DE602004000276D1 - Verfahren zur Herstellung einer Haltevorrichtung aus Quarzglas - Google Patents
Verfahren zur Herstellung einer Haltevorrichtung aus QuarzglasInfo
- Publication number
- DE602004000276D1 DE602004000276D1 DE602004000276T DE602004000276T DE602004000276D1 DE 602004000276 D1 DE602004000276 D1 DE 602004000276D1 DE 602004000276 T DE602004000276 T DE 602004000276T DE 602004000276 T DE602004000276 T DE 602004000276T DE 602004000276 D1 DE602004000276 D1 DE 602004000276D1
- Authority
- DE
- Germany
- Prior art keywords
- producing
- holding device
- quartz glass
- device made
- quartz
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/008—Other surface treatment of glass not in the form of fibres or filaments comprising a lixiviation step
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B32/00—Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0075—Cleaning of glass
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
- C03B2201/03—Impurity concentration specified
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Crystallography & Structural Chemistry (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Glass Melting And Manufacturing (AREA)
- Glass Compositions (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Surface Treatment Of Glass (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003115825 | 2003-04-21 | ||
JP2003115825A JP4204374B2 (ja) | 2003-04-21 | 2003-04-21 | 石英ガラス治具の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE602004000276D1 true DE602004000276D1 (de) | 2006-02-02 |
DE602004000276T2 DE602004000276T2 (de) | 2006-08-10 |
Family
ID=32959581
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602004000276T Expired - Lifetime DE602004000276T2 (de) | 2003-04-21 | 2004-04-20 | Verfahren zur Herstellung einer Haltevorrichtung aus Quarzglas |
Country Status (4)
Country | Link |
---|---|
US (1) | US7497095B2 (de) |
EP (1) | EP1471039B1 (de) |
JP (1) | JP4204374B2 (de) |
DE (1) | DE602004000276T2 (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5001524B2 (ja) * | 2005-04-28 | 2012-08-15 | 信越石英株式会社 | 石英ガラス製治具の再生方法 |
JP2006315886A (ja) * | 2005-05-11 | 2006-11-24 | Shinetsu Quartz Prod Co Ltd | 石英ガラス部材の純化方法 |
DE102006023078B4 (de) * | 2006-05-16 | 2012-04-19 | Schott Ag | Verfahren zur Herstellung von Glaskeramik-Artikeln mit verbesserter Oberfläche, Vorrichtung und Verwendung |
JP2008004851A (ja) * | 2006-06-23 | 2008-01-10 | Tokyo Electron Ltd | 石英製品のベーク方法及び記憶媒体 |
JP2008004852A (ja) * | 2006-06-23 | 2008-01-10 | Tokyo Electron Ltd | 石英製品及び熱処理装置 |
EP2194030B1 (de) * | 2007-08-02 | 2017-12-27 | Shin-Etsu Quartz Products Co.,Ltd. | Verwendung eines quarzglaselements für das plasmaätzen |
JP5340169B2 (ja) * | 2007-12-05 | 2013-11-13 | 信越石英株式会社 | 合成石英ガラス治具の処理方法及び得られた合成石英ガラス治具並びにその使用方法 |
JP5251861B2 (ja) * | 2009-12-28 | 2013-07-31 | 信越化学工業株式会社 | 合成石英ガラス基板の製造方法 |
JP5729351B2 (ja) * | 2012-05-18 | 2015-06-03 | 信越半導体株式会社 | 半導体ウェーハの洗浄方法 |
EP3053888B1 (de) * | 2013-09-30 | 2021-02-17 | Nippon Sheet Glass Company, Limited | Verfahren zur herstellung von glasplatten |
TR201905051T4 (tr) * | 2013-12-17 | 2019-05-21 | Nippon Sheet Glass Co Ltd | Cam levha üretim yöntemi. |
CN110590139A (zh) * | 2019-09-06 | 2019-12-20 | 中电九天智能科技有限公司 | 激光退火制程生产线优化方法 |
DE102022204735A1 (de) | 2022-05-13 | 2023-11-16 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein | Verfahren für die Nanostrukturierung von Glasoberflächen, damit hergestelltes Glas und dessen Verwendung |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3511727A (en) * | 1967-05-08 | 1970-05-12 | Motorola Inc | Vapor phase etching and polishing of semiconductors |
JPS59129421A (ja) | 1983-01-14 | 1984-07-25 | Toshiba Ceramics Co Ltd | 半導体熱処理用部材 |
JPH07183240A (ja) * | 1993-12-24 | 1995-07-21 | Toshiba Ceramics Co Ltd | 半導体製造用治具の製造方法 |
US6124211A (en) * | 1994-06-14 | 2000-09-26 | Fsi International, Inc. | Cleaning method |
JP3931351B2 (ja) | 1994-12-27 | 2007-06-13 | 東ソー株式会社 | 高純度、高耐熱性シリカガラスの製造方法 |
DE19713090B4 (de) * | 1996-03-28 | 2004-06-17 | Kabushiki Kaisha Toshiba, Kawasaki | Verfahren und Apparatur zum Ätzen von Silicium-Materialien |
JPH10114532A (ja) * | 1996-10-04 | 1998-05-06 | Toshiba Ceramics Co Ltd | 石英ガラス質半導体熱処理用治具の製造方法 |
-
2003
- 2003-04-21 JP JP2003115825A patent/JP4204374B2/ja not_active Expired - Lifetime
-
2004
- 2004-04-13 US US10/824,337 patent/US7497095B2/en active Active
- 2004-04-20 EP EP04009276A patent/EP1471039B1/de not_active Expired - Fee Related
- 2004-04-20 DE DE602004000276T patent/DE602004000276T2/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP1471039A1 (de) | 2004-10-27 |
JP4204374B2 (ja) | 2009-01-07 |
US20040237589A1 (en) | 2004-12-02 |
DE602004000276T2 (de) | 2006-08-10 |
US7497095B2 (en) | 2009-03-03 |
EP1471039B1 (de) | 2005-12-28 |
JP2004323246A (ja) | 2004-11-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |