DE69703557D1 - Fraktioniertes novolakharz und daraus hergestellte photolackzusammensetzungen - Google Patents

Fraktioniertes novolakharz und daraus hergestellte photolackzusammensetzungen

Info

Publication number
DE69703557D1
DE69703557D1 DE69703557T DE69703557T DE69703557D1 DE 69703557 D1 DE69703557 D1 DE 69703557D1 DE 69703557 T DE69703557 T DE 69703557T DE 69703557 T DE69703557 T DE 69703557T DE 69703557 D1 DE69703557 D1 DE 69703557D1
Authority
DE
Germany
Prior art keywords
fractionated
paint composition
composition made
photo paint
novola
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69703557T
Other languages
English (en)
Other versions
DE69703557T2 (de
Inventor
Dalil Rahman
Ping-Hung Lu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EMD Performance Materials Corp
Original Assignee
Clariant Finance BVI Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Clariant Finance BVI Ltd filed Critical Clariant Finance BVI Ltd
Application granted granted Critical
Publication of DE69703557D1 publication Critical patent/DE69703557D1/de
Publication of DE69703557T2 publication Critical patent/DE69703557T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G16/00—Condensation polymers of aldehydes or ketones with monomers not provided for in the groups C08G4/00 - C08G14/00
    • C08G16/02—Condensation polymers of aldehydes or ketones with monomers not provided for in the groups C08G4/00 - C08G14/00 of aldehydes
    • C08G16/0293—Condensation polymers of aldehydes or ketones with monomers not provided for in the groups C08G4/00 - C08G14/00 of aldehydes with natural products, oils, bitumens, residues
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE69703557T 1996-12-18 1997-12-16 Fraktioniertes novolakharz und daraus hergestellte photolackzusammensetzungen Expired - Fee Related DE69703557T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/768,539 US5853954A (en) 1996-12-18 1996-12-18 Fractionated novolak resin and photoresist composition therefrom
PCT/EP1997/007056 WO1998027130A1 (en) 1996-12-18 1997-12-16 Fractionated novolak resin and photoresist composition therefrom

Publications (2)

Publication Number Publication Date
DE69703557D1 true DE69703557D1 (de) 2000-12-21
DE69703557T2 DE69703557T2 (de) 2001-05-31

Family

ID=25082780

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69703557T Expired - Fee Related DE69703557T2 (de) 1996-12-18 1997-12-16 Fraktioniertes novolakharz und daraus hergestellte photolackzusammensetzungen

Country Status (8)

Country Link
US (2) US5853954A (de)
EP (1) EP0948551B1 (de)
JP (1) JP2001506296A (de)
KR (1) KR100540029B1 (de)
CN (1) CN1108327C (de)
DE (1) DE69703557T2 (de)
TW (1) TW387064B (de)
WO (1) WO1998027130A1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5853954A (en) * 1996-12-18 1998-12-29 Clariant Finance (Bvi) Limited Fractionated novolak resin and photoresist composition therefrom
US6045966A (en) * 1997-12-15 2000-04-04 Clariant Finance (Bvi) Limited Fractionated novolak resin and photoresist composition therefrom
US6121412A (en) * 1998-11-12 2000-09-19 Clariant Finance (Bvi) Limited Preparation of fractionated novolak resins by a novel extraction technique
US6506831B2 (en) 1998-12-20 2003-01-14 Honeywell International Inc. Novolac polymer planarization films with high temperature stability
KR101020164B1 (ko) 2003-07-17 2011-03-08 허니웰 인터내셔날 인코포레이티드 진보된 마이크로전자적 응용을 위한 평탄화 막, 및 이를제조하기 위한 장치 및 방법
JP5694043B2 (ja) * 2011-05-09 2015-04-01 国立大学法人横浜国立大学 反応現像画像形成法及びそのための組成物
TW202236015A (zh) * 2021-01-07 2022-09-16 德商馬克專利公司 具有改良圖樣輪廓及焦距深度(dof)之正型光阻劑組合物

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2590342B2 (ja) * 1986-11-08 1997-03-12 住友化学工業株式会社 ポジ型フォトレジスト用ノボラック樹脂及びそれを含有するポジ型フォトレジスト組成物
DE3935876A1 (de) * 1989-10-27 1991-05-02 Basf Ag Strahlungsempfindliches gemisch
JPH03253860A (ja) * 1990-03-05 1991-11-12 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
JP2711590B2 (ja) * 1990-09-13 1998-02-10 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JPH04178451A (ja) * 1990-11-09 1992-06-25 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
US5576143A (en) * 1991-12-03 1996-11-19 Fuji Photo Film Co., Ltd. Light-sensitive composition
US5413894A (en) * 1993-05-07 1995-05-09 Ocg Microelectronic Materials, Inc. High ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositions
JP3319092B2 (ja) * 1993-11-08 2002-08-26 住友化学工業株式会社 ポジ型レジスト組成物
US5750632A (en) * 1994-12-30 1998-05-12 Clariant Finance (Bvi) Limited Isolation of novolak resin by low temperature sub surface forced steam distillation
US5837417A (en) * 1994-12-30 1998-11-17 Clariant Finance (Bvi) Limited Quinone diazide compositions containing low metals p-cresol oligomers and process of producing the composition
US5739265A (en) * 1995-09-20 1998-04-14 Clariant Finance (Bvi) Ltd. Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom
US5656413A (en) * 1995-09-28 1997-08-12 Hoechst Celanese Corporation Low metal ion containing 4,4'-[1-[4-[1-(4-Hydroxyphenyl)-1-methylethyl]phenyl]ethylidene]bisphe nol and photoresist compositions therefrom
KR0164962B1 (ko) * 1995-10-14 1999-01-15 김흥기 포지티브형 포토레지스트 조성물
US5853954A (en) * 1996-12-18 1998-12-29 Clariant Finance (Bvi) Limited Fractionated novolak resin and photoresist composition therefrom

Also Published As

Publication number Publication date
US5853954A (en) 1998-12-29
WO1998027130A1 (en) 1998-06-25
CN1244877A (zh) 2000-02-16
KR100540029B1 (ko) 2006-01-12
JP2001506296A (ja) 2001-05-15
EP0948551B1 (de) 2000-11-15
KR20000057688A (ko) 2000-09-25
TW387064B (en) 2000-04-11
US5977288A (en) 1999-11-02
DE69703557T2 (de) 2001-05-31
EP0948551A1 (de) 1999-10-13
CN1108327C (zh) 2003-05-14

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: AZ ELECTRONIC MATERIALS USA CORP. (N.D.GES.D. STAA

8328 Change in the person/name/address of the agent

Representative=s name: PATENTANWAELTE ISENBRUCK BOESL HOERSCHLER WICHMANN HU

8339 Ceased/non-payment of the annual fee