DE68922798D1 - Montierverfahren. - Google Patents
Montierverfahren.Info
- Publication number
- DE68922798D1 DE68922798D1 DE68922798T DE68922798T DE68922798D1 DE 68922798 D1 DE68922798 D1 DE 68922798D1 DE 68922798 T DE68922798 T DE 68922798T DE 68922798 T DE68922798 T DE 68922798T DE 68922798 D1 DE68922798 D1 DE 68922798D1
- Authority
- DE
- Germany
- Prior art keywords
- assembly process
- assembly
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
-
- G—PHYSICS
- G12—INSTRUMENT DETAILS
- G12B—CONSTRUCTIONAL DETAILS OF INSTRUMENTS, OR COMPARABLE DETAILS OF OTHER APPARATUS, NOT OTHERWISE PROVIDED FOR
- G12B5/00—Adjusting position or attitude, e.g. level, of instruments or other apparatus, or of parts thereof; Compensating for the effects of tilting or acceleration, e.g. for optical apparatus
Landscapes
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63192193A JP2660553B2 (ja) | 1988-08-02 | 1988-08-02 | 機器取付方法 |
JP63246314A JP2774527B2 (ja) | 1988-09-30 | 1988-09-30 | 減圧装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE68922798D1 true DE68922798D1 (de) | 1995-06-29 |
DE68922798T2 DE68922798T2 (de) | 1995-11-16 |
Family
ID=26507168
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE68922798T Expired - Fee Related DE68922798T2 (de) | 1988-08-02 | 1989-07-31 | Montierverfahren. |
Country Status (3)
Country | Link |
---|---|
US (1) | US5687947A (de) |
EP (1) | EP0353980B1 (de) |
DE (1) | DE68922798T2 (de) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3200282B2 (ja) * | 1993-07-21 | 2001-08-20 | キヤノン株式会社 | 処理システム及びこれを用いたデバイス製造方法 |
JP3745167B2 (ja) * | 1998-07-29 | 2006-02-15 | キヤノン株式会社 | ステージ装置、露光装置およびデバイス製造方法ならびにステージ駆動方法 |
US6754828B1 (en) * | 1999-07-13 | 2004-06-22 | Intel Corporation | Algorithm for non-volatile memory updates |
US7384228B2 (en) * | 2004-05-24 | 2008-06-10 | Asml Netherlands B.V. | Insertion device, lithographic apparatus with said insertion device and device manufacturing method |
JP5315100B2 (ja) * | 2009-03-18 | 2013-10-16 | 株式会社ニューフレアテクノロジー | 描画装置 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2565807A (en) * | 1939-12-04 | 1951-08-28 | Barr & Stroud Ltd | Antivibration supporting arrangement for optical instruments of the telescope type |
US4106740A (en) * | 1977-03-28 | 1978-08-15 | Westinghouse Electric Corp. | Airborne vibration isolated sensor apparatus |
US4135688A (en) * | 1977-05-26 | 1979-01-23 | Westinghouse Electric Corp. | Anti-tilting resilient support system for aimed airborne pod-enclosed sensor instruments |
US4185202A (en) * | 1977-12-05 | 1980-01-22 | Bell Telephone Laboratories, Incorporated | X-ray lithography |
JPS595179B2 (ja) * | 1979-05-18 | 1984-02-03 | 富士通株式会社 | 真空機器の防振構造 |
DE3070953D1 (en) * | 1979-10-11 | 1985-09-12 | Eaton Optimetrix Inc | Improved shock and vibration isolation system |
JPS58137633A (ja) * | 1982-02-12 | 1983-08-16 | Matsushita Electric Ind Co Ltd | 圧縮機の支持装置 |
ATE30960T1 (de) * | 1983-08-09 | 1987-12-15 | Siemens Ag | Justier- oder positioniertisch und verfahren zu dessen herstellung. |
GB2155201B (en) * | 1984-02-24 | 1988-07-13 | Canon Kk | An x-ray exposure apparatus |
US4803712A (en) * | 1987-01-20 | 1989-02-07 | Hitachi, Ltd. | X-ray exposure system |
-
1989
- 1989-07-31 DE DE68922798T patent/DE68922798T2/de not_active Expired - Fee Related
- 1989-07-31 EP EP89307779A patent/EP0353980B1/de not_active Expired - Lifetime
-
1995
- 1995-04-17 US US08/422,932 patent/US5687947A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE68922798T2 (de) | 1995-11-16 |
EP0353980A3 (en) | 1990-03-28 |
EP0353980B1 (de) | 1995-05-24 |
US5687947A (en) | 1997-11-18 |
EP0353980A2 (de) | 1990-02-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |