DE69922427D1 - Halbleiterlaser - Google Patents
HalbleiterlaserInfo
- Publication number
- DE69922427D1 DE69922427D1 DE1999622427 DE69922427T DE69922427D1 DE 69922427 D1 DE69922427 D1 DE 69922427D1 DE 1999622427 DE1999622427 DE 1999622427 DE 69922427 T DE69922427 T DE 69922427T DE 69922427 D1 DE69922427 D1 DE 69922427D1
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor laser
- laser
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34313—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer having only As as V-compound, e.g. AlGaAs, InGaAs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/2004—Confining in the direction perpendicular to the layer structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/3403—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers having a strained layer structure in which the strain performs a special function, e.g. general strain effects, strain versus polarisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/3403—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers having a strained layer structure in which the strain performs a special function, e.g. general strain effects, strain versus polarisation
- H01S5/3406—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers having a strained layer structure in which the strain performs a special function, e.g. general strain effects, strain versus polarisation including strain compensation
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biophysics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2823898 | 1998-02-10 | ||
JP2823898 | 1998-02-10 | ||
JP08523098A JP3317335B2 (ja) | 1998-02-10 | 1998-03-31 | 半導体レーザ装置 |
JP8523098 | 1998-03-31 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69922427D1 true DE69922427D1 (de) | 2005-01-13 |
DE69922427T2 DE69922427T2 (de) | 2005-05-19 |
Family
ID=26366289
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69922427T Expired - Lifetime DE69922427T2 (de) | 1998-02-10 | 1999-02-10 | Halbleiterlaser |
Country Status (4)
Country | Link |
---|---|
US (1) | US6285695B1 (de) |
EP (1) | EP0936709B1 (de) |
JP (1) | JP3317335B2 (de) |
DE (1) | DE69922427T2 (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6973109B2 (en) * | 2000-02-28 | 2005-12-06 | Fuji Photo Film Co., Ltd. | Semiconductor laser device having strain buffer layer between compressive-strain quantum well layer and tensile-strain barrier layer |
JP2001257431A (ja) * | 2000-03-09 | 2001-09-21 | Fuji Photo Film Co Ltd | 半導体レーザ |
DE60129261T2 (de) * | 2000-10-12 | 2008-05-08 | Fujifilm Corp. | Halbleiterlaser mit Gebiet ohne Stromzuführung in der Nähe einer Resonatorendfläche |
JP2002141610A (ja) * | 2000-10-31 | 2002-05-17 | Fuji Photo Film Co Ltd | 半導体レーザ素子およびその製造方法 |
JP2002204032A (ja) * | 2000-10-31 | 2002-07-19 | Fuji Photo Film Co Ltd | 半導体レーザ素子 |
JP2002374042A (ja) * | 2000-12-12 | 2002-12-26 | Fuji Photo Film Co Ltd | 半導体レーザ素子 |
US6912237B2 (en) * | 2001-02-06 | 2005-06-28 | The Furukawa Electric Co., Ltd. | Semiconductor laser module and semiconductor laser device having light feedback function |
JP2002305352A (ja) | 2001-04-05 | 2002-10-18 | Fuji Photo Film Co Ltd | 半導体レーザ素子 |
KR100817487B1 (ko) * | 2001-04-30 | 2008-03-27 | 후지필름 가부시키가이샤 | 반도체 레이저 장치 |
KR100453963B1 (ko) * | 2001-12-19 | 2004-10-20 | 엘지전자 주식회사 | 광통신 소자와 제조 방법 및 그의 모듈 |
US7687291B2 (en) | 2005-03-25 | 2010-03-30 | Trumpf Photonics Inc. | Laser facet passivation |
JP2009146968A (ja) * | 2007-12-12 | 2009-07-02 | Fujifilm Corp | 半導体発光素子 |
EP3417517A4 (de) * | 2016-05-05 | 2019-02-27 | MACOM Technology Solutions Holdings, Inc. | Halbleiterlaser mit einer elektronenbarriere mit geringem aluminiumgehalt |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA2028899C (en) * | 1989-10-31 | 1997-03-04 | Teturo Ijichi | Semiconductor laser elements and method for the production thereof |
-
1998
- 1998-03-31 JP JP08523098A patent/JP3317335B2/ja not_active Expired - Fee Related
-
1999
- 1999-02-09 US US09/246,946 patent/US6285695B1/en not_active Expired - Lifetime
- 1999-02-10 DE DE69922427T patent/DE69922427T2/de not_active Expired - Lifetime
- 1999-02-10 EP EP99102540A patent/EP0936709B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE69922427T2 (de) | 2005-05-19 |
EP0936709B1 (de) | 2004-12-08 |
JP3317335B2 (ja) | 2002-08-26 |
EP0936709A2 (de) | 1999-08-18 |
US6285695B1 (en) | 2001-09-04 |
EP0936709A3 (de) | 2000-03-15 |
JPH11298086A (ja) | 1999-10-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP |
|
R082 | Change of representative |
Ref document number: 936709 Country of ref document: EP Representative=s name: KLUNKER, SCHMITT-NILSON, HIRSCH, 80796 MUENCHEN, D |