DE69421577D1 - Vorrichtung zur Behandlung von Abfall in einer Poliervorrichtung - Google Patents

Vorrichtung zur Behandlung von Abfall in einer Poliervorrichtung

Info

Publication number
DE69421577D1
DE69421577D1 DE69421577T DE69421577T DE69421577D1 DE 69421577 D1 DE69421577 D1 DE 69421577D1 DE 69421577 T DE69421577 T DE 69421577T DE 69421577 T DE69421577 T DE 69421577T DE 69421577 D1 DE69421577 D1 DE 69421577D1
Authority
DE
Germany
Prior art keywords
treating waste
polishing
polishing device
waste
treating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69421577T
Other languages
English (en)
Other versions
DE69421577T2 (de
Inventor
Norio Kimura
Katsuyuki Aoki
Kiyotaka Kawashima
Seiji Ishikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Application granted granted Critical
Publication of DE69421577D1 publication Critical patent/DE69421577D1/de
Publication of DE69421577T2 publication Critical patent/DE69421577T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/52—Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities
    • C02F1/5236—Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities using inorganic agents
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/52—Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
    • B01D53/1456—Removing acid components
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/48—Sulfur compounds
    • B01D53/50—Sulfur oxides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/54—Nitrogen compounds
    • B01D53/58—Ammonia
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
    • B24B55/02—Equipment for cooling the grinding surfaces, e.g. devices for feeding coolant
    • B24B55/03—Equipment for cooling the grinding surfaces, e.g. devices for feeding coolant designed as a complete equipment for feeding or clarifying coolant
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/18—Nature of the water, waste water, sewage or sludge to be treated from the purification of gaseous effluents
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/909—Controlled atmosphere

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • General Chemical & Material Sciences (AREA)
  • Water Supply & Treatment (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
DE69421577T 1993-08-16 1994-08-16 Vorrichtung zur Behandlung von Abfall in einer Poliervorrichtung Expired - Lifetime DE69421577T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP22384693 1993-08-16
JP22520293 1993-08-17

Publications (2)

Publication Number Publication Date
DE69421577D1 true DE69421577D1 (de) 1999-12-16
DE69421577T2 DE69421577T2 (de) 2000-07-13

Family

ID=26525718

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69421577T Expired - Lifetime DE69421577T2 (de) 1993-08-16 1994-08-16 Vorrichtung zur Behandlung von Abfall in einer Poliervorrichtung

Country Status (4)

Country Link
US (1) US5584959A (de)
EP (2) EP0639534B1 (de)
KR (1) KR100386965B1 (de)
DE (1) DE69421577T2 (de)

