DE60303857D1 - Korrektion der Ungleichmässigkeit durch die Neigungswinkelabweichung des Abbildungskopfes - Google Patents

Korrektion der Ungleichmässigkeit durch die Neigungswinkelabweichung des Abbildungskopfes

Info

Publication number
DE60303857D1
DE60303857D1 DE60303857T DE60303857T DE60303857D1 DE 60303857 D1 DE60303857 D1 DE 60303857D1 DE 60303857 T DE60303857 T DE 60303857T DE 60303857 T DE60303857 T DE 60303857T DE 60303857 D1 DE60303857 D1 DE 60303857D1
Authority
DE
Germany
Prior art keywords
correction
inclination angle
angle deviation
unevenness due
imaging head
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60303857T
Other languages
English (en)
Other versions
DE60303857T2 (de
Inventor
Daisuke Nakaya
Takao Ozaki
Hiromi Ishikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE60303857D1 publication Critical patent/DE60303857D1/de
Application granted granted Critical
Publication of DE60303857T2 publication Critical patent/DE60303857T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/485Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by the process of building-up characters or image elements applicable to two or more kinds of printing or marking processes
    • B41J2/505Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by the process of building-up characters or image elements applicable to two or more kinds of printing or marking processes from an assembly of identical printing elements
    • B41J2/5056Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by the process of building-up characters or image elements applicable to two or more kinds of printing or marking processes from an assembly of identical printing elements using dot arrays providing selective dot disposition modes, e.g. different dot densities for high speed and high-quality printing, array line selections for multi-pass printing, or dot shifts for character inclination
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/435Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
    • B41J2/447Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using arrays of radiation sources
    • B41J2/46Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using arrays of radiation sources characterised by using glass fibres
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/435Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
    • B41J2/465Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using masks, e.g. light-switching masks
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J25/00Actions or mechanisms not otherwise provided for
    • B41J25/001Mechanisms for bodily moving print heads or carriages parallel to the paper surface
    • B41J25/003Mechanisms for bodily moving print heads or carriages parallel to the paper surface for changing the angle between a print element array axis and the printing line, e.g. for dot density changes
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06KGRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
    • G06K15/00Arrangements for producing a permanent visual presentation of the output data, e.g. computer output printers
    • G06K15/02Arrangements for producing a permanent visual presentation of the output data, e.g. computer output printers using printers
    • G06K15/12Arrangements for producing a permanent visual presentation of the output data, e.g. computer output printers using printers by photographic printing, e.g. by laser printers
    • G06K15/1238Arrangements for producing a permanent visual presentation of the output data, e.g. computer output printers using printers by photographic printing, e.g. by laser printers simultaneously exposing more than one point

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Quality & Reliability (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)
  • Facsimile Scanning Arrangements (AREA)
  • Fax Reproducing Arrangements (AREA)
DE60303857T 2002-12-02 2003-12-01 Korrektion der Ungleichmäßigkeit durch die Neigungswinkelabweichung des Abbildungskopfes Expired - Lifetime DE60303857T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002349961A JP4150250B2 (ja) 2002-12-02 2002-12-02 描画ヘッド、描画装置及び描画方法
JP2002349961 2002-12-02

Publications (2)

Publication Number Publication Date
DE60303857D1 true DE60303857D1 (de) 2006-05-04
DE60303857T2 DE60303857T2 (de) 2006-08-17

Family

ID=32310682

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60303857T Expired - Lifetime DE60303857T2 (de) 2002-12-02 2003-12-01 Korrektion der Ungleichmäßigkeit durch die Neigungswinkelabweichung des Abbildungskopfes

Country Status (7)

Country Link
US (2) US6980348B2 (de)
EP (1) EP1426190B1 (de)
JP (1) JP4150250B2 (de)
KR (1) KR100986218B1 (de)
CN (2) CN1827383A (de)
DE (1) DE60303857T2 (de)
TW (1) TWI231700B (de)

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JP4150250B2 (ja) * 2002-12-02 2008-09-17 富士フイルム株式会社 描画ヘッド、描画装置及び描画方法
US7417782B2 (en) 2005-02-23 2008-08-26 Pixtronix, Incorporated Methods and apparatus for spatial light modulation
JP2005022247A (ja) * 2003-07-02 2005-01-27 Fuji Photo Film Co Ltd 画像記録方法及び画像記録装置
JP4373731B2 (ja) * 2003-07-22 2009-11-25 富士フイルム株式会社 描画装置及び描画方法
JP4823581B2 (ja) * 2004-06-17 2011-11-24 富士フイルム株式会社 描画装置および描画方法
JP4601482B2 (ja) 2004-07-29 2010-12-22 新光電気工業株式会社 描画装置および描画方法
JP4532200B2 (ja) * 2004-08-10 2010-08-25 株式会社オーク製作所 描画装置
JP4532202B2 (ja) * 2004-08-11 2010-08-25 株式会社オーク製作所 描画装置
US7755582B2 (en) 2005-02-23 2010-07-13 Pixtronix, Incorporated Display methods and apparatus
US8159428B2 (en) 2005-02-23 2012-04-17 Pixtronix, Inc. Display methods and apparatus
US8310442B2 (en) 2005-02-23 2012-11-13 Pixtronix, Inc. Circuits for controlling display apparatus
US7746529B2 (en) 2005-02-23 2010-06-29 Pixtronix, Inc. MEMS display apparatus
US9229222B2 (en) 2005-02-23 2016-01-05 Pixtronix, Inc. Alignment methods in fluid-filled MEMS displays
US7742016B2 (en) 2005-02-23 2010-06-22 Pixtronix, Incorporated Display methods and apparatus
CN101151207B (zh) * 2005-02-23 2012-01-04 皮克斯特罗尼克斯公司 显示装置和形成图像的方法
US8519945B2 (en) 2006-01-06 2013-08-27 Pixtronix, Inc. Circuits for controlling display apparatus
US9261694B2 (en) 2005-02-23 2016-02-16 Pixtronix, Inc. Display apparatus and methods for manufacture thereof
US7999994B2 (en) 2005-02-23 2011-08-16 Pixtronix, Inc. Display apparatus and methods for manufacture thereof
US20070205969A1 (en) 2005-02-23 2007-09-06 Pixtronix, Incorporated Direct-view MEMS display devices and methods for generating images thereon
US7675665B2 (en) 2005-02-23 2010-03-09 Pixtronix, Incorporated Methods and apparatus for actuating displays
US9158106B2 (en) 2005-02-23 2015-10-13 Pixtronix, Inc. Display methods and apparatus
US9082353B2 (en) 2010-01-05 2015-07-14 Pixtronix, Inc. Circuits for controlling display apparatus
US8482496B2 (en) 2006-01-06 2013-07-09 Pixtronix, Inc. Circuits for controlling MEMS display apparatus on a transparent substrate
JP2006284842A (ja) * 2005-03-31 2006-10-19 Fuji Photo Film Co Ltd パターン形成方法
JP4606949B2 (ja) * 2005-03-31 2011-01-05 富士フイルム株式会社 描画装置および描画方法
EP1872174A2 (de) * 2005-04-02 2008-01-02 Punch Graphix Prepress Germany GmbH Belichtungsvorrichtung für druckplatten
JP2006337601A (ja) * 2005-05-31 2006-12-14 Fujifilm Holdings Corp 描画装置及び描画方法
JP2007003661A (ja) * 2005-06-22 2007-01-11 Fujifilm Holdings Corp パターン形成方法
JP2007010785A (ja) * 2005-06-28 2007-01-18 Fujifilm Holdings Corp 永久パターン形成方法
JP2007024969A (ja) * 2005-07-12 2007-02-01 Fujifilm Holdings Corp セル内構造の製造方法及びセル内構造並びに表示装置
JP2007078894A (ja) * 2005-09-12 2007-03-29 Fujifilm Corp 感光性組成物、パターン形成材料、感光性積層体、並びにパターン形成装置及びパターン形成方法
US8526096B2 (en) 2006-02-23 2013-09-03 Pixtronix, Inc. Mechanical light modulators with stressed beams
JP4948867B2 (ja) * 2006-03-27 2012-06-06 富士フイルム株式会社 描画状態調整方法及び装置
JP4948866B2 (ja) * 2006-03-27 2012-06-06 富士フイルム株式会社 描画状態調整方法及び装置
US7876489B2 (en) 2006-06-05 2011-01-25 Pixtronix, Inc. Display apparatus with optical cavities
DE102006029088A1 (de) 2006-06-24 2007-12-27 Man Roland Druckmaschinen Ag Verfahren zum Bedrucken eines Bedruckstoffs
WO2008051362A1 (en) 2006-10-20 2008-05-02 Pixtronix, Inc. Light guides and backlight systems incorporating light redirectors at varying densities
US9176318B2 (en) 2007-05-18 2015-11-03 Pixtronix, Inc. Methods for manufacturing fluid-filled MEMS displays
US7852546B2 (en) 2007-10-19 2010-12-14 Pixtronix, Inc. Spacers for maintaining display apparatus alignment
JP5253916B2 (ja) * 2008-03-10 2013-07-31 株式会社ジャパンディスプレイイースト マスクレス露光方法
US8248560B2 (en) 2008-04-18 2012-08-21 Pixtronix, Inc. Light guides and backlight systems incorporating prismatic structures and light redirectors
KR20100042864A (ko) * 2008-10-17 2010-04-27 삼성전자주식회사 노광장치 및 그 진직도 측정방법
US8169679B2 (en) 2008-10-27 2012-05-01 Pixtronix, Inc. MEMS anchors
BR112012019383A2 (pt) 2010-02-02 2017-09-12 Pixtronix Inc Circuitos para controlar aparelho de exibição
JP2013519121A (ja) 2010-02-02 2013-05-23 ピクストロニックス・インコーポレーテッド 低温封孔流体充填ディスプレイ装置を製造するための方法
GB2483625A (en) * 2010-02-17 2012-03-21 Cambridge Display Tech Ltd Printing an array of channels on a substrate
JP2012049433A (ja) * 2010-08-30 2012-03-08 Orc Mfg Co Ltd 露光装置
EP2471666B1 (de) * 2010-12-30 2012-09-12 ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung Markierungsvorrichtung und Verfahren zum Betreiben einer Markierungsvorrichtung
US10149390B2 (en) 2012-08-27 2018-12-04 Mycronic AB Maskless writing of a workpiece using a plurality of exposures having different focal planes using multiple DMDs
US9134552B2 (en) 2013-03-13 2015-09-15 Pixtronix, Inc. Display apparatus with narrow gap electrostatic actuators
US9446586B2 (en) * 2013-08-09 2016-09-20 The Procter & Gamble Company Systems and methods for image distortion reduction in web printing
KR102151254B1 (ko) * 2013-08-19 2020-09-03 삼성디스플레이 주식회사 노광장치 및 그 방법
CN112764324B (zh) * 2021-01-07 2022-08-23 江苏迪盛智能科技有限公司 光刻***的扫描方法和光刻***

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JPH08314150A (ja) * 1995-05-19 1996-11-29 Dainippon Screen Mfg Co Ltd 画像記録装置
JPH1039241A (ja) 1996-07-19 1998-02-13 Konica Corp レーザ記録装置
US6312134B1 (en) * 1996-07-25 2001-11-06 Anvik Corporation Seamless, maskless lithography system using spatial light modulator
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Also Published As

Publication number Publication date
JP4150250B2 (ja) 2008-09-17
EP1426190A1 (de) 2004-06-09
TW200414748A (en) 2004-08-01
KR100986218B1 (ko) 2010-10-07
US20040109216A1 (en) 2004-06-10
KR20040048298A (ko) 2004-06-07
CN1827383A (zh) 2006-09-06
US20060055998A1 (en) 2006-03-16
CN1251878C (zh) 2006-04-19
JP2004181723A (ja) 2004-07-02
TWI231700B (en) 2005-04-21
US6980348B2 (en) 2005-12-27
DE60303857T2 (de) 2006-08-17
CN1510904A (zh) 2004-07-07
EP1426190B1 (de) 2006-03-08
US7212327B2 (en) 2007-05-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP