DE69938999D1 - Verfahren und Vorrichtung zur Verwendung von Schiebefenstern in einem mikro-elektromechanischen System - Google Patents

Verfahren und Vorrichtung zur Verwendung von Schiebefenstern in einem mikro-elektromechanischen System

Info

Publication number
DE69938999D1
DE69938999D1 DE69938999T DE69938999T DE69938999D1 DE 69938999 D1 DE69938999 D1 DE 69938999D1 DE 69938999 T DE69938999 T DE 69938999T DE 69938999 T DE69938999 T DE 69938999T DE 69938999 D1 DE69938999 D1 DE 69938999D1
Authority
DE
Germany
Prior art keywords
electro
micro
mechanical system
sliding windows
windows
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69938999T
Other languages
English (en)
Inventor
Joel A Kubby
Eric Peeters
Enrique R Viturro
Fred F Hubble Iii
Stanley J Wallace
Alan J Werner Jr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Xerox Corp
Original Assignee
Xerox Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xerox Corp filed Critical Xerox Corp
Application granted granted Critical
Publication of DE69938999D1 publication Critical patent/DE69938999D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R29/00—Arrangements for measuring or indicating electric quantities not covered by groups G01R19/00 - G01R27/00
    • G01R29/12—Measuring electrostatic fields or voltage-potential
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R29/00—Arrangements for measuring or indicating electric quantities not covered by groups G01R19/00 - G01R27/00
    • G01R29/24—Arrangements for measuring quantities of charge
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R15/00—Details of measuring arrangements of the types provided for in groups G01R17/00 - G01R29/00, G01R33/00 - G01R33/26 or G01R35/00
    • G01R15/14—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks
    • G01R15/16—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks using capacitive devices
    • G01R15/165—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks using capacitive devices measuring electrostatic potential, e.g. with electrostatic voltmeters or electrometers, when the design of the sensor is essential

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Micromachines (AREA)
  • Control Or Security For Electrophotography (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
DE69938999T 1998-11-10 1999-11-05 Verfahren und Vorrichtung zur Verwendung von Schiebefenstern in einem mikro-elektromechanischen System Expired - Lifetime DE69938999D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/200,353 US6177800B1 (en) 1998-11-10 1998-11-10 Method and apparatus for using shuttered windows in a micro-electro-mechanical system

Publications (1)

Publication Number Publication Date
DE69938999D1 true DE69938999D1 (de) 2008-08-14

Family

ID=22741366

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69938999T Expired - Lifetime DE69938999D1 (de) 1998-11-10 1999-11-05 Verfahren und Vorrichtung zur Verwendung von Schiebefenstern in einem mikro-elektromechanischen System

Country Status (4)

Country Link
US (1) US6177800B1 (de)
EP (1) EP1003044B1 (de)
JP (1) JP4558869B2 (de)
DE (1) DE69938999D1 (de)

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US20020086456A1 (en) * 2000-12-19 2002-07-04 Cunningham Shawn Jay Bulk micromachining process for fabricating an optical MEMS device with integrated optical aperture
US6418006B1 (en) * 2000-12-20 2002-07-09 The Board Of Trustees Of The University Of Illinois Wide tuning range variable MEMs capacitor
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US7274193B2 (en) 2003-03-28 2007-09-25 Canon Kabushiki Kaisha Micromechanical potential sensor
JP2004301554A (ja) * 2003-03-28 2004-10-28 Canon Inc 電位測定装置及び画像形成装置
JP2004294351A (ja) * 2003-03-28 2004-10-21 Canon Inc 電位センサおよび画像形成装置
JP2004294350A (ja) * 2003-03-28 2004-10-21 Canon Inc 電位センサおよび画像形成装置
JP5027984B2 (ja) * 2003-03-28 2012-09-19 キヤノン株式会社 揺動体を用いた電位測定装置、電位測定方法、及び画像形成装置
JP4794828B2 (ja) * 2004-06-08 2011-10-19 キヤノン株式会社 電位測定装置および画像形成装置
JP2006003131A (ja) * 2004-06-15 2006-01-05 Canon Inc 電位センサ
US7049804B2 (en) * 2004-07-12 2006-05-23 Canon Kabushiki Kaisha Electric potential measuring apparatus, and image forming apparatus
JP4440065B2 (ja) * 2004-10-08 2010-03-24 キヤノン株式会社 電位測定装置及び画像形成装置
US20060029151A1 (en) * 2004-08-05 2006-02-09 Moran Robert D Capacitive data link
US7350919B2 (en) * 2004-12-03 2008-04-01 Searete Llc Vision modification with reflected image
US8104892B2 (en) * 2004-12-03 2012-01-31 The Invention Science Fund I, Llc Vision modification with reflected image
US7656569B2 (en) * 2004-12-03 2010-02-02 Searete Llc Vision modification with reflected image
US7334892B2 (en) * 2004-12-03 2008-02-26 Searete Llc Method and system for vision enhancement
US7931373B2 (en) * 2004-12-03 2011-04-26 The Invention Science Fund I, Llc Vision modification with reflected image
US8244342B2 (en) * 2004-12-03 2012-08-14 The Invention Science Fund I, Llc Method and system for adaptive vision modification
US7344244B2 (en) * 2004-12-03 2008-03-18 Searete, Llc Adjustable lens system with neural-based control
US7390088B2 (en) * 2004-12-03 2008-06-24 Searete Llc Adjustable lens system with neural-based control
US7594727B2 (en) * 2004-12-03 2009-09-29 Searete Llc Vision modification with reflected image
US9155483B2 (en) 2004-12-03 2015-10-13 The Invention Science Fund I, Llc Vision modification with reflected image
US7470027B2 (en) * 2004-12-03 2008-12-30 Searete Llc Temporal vision modification
US7486988B2 (en) * 2004-12-03 2009-02-03 Searete Llc Method and system for adaptive vision modification
US7334894B2 (en) * 2004-12-03 2008-02-26 Searete, Llc Temporal vision modification
JP2006317358A (ja) * 2005-05-16 2006-11-24 Canon Inc 電位測定装置、およびそれを用いた画像形成装置
US7324766B2 (en) * 2005-05-20 2008-01-29 Xerox Corporation Cross-process charge uniformity scanner
JP4921034B2 (ja) * 2005-05-27 2012-04-18 キヤノン株式会社 電位測定装置
US7382137B2 (en) * 2005-05-27 2008-06-03 Canon Kabushiki Kaisha Potential measuring apparatus
JP5188024B2 (ja) * 2006-02-09 2013-04-24 キヤノン株式会社 揺動体装置、電位測定装置、及び光偏向装置
JP4993349B2 (ja) 2007-01-29 2012-08-08 キヤノン株式会社 電位測定装置、及び画像形成装置
DE102008052477A1 (de) 2008-10-20 2010-06-10 Siemens Aktiengesellschaft Als mikromechanisches System ausgebildeter Sensor für elektrische Felder
DE102009013273A1 (de) 2009-03-13 2010-09-16 Siemens Aktiengesellschaft Sensoranordnung zur Messung elektrischer Potentiale
JP5781002B2 (ja) * 2012-04-23 2015-09-16 株式会社コガネイ 電位測定装置
JP6039916B2 (ja) * 2012-04-23 2016-12-07 株式会社コガネイ 電位測定装置
US10119998B2 (en) 2016-11-07 2018-11-06 Fluke Corporation Variable capacitance non-contact AC voltage measurement system
US10352967B2 (en) 2016-11-11 2019-07-16 Fluke Corporation Non-contact electrical parameter measurement systems
US10120021B1 (en) 2017-06-16 2018-11-06 Fluke Corporation Thermal non-contact voltage and non-contact current devices
CA3022581A1 (en) 2017-11-09 2019-05-09 Janaranjana Sampath Hiniduma Liyanage Torsional moving electric field sensor with modulated sensitivity and without reference ground
CN112903183B (zh) * 2019-11-19 2022-11-22 北京大学 一种片上微型电离真空传感器及其制造方法

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US5025346A (en) 1989-02-17 1991-06-18 Regents Of The University Of California Laterally driven resonant microstructures
JPH04307373A (ja) * 1991-04-04 1992-10-29 Canon Inc 表面電位センサー
JPH0587852A (ja) * 1991-07-12 1993-04-06 Jientetsuku Kk 感光ドラムの表面電位測定用プローブ
US5212451A (en) * 1992-03-09 1993-05-18 Xerox Corporation Single balanced beam electrostatic voltmeter modulator
US5349855A (en) 1992-04-07 1994-09-27 The Charles Stark Draper Laboratory, Inc. Comb drive micromechanical tuning fork gyro
JPH07218566A (ja) * 1994-02-04 1995-08-18 Gentec Kk 無振動交流式非接触表面電位計
US5489850A (en) * 1994-05-09 1996-02-06 Xerox Corporation Balanced beam electrostatic voltmeter modulator employing a shielded electrode and carbon fiber conductors
US5517123A (en) * 1994-08-26 1996-05-14 Analog Devices, Inc. High sensitivity integrated micromechanical electrostatic potential sensor
JPH08114500A (ja) * 1994-10-13 1996-05-07 Murata Mfg Co Ltd チョッパ式赤外線センサ
US5703487A (en) * 1996-01-11 1997-12-30 Xerox Corporation Detection of charge deficient spot susceptibility
JP3673597B2 (ja) * 1996-04-30 2005-07-20 キヤノン株式会社 表面電位計

Also Published As

Publication number Publication date
US6177800B1 (en) 2001-01-23
EP1003044A3 (de) 2001-04-18
JP2000147035A (ja) 2000-05-26
EP1003044A2 (de) 2000-05-24
JP4558869B2 (ja) 2010-10-06
EP1003044B1 (de) 2008-07-02

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