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US5750440A (en) * 1995-11-20 1998-05-12 Motorola, Inc. Apparatus and method for dynamically mixing slurry for chemical mechanical polishing
JP3384530B2 (ja) * 1996-03-25 2003-03-10 信越半導体株式会社 半導体ウェーハの研磨装置および研磨方法
US6156107A (en) * 1996-11-13 2000-12-05 Tokyo Electron Limited Trap apparatus
JP3991375B2 (ja) * 1996-11-13 2007-10-17 東京エレクトロン株式会社 トラップ装置
US6116986A (en) 1996-11-14 2000-09-12 Ebara Corporation Drainage structure in polishing plant and method of polishing using structure
KR100242956B1 (ko) * 1997-06-03 2000-02-01 윤종용 가스 배기 시스템의 잔류물 제거 및 차단장치
US5900047A (en) * 1997-11-26 1999-05-04 Sony Corporation Exhaust system for a semiconductor etcher that utilizes corrosive gas
US6139680A (en) * 1998-12-15 2000-10-31 United Microelectronics Corp. Exhaust line of chemical-mechanical polisher
EP1055448A3 (de) * 1999-05-27 2001-05-16 Sanyo Electric Co., Ltd. Verfahren zur Filtration einer Flüssigkeit
JP3316483B2 (ja) 1999-05-27 2002-08-19 三洋電機株式会社 流体の被除去物除去装置
JP3316484B2 (ja) 1999-05-27 2002-08-19 三洋電機株式会社 半導体装置の製造方法
JP3291487B2 (ja) 1999-05-27 2002-06-10 三洋電機株式会社 流体の被除去物除去方法
JP3291488B2 (ja) 1999-05-27 2002-06-10 三洋電機株式会社 流体の被除去物除去方法
US6689252B1 (en) 1999-07-28 2004-02-10 Applied Materials, Inc. Abatement of hazardous gases in effluent
US6468490B1 (en) 2000-06-29 2002-10-22 Applied Materials, Inc. Abatement of fluorine gas from effluent
US6673323B1 (en) 2000-03-24 2004-01-06 Applied Materials, Inc. Treatment of hazardous gases in effluent
US6391146B1 (en) 2000-04-11 2002-05-21 Applied Materials, Inc. Erosion resistant gas energizer
US7905653B2 (en) * 2001-07-31 2011-03-15 Mega Fluid Systems, Inc. Method and apparatus for blending process materials
US6923568B2 (en) * 2000-07-31 2005-08-02 Celerity, Inc. Method and apparatus for blending process materials
US6824748B2 (en) * 2001-06-01 2004-11-30 Applied Materials, Inc. Heated catalytic treatment of an effluent gas from a substrate fabrication process
US8512580B2 (en) * 2001-09-21 2013-08-20 Lg Display Co., Ltd. Method of fabricating thin liquid crystal display device
DE20205819U1 (de) 2002-04-12 2003-08-21 Kinetics Germany Gmbh Vorrichtung zur Bereitstellung von hochreinen Prozesschemikalien
US7344298B2 (en) * 2002-07-19 2008-03-18 Celerity, Inc. Method and apparatus for blending process materials
US7736599B2 (en) 2004-11-12 2010-06-15 Applied Materials, Inc. Reactor design to reduce particle deposition during process abatement
KR101036734B1 (ko) 2005-10-31 2011-05-24 어플라이드 머티어리얼스, 인코포레이티드 공정 저감 반응로
JP5756945B2 (ja) * 2010-09-16 2015-07-29 日本ソリッド株式会社 原水の処理方法
CN102989717B (zh) * 2012-12-25 2014-11-26 西安烽火光伏科技股份有限公司 一种预清洗工序中在线废水回用方法
CN104907896A (zh) * 2015-06-07 2015-09-16 安徽格楠机械有限公司 一种适用于深井采油钻头研磨抛光机
KR101764815B1 (ko) * 2015-11-09 2017-08-03 유니셈(주) 폐가스 처리장치용 전처리장치
WO2018170081A1 (en) * 2017-03-16 2018-09-20 Belco Technologies Corporation System and method for treating ship exaust
CN107877340A (zh) * 2017-11-07 2018-04-06 佛山市南海富东机械设备有限公司 板材抛光装置的废料收集装置
CN108127513B (zh) * 2017-12-20 2019-04-30 重庆洛昂机械有限公司 阀门磨削维修机床
CN110614586A (zh) * 2018-06-20 2019-12-27 北京铂阳顶荣光伏科技有限公司 一种冷却水循环***及其应用方法
CN109877707B (zh) * 2019-03-25 2021-02-26 威海鹏飞自动化技术有限公司 一种五金打磨的余粉清扫器
CN111113220B (zh) * 2019-11-14 2021-06-01 湖州双金机械配件有限公司 一种用于高锰铸钢生产浇注用辅助装置
CN115650478A (zh) * 2022-10-09 2023-01-31 大连理工大学 复合型化学机械抛光和抛光液循环处理一体化的设备及处理方法

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JPS5436060A (en) * 1977-08-25 1979-03-16 Asahi Chem Ind Co Ltd Method of treating waste water in use of active carbon
JPS5827984A (ja) * 1981-08-10 1983-02-18 Kurisutaru Eng Kk アルミニウム及びその合金のアルカリエツチング液の再生方法
DE3208113C1 (de) * 1982-03-06 1983-10-13 Carl Kurt Walther Gmbh & Co Kg, 5600 Wuppertal Behaelter zum Aufbereiten der beim Vibrationsgleitschleifen anfallenden Abwaesser
JPS6222055A (ja) * 1985-07-22 1987-01-30 Matsushita Electric Ind Co Ltd 調理器
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JPH02207527A (ja) * 1989-02-06 1990-08-17 Sumitomo Electric Ind Ltd ＧａＡｓウエハの研磨方法
JPH0320029A (ja) * 1989-06-16 1991-01-29 Matsushita Electron Corp 半導体ウェハー研削量のモニター方法
JPH03284322A (ja) * 1990-03-29 1991-12-16 Nec Corp 廃ガス処理装置
JP2592344B2 (ja) * 1990-04-09 1997-03-19 富士写真フイルム株式会社 スタンパ裏面研磨方法及び装置
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US5118286A (en) * 1991-01-17 1992-06-02 Amtech Systems Closed loop method and apparatus for preventing exhausted reactant gas from mixing with ambient air and enhancing repeatability of reaction gas results on wafers
US5182029A (en) * 1991-11-26 1993-01-26 International Business Machines Corporation Aqueous photoresist waste treatment by acid/cupric chloride precipitation

Also Published As

Publication number Publication date
EP0639534B1 (de) 1999-11-10
US5584959A (en) 1996-12-17
EP0639534A2 (de) 1995-02-22
EP0639534A3 (de) 1995-05-10
KR950005347A (ko) 1995-03-20
DE69421577T2 (de) 2000-07-13
KR100386965B1 (ko) 2003-10-10
EP0928777A1 (de) 1999-07-14

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition