DE69933973D1 - Catadioptrisches System und dieses verwendender Belichtungsapparat - Google Patents

Catadioptrisches System und dieses verwendender Belichtungsapparat

Info

Publication number
DE69933973D1
DE69933973D1 DE69933973T DE69933973T DE69933973D1 DE 69933973 D1 DE69933973 D1 DE 69933973D1 DE 69933973 T DE69933973 T DE 69933973T DE 69933973 T DE69933973 T DE 69933973T DE 69933973 D1 DE69933973 D1 DE 69933973D1
Authority
DE
Germany
Prior art keywords
exposure apparatus
catadioptric system
catadioptric
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69933973T
Other languages
English (en)
Other versions
DE69933973T2 (de
Inventor
David R Schafer
Helmut Beierl
Gerhard Fuerter
Karl-Heinz Schuster
Wilhelm Ulrich
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of DE69933973D1 publication Critical patent/DE69933973D1/de
Application granted granted Critical
Publication of DE69933973T2 publication Critical patent/DE69933973T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69933973T 1998-07-29 1999-07-01 Katadioptrisches optisches system und damit ausgestattete belichtungsvorrichtung Expired - Lifetime DE69933973T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US9457998P 1998-07-29 1998-07-29
US94579P 1998-07-29

Publications (2)

Publication Number Publication Date
DE69933973D1 true DE69933973D1 (de) 2006-12-28
DE69933973T2 DE69933973T2 (de) 2007-06-28

Family

ID=22245979

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69933973T Expired - Lifetime DE69933973T2 (de) 1998-07-29 1999-07-01 Katadioptrisches optisches system und damit ausgestattete belichtungsvorrichtung

Country Status (6)

Country Link
US (4) US6496306B1 (de)
EP (1) EP0989434B1 (de)
JP (1) JP4693947B2 (de)
KR (1) KR100615068B1 (de)
DE (1) DE69933973T2 (de)
TW (1) TW466349B (de)

Families Citing this family (54)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3395801B2 (ja) 1994-04-28 2003-04-14 株式会社ニコン 反射屈折投影光学系、走査型投影露光装置、及び走査投影露光方法
US6512631B2 (en) * 1996-07-22 2003-01-28 Kla-Tencor Corporation Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system
US6680803B2 (en) * 1996-12-21 2004-01-20 Carl-Zeiss Smt Ag Partial objective in an illuminating systems
US7130129B2 (en) 1996-12-21 2006-10-31 Carl Zeiss Smt Ag Reticle-masking objective with aspherical lenses
EP1293832A1 (de) 1998-06-08 2003-03-19 Nikon Corporation Verfahren und Vorrichtung zur Projektionsbelichtung
US6451507B1 (en) * 1998-08-18 2002-09-17 Nikon Corporation Exposure apparatus and method
EP1094350A3 (de) * 1999-10-21 2001-08-16 Carl Zeiss Optisches Projektionslinsensystem
EP1115019A3 (de) * 1999-12-29 2004-07-28 Carl Zeiss Projektionsobjektiv mit asphärischen Elementen
US6995930B2 (en) * 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
TW538256B (en) 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
WO2002044786A2 (en) * 2000-11-28 2002-06-06 Carl Zeiss Smt Ag Catadioptric projection system for 157 nm lithography
US6480330B1 (en) * 2000-02-24 2002-11-12 Silicon Valley Group, Inc. Ultraviolet polarization beam splitter for microlithography
US7301605B2 (en) * 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
JP2002083766A (ja) 2000-06-19 2002-03-22 Nikon Corp 投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置
KR20010113527A (ko) * 2000-06-19 2001-12-28 시마무라 테루오 투영 광학계, 그 제조 방법 및 투영 노광 장치
JP2002244034A (ja) * 2001-02-21 2002-08-28 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
US7031069B2 (en) 2001-05-19 2006-04-18 Carl Zeiss Smt Ag Microlithographic illumination method and a projection lens for carrying out the method
DE10127227A1 (de) * 2001-05-22 2002-12-05 Zeiss Carl Katadioptrisches Reduktionsobjektiv
US7136220B2 (en) 2001-08-21 2006-11-14 Carl Zeiss Smt Ag Catadioptric reduction lens
US7453641B2 (en) * 2001-10-30 2008-11-18 Asml Netherlands B.V. Structures and methods for reducing aberration in optical systems
JP2005512151A (ja) * 2001-12-10 2005-04-28 カール・ツァイス・エスエムティー・アーゲー カタジオプトリック縮小対物レンズ
AU2002358638A1 (en) * 2001-12-18 2003-06-30 Carl Zeiss Smt Ag Catadioptric reduction lens
US7046459B1 (en) 2001-12-18 2006-05-16 Carl Zeiss Smt Ag Catadioptric reductions lens
DE10210899A1 (de) 2002-03-08 2003-09-18 Zeiss Carl Smt Ag Refraktives Projektionsobjektiv für Immersions-Lithographie
JP4292497B2 (ja) * 2002-04-17 2009-07-08 株式会社ニコン 投影光学系、露光装置および露光方法
DE10220324A1 (de) 2002-04-29 2003-11-13 Zeiss Carl Smt Ag Projektionsverfahren mit Pupillenfilterung und Projektionsobjektiv hierfür
US20050190446A1 (en) * 2002-06-25 2005-09-01 Carl Zeiss Amt Ag Catadioptric reduction objective
US6922293B2 (en) 2002-07-02 2005-07-26 Nikon Corporation Kinematic optical mounting assembly with flexures
WO2004090952A1 (ja) 2003-04-09 2004-10-21 Nikon Corporation 露光方法及び装置、並びにデバイス製造方法
US6995833B2 (en) 2003-05-23 2006-02-07 Canon Kabushiki Kaisha Projection optical system, exposure apparatus, and device manufacturing method
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
EP1700163A1 (de) 2003-12-15 2006-09-13 Carl Zeiss SMT AG Objektiv als mikrolithographie-projektionsobjektiv mit mindestens einer flüssigen linse
US7466489B2 (en) * 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
WO2005106589A1 (en) * 2004-05-04 2005-11-10 Carl Zeiss Smt Ag Microlithographic projection exposure apparatus and immersion liquid therefore
JP5102492B2 (ja) * 2003-12-19 2012-12-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 結晶素子を有するマイクロリソグラフィー投影用対物レンズ
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR101115111B1 (ko) * 2004-02-13 2012-04-16 칼 짜이스 에스엠티 게엠베하 마이크로 리소그래프 투영 노광 장치 투영 대물 렌즈
CN100592210C (zh) * 2004-02-13 2010-02-24 卡尔蔡司Smt股份公司 微平版印刷投影曝光装置的投影物镜
KR101391470B1 (ko) 2004-05-17 2014-05-07 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
JP2006119490A (ja) 2004-10-25 2006-05-11 Canon Inc 反射屈折型投影光学系及び当該反射屈折型投影光学系を有する露光装置、デバイス製造方法
US20060198018A1 (en) * 2005-02-04 2006-09-07 Carl Zeiss Smt Ag Imaging system
KR101653514B1 (ko) * 2005-06-02 2016-09-01 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 대물 렌즈
DE102005031084A1 (de) * 2005-06-28 2007-01-04 Carl Zeiss Smt Ag Mikrolithografisches Belichtungsverfahren sowie Projektionsbelichtungsanlage zur Durchführung des Verfahrens
EP1837695A1 (de) * 2006-03-22 2007-09-26 Carl Zeiss SMT AG Katadioptrisches Abbildungssystem mit Strahlteiler
US8125613B2 (en) 2006-04-21 2012-02-28 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US20070247729A1 (en) * 2006-04-25 2007-10-25 Rudolph Technologies, Inc. Reflective objective
EP1852745A1 (de) * 2006-05-05 2007-11-07 Carl Zeiss SMT AG Projektionsobjektiv mit hoher NA
KR100839487B1 (ko) 2006-10-16 2008-06-19 삼성전자주식회사 팝업 노이즈 방지 회로, 이를 포함하는 디지털 앰프 및디지털 앰프의 팝업 노이즈 방지 방법
US8715909B2 (en) * 2007-10-05 2014-05-06 Infineon Technologies Ag Lithography systems and methods of manufacturing using thereof
DE102008007449A1 (de) * 2008-02-01 2009-08-13 Carl Zeiss Smt Ag Beleuchtungsoptik zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage für die Mikrolithographie
US8345350B2 (en) * 2008-06-20 2013-01-01 Carl Zeiss Smt Gmbh Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same
JP5253081B2 (ja) * 2008-10-14 2013-07-31 キヤノン株式会社 投影光学系、露光装置及びデバイスの製造方法
US8830590B2 (en) * 2012-05-30 2014-09-09 Ultratech, Inc. Unit magnification large-format catadioptric lens for microlithography
CN112965212B (zh) * 2021-03-24 2023-04-07 江西晶超光学有限公司 成像***、摄像模组及电子设备

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4779966A (en) * 1984-12-21 1988-10-25 The Perkin-Elmer Corporation Single mirror projection optical system
US5052763A (en) * 1990-08-28 1991-10-01 International Business Machines Corporation Optical system with two subsystems separately correcting odd aberrations and together correcting even aberrations
US5668673A (en) 1991-08-05 1997-09-16 Nikon Corporation Catadioptric reduction projection optical system
JPH06242379A (ja) * 1992-12-24 1994-09-02 Nikon Corp 反射屈折縮小投影光学系
JP3235077B2 (ja) * 1991-09-28 2001-12-04 株式会社ニコン 露光装置、該装置を用いた露光方法、及び該装置を用いた半導体素子製造方法
US5323563A (en) * 1992-07-31 1994-06-28 Stageright Corporation Retractable locators for deck panels of portable staging
US5323263A (en) * 1993-02-01 1994-06-21 Nikon Precision Inc. Off-axis catadioptric projection system
US5592329A (en) * 1993-02-03 1997-01-07 Nikon Corporation Catadioptric optical system
JP3635684B2 (ja) 1994-08-23 2005-04-06 株式会社ニコン 反射屈折縮小投影光学系、反射屈折光学系、並びに投影露光方法及び装置
JP3747958B2 (ja) 1995-04-07 2006-02-22 株式会社ニコン 反射屈折光学系
JP3747951B2 (ja) * 1994-11-07 2006-02-22 株式会社ニコン 反射屈折光学系
JPH09311278A (ja) 1996-05-20 1997-12-02 Nikon Corp 反射屈折光学系
JPH0713070A (ja) * 1993-06-29 1995-01-17 Nikon Corp 負レンズ及び該負レンズを有する光学系並びに 該負レンズの製造方法
JPH0772393A (ja) * 1993-09-06 1995-03-17 Nikon Corp 反射縮小投影光学系
JP3395801B2 (ja) 1994-04-28 2003-04-14 株式会社ニコン 反射屈折投影光学系、走査型投影露光装置、及び走査投影露光方法
DE4417489A1 (de) * 1994-05-19 1995-11-23 Zeiss Carl Fa Höchstaperturiges katadioptrisches Reduktionsobjektiv für die Miktrolithographie
JPH08203812A (ja) 1995-01-30 1996-08-09 Nikon Corp 反射屈折縮小投影光学系及び露光装置
JP3624973B2 (ja) * 1995-10-12 2005-03-02 株式会社ニコン 投影光学系
JPH103039A (ja) * 1996-06-14 1998-01-06 Nikon Corp 反射屈折光学系
US6157498A (en) * 1996-06-19 2000-12-05 Nikon Corporation Dual-imaging optical system
JPH1010431A (ja) * 1996-06-20 1998-01-16 Nikon Corp 反射屈折光学系
DE19639586A1 (de) * 1996-09-26 1998-04-02 Zeiss Carl Fa Katadioptrisches Mikrolithographie-Reduktionsobjektiv
US6631036B2 (en) * 1996-09-26 2003-10-07 Carl-Zeiss-Stiftung Catadioptric objective
US6486940B1 (en) * 2000-07-21 2002-11-26 Svg Lithography Systems, Inc. High numerical aperture catadioptric lens

Also Published As

Publication number Publication date
US6496306B1 (en) 2002-12-17
EP0989434A2 (de) 2000-03-29
US20060007532A1 (en) 2006-01-12
TW466349B (en) 2001-12-01
US20040169914A1 (en) 2004-09-02
US6985286B2 (en) 2006-01-10
EP0989434A3 (de) 2001-10-17
JP4693947B2 (ja) 2011-06-01
JP2000047114A (ja) 2000-02-18
US20020196533A1 (en) 2002-12-26
DE69933973T2 (de) 2007-06-28
US6717722B2 (en) 2004-04-06
KR20000011933A (ko) 2000-02-25
EP0989434B1 (de) 2006-11-15
KR100615068B1 (ko) 2006-08-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: CARL ZEISS SMT GMBH, 73447 OBERKOCHEN, DE