DE59207732D1 - Monolithisch integrierte schaltungsanordnung - Google Patents

Monolithisch integrierte schaltungsanordnung

Info

Publication number
DE59207732D1
DE59207732D1 DE59207732T DE59207732T DE59207732D1 DE 59207732 D1 DE59207732 D1 DE 59207732D1 DE 59207732 T DE59207732 T DE 59207732T DE 59207732 T DE59207732 T DE 59207732T DE 59207732 D1 DE59207732 D1 DE 59207732D1
Authority
DE
Germany
Prior art keywords
integrated circuit
circuit arrangement
monolithically integrated
monolithically
arrangement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE59207732T
Other languages
English (en)
Inventor
Volkmar Denner
Wolfgang Troelenberg
Peter Brauchle
William-Neil Fox
Neil Davies
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Robert Bosch GmbH
Original Assignee
Robert Bosch GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Robert Bosch GmbH filed Critical Robert Bosch GmbH
Priority to DE59207732T priority Critical patent/DE59207732D1/de
Application granted granted Critical
Publication of DE59207732D1 publication Critical patent/DE59207732D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/7801DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
    • H01L29/7802Vertical DMOS transistors, i.e. VDMOS transistors
    • H01L29/7803Vertical DMOS transistors, i.e. VDMOS transistors structurally associated with at least one other device
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/0203Particular design considerations for integrated circuits
    • H01L27/0248Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
    • H01L27/0251Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Semiconductor Integrated Circuits (AREA)
DE59207732T 1991-06-20 1992-06-10 Monolithisch integrierte schaltungsanordnung Expired - Fee Related DE59207732D1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE59207732T DE59207732D1 (de) 1991-06-20 1992-06-10 Monolithisch integrierte schaltungsanordnung

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE4120394A DE4120394A1 (de) 1991-06-20 1991-06-20 Monolithisch integrierte schaltungsanordnung
DE59207732T DE59207732D1 (de) 1991-06-20 1992-06-10 Monolithisch integrierte schaltungsanordnung
PCT/DE1992/000479 WO1993000709A1 (de) 1991-06-20 1992-06-10 Monolithisch integrierte schaltungsanordnung

Publications (1)

Publication Number Publication Date
DE59207732D1 true DE59207732D1 (de) 1997-01-30

Family

ID=6434387

Family Applications (2)

Application Number Title Priority Date Filing Date
DE4120394A Withdrawn DE4120394A1 (de) 1991-06-20 1991-06-20 Monolithisch integrierte schaltungsanordnung
DE59207732T Expired - Fee Related DE59207732D1 (de) 1991-06-20 1992-06-10 Monolithisch integrierte schaltungsanordnung

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE4120394A Withdrawn DE4120394A1 (de) 1991-06-20 1991-06-20 Monolithisch integrierte schaltungsanordnung

Country Status (6)

Country Link
US (1) US5432371A (de)
EP (1) EP0591476B1 (de)
JP (1) JPH06508958A (de)
DE (2) DE4120394A1 (de)
ES (1) ES2095628T3 (de)
WO (1) WO1993000709A1 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5453390A (en) * 1992-03-30 1995-09-26 Nippondenso Co., Ltd. Method of producing semiconductor device with current detecting function
US5372955A (en) * 1993-08-02 1994-12-13 United Microelectronics Corporation Method of making a device with protection from short circuits between P and N wells
US5510747A (en) * 1993-11-30 1996-04-23 Siliconix Incorporated Gate drive technique for a bidirectional blocking lateral MOSFET
EP0704889A3 (de) * 1994-09-29 1998-10-21 Siemens Aktiengesellschaft Leistungshalbleiterbauelement mit monolithisch integriertem Messwiderstand und Verfahren zu dessen Herstellung
JP3485655B2 (ja) * 1994-12-14 2004-01-13 株式会社ルネサステクノロジ 複合型mosfet
JP3121618B2 (ja) * 1995-04-06 2001-01-09 インダストリアル テクノロジー リサーチ インスティチュート 多重セルトランジスタのためのn辺多角形セルレイアウト
US5602046A (en) * 1996-04-12 1997-02-11 National Semiconductor Corporation Integrated zener diode protection structures and fabrication methods for DMOS power devices
DE59709662D1 (de) * 1996-05-21 2003-05-08 Infineon Technologies Ag MOSFET mit Temperaturschutz
DE69834315T2 (de) 1998-02-10 2007-01-18 Stmicroelectronics S.R.L., Agrate Brianza Integrierte Schaltung mit einem VDMOS-Transistor, der gegen Überspannungen zwischen Source und Gate geschützt ist
DE19823768A1 (de) * 1998-05-28 1999-12-02 Bosch Gmbh Robert Smartpower-Bauelement
US6804100B2 (en) 1999-12-31 2004-10-12 Nokia Mobile Phones, Ltd. Method and apparatus for protection of batteries
JP2001274402A (ja) * 2000-03-24 2001-10-05 Toshiba Corp パワー半導体装置
CN100421182C (zh) * 2003-02-26 2008-09-24 旺宏电子股份有限公司 高压输入垫的静电放电保护装置及方法
JP2005043672A (ja) * 2003-07-22 2005-02-17 Toshiba Matsushita Display Technology Co Ltd アレイ基板およびその製造方法
US20070290261A1 (en) * 2006-06-15 2007-12-20 System General Corp. Self-driven ldmos transistor
DE102006047244B4 (de) * 2006-10-04 2018-01-18 Infineon Technologies Austria Ag Halbleiterbauelement mit einem monokristallinen Halbleiterkörper und Verfahren zur Herstellung desselben
JP2010118548A (ja) * 2008-11-13 2010-05-27 Mitsubishi Electric Corp 半導体装置
JP5367396B2 (ja) * 2009-02-06 2013-12-11 ラピスセミコンダクタ株式会社 半導体装置
CN102334190B (zh) 2009-04-30 2014-05-14 三菱电机株式会社 半导体装置及其制造方法
JP6641161B2 (ja) * 2015-11-18 2020-02-05 株式会社 日立パワーデバイス 半導体装置、およびそれを用いたオルタネータ
US11417644B2 (en) 2020-06-17 2022-08-16 Macom Technology Solutions Holdings, Inc. Integration of multiple discrete GaN devices

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4313768A (en) * 1978-04-06 1982-02-02 Harris Corporation Method of fabricating improved radiation hardened self-aligned CMOS having Si doped Al field gate
IT1213411B (it) * 1986-12-17 1989-12-20 Sgs Microelettronica Spa Struttura mos di potenza con dispositivo di protezione contro le sovratensioni e processo per lasua fabbricazione.
US4990976A (en) * 1987-11-24 1991-02-05 Nec Corporation Semiconductor device including a field effect transistor having a protective diode between source and drain thereof
US4893212A (en) * 1988-12-20 1990-01-09 North American Philips Corp. Protection of power integrated circuits against load voltage surges
US5023692A (en) * 1989-12-07 1991-06-11 Harris Semiconductor Patents, Inc. Power MOSFET transistor circuit
JP2633746B2 (ja) * 1991-05-27 1997-07-23 株式会社東芝 半導体装置

Also Published As

Publication number Publication date
US5432371A (en) 1995-07-11
ES2095628T3 (es) 1997-02-16
EP0591476B1 (de) 1996-12-18
JPH06508958A (ja) 1994-10-06
WO1993000709A1 (de) 1993-01-07
EP0591476A1 (de) 1994-04-13
DE4120394A1 (de) 1992-12-24

Similar Documents

Publication Publication Date Title
NO923989D0 (no) Integrert optisk krets
DE59209302D1 (de) Integrierte leistungsschalterstruktur
DE69428336D1 (de) Integrierte Halbleiterschaltungsanordnung
DE69225537D1 (de) Integrierte Speicherschaltung
DE69210087D1 (de) Vorspannungseinschaltschaltkreis
DE69327357D1 (de) Integrierte Halbleiterschaltungsanordnung
DE59207732D1 (de) Monolithisch integrierte schaltungsanordnung
KR920022294U (ko) 바이어스의 스타트업회로
DE69225508D1 (de) Ausgangsschaltung
DE69119152D1 (de) Schaltungsanordnung
DE69419575D1 (de) Integrierte Halbleiterschaltungsanordnung
DE69213986D1 (de) Schaltungsanordnung
DE69206651D1 (de) Schaltungsanordnung
DE69229315D1 (de) Ausgangs-Schaltkreis
DE69122463D1 (de) Integrierte Schaltkreise
DE69216663D1 (de) Schaltkreis
DE69317944D1 (de) Integrierte Speicherschaltung
DE69416355D1 (de) Integrierte Halbleiterschaltungsanordnung
DE69220456D1 (de) Schaltungsanordnung
DE69408555D1 (de) Optoelektronische integrierte Schaltung
DE59304283D1 (de) Schaltungsanordnung
DE69215184D1 (de) Integrierte Schaltung
DE69129445D1 (de) Integrierte halbleiterschaltungsanordnung
DE59308485D1 (de) Integrierte Schaltungsanordnung
DE69231527D1 (de) Optoelektronische integrierte Schaltung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee