DE69330298D1 - Multifunktionale elektronische Vorrichtung, insbesondere Element mit dynamischem, negativem Widerstandsverhalten und Zugehöriges Herstellungsverfahren - Google Patents

Multifunktionale elektronische Vorrichtung, insbesondere Element mit dynamischem, negativem Widerstandsverhalten und Zugehöriges Herstellungsverfahren

Info

Publication number
DE69330298D1
DE69330298D1 DE69330298T DE69330298T DE69330298D1 DE 69330298 D1 DE69330298 D1 DE 69330298D1 DE 69330298 T DE69330298 T DE 69330298T DE 69330298 T DE69330298 T DE 69330298T DE 69330298 D1 DE69330298 D1 DE 69330298D1
Authority
DE
Germany
Prior art keywords
dynamic
electronic device
manufacturing process
negative resistance
particular element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69330298T
Other languages
English (en)
Other versions
DE69330298T2 (de
Inventor
Tomasz Skotnicki
Gerard Merckel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Orange SA
Original Assignee
France Telecom SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by France Telecom SA filed Critical France Telecom SA
Publication of DE69330298D1 publication Critical patent/DE69330298D1/de
Application granted granted Critical
Publication of DE69330298T2 publication Critical patent/DE69330298T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78606Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
    • H01L29/78618Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure
    • H01L29/78621Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure with LDD structure or an extension or an offset region or characterised by the doping profile
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/06Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H01L27/07Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common
    • H01L27/0705Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type
    • H01L27/0711Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type in combination with bipolar transistors and diodes, or capacitors, or resistors
    • H01L27/0722Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type in combination with bipolar transistors and diodes, or capacitors, or resistors in combination with lateral bipolar transistors and diodes, or capacitors, or resistors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Bipolar Transistors (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
DE69330298T 1992-07-09 1993-06-29 Multifunktionale elektronische Vorrichtung, insbesondere Element mit dynamischem, negativem Widerstandsverhalten und Zugehöriges Herstellungsverfahren Expired - Lifetime DE69330298T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9208502A FR2694449B1 (fr) 1992-07-09 1992-07-09 Composant électronique multifonctions, notamment élément à résistance dynamique négative, et procédé de fabrication correspondant.

Publications (2)

Publication Number Publication Date
DE69330298D1 true DE69330298D1 (de) 2001-07-12
DE69330298T2 DE69330298T2 (de) 2002-06-27

Family

ID=9431729

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69330298T Expired - Lifetime DE69330298T2 (de) 1992-07-09 1993-06-29 Multifunktionale elektronische Vorrichtung, insbesondere Element mit dynamischem, negativem Widerstandsverhalten und Zugehöriges Herstellungsverfahren

Country Status (5)

Country Link
US (1) US5552624A (de)
EP (1) EP0581625B1 (de)
JP (1) JP3641489B2 (de)
DE (1) DE69330298T2 (de)
FR (1) FR2694449B1 (de)

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KR100333153B1 (ko) * 1993-09-07 2002-12-05 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체장치제작방법
JPH07109573A (ja) * 1993-10-12 1995-04-25 Semiconductor Energy Lab Co Ltd ガラス基板および加熱処理方法
SE513512C2 (sv) * 1994-10-31 2000-09-25 Ericsson Telefon Ab L M Halvledaranordning med ett flytande kollektorområde
US8603870B2 (en) 1996-07-11 2013-12-10 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method of manufacturing the same
TW548686B (en) * 1996-07-11 2003-08-21 Semiconductor Energy Lab CMOS semiconductor device and apparatus using the same
JP3383219B2 (ja) 1998-05-22 2003-03-04 シャープ株式会社 Soi半導体装置及びその製造方法
US6255694B1 (en) 2000-01-18 2001-07-03 International Business Machines Corporation Multi-function semiconductor structure and method
JP3485089B2 (ja) 2000-12-15 2004-01-13 セイコーエプソン株式会社 半導体装置およびその製造方法
JP3485091B2 (ja) * 2001-01-19 2004-01-13 セイコーエプソン株式会社 半導体装置およびその製造方法
JP3485092B2 (ja) * 2001-01-19 2004-01-13 セイコーエプソン株式会社 半導体装置およびその製造方法
US20040080356A1 (en) * 2002-10-25 2004-04-29 Hareland Scott A. Compact input/output signal driver for electrostatic discharge protection
US7173320B1 (en) * 2003-04-30 2007-02-06 Altera Corporation High performance lateral bipolar transistor
US6972237B2 (en) * 2003-12-01 2005-12-06 Chartered Semiconductor Manufacturing Ltd. Lateral heterojunction bipolar transistor and method of manufacture using selective epitaxial growth
US9628105B1 (en) * 2015-10-02 2017-04-18 Senseeker Engineering Inc. Electronic circuit having dynamic resistance element
KR20220040536A (ko) 2020-09-23 2022-03-31 삼성전자주식회사 부성 미분 저항 소자
US11949004B2 (en) * 2021-08-27 2024-04-02 Globalfoundries U.S. Inc. Lateral bipolar transistors with gate structure aligned to extrinsic base

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SU42304A1 (ru) * 1933-12-03 1935-03-31 О.А. Бих Прибор дл определени расхода горючего в двигател х внутреннего горени
GB1397789A (en) * 1970-01-02 1975-06-18 Post Office Electrical networks
DE2321426C3 (de) * 1973-04-27 1978-12-21 Siemens Ag, 1000 Berlin Und 8000 Muenchen Bipolarer Dünnschicht-Transistor
US4032961A (en) * 1974-10-16 1977-06-28 General Electric Company Gate modulated bipolar transistor
JPS5939906B2 (ja) * 1978-05-04 1984-09-27 超エル・エス・アイ技術研究組合 半導体装置の製造方法
JPS57208175A (en) * 1981-06-17 1982-12-21 Nec Corp Semiconductor device
US4466178A (en) * 1981-06-25 1984-08-21 Rockwell International Corporation Method of making extremely small area PNP lateral transistor by angled implant of deep trenches followed by refilling the same with dielectrics
US4864372A (en) * 1983-10-19 1989-09-05 Litton Systems, Inc. Field effect transistor
US4698899A (en) * 1983-10-19 1987-10-13 Gould Inc. Field effect transistor
US4891533A (en) * 1984-02-17 1990-01-02 Analog Devices, Incorporated MOS-cascoded bipolar current sources in non-epitaxial structure
US4532698A (en) * 1984-06-22 1985-08-06 International Business Machines Corporation Method of making ultrashort FET using oblique angle metal deposition and ion implantation
JPS6115369A (ja) * 1984-07-02 1986-01-23 Nippon Telegr & Teleph Corp <Ntt> 半導体装置及びその製造方法
JPS63312674A (ja) * 1987-06-16 1988-12-21 Nissan Motor Co Ltd 薄膜半導体装置
US4922315A (en) * 1987-11-13 1990-05-01 Kopin Corporation Control gate lateral silicon-on-insulator bipolar transistor
US4914491A (en) * 1987-11-13 1990-04-03 Kopin Corporation Junction field-effect transistors formed on insulator substrates
US4872010A (en) * 1988-02-08 1989-10-03 Hughes Aircraft Company Analog-to-digital converter made with focused ion beam technology
US5198691A (en) * 1989-04-10 1993-03-30 Tarng Min M BiMOS devices and BiMOS memories
DE69031562T2 (de) * 1989-05-17 1998-03-12 Sarnoff Corp Durch eine niedrige spannung auslösbare rückstellungsanordnung
KR920008922A (ko) * 1990-10-29 1992-05-28 김광호 일체형 바이 시모스 회로

Also Published As

Publication number Publication date
DE69330298T2 (de) 2002-06-27
EP0581625B1 (de) 2001-06-06
JP3641489B2 (ja) 2005-04-20
EP0581625A1 (de) 1994-02-02
FR2694449A1 (fr) 1994-02-04
FR2694449B1 (fr) 1994-10-28
US5552624A (en) 1996-09-03
JPH0677559A (ja) 1994-03-18

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Legal Events

Date Code Title Description
8332 No legal effect for de
8370 Indication of lapse of patent is to be deleted
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FRANCE TELECOM, S.A., PARIS, FR