DE69312894D1 - Pyrometer mit Emissionsmesser - Google Patents
Pyrometer mit EmissionsmesserInfo
- Publication number
- DE69312894D1 DE69312894D1 DE69312894T DE69312894T DE69312894D1 DE 69312894 D1 DE69312894 D1 DE 69312894D1 DE 69312894 T DE69312894 T DE 69312894T DE 69312894 T DE69312894 T DE 69312894T DE 69312894 D1 DE69312894 D1 DE 69312894D1
- Authority
- DE
- Germany
- Prior art keywords
- pyrometer
- emission meter
- meter
- emission
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/03—Observing, e.g. monitoring, the workpiece
- B23K26/032—Observing, e.g. monitoring, the workpiece using optical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/03—Observing, e.g. monitoring, the workpiece
- B23K26/034—Observing the temperature of the workpiece
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
- G01J5/0801—Means for wavelength selection or discrimination
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
- G01J5/0801—Means for wavelength selection or discrimination
- G01J5/0802—Optical filters
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
- G01J5/0808—Convex mirrors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
- G01J5/0814—Particular reflectors, e.g. faceted or dichroic mirrors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
- G01J5/0846—Optical arrangements having multiple detectors for performing different types of detection, e.g. using radiometry and reflectometry channels
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
- G01J5/0878—Diffusers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
- G01J5/0896—Optical arrangements using a light source, e.g. for illuminating a surface
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/80—Calibration
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D23/00—Control of temperature
- G05D23/19—Control of temperature characterised by the use of electric means
- G05D23/27—Control of temperature characterised by the use of electric means with sensing element responsive to radiation
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Automation & Control Theory (AREA)
- Radiation Pyrometers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP92204102 | 1992-12-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69312894D1 true DE69312894D1 (de) | 1997-09-11 |
DE69312894T2 DE69312894T2 (de) | 1998-02-12 |
Family
ID=8211182
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69312894T Expired - Fee Related DE69312894T2 (de) | 1992-12-29 | 1993-12-24 | Pyrometer mit Emissionsmesser |
Country Status (3)
Country | Link |
---|---|
US (1) | US5460451A (de) |
JP (1) | JPH06229832A (de) |
DE (1) | DE69312894T2 (de) |
Families Citing this family (44)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5823681A (en) * | 1994-08-02 | 1998-10-20 | C.I. Systems (Israel) Ltd. | Multipoint temperature monitoring apparatus for semiconductor wafers during processing |
US5601366A (en) * | 1994-10-25 | 1997-02-11 | Texas Instruments Incorporated | Method for temperature measurement in rapid thermal process systems |
US5597237A (en) * | 1995-05-30 | 1997-01-28 | Quantum Logic Corp | Apparatus for measuring the emissivity of a semiconductor wafer |
DE19654773C1 (de) * | 1996-12-31 | 1998-04-23 | Schott Glaswerke | Verfahren und Vorrichtung zur betrieblichen Messung der Temperatur in mindestens einer Kochzone eines Kochfeldes mit einer Glaskeramikplatte |
FR2760528B1 (fr) * | 1997-03-05 | 1999-05-21 | Framatome Sa | Procede et dispositif d'examen photothermique d'un materiau |
FR2760529B1 (fr) * | 1997-03-05 | 1999-05-28 | Framatome Sa | Procede d'examen photothermique d'une piece |
US6635501B1 (en) | 1998-06-25 | 2003-10-21 | Advanced Micro Devices, Inc. | Low temperature cobalt silicidation process monitor |
DE19832833C2 (de) * | 1998-07-21 | 2002-01-31 | Fraunhofer Ges Forschung | Verfahren zur thermographischen Untersuchung eines Werkstückes und Vorrichtung hierfür |
JP3186721B2 (ja) * | 1998-12-07 | 2001-07-11 | 三菱電機株式会社 | 溶接品質判定装置及びその装置を備えた溶接機 |
AU3726100A (en) | 1999-03-08 | 2000-09-28 | C.I. Systems Ltd. | Method and apparatus for active pyrometric measurement of the temperature of a body whose emissivity varies with wavelength |
US6303411B1 (en) | 1999-05-03 | 2001-10-16 | Vortek Industries Ltd. | Spatially resolved temperature measurement and irradiance control |
DE19959862A1 (de) * | 1999-12-10 | 2001-06-13 | Forschungszentrum Juelich Gmbh | Lasersystem mit steuerbarer Pulsdauer |
DE10203476A1 (de) * | 2001-01-18 | 2002-09-12 | Amtron Gmbh | Lasermodul |
US7044386B2 (en) * | 2002-02-05 | 2006-05-16 | William Berson | Information encoding on surfaces by varying spectral emissivity |
US6833536B2 (en) * | 2002-05-22 | 2004-12-21 | Applera Corporation | Non-contact radiant heating and temperature sensing device for a chemical reaction chamber |
US7056012B2 (en) * | 2002-10-03 | 2006-06-06 | Extech Instruments Corporation | Multimeter with non-contact temperature measurement |
DE10393962B4 (de) | 2002-12-20 | 2019-03-14 | Mattson Technology Inc. | Verfahren und Vorrichtung zum Stützen eines Werkstücks und zur Wärmebehandlung des Werkstücks |
US7407195B2 (en) | 2004-04-14 | 2008-08-05 | William Berson | Label for receiving indicia having variable spectral emissivity values |
US20050276308A1 (en) * | 2004-06-10 | 2005-12-15 | Pint Charles S | Method and apparatus for measuring temperature and emissivity |
JP2006098295A (ja) * | 2004-09-30 | 2006-04-13 | Ube Ind Ltd | 放射率測定装置 |
US7186978B2 (en) * | 2004-10-15 | 2007-03-06 | Millennium Enginerring And Integration Company | Compact emissivity and temperature measuring infrared detector |
US7651031B2 (en) | 2004-10-25 | 2010-01-26 | William Berson | Systems and methods for reading indicium |
US7438468B2 (en) * | 2004-11-12 | 2008-10-21 | Applied Materials, Inc. | Multiple band pass filtering for pyrometry in laser based annealing systems |
US7728726B2 (en) | 2005-01-14 | 2010-06-01 | William Berson | Radio frequency identification labels |
US7619520B2 (en) | 2005-01-14 | 2009-11-17 | William Berson | Radio frequency identification labels and systems and methods for making the same |
US7621451B2 (en) | 2005-01-14 | 2009-11-24 | William Berson | Radio frequency identification labels and systems and methods for making the same |
US7931413B2 (en) * | 2005-01-14 | 2011-04-26 | William Berson | Printing system ribbon including print transferable circuitry and elements |
JP5967859B2 (ja) | 2006-11-15 | 2016-08-10 | マトソン テクノロジー、インコーポレイテッド | 熱処理中の被加工物を支持するシステムおよび方法 |
WO2008148529A1 (de) * | 2007-06-05 | 2008-12-11 | Miele & Cie. Kg | Verfahren zur kochfeldsteuerung und kochfeld zur durchführung des verfahrens |
US20090061752A1 (en) * | 2007-08-28 | 2009-03-05 | Current Energy Controls, Lp | Autonomous Ventilation System |
US7696500B2 (en) * | 2008-03-20 | 2010-04-13 | Electro Optical Industries, Inc. | Fused test source |
US8193802B2 (en) * | 2008-04-09 | 2012-06-05 | Milwaukee Electric Tool Corporation | Slidably attachable non-contact voltage detector |
KR101610269B1 (ko) | 2008-05-16 | 2016-04-07 | 맷슨 테크놀로지, 인크. | 워크피스 파손 방지 방법 및 장치 |
US9217731B2 (en) | 2010-05-21 | 2015-12-22 | Kabushiki Kaisha Toshiba | Welding inspection method and apparatus thereof |
US20110284508A1 (en) * | 2010-05-21 | 2011-11-24 | Kabushiki Kaisha Toshiba | Welding system and welding method |
RU2650167C2 (ru) | 2014-01-16 | 2018-04-09 | Хьюлетт-Паккард Дивелопмент Компани, Л.П. | Формирование трехмерного объекта |
US10889059B2 (en) | 2014-01-16 | 2021-01-12 | Hewlett-Packard Development Company, L.P. | Generating three-dimensional objects |
KR101906127B1 (ko) | 2014-01-16 | 2018-11-28 | 휴렛-팩커드 디벨롭먼트 컴퍼니, 엘.피. | 입체 물체 생성 |
CN106061714B (zh) | 2014-01-16 | 2019-07-12 | 惠普发展公司,有限责任合伙企业 | 基于辐射率的温度确定 |
US11154946B2 (en) * | 2014-06-30 | 2021-10-26 | Illinois Tool Works Inc. | Systems and methods for the control of welding parameters |
ES2566077B2 (es) * | 2014-07-18 | 2017-03-10 | Alberto ADARVE LOZANO | Sistema y procedimiento para la generación de una zona de temperatura constante en una superficie |
CN111347157B (zh) * | 2018-12-21 | 2023-04-28 | 松下知识产权经营株式会社 | 激光焊接装置以及激光焊接方法 |
DE102020111293A1 (de) * | 2019-04-24 | 2020-10-29 | Laytec Aktiengesellschaft | Verfahren und Vorrichtung zur in-situ Bestimmung der Temperatur eines Wafers |
CN112404632B (zh) | 2019-08-22 | 2022-09-02 | 台达电子工业股份有限公司 | 焊锡装置及其***控制器 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB621882A (en) * | 1946-10-02 | 1949-04-21 | Birmingham Small Arms Co Ltd | Improvements in or relating to apparatus for determining the temperature of the surface of a hot body |
JPS5234230B2 (de) * | 1971-12-27 | 1977-09-02 | ||
CH547487A (de) * | 1972-07-27 | 1974-03-29 | Bbc Brown Boveri & Cie | Verfahren zur beruehrungslosen und materialunabhaengigen temperaturmessung an oberflaechen mittels infrarot-pyrometer. |
SE458724B (sv) * | 1981-03-16 | 1989-04-24 | Peter Perten | Infraroedanalysator foer relativ maengdbestaemning av visst eller vissa aemnen i ett prov, saerskilt i livsmedel saasom mjoel |
JPS57161521A (en) * | 1981-03-31 | 1982-10-05 | Chino Works Ltd | Radiation thermometer |
US4919542A (en) * | 1988-04-27 | 1990-04-24 | Ag Processing Technologies, Inc. | Emissivity correction apparatus and method |
KR960013995B1 (ko) * | 1988-07-15 | 1996-10-11 | 도오교오 에레구토론 가부시끼가이샤 | 반도체 웨이퍼 기판의 표면온도 측정 방법 및 열처리 장치 |
US4956538A (en) * | 1988-09-09 | 1990-09-11 | Texas Instruments, Incorporated | Method and apparatus for real-time wafer temperature measurement using infrared pyrometry in advanced lamp-heated rapid thermal processors |
US5282017A (en) * | 1990-01-05 | 1994-01-25 | Quantum Logic Corporation | Reflectance probe |
US5239488A (en) * | 1990-04-23 | 1993-08-24 | On-Line Technologies, Inc. | Apparatus and method for determining high temperature surface emissivity through reflectance and radiance measurements |
US5098195A (en) * | 1990-10-31 | 1992-03-24 | Information And Control Systems, Inc. | Directional spectral emissivity measurement system |
US5326173A (en) * | 1993-01-11 | 1994-07-05 | Alcan International Limited | Apparatus and method for remote temperature measurement |
US5308161A (en) * | 1993-02-11 | 1994-05-03 | Quantum Logic Corporation | Pyrometer apparatus for use in rapid thermal processing of semiconductor wafers |
-
1993
- 1993-12-24 DE DE69312894T patent/DE69312894T2/de not_active Expired - Fee Related
- 1993-12-27 JP JP5332117A patent/JPH06229832A/ja active Pending
- 1993-12-27 US US08/173,840 patent/US5460451A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE69312894T2 (de) | 1998-02-12 |
JPH06229832A (ja) | 1994-08-19 |
US5460451A (en) | 1995-10-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: KONINKLIJKE PHILIPS ELECTRONICS N.V., EINDHOVEN, N |
|
8320 | Willingness to grant licences declared (paragraph 23) | ||
8339 | Ceased/non-payment of the annual fee |