DE69501095D1 - Plasmabearbeitungsgerät - Google Patents
PlasmabearbeitungsgerätInfo
- Publication number
- DE69501095D1 DE69501095D1 DE69501095T DE69501095T DE69501095D1 DE 69501095 D1 DE69501095 D1 DE 69501095D1 DE 69501095 T DE69501095 T DE 69501095T DE 69501095 T DE69501095 T DE 69501095T DE 69501095 D1 DE69501095 D1 DE 69501095D1
- Authority
- DE
- Germany
- Prior art keywords
- processing device
- plasma processing
- plasma
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP07901494A JP3387616B2 (ja) | 1994-04-18 | 1994-04-18 | プラズマ処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69501095D1 true DE69501095D1 (de) | 1998-01-08 |
DE69501095T2 DE69501095T2 (de) | 1998-04-09 |
Family
ID=13678098
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69501095T Expired - Lifetime DE69501095T2 (de) | 1994-04-18 | 1995-04-13 | Plasmabearbeitungsgerät |
Country Status (4)
Country | Link |
---|---|
US (1) | US5902405A (de) |
EP (1) | EP0678895B1 (de) |
JP (1) | JP3387616B2 (de) |
DE (1) | DE69501095T2 (de) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1997022136A1 (de) * | 1995-12-08 | 1997-06-19 | Balzers Aktiengesellschaft | Hf-plasmabehandlungskammer bzw. pecvd-beschichtungskammer, deren verwendungen und verfahren zur beschichtung von speicherplatten |
US6152071A (en) * | 1996-12-11 | 2000-11-28 | Canon Kabushiki Kaisha | High-frequency introducing means, plasma treatment apparatus, and plasma treatment method |
DE60219580T2 (de) * | 2001-12-20 | 2007-12-27 | Canon K.K. | Verfahren und Vorrichtung zur Plasmabearbeitung |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3887451A (en) * | 1972-12-29 | 1975-06-03 | Ibm | Method for sputtering garnet compound layer |
JPS60155676A (ja) * | 1984-01-24 | 1985-08-15 | Canon Inc | プラズマcvd装置 |
US4664890A (en) * | 1984-06-22 | 1987-05-12 | Kanegafuchi Kagaku Kogyo Kabushiki Kaisha | Glow-discharge decomposition apparatus |
JP2582553B2 (ja) * | 1986-07-04 | 1997-02-19 | キヤノン株式会社 | プラズマcvd法による機能性堆積膜形成装置 |
JPH0798521B2 (ja) * | 1986-08-20 | 1995-10-25 | 澁谷工業株式会社 | 回転式重量充填装置 |
FR2619579B1 (fr) * | 1987-08-20 | 1993-02-19 | Air Liquide | Procede de controle en temps reel de la selectivite de la gravure par analyse des gaz du plasma dans un procede de gravure ionique reactive et reacteur pour sa mise en oeuvre |
DE68910378T2 (de) * | 1988-05-06 | 1994-03-03 | Fujitsu Ltd | Anlage zur Erzeugung dünner Schichten. |
JPH0796710B2 (ja) * | 1988-10-11 | 1995-10-18 | 宇部興産株式会社 | 高周波自動整合装置 |
EP0432488A3 (en) * | 1989-12-12 | 1991-10-23 | Siemens Aktiengesellschaft | Device for plasma processing semi-conductor wafers and method for utilizing such a device |
JP2977170B2 (ja) * | 1991-05-31 | 1999-11-10 | 京セラ株式会社 | グロー放電成膜装置 |
JP3201495B2 (ja) * | 1992-09-16 | 2001-08-20 | キヤノン株式会社 | 非晶質シリコンの製造方法 |
KR100290748B1 (ko) * | 1993-01-29 | 2001-06-01 | 히가시 데쓰로 | 플라즈마 처리장치 |
-
1994
- 1994-04-18 JP JP07901494A patent/JP3387616B2/ja not_active Expired - Fee Related
-
1995
- 1995-04-13 EP EP95105645A patent/EP0678895B1/de not_active Expired - Lifetime
- 1995-04-13 DE DE69501095T patent/DE69501095T2/de not_active Expired - Lifetime
-
1997
- 1997-06-03 US US08/868,315 patent/US5902405A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0678895A1 (de) | 1995-10-25 |
JPH07288193A (ja) | 1995-10-31 |
US5902405A (en) | 1999-05-11 |
JP3387616B2 (ja) | 2003-03-17 |
DE69501095T2 (de) | 1998-04-09 |
EP0678895B1 (de) | 1997-11-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69500565D1 (de) | Plasmabearbeitungsvorrichtung | |
DE69318480D1 (de) | Plasmabearbeitungsgerät | |
DE69401549D1 (de) | Plasma-Behandlungsgerät | |
DE69735042D1 (de) | Verarbeitungsvorrichtung | |
DE69719108D1 (de) | Plasmabehandlungsgerät | |
DE69405080D1 (de) | Plasmabearbeitungsgerät | |
DE69030744D1 (de) | Plasma-Bearbeitungsgerät | |
NO975056D0 (no) | Innretning for behandling av objekter | |
DE69613087D1 (de) | Plamaschneidvorrichtung | |
DE69625756D1 (de) | Belegverarbeitungsvorrichtung | |
DE69309164D1 (de) | Mehrelektrischen Plasma Behandlungsgerät | |
DE69526685D1 (de) | Parallelprozessorvorrichtung | |
DE69738241D1 (de) | RF Plasmabearbeitungsvorrichtung | |
DE69701615D1 (de) | Rohrbearbeitungsvorrichtung | |
NO981897D0 (no) | Skjermingsanordning | |
DE69736636D1 (de) | Verarbeitungsvorrichtung | |
KR960012295A (ko) | 처리장치 | |
DE69404614D1 (de) | Electrische entladungsbearbeitungsvorrichtung | |
DE69601740D1 (de) | Abschirmungsvorrichtung | |
DE69413159D1 (de) | Plasma-Entladungs-Bearbeitungsvorrichtung | |
DE69131391D1 (de) | Plasmabearbeitungsgerät | |
DE69500830D1 (de) | Plasmabearbeitungsgerät | |
TR199501054A2 (tr) | Plasma tesirli görüntü cihazi. | |
DE69527253D1 (de) | Signalverarbeitungsvorrichtung | |
DE69512376D1 (de) | Plasma-bearbeitungsvorrichtung |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |