DE602004000276D1 - Verfahren zur Herstellung einer Haltevorrichtung aus Quarzglas - Google Patents

Verfahren zur Herstellung einer Haltevorrichtung aus Quarzglas

Info

Publication number
DE602004000276D1
DE602004000276D1 DE602004000276T DE602004000276T DE602004000276D1 DE 602004000276 D1 DE602004000276 D1 DE 602004000276D1 DE 602004000276 T DE602004000276 T DE 602004000276T DE 602004000276 T DE602004000276 T DE 602004000276T DE 602004000276 D1 DE602004000276 D1 DE 602004000276D1
Authority
DE
Germany
Prior art keywords
producing
holding device
quartz glass
device made
quartz
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE602004000276T
Other languages
English (en)
Other versions
DE602004000276T2 (de
Inventor
Tatsuhiro Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Heraeus Quarzglas GmbH and Co KG
Shin Etsu Quartz Products Co Ltd
Original Assignee
Heraeus Quarzglas GmbH and Co KG
Shin Etsu Quartz Products Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Heraeus Quarzglas GmbH and Co KG, Shin Etsu Quartz Products Co Ltd filed Critical Heraeus Quarzglas GmbH and Co KG
Publication of DE602004000276D1 publication Critical patent/DE602004000276D1/de
Application granted granted Critical
Publication of DE602004000276T2 publication Critical patent/DE602004000276T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/008—Other surface treatment of glass not in the form of fibres or filaments comprising a lixiviation step
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B32/00—Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0075—Cleaning of glass
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/02—Pure silica glass, e.g. pure fused quartz
    • C03B2201/03—Impurity concentration specified
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Glass Compositions (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Surface Treatment Of Glass (AREA)
DE602004000276T 2003-04-21 2004-04-20 Verfahren zur Herstellung einer Haltevorrichtung aus Quarzglas Expired - Lifetime DE602004000276T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003115825 2003-04-21
JP2003115825A JP4204374B2 (ja) 2003-04-21 2003-04-21 石英ガラス治具の製造方法

Publications (2)

Publication Number Publication Date
DE602004000276D1 true DE602004000276D1 (de) 2006-02-02
DE602004000276T2 DE602004000276T2 (de) 2006-08-10

Family

ID=32959581

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004000276T Expired - Lifetime DE602004000276T2 (de) 2003-04-21 2004-04-20 Verfahren zur Herstellung einer Haltevorrichtung aus Quarzglas

Country Status (4)

Country Link
US (1) US7497095B2 (de)
EP (1) EP1471039B1 (de)
JP (1) JP4204374B2 (de)
DE (1) DE602004000276T2 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5001524B2 (ja) * 2005-04-28 2012-08-15 信越石英株式会社 石英ガラス製治具の再生方法
JP2006315886A (ja) * 2005-05-11 2006-11-24 Shinetsu Quartz Prod Co Ltd 石英ガラス部材の純化方法
DE102006023078B4 (de) * 2006-05-16 2012-04-19 Schott Ag Verfahren zur Herstellung von Glaskeramik-Artikeln mit verbesserter Oberfläche, Vorrichtung und Verwendung
JP2008004851A (ja) * 2006-06-23 2008-01-10 Tokyo Electron Ltd 石英製品のベーク方法及び記憶媒体
JP2008004852A (ja) * 2006-06-23 2008-01-10 Tokyo Electron Ltd 石英製品及び熱処理装置
EP2194030B1 (de) * 2007-08-02 2017-12-27 Shin-Etsu Quartz Products Co.,Ltd. Verwendung eines quarzglaselements für das plasmaätzen
JP5340169B2 (ja) * 2007-12-05 2013-11-13 信越石英株式会社 合成石英ガラス治具の処理方法及び得られた合成石英ガラス治具並びにその使用方法
JP5251861B2 (ja) * 2009-12-28 2013-07-31 信越化学工業株式会社 合成石英ガラス基板の製造方法
JP5729351B2 (ja) * 2012-05-18 2015-06-03 信越半導体株式会社 半導体ウェーハの洗浄方法
EP3053888B1 (de) * 2013-09-30 2021-02-17 Nippon Sheet Glass Company, Limited Verfahren zur herstellung von glasplatten
TR201905051T4 (tr) * 2013-12-17 2019-05-21 Nippon Sheet Glass Co Ltd Cam levha üretim yöntemi.
CN110590139A (zh) * 2019-09-06 2019-12-20 中电九天智能科技有限公司 激光退火制程生产线优化方法
DE102022204735A1 (de) 2022-05-13 2023-11-16 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein Verfahren für die Nanostrukturierung von Glasoberflächen, damit hergestelltes Glas und dessen Verwendung

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3511727A (en) * 1967-05-08 1970-05-12 Motorola Inc Vapor phase etching and polishing of semiconductors
JPS59129421A (ja) 1983-01-14 1984-07-25 Toshiba Ceramics Co Ltd 半導体熱処理用部材
JPH07183240A (ja) * 1993-12-24 1995-07-21 Toshiba Ceramics Co Ltd 半導体製造用治具の製造方法
US6124211A (en) * 1994-06-14 2000-09-26 Fsi International, Inc. Cleaning method
JP3931351B2 (ja) 1994-12-27 2007-06-13 東ソー株式会社 高純度、高耐熱性シリカガラスの製造方法
DE19713090B4 (de) * 1996-03-28 2004-06-17 Kabushiki Kaisha Toshiba, Kawasaki Verfahren und Apparatur zum Ätzen von Silicium-Materialien
JPH10114532A (ja) * 1996-10-04 1998-05-06 Toshiba Ceramics Co Ltd 石英ガラス質半導体熱処理用治具の製造方法

Also Published As

Publication number Publication date
EP1471039A1 (de) 2004-10-27
JP4204374B2 (ja) 2009-01-07
US20040237589A1 (en) 2004-12-02
DE602004000276T2 (de) 2006-08-10
US7497095B2 (en) 2009-03-03
EP1471039B1 (de) 2005-12-28
JP2004323246A (ja) 2004-11-18

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition