DE69501095D1 - Plasmabearbeitungsgerät - Google Patents

Plasmabearbeitungsgerät

Info

Publication number
DE69501095D1
DE69501095D1 DE69501095T DE69501095T DE69501095D1 DE 69501095 D1 DE69501095 D1 DE 69501095D1 DE 69501095 T DE69501095 T DE 69501095T DE 69501095 T DE69501095 T DE 69501095T DE 69501095 D1 DE69501095 D1 DE 69501095D1
Authority
DE
Germany
Prior art keywords
processing device
plasma processing
plasma
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69501095T
Other languages
English (en)
Other versions
DE69501095T2 (de
Inventor
Shigenori Ueda
Junichiro Hashizume
Shinji Tsuchida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE69501095D1 publication Critical patent/DE69501095D1/de
Application granted granted Critical
Publication of DE69501095T2 publication Critical patent/DE69501095T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
DE69501095T 1994-04-18 1995-04-13 Plasmabearbeitungsgerät Expired - Lifetime DE69501095T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP07901494A JP3387616B2 (ja) 1994-04-18 1994-04-18 プラズマ処理装置

Publications (2)

Publication Number Publication Date
DE69501095D1 true DE69501095D1 (de) 1998-01-08
DE69501095T2 DE69501095T2 (de) 1998-04-09

Family

ID=13678098

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69501095T Expired - Lifetime DE69501095T2 (de) 1994-04-18 1995-04-13 Plasmabearbeitungsgerät

Country Status (4)

Country Link
US (1) US5902405A (de)
EP (1) EP0678895B1 (de)
JP (1) JP3387616B2 (de)
DE (1) DE69501095T2 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997022136A1 (de) * 1995-12-08 1997-06-19 Balzers Aktiengesellschaft Hf-plasmabehandlungskammer bzw. pecvd-beschichtungskammer, deren verwendungen und verfahren zur beschichtung von speicherplatten
US6152071A (en) * 1996-12-11 2000-11-28 Canon Kabushiki Kaisha High-frequency introducing means, plasma treatment apparatus, and plasma treatment method
DE60219580T2 (de) * 2001-12-20 2007-12-27 Canon K.K. Verfahren und Vorrichtung zur Plasmabearbeitung

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3887451A (en) * 1972-12-29 1975-06-03 Ibm Method for sputtering garnet compound layer
JPS60155676A (ja) * 1984-01-24 1985-08-15 Canon Inc プラズマｃｖｄ装置
US4664890A (en) * 1984-06-22 1987-05-12 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Glow-discharge decomposition apparatus
JP2582553B2 (ja) * 1986-07-04 1997-02-19 キヤノン株式会社 プラズマｃｖｄ法による機能性堆積膜形成装置
JPH0798521B2 (ja) * 1986-08-20 1995-10-25 澁谷工業株式会社 回転式重量充填装置
FR2619579B1 (fr) * 1987-08-20 1993-02-19 Air Liquide Procede de controle en temps reel de la selectivite de la gravure par analyse des gaz du plasma dans un procede de gravure ionique reactive et reacteur pour sa mise en oeuvre
DE68910378T2 (de) * 1988-05-06 1994-03-03 Fujitsu Ltd Anlage zur Erzeugung dünner Schichten.
JPH0796710B2 (ja) * 1988-10-11 1995-10-18 宇部興産株式会社 高周波自動整合装置
EP0432488A3 (en) * 1989-12-12 1991-10-23 Siemens Aktiengesellschaft Device for plasma processing semi-conductor wafers and method for utilizing such a device
JP2977170B2 (ja) * 1991-05-31 1999-11-10 京セラ株式会社 グロー放電成膜装置
JP3201495B2 (ja) * 1992-09-16 2001-08-20 キヤノン株式会社 非晶質シリコンの製造方法
KR100290748B1 (ko) * 1993-01-29 2001-06-01 히가시 데쓰로 플라즈마 처리장치

Also Published As

Publication number Publication date
EP0678895A1 (de) 1995-10-25
JPH07288193A (ja) 1995-10-31
US5902405A (en) 1999-05-11
JP3387616B2 (ja) 2003-03-17
DE69501095T2 (de) 1998-04-09
EP0678895B1 (de) 1997-11-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition