DE60224777D1 - Quarzglasblock, synthetisches Quarzglas und Verfahren zu dessen Herstellung - Google Patents

Quarzglasblock, synthetisches Quarzglas und Verfahren zu dessen Herstellung

Info

Publication number
DE60224777D1
DE60224777D1 DE60224777T DE60224777T DE60224777D1 DE 60224777 D1 DE60224777 D1 DE 60224777D1 DE 60224777 T DE60224777 T DE 60224777T DE 60224777 T DE60224777 T DE 60224777T DE 60224777 D1 DE60224777 D1 DE 60224777D1
Authority
DE
Germany
Prior art keywords
quartz glass
production
block
synthetic
synthetic quartz
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60224777T
Other languages
English (en)
Other versions
DE60224777T2 (de
Inventor
Hisatoshi Otsuka
Kazuo Shirota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Application granted granted Critical
Publication of DE60224777D1 publication Critical patent/DE60224777D1/de
Publication of DE60224777T2 publication Critical patent/DE60224777T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1469—Means for changing or stabilising the shape or form of the shaped article or deposit
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00—Compositions for glass with special properties
    • C03C4/0071—Compositions for glass with special properties for laserable glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00—Compositions for glass with special properties
    • C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/32—Non-halide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/36—Fuel or oxidant details, e.g. flow rate, flow rate ratio, fuel additives
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment
    • C03C2203/52—Heat-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Optics & Photonics (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Glass Compositions (AREA)
DE60224777T 2001-12-11 2002-12-11 Quarzglasblock, synthetisches Quarzglas und Verfahren zu dessen Herstellung Expired - Lifetime DE60224777T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001376641A JP4158009B2 (ja) 2001-12-11 2001-12-11 合成石英ガラスインゴット及び合成石英ガラスの製造方法
JP2001376641 2001-12-11

Publications (2)

Publication Number Publication Date
DE60224777D1 true DE60224777D1 (de) 2008-03-13
DE60224777T2 DE60224777T2 (de) 2009-01-15

Family

ID=19184790

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60224777T Expired - Lifetime DE60224777T2 (de) 2001-12-11 2002-12-11 Quarzglasblock, synthetisches Quarzglas und Verfahren zu dessen Herstellung

Country Status (4)

Country Link
US (1) US7232778B2 (de)
EP (1) EP1329429B1 (de)
JP (1) JP4158009B2 (de)
DE (1) DE60224777T2 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1319637A3 (de) * 2001-12-11 2004-01-28 Shin-Etsu Chemical Co., Ltd. Ein Rohling aus Quarzglas
JP2004284886A (ja) * 2003-03-24 2004-10-14 Shin Etsu Chem Co Ltd 合成石英ガラス製造用バーナー
US20050132749A1 (en) * 2003-12-05 2005-06-23 Shin-Etsu Chmeical Co., Ltd. Burner and method for the manufacture of synthetic quartz glass
JP4826118B2 (ja) * 2005-03-29 2011-11-30 旭硝子株式会社 合成石英ガラスの製造方法及び光学部材用合成石英ガラス
JP4569779B2 (ja) 2006-09-07 2010-10-27 信越化学工業株式会社 合成石英ガラスインゴット及び合成石英ガラス部材の製造方法
JP4697162B2 (ja) * 2007-03-16 2011-06-08 セイコーエプソン株式会社 表面処理装置及び方法
WO2011145634A1 (en) 2010-05-21 2011-11-24 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
DE102011119374A1 (de) * 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas
DE102011119373A1 (de) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas
DE102011119339A1 (de) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Zerstäubungsverfahren zur Herstellung von synthetischem Quarzglas
DE102011119341A1 (de) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas nach der Sootmethode
JP6650820B2 (ja) 2016-04-19 2020-02-19 株式会社フジクラ ガラスインゴットの製造方法
WO2018162938A1 (en) 2017-03-10 2018-09-13 Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V. Methods and system for labeling and detecting a clone-resistant physical unit
EP3643688B1 (de) * 2018-10-26 2022-12-14 Heraeus Quarzglas GmbH & Co. KG Verfahren zur homogenisierung von glas
EP3643687B1 (de) * 2018-10-26 2022-11-30 Heraeus Quarzglas GmbH & Co. KG Verfahren und vorrichtung zur homogenisierung von glas

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0450258Y2 (de) * 1987-07-31 1992-11-26
JP2588447B2 (ja) 1991-06-29 1997-03-05 信越石英株式会社 エキシマレーザー用石英ガラス部材の製造方法
JP3007510B2 (ja) 1993-04-27 2000-02-07 信越化学工業株式会社 合成石英ガラス部材の製造方法
JP3064857B2 (ja) * 1995-03-28 2000-07-12 株式会社ニコン 光リソグラフィー用光学部材および合成石英ガラスの製造方法
US6094941A (en) * 1995-06-06 2000-08-01 Shin-Etsu Quartz Products Co., Ltd. Process for manufacturing optical member for excimer laser
JP3841435B2 (ja) * 1995-09-12 2006-11-01 コーニング インコーポレイテッド 溶融シリカガラスを製造するためのブール振動パターン
DE69806672T2 (de) * 1997-04-08 2003-03-20 Shin-Etsu Chemical Co., Ltd. Optisches synthetisches Quarzglas, Herstellungsverfahren davon, und optisches Element für Excimer-Laser mit dem synthetischen Quarzglas
JP2000143258A (ja) * 1998-09-10 2000-05-23 Shinetsu Quartz Prod Co Ltd ＡｒＦエキシマレ―ザ―リソグラフィ―用合成石英ガラスの製造方法
JP4601022B2 (ja) 1999-03-04 2010-12-22 信越石英株式会社 ＡｒＦエキシマレーザーリソグラフィー用合成石英ガラス部材
JP2001010833A (ja) 1999-06-21 2001-01-16 Nikon Corp 石英ガラス部材
JP2001019465A (ja) 1999-07-07 2001-01-23 Shin Etsu Chem Co Ltd エキシマレーザ用合成石英ガラス部材及びその製造方法
US6776006B2 (en) * 2000-10-13 2004-08-17 Corning Incorporated Method to avoid striae in EUV lithography mirrors
EP1319637A3 (de) * 2001-12-11 2004-01-28 Shin-Etsu Chemical Co., Ltd. Ein Rohling aus Quarzglas

Also Published As

Publication number Publication date
EP1329429B1 (de) 2008-01-23
DE60224777T2 (de) 2009-01-15
JP2003176142A (ja) 2003-06-24
US7232778B2 (en) 2007-06-19
EP1329429A1 (de) 2003-07-23
US20030126889A1 (en) 2003-07-10
JP4158009B2 (ja) 2008-10-01

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Legal Events

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