DE60216039D1 - Piezoelektrischer Einkristall mit kontrollierter Domänenstruktur - Google Patents
Piezoelektrischer Einkristall mit kontrollierter DomänenstrukturInfo
- Publication number
- DE60216039D1 DE60216039D1 DE60216039T DE60216039T DE60216039D1 DE 60216039 D1 DE60216039 D1 DE 60216039D1 DE 60216039 T DE60216039 T DE 60216039T DE 60216039 T DE60216039 T DE 60216039T DE 60216039 D1 DE60216039 D1 DE 60216039D1
- Authority
- DE
- Germany
- Prior art keywords
- single crystal
- domain structure
- piezoelectric single
- controlled domain
- controlled
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000013078 crystal Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/85—Piezoelectric or electrostrictive active materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/85—Piezoelectric or electrostrictive active materials
- H10N30/853—Ceramic compositions
- H10N30/8548—Lead-based oxides
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/04—Treatments to modify a piezoelectric or electrostrictive property, e.g. polarisation characteristics, vibration characteristics or mode tuning
- H10N30/045—Treatments to modify a piezoelectric or electrostrictive property, e.g. polarisation characteristics, vibration characteristics or mode tuning by polarising
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Compositions Of Oxide Ceramics (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002083702 | 2002-03-25 | ||
JP2002083702A JP3987744B2 (ja) | 2002-03-25 | 2002-03-25 | ドメイン制御圧電単結晶素子 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60216039D1 true DE60216039D1 (de) | 2006-12-28 |
DE60216039T2 DE60216039T2 (de) | 2007-05-24 |
Family
ID=27800407
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE2002616039 Expired - Lifetime DE60216039T2 (de) | 2002-03-25 | 2002-09-25 | Piezoelektrischer Einkristall mit kontrollierter Domänenstruktur |
DE60228508T Expired - Lifetime DE60228508D1 (de) | 2002-03-25 | 2002-09-25 | Piezoelektrischer Einkristall mit Domänenkontrolle und dessen Herstellungsverfahren |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60228508T Expired - Lifetime DE60228508D1 (de) | 2002-03-25 | 2002-09-25 | Piezoelektrischer Einkristall mit Domänenkontrolle und dessen Herstellungsverfahren |
Country Status (7)
Country | Link |
---|---|
US (1) | US6756238B2 (de) |
EP (2) | EP1349220B1 (de) |
JP (1) | JP3987744B2 (de) |
KR (2) | KR100921301B1 (de) |
CN (1) | CN100385701C (de) |
DE (2) | DE60216039T2 (de) |
SG (1) | SG115497A1 (de) |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003065468A2 (de) * | 2002-02-01 | 2003-08-07 | Siemens Aktiengesellschaft | Verfahren zum vorbehandeln einer piezoelektrischen keramik und verfahren zum justieren eines einspritzventils |
KR100628812B1 (ko) * | 2003-05-21 | 2006-09-26 | 제이에프이 미네랄 가부시키가이샤 | 압전단결정 소자와 그 제조방법 |
JP4508725B2 (ja) * | 2003-05-21 | 2010-07-21 | Jfeミネラル株式会社 | 圧電単結晶素子とその製造方法 |
JP4373777B2 (ja) * | 2003-12-26 | 2009-11-25 | 敏夫 小川 | 圧電デバイス |
JP4568529B2 (ja) * | 2004-04-30 | 2010-10-27 | Jfeミネラル株式会社 | 圧電単結晶素子 |
JP4613032B2 (ja) | 2004-05-06 | 2011-01-12 | Jfeミネラル株式会社 | 圧電単結晶素子およびその製造方法 |
US7402938B2 (en) * | 2004-10-29 | 2008-07-22 | Jfe Mineral Co., Ltd. | Piezoelectric single crystal device |
JP5168439B2 (ja) * | 2005-07-29 | 2013-03-21 | セイコーエプソン株式会社 | 圧電素子、圧電アクチュエーター、インクジェット式記録ヘッド、およびインクジェットプリンター |
WO2007023985A1 (ja) | 2005-08-23 | 2007-03-01 | Canon Kabushiki Kaisha | 圧電体素子、それを用いた液体吐出ヘッド、および液体吐出装置 |
DE102005043037B4 (de) * | 2005-09-09 | 2009-04-09 | Siemens Ag | Vorrichtung mit piezoakustischem Resonatorelement, Verfahren zu dessen Herstellung und Verfahren zur Ausgabe eines Signals in Abhängigkeit einer Resonanzfrequenz |
JP5307986B2 (ja) * | 2007-05-07 | 2013-10-02 | 富士フイルム株式会社 | 圧電素子とその製造方法、及び液体吐出装置 |
JP5065763B2 (ja) * | 2007-05-18 | 2012-11-07 | Jfeミネラル株式会社 | 圧電単結晶素子 |
US8818193B2 (en) * | 2009-09-29 | 2014-08-26 | Finisar Corporation | Multichannel tunable optical dispersion compensator |
US8907546B2 (en) | 2010-08-10 | 2014-12-09 | Wesley S. Hackenberger | Temperature and field stable relaxor-PT piezoelectric single crystals |
US8987976B2 (en) * | 2011-09-23 | 2015-03-24 | Qualcomm Incorporated | Piezoelectric resonator having combined thickness and width vibrational modes |
KR101305271B1 (ko) * | 2012-03-22 | 2013-09-06 | 한국기계연구원 | 자기전기 복합체 |
JP6073600B2 (ja) * | 2012-08-28 | 2017-02-01 | 東芝メディカルシステムズ株式会社 | 超音波プローブおよび圧電振動子 |
JP6091951B2 (ja) * | 2013-03-25 | 2017-03-08 | 東芝メディカルシステムズ株式会社 | 圧電振動子、超音波プローブ、圧電振動子製造方法および超音波プローブ製造方法 |
CN103346253B (zh) * | 2013-06-08 | 2015-01-21 | 西安交通大学 | 铁电单晶/环氧2-2结构及应力板加固的2-2结构复合材料 |
JP6398060B2 (ja) * | 2013-12-27 | 2018-10-03 | アドバンストマテリアルテクノロジーズ株式会社 | 熱ポーリング方法、圧電体膜の製造方法、及び圧電特性の検査方法 |
CN105256376B (zh) * | 2015-11-18 | 2017-12-22 | 中国科学技术大学 | 一种控制铁电单晶电致形变取向的方法 |
CN107512910B (zh) * | 2016-06-16 | 2019-11-26 | 中国科学院福建物质结构研究所 | 一种三元弛豫铁电压电材料铌镥酸铅-铌镍酸铅-钛酸铅及其制备方法和应用 |
US11039814B2 (en) | 2016-12-04 | 2021-06-22 | Exo Imaging, Inc. | Imaging devices having piezoelectric transducers |
CN109037432B (zh) * | 2018-07-24 | 2022-05-13 | 歌尔微电子股份有限公司 | 压电元件变温极化装置及方法 |
WO2020068473A1 (en) | 2018-09-25 | 2020-04-02 | Exo Imaging, Inc. | Imaging devices with selectively alterable characteristics |
JP7406876B2 (ja) * | 2018-10-17 | 2023-12-28 | キヤノン株式会社 | 圧電トランス、および電子機器 |
JP7369504B2 (ja) * | 2019-09-27 | 2023-10-26 | テイカ株式会社 | 圧電単結晶素子の製造方法、超音波送受信素子の製造方法および超音波プローブの製造方法 |
CA3135281C (en) | 2020-03-05 | 2022-03-01 | Exo Imaging, Inc. | Ultrasonic imaging device with programmable anatomy and flow imaging |
CN111740005B (zh) * | 2020-06-17 | 2022-05-24 | 上海新硅聚合半导体有限公司 | 一种压电薄膜高温极化方法 |
US11545615B2 (en) * | 2020-09-09 | 2023-01-03 | Baker Hughes Oilfield Operations Llc | Method for manufacturing piezoelectric instrumentation devices with 3D structures using additive manufacturing |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3258111B2 (ja) | 1992-02-12 | 2002-02-18 | 株式会社東芝 | 超音波送受信素子、超音波プローブおよび超音波治療装置用送波器 |
US5295487A (en) * | 1992-02-12 | 1994-03-22 | Kabushiki Kaisha Toshiba | Ultrasonic probe |
JPH07240546A (ja) * | 1994-02-28 | 1995-09-12 | Toyota Central Res & Dev Lab Inc | 大変位用圧電セラミックスおよび圧電セラミックスの分極処理方法 |
JP2001106569A (ja) * | 1995-10-09 | 2001-04-17 | Ngk Insulators Ltd | 電界誘起歪み材料 |
JP2001509312A (ja) * | 1997-01-28 | 2001-07-10 | ザ ペンステート リサーチファウンデーション | 超音波変換器のためのリラクサー強誘電体単結晶 |
US6231779B1 (en) * | 1997-10-20 | 2001-05-15 | Massachusetts Institute Of Technology | Piezoelectric actuators and method of making same |
JP3345580B2 (ja) * | 1998-03-05 | 2002-11-18 | 株式会社東芝 | 超音波プローブの製造方法 |
US6491889B2 (en) * | 2000-04-03 | 2002-12-10 | Ibule Photonics Co., Ltd. | Ferroelectric single crystal wafer and process for the preparation thereof |
KR100384442B1 (ko) * | 2000-04-03 | 2003-05-22 | (주)아이블포토닉스 | 신규의 복합 금속 화합물 및 이의 제조방법 |
-
2002
- 2002-03-25 JP JP2002083702A patent/JP3987744B2/ja not_active Expired - Fee Related
- 2002-09-19 US US10/246,400 patent/US6756238B2/en not_active Expired - Lifetime
- 2002-09-24 SG SG200205771A patent/SG115497A1/en unknown
- 2002-09-24 KR KR20020057743A patent/KR100921301B1/ko active IP Right Grant
- 2002-09-25 DE DE2002616039 patent/DE60216039T2/de not_active Expired - Lifetime
- 2002-09-25 DE DE60228508T patent/DE60228508D1/de not_active Expired - Lifetime
- 2002-09-25 CN CNB021434298A patent/CN100385701C/zh not_active Expired - Fee Related
- 2002-09-25 EP EP20020256636 patent/EP1349220B1/de not_active Expired - Lifetime
- 2002-09-25 EP EP20060001261 patent/EP1655789B1/de not_active Expired - Fee Related
-
2009
- 2009-06-12 KR KR1020090052380A patent/KR100947156B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP1655789B1 (de) | 2008-08-20 |
DE60216039T2 (de) | 2007-05-24 |
EP1349220A2 (de) | 2003-10-01 |
EP1349220B1 (de) | 2006-11-15 |
EP1655789A1 (de) | 2006-05-10 |
US20030178914A1 (en) | 2003-09-25 |
KR100947156B1 (ko) | 2010-03-12 |
JP2003282986A (ja) | 2003-10-03 |
CN100385701C (zh) | 2008-04-30 |
DE60228508D1 (de) | 2008-10-02 |
SG115497A1 (en) | 2005-10-28 |
KR100921301B1 (ko) | 2009-10-09 |
EP1349220A3 (de) | 2005-04-13 |
US6756238B2 (en) | 2004-06-29 |
CN1447455A (zh) | 2003-10-08 |
KR20090081354A (ko) | 2009-07-28 |
JP3987744B2 (ja) | 2007-10-10 |
KR20030077924A (ko) | 2003-10-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |