DE69208979T2 - Freitragender Ausleger für Atomkraftmikroskop und Verfahren zu dessen Herstellung - Google Patents

Freitragender Ausleger für Atomkraftmikroskop und Verfahren zu dessen Herstellung

Info

Publication number
DE69208979T2
DE69208979T2 DE69208979T DE69208979T DE69208979T2 DE 69208979 T2 DE69208979 T2 DE 69208979T2 DE 69208979 T DE69208979 T DE 69208979T DE 69208979 T DE69208979 T DE 69208979T DE 69208979 T2 DE69208979 T2 DE 69208979T2
Authority
DE
Germany
Prior art keywords
cantilever
production
atomic force
force microscope
microscope
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69208979T
Other languages
English (en)
Other versions
DE69208979D1 (de
Inventor
Hiroyuki Kado
Takao Tohda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP34451791A external-priority patent/JP2622322B2/ja
Priority claimed from JP4054665A external-priority patent/JP2653313B2/ja
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Application granted granted Critical
Publication of DE69208979D1 publication Critical patent/DE69208979D1/de
Publication of DE69208979T2 publication Critical patent/DE69208979T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/24—AFM [Atomic Force Microscopy] or apparatus therefor, e.g. AFM probes
    • G01Q60/38—Probes, their manufacture, or their related instrumentation, e.g. holders
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y15/00—Nanotechnology for interacting, sensing or actuating, e.g. quantum dots as markers in protein assays or molecular motors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q70/00—General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/00
    • G01Q70/08—Probe characteristics
    • G01Q70/10—Shape or taper
    • G01Q70/12—Nanotube tips
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/85—Scanning probe control process
    • Y10S977/851—Particular movement or positioning of scanning tip
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/86—Scanning probe structure
    • Y10S977/863—Atomic force probe
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/86—Scanning probe structure
    • Y10S977/873—Tip holder
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/86—Scanning probe structure
    • Y10S977/875—Scanning probe structure with tip detail
    • Y10S977/878—Shape/taper
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/86—Scanning probe structure
    • Y10S977/875—Scanning probe structure with tip detail
    • Y10S977/879—Material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/88—Manufacture, treatment, or detection of nanostructure with arrangement, process, or apparatus for testing
    • Y10S977/881—Microscopy or spectroscopy, e.g. sem, tem
DE69208979T 1991-07-15 1992-07-14 Freitragender Ausleger für Atomkraftmikroskop und Verfahren zu dessen Herstellung Expired - Fee Related DE69208979T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP17370991 1991-07-15
JP34451791A JP2622322B2 (ja) 1991-12-26 1991-12-26 原子間力顕微鏡用探針の製造方法
JP4054665A JP2653313B2 (ja) 1991-07-15 1992-03-13 原子間力顕微鏡用カンチレバーおよびその製造方法

Publications (2)

Publication Number Publication Date
DE69208979D1 DE69208979D1 (de) 1996-04-18
DE69208979T2 true DE69208979T2 (de) 1996-07-25

Family

ID=27295366

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69208979T Expired - Fee Related DE69208979T2 (de) 1991-07-15 1992-07-14 Freitragender Ausleger für Atomkraftmikroskop und Verfahren zu dessen Herstellung

Country Status (3)

Country Link
US (1) US5357787A (de)
EP (1) EP0530473B1 (de)
DE (1) DE69208979T2 (de)

Families Citing this family (16)

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Publication number Priority date Publication date Assignee Title
JP2917674B2 (ja) * 1992-06-03 1999-07-12 松下電器産業株式会社 走査トンネル顕微鏡用探針およびその製造方法
US5553488A (en) * 1993-07-30 1996-09-10 Toyota Jidosha Kabushiki Kaisha Diagnosis apparatus for vehicle control system
US5883387A (en) * 1994-11-15 1999-03-16 Olympus Optical Co., Ltd. SPM cantilever and a method for manufacturing the same
US5874668A (en) 1995-10-24 1999-02-23 Arch Development Corporation Atomic force microscope for biological specimens
JPH09196933A (ja) * 1996-01-19 1997-07-31 Canon Inc プローブとプローブの作製方法、及びプローブユニット、並びにこれを用いた情報記録再生装置
US5856672A (en) * 1996-08-29 1999-01-05 International Business Machines Corporation Single-crystal silicon cantilever with integral in-plane tip for use in atomic force microscope system
US5729026A (en) * 1996-08-29 1998-03-17 International Business Machines Corporation Atomic force microscope system with angled cantilever having integral in-plane tip
EP0899538B1 (de) * 1997-08-27 2003-05-14 IMEC vzw Taststift-Konfiguration sowie Herstellungsverfahren und Verwendung von Taststiften
US6121771A (en) * 1998-08-31 2000-09-19 International Business Machines Corporation Magnetic force microscopy probe with bar magnet tip
JP2001091441A (ja) * 1999-07-16 2001-04-06 Japan Science & Technology Corp ナノメートルオーダの機械振動子、その製造方法及びそれを用いた測定装置
US6813937B2 (en) * 2001-11-28 2004-11-09 General Nanotechnology Llc Method and apparatus for micromachines, microstructures, nanomachines and nanostructures
CN100590438C (zh) * 2002-01-25 2010-02-17 株式会社爱德万测试 探针卡及探针卡的制造方法
US7383643B2 (en) * 2004-03-24 2008-06-10 Apollo Hardwoods Company Method for drying veneers
US7444856B2 (en) * 2004-09-23 2008-11-04 The Board Of Trustees Of The Leland Stanford Junior University Sensors for electrochemical, electrical or topographical analysis
US7408366B2 (en) * 2006-02-13 2008-08-05 Georgia Tech Research Corporation Probe tips and method of making same
KR20080006911A (ko) * 2006-07-14 2008-01-17 전자부품연구원 원자간력 현미경용 캔틸레버 탐침 및 그의 제조방법

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2538622A (en) * 1944-12-08 1951-01-16 Bailey Meter Co Apparatus for determining surface quality
US2608092A (en) * 1946-02-08 1952-08-26 Lincoln Park Ind Inc Displacement integrator
DE2535912A1 (de) * 1975-08-12 1977-02-17 Salje Ernst Verfahren und vorrichtung zur rauhigkeitspruefung von oberflaechen
US4290303A (en) * 1979-07-03 1981-09-22 Westinghouse Electric Corp. Apparatus for measuring surface scratches on a tube
JPS60161503A (ja) * 1984-02-01 1985-08-23 Tokyo Seimitsu Co Ltd 表面粗さ測定機用検出装置
US4791807A (en) * 1986-11-04 1988-12-20 Oechsle S John Apparatus for determining the relative hardness and abrasion resistance of industrial film coatings and linings
EP0360425B1 (de) * 1988-08-29 1993-05-26 Matsushita Electric Industrial Co., Ltd. Metallische Zusammensetzung enthaltend Zinkoxyd-Whisker
EP0413040B1 (de) * 1989-08-16 1992-12-16 International Business Machines Corporation Verfahren für die Herstellung ultrafeiner Siliziumspitzen für AFM/STM-Profilometrie
JPH03218998A (ja) * 1989-10-10 1991-09-26 Univ Leland Stanford Jr 探針付きカンチレバー及びその製造方法
EP0437275B1 (de) * 1990-01-11 1997-08-27 Canon Kabushiki Kaisha Mikrosonde, Herstellungsverfahren zur Herstellung derselben und Informations-Eingabe- und/oder Ausgabe-Gerät welches dieselbe verwendet
US5171992A (en) * 1990-10-31 1992-12-15 International Business Machines Corporation Nanometer scale probe for an atomic force microscope, and method for making same
US5186041A (en) * 1990-11-28 1993-02-16 International Business Machines Corporation Microprobe-based CD measurement tool
US5218656A (en) * 1991-03-04 1993-06-08 Specac Ltd. Optical fiber probe for attentuated total reflectance measurements

Also Published As

Publication number Publication date
EP0530473B1 (de) 1996-03-13
EP0530473A1 (de) 1993-03-10
DE69208979D1 (de) 1996-04-18
US5357787A (en) 1994-10-25

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee