DE69406739T2 - Elektronenstrahlgerät - Google Patents

Elektronenstrahlgerät

Info

Publication number
DE69406739T2
DE69406739T2 DE69406739T DE69406739T DE69406739T2 DE 69406739 T2 DE69406739 T2 DE 69406739T2 DE 69406739 T DE69406739 T DE 69406739T DE 69406739 T DE69406739 T DE 69406739T DE 69406739 T2 DE69406739 T2 DE 69406739T2
Authority
DE
Germany
Prior art keywords
electron beam
beam device
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69406739T
Other languages
English (en)
Other versions
DE69406739D1 (de
Inventor
Hideo Todokoro
Tadashi Otaka
Tatsuya Maeda
Katsuhiro Sasada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of DE69406739D1 publication Critical patent/DE69406739D1/de
Application granted granted Critical
Publication of DE69406739T2 publication Critical patent/DE69406739T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/21—Means for adjusting the focus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/21—Focus adjustment
    • H01J2237/216—Automatic focusing methods
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/248—Components associated with the control of the tube
    • H01J2237/2482—Optical means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Electron Beam Exposure (AREA)
DE69406739T 1993-08-26 1994-08-11 Elektronenstrahlgerät Expired - Lifetime DE69406739T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5211814A JP2875940B2 (ja) 1993-08-26 1993-08-26 試料の高さ計測手段を備えた電子ビーム装置

Publications (2)

Publication Number Publication Date
DE69406739D1 DE69406739D1 (de) 1997-12-18
DE69406739T2 true DE69406739T2 (de) 1998-06-04

Family

ID=16612041

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69406739T Expired - Lifetime DE69406739T2 (de) 1993-08-26 1994-08-11 Elektronenstrahlgerät

Country Status (4)

Country Link
US (1) US5598002A (de)
EP (1) EP0641011B1 (de)
JP (1) JP2875940B2 (de)
DE (1) DE69406739T2 (de)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3216474B2 (ja) * 1995-03-30 2001-10-09 株式会社日立製作所 走査型電子顕微鏡
DE19733195B4 (de) * 1997-08-01 2006-04-06 Carl Zeiss Jena Gmbh Hoch-Kompaktes Laser Scanning Mikroskop mit integriertem Kurzpuls Laser
US6356088B1 (en) * 1997-08-01 2002-03-12 Carl Zeiss Jena Gmbh Highly compact laser scanning microscope with integrated short-pulse laser
JP3564958B2 (ja) * 1997-08-07 2004-09-15 株式会社日立製作所 電子ビームを用いた検査方法及び検査装置
US6107637A (en) * 1997-08-11 2000-08-22 Hitachi, Ltd. Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus
US6642520B2 (en) 1999-04-13 2003-11-04 Kabushiki Kaisha Topcon Scanning electron microscope
JP4727777B2 (ja) 1999-05-24 2011-07-20 株式会社日立製作所 走査形電子顕微鏡による測長方法
FR2806527B1 (fr) * 2000-03-20 2002-10-25 Schlumberger Technologies Inc Colonne a focalisation simultanee d'un faisceau de particules et d'un faisceau optique
US6858843B1 (en) * 2002-06-21 2005-02-22 Kla-Tencor Technologies Corporation Immersion objective lens for e-beam inspection
DE102004019833B4 (de) * 2004-04-23 2007-03-01 Leica Microsystems Lithography Gmbh Objektivlinse für einen Strahl geladener Partikel und deren Verwendung
EP1724809A1 (de) * 2005-05-18 2006-11-22 FEI Company Teilchenoptisches Gerät zur Bestrahlung einer Probe
US7259373B2 (en) * 2005-07-08 2007-08-21 Nexgensemi Holdings Corporation Apparatus and method for controlled particle beam manufacturing
US7446320B1 (en) 2005-08-17 2008-11-04 Kla-Tencor Technologies Corproation Electronically-variable immersion electrostatic lens
WO2007090537A2 (de) * 2006-02-03 2007-08-16 Carl Zeiss Nts Gmbh Fokussier- und positionierhilfseinrichtung für ein teilchenoptisches rastermikroskop
WO2008140585A1 (en) 2006-11-22 2008-11-20 Nexgen Semi Holding, Inc. Apparatus and method for conformal mask manufacturing
US8698093B1 (en) 2007-01-19 2014-04-15 Kla-Tencor Corporation Objective lens with deflector plates immersed in electrostatic lens field
JP5134826B2 (ja) * 2007-02-07 2013-01-30 株式会社日立ハイテクノロジーズ 荷電粒子線装置
DE102008001812B4 (de) * 2008-05-15 2013-05-29 Carl Zeiss Microscopy Gmbh Positioniereinrichtung für ein Teilchenstrahlgerät
US10566169B1 (en) 2008-06-30 2020-02-18 Nexgen Semi Holding, Inc. Method and device for spatial charged particle bunching
US10991545B2 (en) 2008-06-30 2021-04-27 Nexgen Semi Holding, Inc. Method and device for spatial charged particle bunching
JP5756585B2 (ja) 2010-04-07 2015-07-29 エフ・イ−・アイ・カンパニー 組合せレーザおよび荷電粒子ビーム・システム
DE102011005732B4 (de) * 2011-03-17 2013-08-22 Carl Zeiss Microscopy Gmbh Einrichtung zur Röntgenspektroskopie
US9082580B2 (en) * 2013-09-23 2015-07-14 Kla-Tencor Corporation Notched magnetic lens for improved sample access in an SEM
US10176967B2 (en) * 2017-02-23 2019-01-08 Hermes Microvision, Inc. Load lock system for charged particle beam imaging
JP6722958B1 (ja) * 2019-11-20 2020-07-15 株式会社Ｐｈｏｔｏ ｅｌｅｃｔｒｏｎ Ｓｏｕｌ 電子線適用装置および電子線適用装置における電子ビームの射出方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2116931A5 (fr) * 1970-12-11 1972-07-21 Onera (Off Nat Aerospatiale) Dispositif de protection d'appareillages d'etude d'echantillons a l'aide d'un pinceau d'electrons
FR2485189A1 (fr) * 1980-06-19 1981-12-24 Beauvineau Jacky Spectroscope optique a reseaux et miroirs pour microscope electronique a balyage
FR2498767A1 (fr) * 1981-01-23 1982-07-30 Cameca Micro-analyseur a sonde electronique comportant un systeme d'observation a double grandissement
JPS57145259A (en) * 1981-03-03 1982-09-08 Akashi Seisakusho Co Ltd Scanning type electron microscope and its similar device
GB2130433B (en) * 1982-03-05 1986-02-05 Jeol Ltd Scanning electron microscope with as optical microscope
JPS61104551A (ja) * 1984-10-29 1986-05-22 Hitachi Ltd 電子顕微鏡
JPH077653B2 (ja) * 1987-04-11 1995-01-30 株式会社日立製作所 走査電子顕微鏡による観察装置
JPH0754684B2 (ja) * 1987-08-28 1995-06-07 株式会社日立製作所 電子顕微鏡
JPH01120749A (ja) * 1987-11-02 1989-05-12 Hitachi Ltd 電子顕微鏡の自動焦点合せ装置

Also Published As

Publication number Publication date
JP2875940B2 (ja) 1999-03-31
EP0641011A2 (de) 1995-03-01
DE69406739D1 (de) 1997-12-18
EP0641011B1 (de) 1997-11-12
US5598002A (en) 1997-01-28
EP0641011A3 (de) 1995-04-19
JPH07134964A (ja) 1995-05-23

Similar Documents

Publication Publication Date Title
DE69224506D1 (de) Elektronenstrahlgerät
DE69406739T2 (de) Elektronenstrahlgerät
DE69432098D1 (de) Elektronenstrahl-Lithographie-System
DE69320617D1 (de) Elektronenemitter
DE69318269D1 (de) Fokussierender Elektronendetektor
DE69407453D1 (de) Blendenvorrichtung
DE69622009T2 (de) Ionenstrahlgerät
DE69213146D1 (de) Elektronenstrahl-Lithographiegerät
DE59303531D1 (de) Elektronenstrahl-Vorrichtung
DE69407927T2 (de) Feldemissionskathodenvorrichtung
DE69405529T2 (de) Feldemissionselektronenvorrichtung
DE69213157D1 (de) Elektronenstrahlvorrichtung
FI933378A0 (fi) Kirjekuori
DE69330699D1 (de) Ionenstrahl-Abrasterungsvorrichtung
DE59407791D1 (de) Elektronenröhre
DE69428635D1 (de) Elektronenstrahlröhre
DE69615804D1 (de) Elektronenstrahl-Belichtungsgerät
DE69412676D1 (de) Elektronenstrahlmessapparat
DE69417187T2 (de) Ablenkungsvorrichtung
NO941787D0 (no) Anodenippel-retteinnretning
KR940020718U (ko) 이온 빔 장치
KR940022706U (ko) 비임(beam) 플랜지(flanges)
GB9415790D0 (en) Electron beam devices
KR960012401U (ko) 전자빔 식별 장치
NO931100D0 (no) Anordning ved bjelke

Legal Events

Date Code Title Description
8364 No opposition during term of opposition