DE60224777D1 - Quarzglasblock, synthetisches Quarzglas und Verfahren zu dessen Herstellung - Google Patents
Quarzglasblock, synthetisches Quarzglas und Verfahren zu dessen HerstellungInfo
- Publication number
- DE60224777D1 DE60224777D1 DE60224777T DE60224777T DE60224777D1 DE 60224777 D1 DE60224777 D1 DE 60224777D1 DE 60224777 T DE60224777 T DE 60224777T DE 60224777 T DE60224777 T DE 60224777T DE 60224777 D1 DE60224777 D1 DE 60224777D1
- Authority
- DE
- Germany
- Prior art keywords
- quartz glass
- production
- block
- synthetic
- synthetic quartz
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1469—Means for changing or stabilising the shape or form of the shaped article or deposit
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/0071—Compositions for glass with special properties for laserable glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
- C03B2207/32—Non-halide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/36—Fuel or oxidant details, e.g. flow rate, flow rate ratio, fuel additives
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/40—Gas-phase processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/50—After-treatment
- C03C2203/52—Heat-treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Geochemistry & Mineralogy (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Optics & Photonics (AREA)
- Glass Melting And Manufacturing (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001376641A JP4158009B2 (ja) | 2001-12-11 | 2001-12-11 | 合成石英ガラスインゴット及び合成石英ガラスの製造方法 |
JP2001376641 | 2001-12-11 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60224777D1 true DE60224777D1 (de) | 2008-03-13 |
DE60224777T2 DE60224777T2 (de) | 2009-01-15 |
Family
ID=19184790
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60224777T Expired - Lifetime DE60224777T2 (de) | 2001-12-11 | 2002-12-11 | Quarzglasblock, synthetisches Quarzglas und Verfahren zu dessen Herstellung |
Country Status (4)
Country | Link |
---|---|
US (1) | US7232778B2 (de) |
EP (1) | EP1329429B1 (de) |
JP (1) | JP4158009B2 (de) |
DE (1) | DE60224777T2 (de) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1319637A3 (de) * | 2001-12-11 | 2004-01-28 | Shin-Etsu Chemical Co., Ltd. | Ein Rohling aus Quarzglas |
JP2004284886A (ja) * | 2003-03-24 | 2004-10-14 | Shin Etsu Chem Co Ltd | 合成石英ガラス製造用バーナー |
US20050132749A1 (en) * | 2003-12-05 | 2005-06-23 | Shin-Etsu Chmeical Co., Ltd. | Burner and method for the manufacture of synthetic quartz glass |
JP4826118B2 (ja) * | 2005-03-29 | 2011-11-30 | 旭硝子株式会社 | 合成石英ガラスの製造方法及び光学部材用合成石英ガラス |
JP4569779B2 (ja) | 2006-09-07 | 2010-10-27 | 信越化学工業株式会社 | 合成石英ガラスインゴット及び合成石英ガラス部材の製造方法 |
JP4697162B2 (ja) * | 2007-03-16 | 2011-06-08 | セイコーエプソン株式会社 | 表面処理装置及び方法 |
WO2011145634A1 (en) | 2010-05-21 | 2011-11-24 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
DE102011119374A1 (de) * | 2011-11-25 | 2013-05-29 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von synthetischem Quarzglas |
DE102011119373A1 (de) | 2011-11-25 | 2013-05-29 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von synthetischem Quarzglas |
DE102011119339A1 (de) | 2011-11-25 | 2013-05-29 | Heraeus Quarzglas Gmbh & Co. Kg | Zerstäubungsverfahren zur Herstellung von synthetischem Quarzglas |
DE102011119341A1 (de) | 2011-11-25 | 2013-05-29 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von synthetischem Quarzglas nach der Sootmethode |
JP6650820B2 (ja) | 2016-04-19 | 2020-02-19 | 株式会社フジクラ | ガラスインゴットの製造方法 |
WO2018162938A1 (en) | 2017-03-10 | 2018-09-13 | Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V. | Methods and system for labeling and detecting a clone-resistant physical unit |
EP3643688B1 (de) * | 2018-10-26 | 2022-12-14 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur homogenisierung von glas |
EP3643687B1 (de) * | 2018-10-26 | 2022-11-30 | Heraeus Quarzglas GmbH & Co. KG | Verfahren und vorrichtung zur homogenisierung von glas |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0450258Y2 (de) * | 1987-07-31 | 1992-11-26 | ||
JP2588447B2 (ja) | 1991-06-29 | 1997-03-05 | 信越石英株式会社 | エキシマレーザー用石英ガラス部材の製造方法 |
JP3007510B2 (ja) | 1993-04-27 | 2000-02-07 | 信越化学工業株式会社 | 合成石英ガラス部材の製造方法 |
JP3064857B2 (ja) * | 1995-03-28 | 2000-07-12 | 株式会社ニコン | 光リソグラフィー用光学部材および合成石英ガラスの製造方法 |
US6094941A (en) * | 1995-06-06 | 2000-08-01 | Shin-Etsu Quartz Products Co., Ltd. | Process for manufacturing optical member for excimer laser |
JP3841435B2 (ja) * | 1995-09-12 | 2006-11-01 | コーニング インコーポレイテッド | 溶融シリカガラスを製造するためのブール振動パターン |
DE69806672T2 (de) * | 1997-04-08 | 2003-03-20 | Shin-Etsu Chemical Co., Ltd. | Optisches synthetisches Quarzglas, Herstellungsverfahren davon, und optisches Element für Excimer-Laser mit dem synthetischen Quarzglas |
JP2000143258A (ja) * | 1998-09-10 | 2000-05-23 | Shinetsu Quartz Prod Co Ltd | ArFエキシマレ―ザ―リソグラフィ―用合成石英ガラスの製造方法 |
JP4601022B2 (ja) | 1999-03-04 | 2010-12-22 | 信越石英株式会社 | ArFエキシマレーザーリソグラフィー用合成石英ガラス部材 |
JP2001010833A (ja) | 1999-06-21 | 2001-01-16 | Nikon Corp | 石英ガラス部材 |
JP2001019465A (ja) | 1999-07-07 | 2001-01-23 | Shin Etsu Chem Co Ltd | エキシマレーザ用合成石英ガラス部材及びその製造方法 |
US6776006B2 (en) * | 2000-10-13 | 2004-08-17 | Corning Incorporated | Method to avoid striae in EUV lithography mirrors |
EP1319637A3 (de) * | 2001-12-11 | 2004-01-28 | Shin-Etsu Chemical Co., Ltd. | Ein Rohling aus Quarzglas |
-
2001
- 2001-12-11 JP JP2001376641A patent/JP4158009B2/ja not_active Expired - Lifetime
-
2002
- 2002-12-11 EP EP02258522A patent/EP1329429B1/de not_active Expired - Fee Related
- 2002-12-11 US US10/315,984 patent/US7232778B2/en not_active Expired - Lifetime
- 2002-12-11 DE DE60224777T patent/DE60224777T2/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP1329429B1 (de) | 2008-01-23 |
DE60224777T2 (de) | 2009-01-15 |
JP2003176142A (ja) | 2003-06-24 |
US7232778B2 (en) | 2007-06-19 |
EP1329429A1 (de) | 2003-07-23 |
US20030126889A1 (en) | 2003-07-10 |
JP4158009B2 (ja) | 2008-10-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |