DE69327749D1 - Verfahren zum Einstellen der Konzentration eines Entwicklers - Google Patents
Verfahren zum Einstellen der Konzentration eines EntwicklersInfo
- Publication number
- DE69327749D1 DE69327749D1 DE69327749T DE69327749T DE69327749D1 DE 69327749 D1 DE69327749 D1 DE 69327749D1 DE 69327749 T DE69327749 T DE 69327749T DE 69327749 T DE69327749 T DE 69327749T DE 69327749 D1 DE69327749 D1 DE 69327749D1
- Authority
- DE
- Germany
- Prior art keywords
- developer
- concentration
- adjusting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Accessories For Mixers (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Developing Agents For Electrophotography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4207431A JP2670211B2 (ja) | 1992-07-10 | 1992-07-10 | 現像液の調整方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69327749D1 true DE69327749D1 (de) | 2000-03-09 |
DE69327749T2 DE69327749T2 (de) | 2000-10-12 |
Family
ID=16539651
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69327749T Expired - Lifetime DE69327749T2 (de) | 1992-07-10 | 1993-07-09 | Verfahren zum Einstellen der Konzentration eines Entwicklers |
Country Status (6)
Country | Link |
---|---|
US (1) | US5843602A (de) |
EP (1) | EP0578505B1 (de) |
JP (1) | JP2670211B2 (de) |
KR (1) | KR100232861B1 (de) |
DE (1) | DE69327749T2 (de) |
TW (1) | TW217462B (de) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5476320A (en) * | 1992-12-28 | 1995-12-19 | Sumitomo Chemical Co., Ltd. | Developer preparing apparatus and developer preparing method |
JPH06190256A (ja) * | 1992-12-28 | 1994-07-12 | Sumitomo Chem Co Ltd | 現像液調合装置及び現像液調合方法 |
WO1998029900A1 (fr) * | 1996-12-25 | 1998-07-09 | Nippon Zeon Co., Ltd. | Unite de commande centralisee de liquide chimique d'impression de motifs |
US6355388B1 (en) * | 1999-10-07 | 2002-03-12 | Advanced Micro Devices, Inc. | Method for controlling photoresist strip processes |
EP1094506A3 (de) | 1999-10-18 | 2004-03-03 | Applied Materials, Inc. | Schutzschicht für Filme mit besonders kleiner Dielektrizitätskonstante |
JP4648513B2 (ja) * | 2000-03-15 | 2011-03-09 | 関東化学株式会社 | 濃度検知方法及び濃度検知装置並びに薬剤の希釈調合装置 |
JP4704228B2 (ja) * | 2005-09-06 | 2011-06-15 | 東京応化工業株式会社 | レジスト液供給装置及び当該レジスト液供給装置を得るための改造キット |
US20110159447A1 (en) | 2009-12-25 | 2011-06-30 | Tokyo Ohka Kogyo Co., Ltd. | Developing solution for photolithography, method for forming resist pattern, and method and apparatus for producing developing solution for photolithography |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL179316C (nl) * | 1973-09-10 | 1986-08-18 | Oce Van Der Grinten N V P A Oc | Concentratie-regelinrichting voor een vloeibare oplossing. |
JPS5921022A (ja) * | 1982-07-27 | 1984-02-02 | Nippon Zeon Co Ltd | 半導体用レジスト現像液又はリンス液を容器に充填する方法 |
JPS59184221A (ja) * | 1983-04-04 | 1984-10-19 | Kanegafuchi Chem Ind Co Ltd | 改良された芳香族ポリエステル及びその製造方法 |
US4724795A (en) * | 1985-06-03 | 1988-02-16 | Acheson Industries, Inc. | Automatic solution concentration monitoring system |
JPS61279858A (ja) * | 1985-06-05 | 1986-12-10 | Mitsubishi Electric Corp | ネガレジスト現像装置 |
JPS634236A (ja) * | 1986-06-24 | 1988-01-09 | Konica Corp | 現像の安定性等が改良される感光性平版印刷版の現像処理方法 |
JPH067910B2 (ja) * | 1987-02-10 | 1994-02-02 | 日立プラント建設株式会社 | 現像原液の希釈装置 |
CA1290744C (en) * | 1987-07-08 | 1991-10-15 | Laurent Verreault | Process and an apparatus for mixing substances |
JP2516022B2 (ja) * | 1987-07-17 | 1996-07-10 | 富士写真フイルム株式会社 | 感光性平版印刷版自動現像装置の現像補充液補充方法 |
JP2585784B2 (ja) * | 1989-02-03 | 1997-02-26 | 株式会社東芝 | 自動現像装置および方法 |
DE3921564A1 (de) * | 1989-06-30 | 1991-01-17 | Peter Luettgen | Verfahren zur regelung der konzentration von entwickler- bzw. entschichterloesung fuer leiterplatten und vorrichtung zur durchfuehrung des verfahrens |
JP3120817B2 (ja) * | 1992-02-04 | 2000-12-25 | 三菱瓦斯化学株式会社 | 現像液の自動希釈装置 |
JPH06230037A (ja) * | 1993-02-03 | 1994-08-19 | Nippondenso Co Ltd | 交差コイル駆動回路 |
-
1992
- 1992-07-10 JP JP4207431A patent/JP2670211B2/ja not_active Expired - Lifetime
-
1993
- 1993-07-07 TW TW082105428A patent/TW217462B/zh not_active IP Right Cessation
- 1993-07-08 KR KR1019930012806A patent/KR100232861B1/ko not_active IP Right Cessation
- 1993-07-09 EP EP93305416A patent/EP0578505B1/de not_active Expired - Lifetime
- 1993-07-09 DE DE69327749T patent/DE69327749T2/de not_active Expired - Lifetime
-
1996
- 1996-01-16 US US08/586,543 patent/US5843602A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US5843602A (en) | 1998-12-01 |
EP0578505A2 (de) | 1994-01-12 |
EP0578505B1 (de) | 2000-02-02 |
KR100232861B1 (ko) | 1999-12-01 |
JPH0629207A (ja) | 1994-02-04 |
KR940005997A (ko) | 1994-03-22 |
JP2670211B2 (ja) | 1997-10-29 |
DE69327749T2 (de) | 2000-10-12 |
EP0578505A3 (en) | 1994-05-25 |
TW217462B (en) | 1993-12-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |