DE60032041D1 - Piezoelektrisches Antriebselement, Tintenstrahldruckkopf, Herstellungsverfahren dafür, und Tintenstrahldrucker - Google Patents

Piezoelektrisches Antriebselement, Tintenstrahldruckkopf, Herstellungsverfahren dafür, und Tintenstrahldrucker

Info

Publication number
DE60032041D1
DE60032041D1 DE60032041T DE60032041T DE60032041D1 DE 60032041 D1 DE60032041 D1 DE 60032041D1 DE 60032041 T DE60032041 T DE 60032041T DE 60032041 T DE60032041 T DE 60032041T DE 60032041 D1 DE60032041 D1 DE 60032041D1
Authority
DE
Germany
Prior art keywords
ink jet
piezoelectric
group
ceramic particles
piezoelectric ceramic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60032041T
Other languages
English (en)
Other versions
DE60032041T2 (de
Inventor
Hong Qui
Koji Sumi
Tsutomu Nishiwaki
Haruo Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Application granted granted Critical
Publication of DE60032041D1 publication Critical patent/DE60032041D1/de
Publication of DE60032041T2 publication Critical patent/DE60032041T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/14Structure thereof only for on-demand ink jet heads
    • B41J2/14201Structure of print heads with piezoelectric elements
    • B41J2/14233Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1607Production of print heads with piezoelectric elements
    • B41J2/161Production of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1626Manufacturing processes etching
    • B41J2/1628Manufacturing processes etching dry etching
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/164Manufacturing processes thin film formation
    • B41J2/1642Manufacturing processes thin film formation thin film formation by CVD [chemical vapor deposition]
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/164Manufacturing processes thin film formation
    • B41J2/1645Manufacturing processes thin film formation thin film formation by spincoating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/164Manufacturing processes thin film formation
    • B41J2/1646Manufacturing processes thin film formation thin film formation by sputtering
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/01Manufacture or treatment
    • H10N30/07Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
    • H10N30/074Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing
    • H10N30/077Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing by liquid phase deposition
    • H10N30/078Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing by liquid phase deposition by sol-gel deposition
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/20Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
    • H10N30/204Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators using bending displacement, e.g. unimorph, bimorph or multimorph cantilever or membrane benders
    • H10N30/2047Membrane type
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/80Constructional details
    • H10N30/85Piezoelectric or electrostrictive active materials
    • H10N30/853Ceramic compositions
    • H10N30/8548Lead-based oxides
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/42Piezoelectric device making

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
  • Compositions Of Oxide Ceramics (AREA)
DE2000632041 1999-03-02 2000-03-02 Piezoelektrisches Antriebselement, Tintenstrahldruckkopf, Herstellungsverfahren dafür, und Tintenstrahldrucker Expired - Lifetime DE60032041T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP5393199 1999-03-02
JP5393199 1999-03-02
JP2000056138 2000-03-01
JP2000056138A JP3508682B2 (ja) 1999-03-02 2000-03-01 圧電アクチュエータ、インクジェット式記録ヘッド、これらの製造方法及びインクジェットプリンタ

Publications (2)

Publication Number Publication Date
DE60032041D1 true DE60032041D1 (de) 2007-01-11
DE60032041T2 DE60032041T2 (de) 2007-03-08

Family

ID=26394664

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2000632041 Expired - Lifetime DE60032041T2 (de) 1999-03-02 2000-03-02 Piezoelektrisches Antriebselement, Tintenstrahldruckkopf, Herstellungsverfahren dafür, und Tintenstrahldrucker

Country Status (5)

Country Link
US (1) US6419848B1 (de)
EP (1) EP1033250B1 (de)
JP (1) JP3508682B2 (de)
AT (1) ATE346748T1 (de)
DE (1) DE60032041T2 (de)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6566983B2 (en) * 2000-09-02 2003-05-20 Lg Electronics Inc. Saw filter using a carbon nanotube and method for manufacturing the same
JP4721507B2 (ja) * 2000-11-29 2011-07-13 京セラ株式会社 圧電磁器組成物及びこれを用いたインクジェット記録ヘッド
JP4688301B2 (ja) * 2001-01-23 2011-05-25 京セラ株式会社 圧電磁器組成物及びこれを用いたインクジェット記録ヘッド
SG115500A1 (en) 2002-10-09 2005-10-28 Inst Materials Research & Eng Method to produce a reliable piezoelectric thick film on a substrate
GB0229655D0 (en) * 2002-12-20 2003-01-22 Xaar Technology Ltd Droplet deposition apparatus
JP4521751B2 (ja) * 2003-03-26 2010-08-11 国立大学法人東京工業大学 チタン酸ジルコニウム酸鉛系膜、誘電体素子、誘電体膜の製造方法
JP4179029B2 (ja) 2003-04-15 2008-11-12 株式会社村田製作所 圧電セラミックの製造方法
US7399067B2 (en) 2004-02-27 2008-07-15 Canon Kabushiki Kaisha Piezoelectric thin film, method of manufacturing piezoelectric thin film, piezoelectric element, and ink jet recording head
US7565723B2 (en) * 2004-03-30 2009-07-28 Brother Kogyo Kabushik Kaisha Piezoelectric actuator and method of fabricating piezoelectric actuator
US7527363B2 (en) * 2004-07-16 2009-05-05 Fujifilm Corporation Discharge head of image forming apparatus with piezoelectric body for generating and sensing pressure
US8356011B2 (en) * 2005-07-26 2013-01-15 Microsoft Corporation Organizing presence information into collections of publications
JP4925007B2 (ja) * 2006-02-17 2012-04-25 独立行政法人産業技術総合研究所 圧電体球状微粒子の製造方法
JP4640222B2 (ja) * 2006-03-15 2011-03-02 セイコーエプソン株式会社 インクジェットヘッドの製造方法
US8108345B2 (en) 2006-03-31 2012-01-31 Microsoft Corporation Managing rich presence collections in a single request
US20070235500A1 (en) * 2006-03-31 2007-10-11 Daewoong Suh Room temperature joining process with piezoelectric ceramic-activated reactive multilayer foil
US8234559B2 (en) * 2006-03-31 2012-07-31 Microsoft Corporation Managing rich presence collections
JP4940389B2 (ja) * 2007-01-19 2012-05-30 国立大学法人 名古屋工業大学 無鉛圧電磁器複合体及びこれを用いた圧電素子
JP5281786B2 (ja) * 2007-11-14 2013-09-04 日本碍子株式会社 (Li,Na,K)(Nb,Ta)O3系圧電材料、及びその製造方法
JP5011227B2 (ja) * 2008-07-28 2012-08-29 日本碍子株式会社 (Li,Na,K,Bi)(Nb,Ta)O3系圧電材料及びその製造方法
JP5244749B2 (ja) * 2009-09-14 2013-07-24 富士フイルム株式会社 液体吐出ヘッド、液体吐出ヘッドの駆動方法、及び、画像記録装置
FR2950197A1 (fr) * 2009-09-15 2011-03-18 Commissariat Energie Atomique Membrane piezoelectrique a actionnement optimise et procede de fabrication de la membrane
US8766511B2 (en) * 2011-08-17 2014-07-01 The Boeing Company Method and system for distributed network of nanoparticle ink based piezoelectric sensors for structural health monitoring
JP6186784B2 (ja) * 2013-03-22 2017-08-30 セイコーエプソン株式会社 液体噴射ヘッド、液体噴射装置、圧電素子及び超音波センサー
JP5984774B2 (ja) * 2013-09-30 2016-09-06 三菱重工業株式会社 超音波探触子
JP6597987B2 (ja) * 2014-03-18 2019-10-30 セイコーエプソン株式会社 圧電素子、アクチュエーター装置、液体噴射ヘッド、液体噴射装置及び超音波測定装置
CN107266072A (zh) * 2017-03-02 2017-10-20 中国兵器工业第五二研究所烟台分所 一种低温烧结pzt95‑5压电陶瓷的制备方法
CN113004025A (zh) * 2021-02-24 2021-06-22 广西中科鑫玺电子科技有限公司 一种压电陶瓷工艺配方
CN113264766A (zh) * 2021-06-07 2021-08-17 西安交通大学 一种无铅压电薄膜材料及其制备方法

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Publication number Priority date Publication date Assignee Title
SG83626A1 (en) 1989-07-11 2001-10-16 Seiko Epson Corp Piezoelectric/electrostrictive actuator having at least one piezoelectric/electrostrictive film
JP2842448B2 (ja) 1989-07-11 1999-01-06 日本碍子株式会社 圧電/電歪膜型アクチュエータ
JP2825366B2 (ja) * 1991-05-23 1998-11-18 松下電器産業株式会社 圧電セラミックス
JP3254750B2 (ja) * 1992-09-28 2002-02-12 セイコーエプソン株式会社 強誘電体薄膜素子、インクジェット記録装置および強誘電体薄膜素子の製造方法
US5634999A (en) 1994-09-06 1997-06-03 Ngk Insulators, Ltd. Method of producing ceramic diaphragm structure having convex diaphragm portion
JPH08104568A (ja) * 1994-09-30 1996-04-23 Matsushita Electric Ind Co Ltd 圧電セラミックスおよびその製造方法
JPH09157019A (ja) 1995-11-30 1997-06-17 Mita Ind Co Ltd 複合酸化物膜
JPH1093153A (ja) * 1996-09-13 1998-04-10 Ricoh Co Ltd 電気機械変換素子及びその製造方法並びにインクジェットヘッド
JP3682684B2 (ja) * 1997-10-20 2005-08-10 セイコーエプソン株式会社 圧電体薄膜素子の製造方法
US6402304B1 (en) 1998-08-12 2002-06-11 Seiko Epson Corporation Piezoelectric actuator, ink jet printing head, printer, method for manufacturing piezoelectric actuator, and method for manufacturing ink jet printing head

Also Published As

Publication number Publication date
ATE346748T1 (de) 2006-12-15
JP3508682B2 (ja) 2004-03-22
DE60032041T2 (de) 2007-03-08
EP1033250B1 (de) 2006-11-29
JP2000315827A (ja) 2000-11-14
EP1033250A1 (de) 2000-09-06
US6419848B1 (en) 2002-07-16

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8364 No opposition during term of opposition