DE60130817D1 - Dispersion von Siliciumdioxid-Partikelagglomeraten und Verfahren zu ihrer Herstellung - Google Patents

Dispersion von Siliciumdioxid-Partikelagglomeraten und Verfahren zu ihrer Herstellung

Info

Publication number
DE60130817D1
DE60130817D1 DE60130817T DE60130817T DE60130817D1 DE 60130817 D1 DE60130817 D1 DE 60130817D1 DE 60130817 T DE60130817 T DE 60130817T DE 60130817 T DE60130817 T DE 60130817T DE 60130817 D1 DE60130817 D1 DE 60130817D1
Authority
DE
Germany
Prior art keywords
dispersion
preparation
silica particle
particle agglomerates
agglomerates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60130817T
Other languages
English (en)
Other versions
DE60130817T2 (de
Inventor
Tetsuro Noguchi
Kozo Tajiri
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
New Oji Paper Co Ltd
Original Assignee
Oji Paper Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oji Paper Co Ltd filed Critical Oji Paper Co Ltd
Publication of DE60130817D1 publication Critical patent/DE60130817D1/de
Application granted granted Critical
Publication of DE60130817T2 publication Critical patent/DE60130817T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/146After-treatment of sols
    • C01B33/1465"Build-up" of particles using only one sol and a "heel" consisting or not of the sol
DE60130817T 2000-01-19 2001-01-17 Dispersion von Siliciumdioxid-Partikelagglomeraten und Verfahren zu ihrer Herstellung Expired - Fee Related DE60130817T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2000009640 2000-01-19
JP2000009640 2000-01-19
JP2000112869 2000-04-14
JP2000112869 2000-04-14

Publications (2)

Publication Number Publication Date
DE60130817D1 true DE60130817D1 (de) 2007-11-22
DE60130817T2 DE60130817T2 (de) 2008-07-17

Family

ID=26583730

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60130817T Expired - Fee Related DE60130817T2 (de) 2000-01-19 2001-01-17 Dispersion von Siliciumdioxid-Partikelagglomeraten und Verfahren zu ihrer Herstellung

Country Status (3)

Country Link
US (2) US6569908B2 (de)
EP (1) EP1118584B1 (de)
DE (1) DE60130817T2 (de)

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US6643765B1 (en) 1995-08-16 2003-11-04 Microunity Systems Engineering, Inc. Programmable processor with group floating point operations
US6808768B2 (en) * 2000-06-26 2004-10-26 Asani Kasei Kabushiki Kaisha Porous, fine inorganic particles
JP2003211824A (ja) * 2002-01-17 2003-07-30 Konica Corp 空隙型インクジェット受像層、インクジェット記録材料及びその製造方法
TWI349024B (en) * 2002-03-19 2011-09-21 Grace W R & Co Coating composition comprising colloidal silica and glossy ink jet recording sheets prepared therefrom
DE10239144A1 (de) * 2002-08-27 2004-03-18 Degussa Ag Dispersion
US7594962B2 (en) * 2003-01-17 2009-09-29 Ciba Specialty Chemicals Corporation Process for the production of porous inorganic materials or a matrix material containing nanoparticles
AU2003241970A1 (en) * 2003-06-03 2005-01-04 Oji Paper Co., Ltd. Ink-jet recording sheet
JP5107700B2 (ja) * 2004-05-04 2012-12-26 キャボット コーポレイション 所望の凝集体粒子直径を有する凝集体金属酸化物粒子分散体の調製方法
TW200604097A (en) * 2004-07-26 2006-02-01 Fuso Chemical Co Ltd Silica sol and manufacturing method therefor
US20060100338A1 (en) * 2004-11-08 2006-05-11 Akzo Nobel N.V. Pigment composition
WO2006080395A1 (ja) 2005-01-28 2006-08-03 Oji Paper Co., Ltd. インクジェット記録体
DE102005061965A1 (de) * 2005-12-23 2007-07-05 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Oxidische Agglomeratpartikel, Verfahren zur Herstellung von Nanokompositen sowie deren Verwendung
US10227238B2 (en) * 2006-04-04 2019-03-12 Ecolab Usa Inc. Production and use of polysilicate particulate materials
US8234773B2 (en) * 2006-06-05 2012-08-07 The United States Of America As Represented By The Secretary Of The Army Apparatus and method for forming electronic devices
TWI436947B (zh) * 2007-03-27 2014-05-11 Fuso Chemical Co Ltd 膠體矽石及其製法
CN101918312A (zh) * 2007-06-04 2010-12-15 全技术联合公司 二氧化硅颗粒及其制备方法和使用方法
US20100284884A1 (en) * 2007-12-27 2010-11-11 James Neil Pryor Method for making colloidal silica particles
US20090252988A1 (en) * 2008-04-04 2009-10-08 Honeywell International Inc. Coated components for use in high temperature environments and methods of forming a coating on the component
US9222060B2 (en) 2009-03-27 2015-12-29 Australian Nuclear Science And Technology Organisation Triggered release
US8029752B2 (en) * 2009-04-06 2011-10-04 Nalco Company Approach in controlling DSP scale in bayer process
US9487408B2 (en) 2009-09-25 2016-11-08 Nalco Company Reducing aluminosilicate scale in the bayer process
US8282834B2 (en) 2009-09-25 2012-10-09 Nalco Company Di- and mono-alkoxysilane functionalized polymers and their application in the Bayer process
US8545776B2 (en) * 2009-09-25 2013-10-01 Nalco Company Reducing aluminosilicate scale in the Bayer process
US9416020B2 (en) 2009-09-25 2016-08-16 Nalco Company Surfactant based small molecules for reducing aluminosilicate scale in the bayer process
US8936772B2 (en) 2010-04-08 2015-01-20 Ecolab Usa Inc. Silica containing particle
US9555420B2 (en) 2010-04-08 2017-01-31 Nalco Company Gas stream treatment process
US9682383B2 (en) 2010-04-08 2017-06-20 Nalco Company Gas stream treatment process
US8333835B2 (en) 2010-04-08 2012-12-18 Nalco Company Sulfur containing silica particle
US8377194B2 (en) 2010-04-08 2013-02-19 Nalco Company Sulfur containing silica particle
WO2013052876A1 (en) 2011-10-07 2013-04-11 Nalco Company Gas stream treatment process
US10087081B2 (en) 2013-03-08 2018-10-02 Ecolab Usa Inc. Process for producing high solids colloidal silica
WO2017015180A1 (en) 2015-07-18 2017-01-26 Ecolab Usa Inc. Chemical additives to improve oil separation in stillage process operations
JP6854683B2 (ja) * 2017-03-30 2021-04-07 株式会社フジミインコーポレーテッド シリカゾルの製造方法
CN110655087A (zh) * 2019-10-23 2020-01-07 浙江新创纳电子科技有限公司 一种二氧化硅胶体及其制备方法

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US2577484A (en) 1950-09-08 1951-12-04 Du Pont Process for producing stable silica sols
US2731326A (en) * 1951-08-31 1956-01-17 Du Pont Process of preparing dense amorphous silica aggregates and product
US3081154A (en) * 1959-11-17 1963-03-12 Grace W R & Co Process for preparing fine size silica
US3798174A (en) * 1972-04-21 1974-03-19 Grace W R & Co Method of preparing thickening grade silica composition
JPS55116613A (en) 1979-02-28 1980-09-08 Tokuyama Soda Co Ltd Silicic acid hydrate and manufacture thereof
JPS627622A (ja) 1985-07-04 1987-01-14 Nissan Chem Ind Ltd 極小粒子径シリカゾルの製造法
JPH05105418A (ja) 1991-10-11 1993-04-27 Sintokogio Ltd 単分散シリカ粒子の製造方法
EP0803374B1 (de) 1996-04-24 2004-06-30 Oji Paper Company Limited Tintenstrahlaufzeichnungsmaterial und Verfahren zur Herstellung eines Tintenstrahlaufzeichnungsmaterials
JP3411151B2 (ja) * 1996-04-24 2003-05-26 王子製紙株式会社 インクジェット記録体
US6380265B1 (en) * 1998-07-09 2002-04-30 W. R. Grace & Co.-Conn. Dispersion of fine porous inorganic oxide particles and processes for preparing same
TW409329B (en) * 1998-11-02 2000-10-21 Mosel Vitelic Inc Marking method and device of the ultra-thin test block
US6562441B1 (en) * 1999-11-19 2003-05-13 Oji Paper Co., Ltd. Ink jet recording medium

Also Published As

Publication number Publication date
EP1118584A1 (de) 2001-07-25
US6569908B2 (en) 2003-05-27
DE60130817T2 (de) 2008-07-17
US20010011105A1 (en) 2001-08-02
EP1118584B1 (de) 2007-10-10
US20030180549A1 (en) 2003-09-25

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee