DE69602936T2 - Detektor-Objektivlinse - Google Patents
Detektor-ObjektivlinseInfo
- Publication number
- DE69602936T2 DE69602936T2 DE69602936T DE69602936T DE69602936T2 DE 69602936 T2 DE69602936 T2 DE 69602936T2 DE 69602936 T DE69602936 T DE 69602936T DE 69602936 T DE69602936 T DE 69602936T DE 69602936 T2 DE69602936 T2 DE 69602936T2
- Authority
- DE
- Germany
- Prior art keywords
- objective lens
- detector objective
- detector
- lens
- objective
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/10—Lenses
- H01J37/145—Combinations of electrostatic and magnetic lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/25—Tubes for localised analysis using electron or ion beams
- H01J2237/2505—Tubes for localised analysis using electron or ion beams characterised by their application
- H01J2237/2594—Measuring electric fields or potentials
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP96112017A EP0821393B1 (de) | 1996-07-25 | 1996-07-25 | Detektor-Objektivlinse |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69602936D1 DE69602936D1 (de) | 1999-07-22 |
DE69602936T2 true DE69602936T2 (de) | 1999-11-04 |
Family
ID=8223041
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69602936T Expired - Lifetime DE69602936T2 (de) | 1996-07-25 | 1996-07-25 | Detektor-Objektivlinse |
Country Status (4)
Country | Link |
---|---|
US (1) | US5895917A (de) |
EP (1) | EP0821393B1 (de) |
JP (1) | JPH1064464A (de) |
DE (1) | DE69602936T2 (de) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE59711915D1 (de) * | 1997-09-29 | 2004-10-21 | Advantest Corp | Objektivlinse |
EP0910108B1 (de) * | 1997-09-29 | 2004-11-24 | Advantest Corporation | Elektronenstrahl-Linse |
DE19828476A1 (de) * | 1998-06-26 | 1999-12-30 | Leo Elektronenmikroskopie Gmbh | Teilchenstrahlgerät |
JP4236742B2 (ja) * | 1998-10-29 | 2009-03-11 | 株式会社日立製作所 | 走査形電子顕微鏡 |
GB2348048A (en) | 1999-03-19 | 2000-09-20 | Shimadzu Research Lab | Magnetic immersion lenses |
EP1120809B1 (de) * | 2000-01-27 | 2012-02-22 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Objektivlinse für eine Ladungsträgerstrahl-Vorrichtung |
CN100565774C (zh) | 2002-03-21 | 2009-12-02 | 汉民微测科技股份有限公司 | 回转减速浸没式物镜电子光学聚焦、偏转和信号的收集方法 |
DE10317894B9 (de) | 2003-04-17 | 2007-03-22 | Leo Elektronenmikroskopie Gmbh | Fokussiersystem für geladene Teilchen, Elektronenmikroskopiesystem und Elektronenmikroskopieverfahren |
US6897442B2 (en) * | 2003-04-25 | 2005-05-24 | Applied Materials Israel, Ltd. | Objective lens arrangement for use in a charged particle beam column |
AU2003284339A1 (en) * | 2003-07-30 | 2005-03-07 | Applied Materials Israel, Ltd. | Scanning electron microscope having multiple detectors and a method for multiple detector based imaging |
US7842933B2 (en) * | 2003-10-22 | 2010-11-30 | Applied Materials Israel, Ltd. | System and method for measuring overlay errors |
DE102004037781A1 (de) * | 2004-08-03 | 2006-02-23 | Carl Zeiss Nts Gmbh | Elektronenstrahlgerät |
JP2006004953A (ja) * | 2005-08-24 | 2006-01-05 | Ebara Corp | 電子線装置及び該装置を用いたデバイス製造方法 |
US9046475B2 (en) | 2011-05-19 | 2015-06-02 | Applied Materials Israel, Ltd. | High electron energy based overlay error measurement methods and systems |
EP2629317B1 (de) * | 2012-02-20 | 2015-01-28 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Teilchenstrahlvorrichtung mit dynamischem Fokus und Verfahren zu deren Betrieb |
US10096447B1 (en) * | 2017-08-02 | 2018-10-09 | Kla-Tencor Corporation | Electron beam apparatus with high resolutions |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0236807A3 (de) * | 1986-03-07 | 1990-05-16 | Siemens Aktiengesellschaft | Spektrometerobjektiv für die Korpuskularstrahl-Messtechnik |
NL8602177A (nl) * | 1986-08-27 | 1988-03-16 | Philips Nv | Electronen detectie met energie discriminatie. |
DE3638682A1 (de) * | 1986-11-13 | 1988-05-19 | Siemens Ag | Spektrometerobjektiv fuer korpuskularstrahlmesstechnik |
JPH0636346B2 (ja) * | 1988-03-09 | 1994-05-11 | セイコー電子工業株式会社 | 荷電粒子線装置及びこれによる試料観察方法 |
US4926054A (en) * | 1988-03-17 | 1990-05-15 | Ict Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik Mbh | Objective lens for focusing charged particles in an electron microscope |
DE4236273A1 (en) * | 1992-10-27 | 1993-07-01 | Siemens Ag | Lens for focussing electrons for specimen inspection - has field generated by coils and cone-shaped electrode set into entry section |
-
1996
- 1996-07-25 DE DE69602936T patent/DE69602936T2/de not_active Expired - Lifetime
- 1996-07-25 EP EP96112017A patent/EP0821393B1/de not_active Expired - Lifetime
-
1997
- 1997-06-18 US US08/877,601 patent/US5895917A/en not_active Expired - Lifetime
- 1997-06-30 JP JP9173615A patent/JPH1064464A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
EP0821393B1 (de) | 1999-06-16 |
EP0821393A1 (de) | 1998-01-28 |
DE69602936D1 (de) | 1999-07-22 |
US5895917A (en) | 1999-04-20 |
JPH1064464A (ja) | 1998-03-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: ADVANTEST CORP., TOKIO/TOKYO, JP |
|
8328 | Change in the person/name/address of the agent |
Free format text: RECHTSANW. UND PAT.-ANW. DR.-ING. DR.JUR. VOLKMAR TETZNER, PAT.-ANW. DIPL.-ING. MICHAEL TETZNER, 81479 MUENCHEN |