned aims and as a result have noted that in order to form an oxide coating without any cracks on a substrate such as silicon, aluminum, etc. and further without any occurrence of cracks even at the time of the subsequent oxidizing step such as oxygen plasma treatment, it is necessary to use a coating fluid satisfying conditions of (1) reducing the strain of curing shrinkage at the time of calcination, (2) bringing the thermal expansion coefficient of the coating close to that of the substrate, and (3) making the carbon content in the coating very low or nil and such a coating fluid is obtained by subjecting a specified compound to hydrolysis and condensation by the use of a catalyst in the presence of a solvent; thus we have achieved the present invention.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Paints Or Removers (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Silicon Polymers (AREA)
- Local Oxidation Of Silicon (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22370/88 | 1988-02-02 | ||
JP2237088 | 1988-02-02 |
Publications (3)
Publication Number | Publication Date |
---|---|
EP0327311A2 true EP0327311A2 (fr) | 1989-08-09 |
EP0327311A3 EP0327311A3 (en) | 1990-08-01 |
EP0327311B1 EP0327311B1 (fr) | 1994-09-14 |
Family
ID=12080747
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP19890300927 Expired - Lifetime EP0327311B1 (fr) | 1988-02-02 | 1989-01-31 | Fluide de revêtement pour la formation d'une couche d'oxyde |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0327311B1 (fr) |
JP (1) | JPH021778A (fr) |
DE (1) | DE68918124T2 (fr) |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0580944A1 (fr) * | 1992-07-30 | 1994-02-02 | Heraeus Kulzer Gmbh | Procédé et dispositif pour la fabrication d'un composite métal-plastique |
BE1008162A5 (fr) * | 1989-09-27 | 1996-02-06 | Air Prod & Chem | Produits manufactures carbones et procede pour les produire. |
EP0768352A1 (fr) * | 1994-06-30 | 1997-04-16 | Hitachi Chemical Co., Ltd. | Matiere pour la formation d'une couche mince isolante revetue a base de silice, son procede de fabrication, couche isolante a base de silice, dispositif a semi-conducteurs, et procede de fabrication de ce dispositif |
WO1998045502A1 (fr) * | 1997-04-10 | 1998-10-15 | Institut Für Neue Materialien Gem. Gmbh | Procede pour munir une surface metallique d'une couche vitreuse |
WO2006017450A1 (fr) * | 2004-08-03 | 2006-02-16 | Honeywell International Inc. | Matieres durcissables a faible temperature pour applications optiques |
WO2006065819A3 (fr) * | 2004-12-13 | 2006-11-30 | Aeromet Technologies Inc | Composants metalliques avec revetements protecteurs au silicium et procedes de formation de ces revetements protecteurs |
US7901739B2 (en) | 2004-09-16 | 2011-03-08 | Mt Coatings, Llc | Gas turbine engine components with aluminide coatings and method of forming such aluminide coatings on gas turbine engine components |
RU2444540C1 (ru) * | 2010-10-21 | 2012-03-10 | Общество с ограниченной ответственностью "Пента-91" | Способ получения полиметаллосилоксанов |
WO2012094450A1 (fr) * | 2011-01-05 | 2012-07-12 | Dow Corning Corporation | Polyhétérosiloxanes pour des matières à indice de réfraction élevé |
GB2496708A (en) * | 2011-11-17 | 2013-05-22 | Dow Corning | Solvent-borne scratch resistant coating compositions containing polymetallosiloxanes |
US9133718B2 (en) | 2004-12-13 | 2015-09-15 | Mt Coatings, Llc | Turbine engine components with non-aluminide silicon-containing and chromium-containing protective coatings and methods of forming such non-aluminide protective coatings |
CN108807427A (zh) * | 2012-11-30 | 2018-11-13 | 株式会社理光 | 场效应晶体管、显示元件、图像显示装置、和*** |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02258839A (ja) * | 1989-03-31 | 1990-10-19 | Fuji Xerox Co Ltd | 無機・有機複合材料の製造方法 |
JP2576065B2 (ja) * | 1989-03-31 | 1997-01-29 | 富士ゼロックス株式会社 | 半導電性重合体組成物 |
JP2576066B2 (ja) * | 1989-03-31 | 1997-01-29 | 富士ゼロックス株式会社 | 半導電性重合体組成物 |
JPH02258841A (ja) * | 1989-03-31 | 1990-10-19 | Fuji Xerox Co Ltd | 無機・有機複合材料の製造方法 |
DE4018984A1 (de) * | 1990-06-13 | 1991-12-19 | Wacker Chemitronic | Verfahren zur herstellung lagerstabiler oberflaechen von polierten siliciumscheiben |
JP2739916B2 (ja) * | 1992-02-18 | 1998-04-15 | キヤノン株式会社 | 光学素子製造用ガラスブランク及びこれを用いた光学素子の製造方法 |
JP4499907B2 (ja) * | 2000-12-07 | 2010-07-14 | 富士化学株式会社 | 無機高分子化合物の製造方法、無機高分子化合物、および無機高分子化合物膜 |
KR20070108658A (ko) * | 2006-05-08 | 2007-11-13 | 유영선 | 반도체 장치의 절연막 형성용 도포액 조성물의 제조방법 및제조된 도포액 조성물 |
WO2008018981A2 (fr) * | 2006-08-04 | 2008-02-14 | Dow Corning Corporation | Résine de silicium et composition de silicium |
US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
RU2453550C1 (ru) * | 2011-03-09 | 2012-06-20 | Федеральное государственное унитарное предприятие "Государственный ордена Трудового Красного Знамени научно-исследовательский институт химии и технологии элементоорганических соединений" (ФГУП ГНИИХТЭОС) | Способ получения иттрийсодержащих органоалюмоксансилоксанов, связующие и пропиточные композиции на их основе |
US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
EP3194502A4 (fr) | 2015-04-13 | 2018-05-16 | Honeywell International Inc. | Formulations de polysiloxane et revêtements pour applications optoélectroniques |
CN110289204B (zh) * | 2018-03-19 | 2023-08-15 | 株式会社理光 | 氧化物绝缘体膜形成用涂布液 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2123652A5 (fr) * | 1970-02-19 | 1972-09-15 | Ibm | |
US3847583A (en) * | 1969-08-13 | 1974-11-12 | Jenaer Glaswerk Schott & Gen | Process for the manufacture of multi-component substances |
EP0008215A2 (fr) * | 1978-08-08 | 1980-02-20 | Westinghouse Electric Corporation | Solutions polymérisées d'un oxyde et procédé pour leur préparation; procédé d'application de revêtements d'alcoxydes sur des substrats, tels que les cellules solaires, et produits ainsi fabriqués |
US4318939A (en) * | 1980-08-21 | 1982-03-09 | Western Electric Co., Incorporated | Stabilized catalyzed organopolysiloxanes |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5534276A (en) * | 1978-09-04 | 1980-03-10 | Tokyo Denshi Kagaku Kabushiki | Preparation of coating liquid for silica-based film formation |
JPS5638472A (en) * | 1979-09-06 | 1981-04-13 | Tokyo Denshi Kagaku Kabushiki | Formation of silica coating |
JPS60258477A (ja) * | 1984-06-02 | 1985-12-20 | Nippon Steel Corp | 珪素鋼板の絶縁皮膜の形成方法 |
-
1989
- 1989-01-31 DE DE1989618124 patent/DE68918124T2/de not_active Expired - Fee Related
- 1989-01-31 EP EP19890300927 patent/EP0327311B1/fr not_active Expired - Lifetime
- 1989-01-31 JP JP1022041A patent/JPH021778A/ja active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3847583A (en) * | 1969-08-13 | 1974-11-12 | Jenaer Glaswerk Schott & Gen | Process for the manufacture of multi-component substances |
FR2123652A5 (fr) * | 1970-02-19 | 1972-09-15 | Ibm | |
EP0008215A2 (fr) * | 1978-08-08 | 1980-02-20 | Westinghouse Electric Corporation | Solutions polymérisées d'un oxyde et procédé pour leur préparation; procédé d'application de revêtements d'alcoxydes sur des substrats, tels que les cellules solaires, et produits ainsi fabriqués |
US4318939A (en) * | 1980-08-21 | 1982-03-09 | Western Electric Co., Incorporated | Stabilized catalyzed organopolysiloxanes |
Cited By (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE1008162A5 (fr) * | 1989-09-27 | 1996-02-06 | Air Prod & Chem | Produits manufactures carbones et procede pour les produire. |
EP0580944A1 (fr) * | 1992-07-30 | 1994-02-02 | Heraeus Kulzer Gmbh | Procédé et dispositif pour la fabrication d'un composite métal-plastique |
EP0768352A1 (fr) * | 1994-06-30 | 1997-04-16 | Hitachi Chemical Co., Ltd. | Matiere pour la formation d'une couche mince isolante revetue a base de silice, son procede de fabrication, couche isolante a base de silice, dispositif a semi-conducteurs, et procede de fabrication de ce dispositif |
EP0768352A4 (fr) * | 1994-06-30 | 1997-12-10 | Hitachi Chemical Co Ltd | Matiere pour la formation d'une couche mince isolante revetue a base de silice, son procede de fabrication, couche isolante a base de silice, dispositif a semi-conducteurs, et procede de fabrication de ce dispositif |
US6000339A (en) * | 1994-06-30 | 1999-12-14 | Hitachi Chemical Company, Ltd. | Material for forming silica-base coated insulation film, process for producing the material, silica-base insulation film, semiconductor device, and process for producing the device |
CN1069675C (zh) * | 1994-06-30 | 2001-08-15 | 日立化成工业株式会社 | 二氧化硅基隔离膜及其制作材料和该材料的生产工艺 |
WO1998045502A1 (fr) * | 1997-04-10 | 1998-10-15 | Institut Für Neue Materialien Gem. Gmbh | Procede pour munir une surface metallique d'une couche vitreuse |
EP1284307A1 (fr) * | 1997-04-10 | 2003-02-19 | Institut Für Neue Materialien Gem. Gmbh | Procédé pour munir une surface métallique d'une couche vitreuse |
US7445953B2 (en) | 2004-08-03 | 2008-11-04 | Honeywell International Inc. | Low temperature curable materials for optical applications |
WO2006017450A1 (fr) * | 2004-08-03 | 2006-02-16 | Honeywell International Inc. | Matieres durcissables a faible temperature pour applications optiques |
US8623461B2 (en) | 2004-09-16 | 2014-01-07 | Mt Coatings Llc | Metal components with silicon-containing protective coatings substantially free of chromium and methods of forming such protective coatings |
US7901739B2 (en) | 2004-09-16 | 2011-03-08 | Mt Coatings, Llc | Gas turbine engine components with aluminide coatings and method of forming such aluminide coatings on gas turbine engine components |
WO2006065819A3 (fr) * | 2004-12-13 | 2006-11-30 | Aeromet Technologies Inc | Composants metalliques avec revetements protecteurs au silicium et procedes de formation de ces revetements protecteurs |
EP3095895A1 (fr) * | 2004-12-13 | 2016-11-23 | MT Coatings, LLC | Procédé de formation des revêtements protecteurs au silicium sur composants métalliques |
US9133718B2 (en) | 2004-12-13 | 2015-09-15 | Mt Coatings, Llc | Turbine engine components with non-aluminide silicon-containing and chromium-containing protective coatings and methods of forming such non-aluminide protective coatings |
RU2444540C1 (ru) * | 2010-10-21 | 2012-03-10 | Общество с ограниченной ответственностью "Пента-91" | Способ получения полиметаллосилоксанов |
CN103282801A (zh) * | 2011-01-05 | 2013-09-04 | 道康宁公司 | 用于高折射率材料的聚杂硅氧烷 |
US8962091B2 (en) | 2011-01-05 | 2015-02-24 | Dow Corning Corporation | Polyheterosilxoanes for high refractive index materials |
WO2012094450A1 (fr) * | 2011-01-05 | 2012-07-12 | Dow Corning Corporation | Polyhétérosiloxanes pour des matières à indice de réfraction élevé |
GB2496708A (en) * | 2011-11-17 | 2013-05-22 | Dow Corning | Solvent-borne scratch resistant coating compositions containing polymetallosiloxanes |
CN108807427A (zh) * | 2012-11-30 | 2018-11-13 | 株式会社理光 | 场效应晶体管、显示元件、图像显示装置、和*** |
CN108807427B (zh) * | 2012-11-30 | 2023-08-22 | 株式会社理光 | 场效应晶体管、显示元件、图像显示装置、和*** |
US11876137B2 (en) | 2012-11-30 | 2024-01-16 | Ricoh Company, Ltd. | Field-effect transistor including a metal oxide composite protective layer, and display element, image display device, and system including the field-effect transistor |
Also Published As
Publication number | Publication date |
---|---|
DE68918124T2 (de) | 1995-02-23 |
DE68918124D1 (de) | 1994-10-20 |
EP0327311A3 (en) | 1990-08-01 |
JPH021778A (ja) | 1990-01-08 |
JPH0559154B2 (fr) | 1993-08-30 |
EP0327311B1 (fr) | 1994-09-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0327311B1 (fr) | Fluide de revêtement pour la formation d'une couche d'oxyde | |
EP0615000B1 (fr) | Revêtements à l'aide hydrogène silberquioxane contenant une charge | |
EP0274274B1 (fr) | Revêtements céramiques multicouches obtenus à partir d'esters de silicates et d'oxydes métalliques | |
EP0460868B1 (fr) | Catalyseur à base d'amines pour la conversion à température basse de produits préliminaires de l'acide silicique en acide silicique | |
US5547703A (en) | Method of forming si-o containing coatings | |
EP0270241B1 (fr) | Céramiques multicouches à partir des esters de silicate | |
EP0579456B1 (fr) | Traitement thermique de matériaux qui comprennent de l'hydride de silicium dans une atmosphère d'oxyde nitrique | |
JPS63152130A (ja) | 多層セラミック被膜の形成方法 | |
EP0461782A2 (fr) | Conversion à basse température de précurseurs de silice en silice | |
EP0643025A1 (fr) | Méthode de formation de couches contenant Si-0 | |
US5445894A (en) | Ceramic coatings | |
US5271768A (en) | Coating for forming an oxide coating | |
JPS6346095B2 (fr) | ||
US4997482A (en) | Coating composition containing hydrolyzed silicate esters and other metal oxide precursors | |
US5820923A (en) | Curing silica precursors by exposure to nitrous oxide | |
JPH05214296A (ja) | 酸化物被膜形成用塗布液および酸化物被膜の製造法 | |
JPH06293879A (ja) | 酸化物被膜形成用塗布液および酸化物被膜の製造法 | |
JPH07173434A (ja) | 酸化物被膜形成用塗布液および酸化物被膜の製造法 | |
JPH0371472B2 (fr) | ||
JP2520834B2 (ja) | 無機系被膜形成方法および同被膜形成物品 | |
JPH06172709A (ja) | 酸化物被膜形成用塗布液および酸化物被膜の製造法 | |
JPH1112542A (ja) | シリカ系被膜形成用塗布液、シリカ系被膜及びそれを用いた半導体装置 | |
JPS6155164A (ja) | シリカ被膜の形成方法 | |
JPH04352329A (ja) | 酸化物被膜形成用塗布液および酸化物被膜の製造法 | |
JPH0673339A (ja) | 酸化物被膜形成用塗布液および酸化物被膜の製造法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
AK | Designated contracting states |
Kind code of ref document: A2 Designated state(s): BE DE GB LU NL |
|
PUAL | Search report despatched |
Free format text: ORIGINAL CODE: 0009013 |
|
AK | Designated contracting states |
Kind code of ref document: A3 Designated state(s): BE DE GB LU NL |
|
17P | Request for examination filed |
Effective date: 19901022 |
|
17Q | First examination report despatched |
Effective date: 19911223 |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): BE DE GB LU NL |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: BE Effective date: 19940914 |
|
REF | Corresponds to: |
Ref document number: 68918124 Country of ref document: DE Date of ref document: 19941020 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LU Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 19950131 |
|
PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
26N | No opposition filed | ||
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: GB Payment date: 19980122 Year of fee payment: 10 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: NL Payment date: 19980128 Year of fee payment: 10 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: GB Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 19990131 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: NL Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 19990801 |
|
GBPC | Gb: european patent ceased through non-payment of renewal fee |
Effective date: 19990131 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: DE Payment date: 20010122 Year of fee payment: 13 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: DE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20020801 |