DE60200719D1 - Filmbildende Zusammensetzung, poröser Film und deren Herstellung - Google Patents
Filmbildende Zusammensetzung, poröser Film und deren HerstellungInfo
- Publication number
- DE60200719D1 DE60200719D1 DE60200719T DE60200719T DE60200719D1 DE 60200719 D1 DE60200719 D1 DE 60200719D1 DE 60200719 T DE60200719 T DE 60200719T DE 60200719 T DE60200719 T DE 60200719T DE 60200719 D1 DE60200719 D1 DE 60200719D1
- Authority
- DE
- Germany
- Prior art keywords
- film
- production
- forming composition
- porous
- porous film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L43/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium or a metal; Compositions of derivatives of such polymers
- C08L43/04—Homopolymers or copolymers of monomers containing silicon
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2383/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
- C08J2383/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Formation Of Insulating Films (AREA)
- Paints Or Removers (AREA)
- Silicon Polymers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Polymerisation Methods In General (AREA)
- Graft Or Block Polymers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001006614 | 2001-01-15 | ||
JP2001006614A JP3654343B2 (ja) | 2001-01-15 | 2001-01-15 | 膜形成用組成物及びその製造方法、並びに多孔質膜の形成方法及び多孔質膜 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60200719D1 true DE60200719D1 (de) | 2004-08-19 |
DE60200719T2 DE60200719T2 (de) | 2005-08-04 |
Family
ID=18874473
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60200719T Expired - Fee Related DE60200719T2 (de) | 2001-01-15 | 2002-01-15 | Filmbildende Zusammensetzung, poröser Film und deren Herstellung |
Country Status (6)
Country | Link |
---|---|
US (1) | US6680107B2 (de) |
EP (1) | EP1223192B1 (de) |
JP (1) | JP3654343B2 (de) |
KR (1) | KR100570246B1 (de) |
DE (1) | DE60200719T2 (de) |
TW (1) | TW574319B (de) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002212502A (ja) * | 2001-01-15 | 2002-07-31 | Shin Etsu Chem Co Ltd | 膜形成用組成物、多孔質膜の形成方法及び多孔質膜 |
JP2003031566A (ja) | 2001-07-16 | 2003-01-31 | Fujitsu Ltd | 低誘電率絶縁膜形成用組成物、これを用いる絶縁膜形成方法、及びそれにより得られた絶縁膜を有する電子部品 |
GB0120134D0 (en) * | 2001-08-17 | 2001-10-10 | Nokia Corp | Improvements in or relating to communication networks and methods of distributing information around the network |
JP2003296922A (ja) * | 2002-04-02 | 2003-10-17 | Fuji Photo Film Co Ltd | 磁気記録媒体 |
JP2004161875A (ja) | 2002-11-13 | 2004-06-10 | Shin Etsu Chem Co Ltd | 多孔質膜形成用組成物、多孔質膜とその製造方法、層間絶縁間膜及び半導体装置 |
JP3884699B2 (ja) | 2002-11-13 | 2007-02-21 | 信越化学工業株式会社 | 多孔質膜形成用組成物、多孔質膜とその製造方法、層間絶縁膜及び半導体装置 |
JP2004161876A (ja) | 2002-11-13 | 2004-06-10 | Shin Etsu Chem Co Ltd | 多孔質膜形成用組成物、多孔質膜とその製造方法、層間絶縁膜及び半導体装置 |
JP4493278B2 (ja) * | 2003-02-20 | 2010-06-30 | 富士通株式会社 | 多孔性樹脂絶縁膜、電子装置及びそれらの製造方法 |
JP2004269693A (ja) | 2003-03-10 | 2004-09-30 | Shin Etsu Chem Co Ltd | 多孔質膜形成用組成物及びその製造方法、多孔質膜の製造方法、多孔質膜、層間絶縁膜、及び半導体装置 |
JP4139710B2 (ja) | 2003-03-10 | 2008-08-27 | 信越化学工業株式会社 | 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜、及び半導体装置 |
JP2004292641A (ja) | 2003-03-27 | 2004-10-21 | Shin Etsu Chem Co Ltd | 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜、及び半導体装置 |
JP2004307692A (ja) | 2003-04-09 | 2004-11-04 | Shin Etsu Chem Co Ltd | 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜及び半導体装置 |
JP2004307694A (ja) | 2003-04-09 | 2004-11-04 | Shin Etsu Chem Co Ltd | 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜及び半導体装置。 |
US8043219B2 (en) * | 2004-09-17 | 2011-10-25 | Siemens Medical Solutions Usa, Inc. | Automated power level for contrast agent imaging |
JP4591032B2 (ja) * | 2004-10-15 | 2010-12-01 | Jsr株式会社 | 表面疎水化用組成物、表面疎水化方法および半導体装置の製造方法 |
JP4781780B2 (ja) | 2005-10-27 | 2011-09-28 | 信越化学工業株式会社 | 光関連デバイス封止用樹脂組成物およびその硬化物ならびに半導体素子の封止方法 |
JP5388331B2 (ja) * | 2006-09-29 | 2014-01-15 | 旭化成イーマテリアルズ株式会社 | ポリオルガノシロキサン組成物 |
US7700871B2 (en) * | 2007-01-19 | 2010-04-20 | Novinium, Inc. | Acid-catalyzed dielectric enhancement fluid and cable restoration method employing same |
WO2009102035A1 (ja) * | 2008-02-15 | 2009-08-20 | Asahi Kasei E-Materials Corporation | 樹脂組成物 |
CN102365315B (zh) | 2009-03-27 | 2014-12-10 | 旭硝子株式会社 | 有机聚硅氧烷和硬涂剂组合物以及具有硬涂层的树脂基板 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3414251B2 (ja) * | 1998-03-13 | 2003-06-09 | 信越化学工業株式会社 | シリコーン樹脂含有エマルジョン組成物及びその製造方法並びに該組成物の硬化被膜を有する物品 |
JP2000038509A (ja) | 1998-05-18 | 2000-02-08 | Jsr Corp | 多孔質膜形成用組成物、該組成物の製造方法、膜の形成方法および多孔質膜 |
EP1035183B1 (de) * | 1998-09-25 | 2009-11-25 | JGC Catalysts and Chemicals Ltd. | Flüssige beschichtungszusammensetzung für silicabeschichtung mit niedriger durchlössigkeit und mit dieser zusammensetzung beschichtetes substrat |
US6399666B1 (en) * | 1999-01-27 | 2002-06-04 | International Business Machines Corporation | Insulative matrix material |
WO2000061834A1 (en) | 1999-04-14 | 2000-10-19 | Alliedsignal Inc. | Low dielectric mano-porous material obtainable from polymer decomposition |
US6271273B1 (en) * | 2000-07-14 | 2001-08-07 | Shipley Company, L.L.C. | Porous materials |
-
2001
- 2001-01-15 JP JP2001006614A patent/JP3654343B2/ja not_active Expired - Fee Related
-
2002
- 2002-01-14 TW TW91100387A patent/TW574319B/zh not_active IP Right Cessation
- 2002-01-14 KR KR1020020001978A patent/KR100570246B1/ko not_active IP Right Cessation
- 2002-01-15 DE DE60200719T patent/DE60200719T2/de not_active Expired - Fee Related
- 2002-01-15 EP EP02250260A patent/EP1223192B1/de not_active Expired - Lifetime
- 2002-01-15 US US10/045,160 patent/US6680107B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US6680107B2 (en) | 2004-01-20 |
US20020132908A1 (en) | 2002-09-19 |
EP1223192B1 (de) | 2004-07-14 |
JP2002212503A (ja) | 2002-07-31 |
KR100570246B1 (ko) | 2006-04-12 |
TW574319B (en) | 2004-02-01 |
KR20020061517A (ko) | 2002-07-24 |
DE60200719T2 (de) | 2005-08-04 |
EP1223192A1 (de) | 2002-07-17 |
JP3654343B2 (ja) | 2005-06-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |