DE69108689D1 - Vorrichtung zum Reinigen von Siliciumscheiben. - Google Patents

Vorrichtung zum Reinigen von Siliciumscheiben.

Info

Publication number
DE69108689D1
DE69108689D1 DE69108689T DE69108689T DE69108689D1 DE 69108689 D1 DE69108689 D1 DE 69108689D1 DE 69108689 T DE69108689 T DE 69108689T DE 69108689 T DE69108689 T DE 69108689T DE 69108689 D1 DE69108689 D1 DE 69108689D1
Authority
DE
Germany
Prior art keywords
silicon wafers
cleaning silicon
cleaning
wafers
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69108689T
Other languages
English (en)
Other versions
DE69108689T2 (de
Inventor
Shigeyoshi Netsu
Masaki Kameya
Yasuyuki Harada
Hiroshi Amano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pre Tech Co Ltd
Shin Etsu Handotai Co Ltd
Original Assignee
Pre Tech Co Ltd
Shin Etsu Handotai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2402400A external-priority patent/JP2680933B2/ja
Application filed by Pre Tech Co Ltd, Shin Etsu Handotai Co Ltd filed Critical Pre Tech Co Ltd
Application granted granted Critical
Publication of DE69108689D1 publication Critical patent/DE69108689D1/de
Publication of DE69108689T2 publication Critical patent/DE69108689T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
DE69108689T 1990-12-14 1991-12-13 Vorrichtung zum Reinigen von Siliciumscheiben. Expired - Lifetime DE69108689T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2402400A JP2680933B2 (ja) 1990-12-14 1990-12-14 シリコンウェハの洗浄方法及びその洗浄装置
JP30291791 1991-11-19

Publications (2)

Publication Number Publication Date
DE69108689D1 true DE69108689D1 (de) 1995-05-11
DE69108689T2 DE69108689T2 (de) 1995-09-07

Family

ID=26563315

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69108689T Expired - Lifetime DE69108689T2 (de) 1990-12-14 1991-12-13 Vorrichtung zum Reinigen von Siliciumscheiben.

Country Status (3)

Country Link
US (1) US5186192A (de)
EP (1) EP0490405B1 (de)
DE (1) DE69108689T2 (de)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5383483A (en) * 1992-10-14 1995-01-24 Shibano; Yoshihide Ultrasonic cleaning and deburring apparatus
US5449502A (en) * 1992-12-30 1995-09-12 Sanden Corp. Sterilizing apparatus utilizing ultrasonic vibration
JP2912538B2 (ja) * 1993-12-08 1999-06-28 大日本スクリーン製造株式会社 浸漬型基板処理装置
US5772784A (en) * 1994-11-14 1998-06-30 Yieldup International Ultra-low particle semiconductor cleaner
US5958146A (en) * 1994-11-14 1999-09-28 Yieldup International Ultra-low particle semiconductor cleaner using heated fluids
US5849104A (en) * 1996-09-19 1998-12-15 Yieldup International Method and apparatus for cleaning wafers using multiple tanks
JP3200528B2 (ja) * 1995-01-19 2001-08-20 三菱電機株式会社 ドライエッチングの後処理方法
US6006736A (en) * 1995-07-12 1999-12-28 Memc Electronic Materials, Inc. Method and apparatus for washing silicon ingot with water to remove particulate matter
JPH0936080A (ja) * 1995-07-13 1997-02-07 Toray Eng Co Ltd 加工済シリコンインゴットの洗浄方法
JPH0969509A (ja) * 1995-09-01 1997-03-11 Matsushita Electron Corp 半導体ウェーハの洗浄・エッチング・乾燥装置及びその使用方法
EP0782177A3 (de) * 1995-12-28 1997-07-30 Texas Instruments Incorporated Verbesserungen bezüglich Halbleiter
TW363903B (en) * 1996-03-11 1999-07-11 Memc Electronic Materials Spa Apparatus for use in automatically cleaning semiconductor wafers and methods for drying a semiconductor wafer in the automatic drying machine
US6050275A (en) * 1996-09-27 2000-04-18 Tokyo Electron Limited Apparatus for and method of cleaning objects to be processed
US6413355B1 (en) * 1996-09-27 2002-07-02 Tokyo Electron Limited Apparatus for and method of cleaning objects to be processed
JPH10216660A (ja) * 1997-01-31 1998-08-18 Tokyo Seimitsu Co Ltd 洗浄装置
US6350322B1 (en) * 1997-03-21 2002-02-26 Micron Technology, Inc. Method of reducing water spotting and oxide growth on a semiconductor structure
JP3676912B2 (ja) * 1997-08-07 2005-07-27 株式会社ルネサステクノロジ 半導体製造装置およびその異物除去方法
US5937878A (en) * 1997-12-18 1999-08-17 Vanguard International Semiconductor Corporation Apparatus for removing particles from a wafer and for cleaning the wafer
US6047717A (en) * 1998-04-29 2000-04-11 Scd Mountain View, Inc. Mandrel device and method for hard disks
US6168961B1 (en) 1998-05-21 2001-01-02 Memc Electronic Materials, Inc. Process for the preparation of epitaxial wafers for resistivity measurements
US6328814B1 (en) 1999-03-26 2001-12-11 Applied Materials, Inc. Apparatus for cleaning and drying substrates
TW499696B (en) * 1999-04-27 2002-08-21 Tokyo Electron Ltd Processing apparatus and processing method
JP2003517917A (ja) * 1999-10-12 2003-06-03 ゲイリー ダブリュー ファレル 制御された噴霧質およびガス質を用いた物体乾燥洗浄処理の改良
US6203623B1 (en) * 1999-12-28 2001-03-20 Ball Semiconductor, Inc. Aerosol assisted chemical cleaning method
TW434668B (en) * 2000-01-27 2001-05-16 Ind Tech Res Inst Wafer rinse apparatus and rinse method of the same
US6951221B2 (en) * 2000-09-22 2005-10-04 Dainippon Screen Mfg. Co., Ltd. Substrate processing apparatus
US7513062B2 (en) * 2001-11-02 2009-04-07 Applied Materials, Inc. Single wafer dryer and drying methods
CN101414547B (zh) * 2001-11-02 2012-02-08 应用材料公司 清洗微电子器件的方法
JP2006310767A (ja) * 2005-03-28 2006-11-09 Dainippon Screen Mfg Co Ltd 基板処理装置
DE102007060854A1 (de) * 2007-12-18 2009-06-25 BSH Bosch und Siemens Hausgeräte GmbH Reinigungsvorrichtung für ein mit Flusen beladenes Bauteil in einem Hausgerät sowie Hausgerät und Verfahren zum Reinigen eines mit Flusen beladenen Bauteils
CN102698983A (zh) * 2012-05-08 2012-10-03 常州天合光能有限公司 一种太阳能级硅片的清洗方法
CN104091776B (zh) * 2014-07-25 2017-12-08 上海华力微电子有限公司 一种消除连接孔刻蚀副产物凝结缺陷的晶圆净化设备
CN104078398A (zh) * 2014-07-25 2014-10-01 上海华力微电子有限公司 一种改善刻蚀副产物凝结缺陷的晶圆净化腔
CN107799446B (zh) * 2017-11-14 2023-07-14 扬州扬杰电子科技股份有限公司 一种芯片势垒前的清洗装置
CN109201608A (zh) * 2018-10-09 2019-01-15 无锡亚电智能装备有限公司 一种晶圆高效清洗装置以及清洗方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE346129B (de) * 1970-12-10 1972-06-26 Nordnero Ab
JPS6014244A (ja) * 1983-07-06 1985-01-24 Fujitsu Ltd マスク洗浄装置
US4736758A (en) * 1985-04-15 1988-04-12 Wacom Co., Ltd. Vapor drying apparatus
FR2601890B1 (fr) * 1986-07-25 1989-04-21 Renault Dispositif de controle de la proprete de pieces
DE3815018A1 (de) * 1987-05-06 1988-12-01 Dan Science Co Traegerreinigungs- und -trocknungsvorrichtung
JP2653511B2 (ja) * 1989-03-30 1997-09-17 株式会社東芝 半導体装置の洗浄方法及びその洗浄装置
US4983223A (en) * 1989-10-24 1991-01-08 Chenpatents Apparatus and method for reducing solvent vapor losses
US5027841A (en) * 1990-04-24 1991-07-02 Electronic Controls Design, Inc. Apparatus to clean printed circuit boards
US5069235A (en) * 1990-08-02 1991-12-03 Bold Plastics, Inc. Apparatus for cleaning and rinsing wafers

Also Published As

Publication number Publication date
US5186192A (en) 1993-02-16
DE69108689T2 (de) 1995-09-07
EP0490405B1 (de) 1995-04-05
EP0490405A1 (de) 1992-06-17

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition