DE69703557D1 - Fraktioniertes novolakharz und daraus hergestellte photolackzusammensetzungen - Google Patents
Fraktioniertes novolakharz und daraus hergestellte photolackzusammensetzungenInfo
- Publication number
- DE69703557D1 DE69703557D1 DE69703557T DE69703557T DE69703557D1 DE 69703557 D1 DE69703557 D1 DE 69703557D1 DE 69703557 T DE69703557 T DE 69703557T DE 69703557 T DE69703557 T DE 69703557T DE 69703557 D1 DE69703557 D1 DE 69703557D1
- Authority
- DE
- Germany
- Prior art keywords
- fractionated
- paint composition
- composition made
- photo paint
- novola
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
- C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G16/00—Condensation polymers of aldehydes or ketones with monomers not provided for in the groups C08G4/00 - C08G14/00
- C08G16/02—Condensation polymers of aldehydes or ketones with monomers not provided for in the groups C08G4/00 - C08G14/00 of aldehydes
- C08G16/0293—Condensation polymers of aldehydes or ketones with monomers not provided for in the groups C08G4/00 - C08G14/00 of aldehydes with natural products, oils, bitumens, residues
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/768,539 US5853954A (en) | 1996-12-18 | 1996-12-18 | Fractionated novolak resin and photoresist composition therefrom |
PCT/EP1997/007056 WO1998027130A1 (en) | 1996-12-18 | 1997-12-16 | Fractionated novolak resin and photoresist composition therefrom |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69703557D1 true DE69703557D1 (de) | 2000-12-21 |
DE69703557T2 DE69703557T2 (de) | 2001-05-31 |
Family
ID=25082780
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69703557T Expired - Fee Related DE69703557T2 (de) | 1996-12-18 | 1997-12-16 | Fraktioniertes novolakharz und daraus hergestellte photolackzusammensetzungen |
Country Status (8)
Country | Link |
---|---|
US (2) | US5853954A (de) |
EP (1) | EP0948551B1 (de) |
JP (1) | JP2001506296A (de) |
KR (1) | KR100540029B1 (de) |
CN (1) | CN1108327C (de) |
DE (1) | DE69703557T2 (de) |
TW (1) | TW387064B (de) |
WO (1) | WO1998027130A1 (de) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5853954A (en) * | 1996-12-18 | 1998-12-29 | Clariant Finance (Bvi) Limited | Fractionated novolak resin and photoresist composition therefrom |
US6045966A (en) * | 1997-12-15 | 2000-04-04 | Clariant Finance (Bvi) Limited | Fractionated novolak resin and photoresist composition therefrom |
US6121412A (en) * | 1998-11-12 | 2000-09-19 | Clariant Finance (Bvi) Limited | Preparation of fractionated novolak resins by a novel extraction technique |
US6506831B2 (en) | 1998-12-20 | 2003-01-14 | Honeywell International Inc. | Novolac polymer planarization films with high temperature stability |
KR101020164B1 (ko) | 2003-07-17 | 2011-03-08 | 허니웰 인터내셔날 인코포레이티드 | 진보된 마이크로전자적 응용을 위한 평탄화 막, 및 이를제조하기 위한 장치 및 방법 |
JP5694043B2 (ja) * | 2011-05-09 | 2015-04-01 | 国立大学法人横浜国立大学 | 反応現像画像形成法及びそのための組成物 |
TW202236015A (zh) * | 2021-01-07 | 2022-09-16 | 德商馬克專利公司 | 具有改良圖樣輪廓及焦距深度(dof)之正型光阻劑組合物 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2590342B2 (ja) * | 1986-11-08 | 1997-03-12 | 住友化学工業株式会社 | ポジ型フォトレジスト用ノボラック樹脂及びそれを含有するポジ型フォトレジスト組成物 |
DE3935876A1 (de) * | 1989-10-27 | 1991-05-02 | Basf Ag | Strahlungsempfindliches gemisch |
JPH03253860A (ja) * | 1990-03-05 | 1991-11-12 | Fuji Photo Film Co Ltd | ポジ型フオトレジスト組成物 |
JP2711590B2 (ja) * | 1990-09-13 | 1998-02-10 | 富士写真フイルム株式会社 | ポジ型フオトレジスト組成物 |
JPH04178451A (ja) * | 1990-11-09 | 1992-06-25 | Fuji Photo Film Co Ltd | ポジ型フオトレジスト組成物 |
US5576143A (en) * | 1991-12-03 | 1996-11-19 | Fuji Photo Film Co., Ltd. | Light-sensitive composition |
US5413894A (en) * | 1993-05-07 | 1995-05-09 | Ocg Microelectronic Materials, Inc. | High ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositions |
JP3319092B2 (ja) * | 1993-11-08 | 2002-08-26 | 住友化学工業株式会社 | ポジ型レジスト組成物 |
US5750632A (en) * | 1994-12-30 | 1998-05-12 | Clariant Finance (Bvi) Limited | Isolation of novolak resin by low temperature sub surface forced steam distillation |
US5837417A (en) * | 1994-12-30 | 1998-11-17 | Clariant Finance (Bvi) Limited | Quinone diazide compositions containing low metals p-cresol oligomers and process of producing the composition |
US5739265A (en) * | 1995-09-20 | 1998-04-14 | Clariant Finance (Bvi) Ltd. | Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom |
US5656413A (en) * | 1995-09-28 | 1997-08-12 | Hoechst Celanese Corporation | Low metal ion containing 4,4'-[1-[4-[1-(4-Hydroxyphenyl)-1-methylethyl]phenyl]ethylidene]bisphe nol and photoresist compositions therefrom |
KR0164962B1 (ko) * | 1995-10-14 | 1999-01-15 | 김흥기 | 포지티브형 포토레지스트 조성물 |
US5853954A (en) * | 1996-12-18 | 1998-12-29 | Clariant Finance (Bvi) Limited | Fractionated novolak resin and photoresist composition therefrom |
-
1996
- 1996-12-18 US US08/768,539 patent/US5853954A/en not_active Expired - Fee Related
-
1997
- 1997-11-28 TW TW086117957A patent/TW387064B/zh not_active IP Right Cessation
- 1997-12-16 KR KR1019997005545A patent/KR100540029B1/ko not_active IP Right Cessation
- 1997-12-16 JP JP52731298A patent/JP2001506296A/ja not_active Ceased
- 1997-12-16 EP EP97953828A patent/EP0948551B1/de not_active Expired - Lifetime
- 1997-12-16 WO PCT/EP1997/007056 patent/WO1998027130A1/en active IP Right Grant
- 1997-12-16 CN CN97181411A patent/CN1108327C/zh not_active Expired - Fee Related
- 1997-12-16 DE DE69703557T patent/DE69703557T2/de not_active Expired - Fee Related
-
1998
- 1998-08-04 US US09/128,900 patent/US5977288A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US5853954A (en) | 1998-12-29 |
WO1998027130A1 (en) | 1998-06-25 |
CN1244877A (zh) | 2000-02-16 |
KR100540029B1 (ko) | 2006-01-12 |
JP2001506296A (ja) | 2001-05-15 |
EP0948551B1 (de) | 2000-11-15 |
KR20000057688A (ko) | 2000-09-25 |
TW387064B (en) | 2000-04-11 |
US5977288A (en) | 1999-11-02 |
DE69703557T2 (de) | 2001-05-31 |
EP0948551A1 (de) | 1999-10-13 |
CN1108327C (zh) | 2003-05-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: AZ ELECTRONIC MATERIALS USA CORP. (N.D.GES.D. STAA |
|
8328 | Change in the person/name/address of the agent |
Representative=s name: PATENTANWAELTE ISENBRUCK BOESL HOERSCHLER WICHMANN HU |
|
8339 | Ceased/non-payment of the annual fee |