DE60103964D1 - Verfahren und Vorrichtung zur Ermittlung von Aberrationen in einem optischen System - Google Patents

Verfahren und Vorrichtung zur Ermittlung von Aberrationen in einem optischen System

Info

Publication number
DE60103964D1
DE60103964D1 DE60103964T DE60103964T DE60103964D1 DE 60103964 D1 DE60103964 D1 DE 60103964D1 DE 60103964 T DE60103964 T DE 60103964T DE 60103964 T DE60103964 T DE 60103964T DE 60103964 D1 DE60103964 D1 DE 60103964D1
Authority
DE
Germany
Prior art keywords
optical system
determining aberrations
aberrations
determining
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60103964T
Other languages
English (en)
Other versions
DE60103964T2 (de
Inventor
Jang Fung Chen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML MaskTools Netherlands BV
Original Assignee
ASML MaskTools Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML MaskTools Netherlands BV filed Critical ASML MaskTools Netherlands BV
Application granted granted Critical
Publication of DE60103964D1 publication Critical patent/DE60103964D1/de
Publication of DE60103964T2 publication Critical patent/DE60103964T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
DE60103964T 2000-12-06 2001-12-04 Verfahren und Vorrichtung zur Ermittlung von Aberrationen in einem optischen System Expired - Fee Related DE60103964T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/729,695 US6753954B2 (en) 2000-12-06 2000-12-06 Method and apparatus for detecting aberrations in a projection lens utilized for projection optics
US729695 2000-12-06

Publications (2)

Publication Number Publication Date
DE60103964D1 true DE60103964D1 (de) 2004-07-29
DE60103964T2 DE60103964T2 (de) 2005-07-14

Family

ID=24932190

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60103964T Expired - Fee Related DE60103964T2 (de) 2000-12-06 2001-12-04 Verfahren und Vorrichtung zur Ermittlung von Aberrationen in einem optischen System

Country Status (6)

Country Link
US (2) US6753954B2 (de)
EP (1) EP1213618B1 (de)
JP (1) JP3910065B2 (de)
KR (1) KR100483515B1 (de)
DE (1) DE60103964T2 (de)
TW (1) TWI239434B (de)

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DE102008048660B4 (de) * 2008-09-22 2015-06-18 Carl Zeiss Sms Gmbh Verfahren und Vorrichtung zur Vermessung von Strukturen auf Photolithographiemasken
US8161422B2 (en) * 2009-01-06 2012-04-17 International Business Machines Corporation Fast and accurate method to simulate intermediate range flare effects
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CN103217871B (zh) * 2013-04-19 2014-11-26 中国科学院上海光学精密机械研究所 基于相位环空间像主成分分析的投影物镜波像差检测方法
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US10451564B2 (en) * 2017-10-27 2019-10-22 Applied Materials, Inc. Empirical detection of lens aberration for diffraction-limited optical system
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CN113008522A (zh) * 2021-03-08 2021-06-22 苏州长光华芯光电技术股份有限公司 激光器寿命老化测试装置
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Also Published As

Publication number Publication date
EP1213618B1 (de) 2004-06-23
US20030098970A1 (en) 2003-05-29
US6753954B2 (en) 2004-06-22
TWI239434B (en) 2005-09-11
JP3910065B2 (ja) 2007-04-25
DE60103964T2 (de) 2005-07-14
KR100483515B1 (ko) 2005-04-15
EP1213618A1 (de) 2002-06-12
US6788400B2 (en) 2004-09-07
US20020088951A1 (en) 2002-07-11
KR20020045536A (ko) 2002-06-19
JP2002231626A (ja) 2002-08-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee