DE69837517D1 - Verfahren und kompaktes System zur hochgenauen Inspektion einer Photomaske - Google Patents
Verfahren und kompaktes System zur hochgenauen Inspektion einer PhotomaskeInfo
- Publication number
- DE69837517D1 DE69837517D1 DE69837517T DE69837517T DE69837517D1 DE 69837517 D1 DE69837517 D1 DE 69837517D1 DE 69837517 T DE69837517 T DE 69837517T DE 69837517 T DE69837517 T DE 69837517T DE 69837517 D1 DE69837517 D1 DE 69837517D1
- Authority
- DE
- Germany
- Prior art keywords
- photomask
- compact system
- precision inspection
- inspection
- precision
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32326497 | 1997-11-25 | ||
JP32326497A JP2956671B2 (ja) | 1997-11-25 | 1997-11-25 | レティクル検査方法および検査装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69837517D1 true DE69837517D1 (de) | 2007-05-24 |
DE69837517T2 DE69837517T2 (de) | 2007-12-20 |
Family
ID=18152854
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69837517T Expired - Lifetime DE69837517T2 (de) | 1997-11-25 | 1998-11-25 | Verfahren und kompaktes System zur hochgenauen Inspektion einer Photomaske |
Country Status (6)
Country | Link |
---|---|
US (1) | US6169603B1 (de) |
EP (1) | EP0919803B1 (de) |
JP (1) | JP2956671B2 (de) |
KR (1) | KR100291258B1 (de) |
DE (1) | DE69837517T2 (de) |
TW (1) | TW390955B (de) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW429414B (en) * | 1998-08-11 | 2001-04-11 | Nippon Kogaku Kk | Stage apparatus, position detector and exposure device |
US6369888B1 (en) * | 1999-11-17 | 2002-04-09 | Applied Materials, Inc. | Method and apparatus for article inspection including speckle reduction |
JP3874996B2 (ja) * | 2000-05-30 | 2007-01-31 | ファブソリューション株式会社 | デバイス検査方法および装置 |
US6384911B1 (en) * | 2000-09-19 | 2002-05-07 | Machvision, Inc. | Apparatus and method for detecting accuracy of drill holes on a printed circuit board |
JP2003066341A (ja) * | 2001-08-28 | 2003-03-05 | Nec Corp | レチクル検査装置 |
JP3913555B2 (ja) * | 2002-01-17 | 2007-05-09 | ファブソリューション株式会社 | 膜厚測定方法および膜厚測定装置 |
JP3672884B2 (ja) * | 2002-03-27 | 2005-07-20 | 株式会社東芝 | パターン検査方法、パターン検査装置およびマスクの製造方法 |
US6831736B2 (en) * | 2002-10-07 | 2004-12-14 | Applied Materials Israel, Ltd. | Method of and apparatus for line alignment to compensate for static and dynamic inaccuracies in scanning |
AU2002368481B2 (en) | 2002-12-23 | 2007-05-10 | Nordson Corporation | Surgical device for extracting a foreign object and method for manufacturing thereof |
US7025498B2 (en) * | 2003-05-30 | 2006-04-11 | Asml Holding N.V. | System and method of measuring thermal expansion |
US7271891B1 (en) | 2003-08-29 | 2007-09-18 | Kla-Tencor Technologies Corporation | Apparatus and methods for providing selective defect sensitivity |
JP4767665B2 (ja) * | 2005-01-05 | 2011-09-07 | 富士通セミコンダクター株式会社 | レチクル検査装置およびレチクル検査方法 |
KR100701974B1 (ko) | 2005-12-14 | 2007-03-30 | 나노전광 주식회사 | 광위상 간섭계를 이용한 포토마스크 표면의 헤이즈검출장치 및 그 검출방법 |
US8194232B2 (en) * | 2007-07-24 | 2012-06-05 | Nikon Corporation | Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, position control method and position control system, and device manufacturing method |
JP5234308B2 (ja) * | 2007-07-30 | 2013-07-10 | 株式会社ニコン | 露光方法及び露光装置、並びにデバイス製造方法 |
US8867022B2 (en) * | 2007-08-24 | 2014-10-21 | Nikon Corporation | Movable body drive method and movable body drive system, pattern formation method and apparatus, and device manufacturing method |
US20090051895A1 (en) * | 2007-08-24 | 2009-02-26 | Nikon Corporation | Movable body drive method and movable body drive system, pattern formation method and apparatus, device manufacturing method, and processing system |
US8023106B2 (en) * | 2007-08-24 | 2011-09-20 | Nikon Corporation | Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method |
US7453274B1 (en) * | 2007-10-09 | 2008-11-18 | Kla-Tencor Technologies Corporation | Detection of defects using transient contrast |
JP5048558B2 (ja) * | 2008-03-14 | 2012-10-17 | 株式会社ニューフレアテクノロジー | 基板検査方法および基板検査装置 |
JP5525739B2 (ja) | 2008-09-16 | 2014-06-18 | 株式会社ニューフレアテクノロジー | パターン検査装置及びパターン検査方法 |
JP5121642B2 (ja) * | 2008-09-19 | 2013-01-16 | 株式会社ニューフレアテクノロジー | マスク検査装置及びマスク検査方法 |
JP5635309B2 (ja) * | 2010-06-18 | 2014-12-03 | 株式会社ニューフレアテクノロジー | 検査装置および検査方法 |
JP5832345B2 (ja) * | 2012-03-22 | 2015-12-16 | 株式会社ニューフレアテクノロジー | 検査装置および検査方法 |
JP6259642B2 (ja) * | 2013-11-06 | 2018-01-10 | 株式会社ニューフレアテクノロジー | 計測装置 |
JP2017187436A (ja) * | 2016-04-08 | 2017-10-12 | 株式会社Screenホールディングス | 底面位置検出装置、画像取得装置、底面位置検出方法および画像取得方法 |
JP2019120654A (ja) * | 2018-01-11 | 2019-07-22 | 株式会社ニューフレアテクノロジー | 検査方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4926489A (en) * | 1983-03-11 | 1990-05-15 | Kla Instruments Corporation | Reticle inspection system |
US4805123B1 (en) * | 1986-07-14 | 1998-10-13 | Kla Instr Corp | Automatic photomask and reticle inspection method and apparatus including improved defect detector and alignment sub-systems |
GB8705302D0 (en) * | 1987-03-06 | 1987-04-08 | Renishaw Plc | Combined scale & interferometer |
JP2851306B2 (ja) * | 1989-07-20 | 1999-01-27 | 旭光学工業株式会社 | テーブル搬送システム |
NL9100215A (nl) * | 1991-02-07 | 1992-09-01 | Asm Lithography Bv | Inrichting voor het repeterend afbeelden van een maskerpatroon op een substraat. |
US5552888A (en) * | 1994-12-02 | 1996-09-03 | Nikon Precision, Inc. | Apparatus for measuring position of an X-Y stage |
-
1997
- 1997-11-25 JP JP32326497A patent/JP2956671B2/ja not_active Expired - Lifetime
-
1998
- 1998-11-24 TW TW087119518A patent/TW390955B/zh not_active IP Right Cessation
- 1998-11-25 US US09/199,477 patent/US6169603B1/en not_active Expired - Lifetime
- 1998-11-25 EP EP98122376A patent/EP0919803B1/de not_active Expired - Lifetime
- 1998-11-25 DE DE69837517T patent/DE69837517T2/de not_active Expired - Lifetime
- 1998-11-25 KR KR1019980050552A patent/KR100291258B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE69837517T2 (de) | 2007-12-20 |
EP0919803A1 (de) | 1999-06-02 |
TW390955B (en) | 2000-05-21 |
EP0919803B1 (de) | 2007-04-11 |
US6169603B1 (en) | 2001-01-02 |
KR19990045542A (ko) | 1999-06-25 |
JPH11160039A (ja) | 1999-06-18 |
KR100291258B1 (ko) | 2002-02-28 |
JP2956671B2 (ja) | 1999-10-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |