DE69327749D1 - Verfahren zum Einstellen der Konzentration eines Entwicklers - Google Patents

Verfahren zum Einstellen der Konzentration eines Entwicklers

Info

Publication number
DE69327749D1
DE69327749D1 DE69327749T DE69327749T DE69327749D1 DE 69327749 D1 DE69327749 D1 DE 69327749D1 DE 69327749 T DE69327749 T DE 69327749T DE 69327749 T DE69327749 T DE 69327749T DE 69327749 D1 DE69327749 D1 DE 69327749D1
Authority
DE
Germany
Prior art keywords
developer
concentration
adjusting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69327749T
Other languages
English (en)
Other versions
DE69327749T2 (de
Inventor
Koichi Kotake
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of DE69327749D1 publication Critical patent/DE69327749D1/de
Application granted granted Critical
Publication of DE69327749T2 publication Critical patent/DE69327749T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Accessories For Mixers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Developing Agents For Electrophotography (AREA)
DE69327749T 1992-07-10 1993-07-09 Verfahren zum Einstellen der Konzentration eines Entwicklers Expired - Lifetime DE69327749T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4207431A JP2670211B2 (ja) 1992-07-10 1992-07-10 現像液の調整方法

Publications (2)

Publication Number Publication Date
DE69327749D1 true DE69327749D1 (de) 2000-03-09
DE69327749T2 DE69327749T2 (de) 2000-10-12

Family

ID=16539651

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69327749T Expired - Lifetime DE69327749T2 (de) 1992-07-10 1993-07-09 Verfahren zum Einstellen der Konzentration eines Entwicklers

Country Status (6)

Country Link
US (1) US5843602A (de)
EP (1) EP0578505B1 (de)
JP (1) JP2670211B2 (de)
KR (1) KR100232861B1 (de)
DE (1) DE69327749T2 (de)
TW (1) TW217462B (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5476320A (en) * 1992-12-28 1995-12-19 Sumitomo Chemical Co., Ltd. Developer preparing apparatus and developer preparing method
JPH06190256A (ja) * 1992-12-28 1994-07-12 Sumitomo Chem Co Ltd 現像液調合装置及び現像液調合方法
WO1998029900A1 (fr) * 1996-12-25 1998-07-09 Nippon Zeon Co., Ltd. Unite de commande centralisee de liquide chimique d'impression de motifs
US6355388B1 (en) * 1999-10-07 2002-03-12 Advanced Micro Devices, Inc. Method for controlling photoresist strip processes
EP1094506A3 (de) 1999-10-18 2004-03-03 Applied Materials, Inc. Schutzschicht für Filme mit besonders kleiner Dielektrizitätskonstante
JP4648513B2 (ja) * 2000-03-15 2011-03-09 関東化学株式会社 濃度検知方法及び濃度検知装置並びに薬剤の希釈調合装置
JP4704228B2 (ja) * 2005-09-06 2011-06-15 東京応化工業株式会社 レジスト液供給装置及び当該レジスト液供給装置を得るための改造キット
US20110159447A1 (en) 2009-12-25 2011-06-30 Tokyo Ohka Kogyo Co., Ltd. Developing solution for photolithography, method for forming resist pattern, and method and apparatus for producing developing solution for photolithography

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL179316C (nl) * 1973-09-10 1986-08-18 Oce Van Der Grinten N V P A Oc Concentratie-regelinrichting voor een vloeibare oplossing.
JPS5921022A (ja) * 1982-07-27 1984-02-02 Nippon Zeon Co Ltd 半導体用レジスト現像液又はリンス液を容器に充填する方法
JPS59184221A (ja) * 1983-04-04 1984-10-19 Kanegafuchi Chem Ind Co Ltd 改良された芳香族ポリエステル及びその製造方法
US4724795A (en) * 1985-06-03 1988-02-16 Acheson Industries, Inc. Automatic solution concentration monitoring system
JPS61279858A (ja) * 1985-06-05 1986-12-10 Mitsubishi Electric Corp ネガレジスト現像装置
JPS634236A (ja) * 1986-06-24 1988-01-09 Konica Corp 現像の安定性等が改良される感光性平版印刷版の現像処理方法
JPH067910B2 (ja) * 1987-02-10 1994-02-02 日立プラント建設株式会社 現像原液の希釈装置
CA1290744C (en) * 1987-07-08 1991-10-15 Laurent Verreault Process and an apparatus for mixing substances
JP2516022B2 (ja) * 1987-07-17 1996-07-10 富士写真フイルム株式会社 感光性平版印刷版自動現像装置の現像補充液補充方法
JP2585784B2 (ja) * 1989-02-03 1997-02-26 株式会社東芝 自動現像装置および方法
DE3921564A1 (de) * 1989-06-30 1991-01-17 Peter Luettgen Verfahren zur regelung der konzentration von entwickler- bzw. entschichterloesung fuer leiterplatten und vorrichtung zur durchfuehrung des verfahrens
JP3120817B2 (ja) * 1992-02-04 2000-12-25 三菱瓦斯化学株式会社 現像液の自動希釈装置
JPH06230037A (ja) * 1993-02-03 1994-08-19 Nippondenso Co Ltd 交差コイル駆動回路

Also Published As

Publication number Publication date
US5843602A (en) 1998-12-01
EP0578505A2 (de) 1994-01-12
EP0578505B1 (de) 2000-02-02
KR100232861B1 (ko) 1999-12-01
JPH0629207A (ja) 1994-02-04
KR940005997A (ko) 1994-03-22
JP2670211B2 (ja) 1997-10-29
DE69327749T2 (de) 2000-10-12
EP0578505A3 (en) 1994-05-25
TW217462B (en) 1993-12-11

Similar Documents

Publication Publication Date Title
DE69525130D1 (de) Verfahren zum Verbessern der Auflösung eines Anzeigesystems
DE69124963D1 (de) Verfahren zum Steuern der Flüssigkeitsversorgung eines chromatographischen Detektors
DE69333515D1 (de) Verfahren zum aufrechterhalten eines gruppenrufes
ATE150681T1 (de) Verfahren zum beschriften von diamanten
DE59406372D1 (de) Verfahren zum herstellen eines dredidimensionalen objekts
DE69325218D1 (de) Verfahren zum wiederentbindbaren metallischen Verbinden
DE69229532D1 (de) Verfahren zum Kontrollieren und Steuern eines Alkanolaminereaktionsverfahrens
DE69222396D1 (de) Verfahren zum Aufbereiten von Kohlenwasserstoffen
DE69015550D1 (de) Verfahren zum Züchten eines Kristalls.
DE59408739D1 (de) Verfahren zum Herstellen von lackierten Teilen
DE69207075D1 (de) Verfahren und Vorrichtung zum Abschrägen der Kerbe eines Plättchen
DE69129406D1 (de) Verfahren zum korrigieren der abbiegung eines roboters
DE69019521D1 (de) Verfahren zum Herstellen eines Plasmabildschirms.
DE69425497D1 (de) Verfahren zum anreichern von löslichen ballaststoffen
DE69219063D1 (de) Verfahren zum Regenerieren von Ätzmitteln
DE69318459D1 (de) Verfahren zum Herstellen eines synthetischen Seismogramms
DE69331887D1 (de) Verfahren zum Lernen von Mustern
DE3851315D1 (de) Apparat zum elektrooptischen Nachweis eines Teilchens.
DE59508937D1 (de) Verfahren zum Herstellen eines Behälters
DE69327749D1 (de) Verfahren zum Einstellen der Konzentration eines Entwicklers
DE69028174D1 (de) Verfahren zum Beschichten
DE69215050D1 (de) Verfahren zum Aktivieren eines Katalysators
DE69306782D1 (de) Verfahren zum verbinden von perfluorelastomeren
DE69324888D1 (de) Verfahren zum Nachweis von Phosphatase
DE69408415D1 (de) Verfahren zum Einpacken eines elektrophotographischen Photorezeptors

Legal Events

Date Code Title Description
8364 No opposition during term of opposition