DE3891284T1 - Laserwellenlaengen-regelvorrichtung - Google Patents

Laserwellenlaengen-regelvorrichtung

Info

Publication number
DE3891284T1
DE3891284T1 DE883891284T DE3891284T DE3891284T1 DE 3891284 T1 DE3891284 T1 DE 3891284T1 DE 883891284 T DE883891284 T DE 883891284T DE 3891284 T DE3891284 T DE 3891284T DE 3891284 T1 DE3891284 T1 DE 3891284T1
Authority
DE
Germany
Prior art keywords
control device
length control
shaft length
laser shaft
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE883891284T
Other languages
English (en)
Inventor
Osamu Wakabayashi
Yasuo Itakura
Masahiko Kowaka
Yoshio Amada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Komatsu Ltd
Original Assignee
Komatsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP17732087A external-priority patent/JPS6422086A/ja
Priority claimed from JP62214396A external-priority patent/JP2617320B2/ja
Application filed by Komatsu Ltd filed Critical Komatsu Ltd
Publication of DE3891284T1 publication Critical patent/DE3891284T1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/136—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity
    • H01S3/137—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity for stabilising of frequency
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
DE883891284T 1987-07-17 1988-07-18 Laserwellenlaengen-regelvorrichtung Withdrawn DE3891284T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP17732087A JPS6422086A (en) 1987-07-17 1987-07-17 Control equipment for laser wavelength
JP62214396A JP2617320B2 (ja) 1987-08-28 1987-08-28 レーザの波長制御装置
PCT/JP1988/000713 WO1989000779A1 (en) 1987-07-17 1988-07-18 Apparatus for controlling laser wavelength

Publications (1)

Publication Number Publication Date
DE3891284T1 true DE3891284T1 (de) 1990-04-26

Family

ID=26497900

Family Applications (1)

Application Number Title Priority Date Filing Date
DE883891284T Withdrawn DE3891284T1 (de) 1987-07-17 1988-07-18 Laserwellenlaengen-regelvorrichtung

Country Status (3)

Country Link
US (1) US5373515A (de)
DE (1) DE3891284T1 (de)
WO (1) WO1989000779A1 (de)

Cited By (2)

* Cited by examiner, † Cited by third party
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DE3832636A1 (de) * 1987-09-26 1989-04-13 Mitsubishi Electric Corp Verfahren und vorrichtung zur stabilisierung der wellenlaenge eines laserstrahls
DE4139032A1 (de) * 1990-11-28 1992-06-17 Mitsubishi Electric Corp Wellenlaengenstabilisator fuer schmalbandlaser

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JPH03155691A (ja) * 1989-08-04 1991-07-03 Mitsui Petrochem Ind Ltd レーザ光の安定化方法及びレーザ装置
JP3175515B2 (ja) 1994-12-26 2001-06-11 キヤノン株式会社 露光装置及びそれを用いたデバイスの製造方法
JP3402850B2 (ja) * 1995-05-09 2003-05-06 キヤノン株式会社 投影露光装置及びそれを用いたデバイスの製造方法
US5757488A (en) * 1996-10-10 1998-05-26 Itt Industries, Inc. Optical frequency stability controller
US6721340B1 (en) * 1997-07-22 2004-04-13 Cymer, Inc. Bandwidth control technique for a laser
US6671294B2 (en) * 1997-07-22 2003-12-30 Cymer, Inc. Laser spectral engineering for lithographic process
US6853653B2 (en) * 1997-07-22 2005-02-08 Cymer, Inc. Laser spectral engineering for lithographic process
KR100264469B1 (ko) * 1997-08-12 2000-08-16 정선종 다파장 채널 투과형 광필터
DE19755457A1 (de) * 1997-12-01 1999-06-10 Deutsche Telekom Ag Verfahren und Anordnung zur Wellenlängenabstimmung einer optoelektronischen Bauelemente-Anordnung
JP3278407B2 (ja) 1998-02-12 2002-04-30 キヤノン株式会社 投影露光装置及びデバイス製造方法
JP3690632B2 (ja) * 1998-03-17 2005-08-31 株式会社小松製作所 狭帯域モジュールの検査装置
US6580517B2 (en) 2000-03-01 2003-06-17 Lambda Physik Ag Absolute wavelength calibration of lithography laser using multiple element or tandem see through hollow cathode lamp
US6160832A (en) 1998-06-01 2000-12-12 Lambda Physik Gmbh Method and apparatus for wavelength calibration
US7006541B2 (en) * 1998-06-01 2006-02-28 Lambda Physik Ag Absolute wavelength calibration of lithography laser using multiple element or tandem see through hollow cathode lamp
US6795473B1 (en) 1999-06-23 2004-09-21 Lambda Physik Ag Narrow band excimer laser with a prism-grating as line-narrowing optical element
US6393037B1 (en) 1999-02-03 2002-05-21 Lambda Physik Ag Wavelength selector for laser with adjustable angular dispersion
US6426966B1 (en) 1999-02-10 2002-07-30 Lambda Physik Ag Molecular fluorine (F2) laser with narrow spectral linewidth
AU6142399A (en) 1998-09-11 2000-04-03 New Focus, Inc. Tunable laser
EP1133673A1 (de) 1998-10-16 2001-09-19 New Focus, Inc. Interferometer für die kontrolle optischer wellenlängen
US6160831A (en) * 1998-10-26 2000-12-12 Lambda Physik Gmbh Wavelength calibration tool for narrow band excimer lasers
US6717973B2 (en) 1999-02-10 2004-04-06 Lambda Physik Ag Wavelength and bandwidth monitor for excimer or molecular fluorine laser
US6243401B1 (en) * 1999-02-10 2001-06-05 National Science Council Methods and apparatus for wavelength measurement and tracking using a semiconductor laser amplifier
US6678291B2 (en) 1999-12-15 2004-01-13 Lambda Physik Ag Molecular fluorine laser
US6421365B1 (en) 1999-11-18 2002-07-16 Lambda Physik Ag Narrow band excimer or molecular fluorine laser having an output coupling interferometer
DE29907349U1 (de) 1999-04-26 2000-07-06 Lambda Physik Gmbh Laser zur Erzeugung schmalbandiger Strahlung
US6795474B2 (en) * 2000-11-17 2004-09-21 Cymer, Inc. Gas discharge laser with improved beam path
US6853654B2 (en) 1999-07-27 2005-02-08 Intel Corporation Tunable external cavity laser
US6879619B1 (en) 1999-07-27 2005-04-12 Intel Corporation Method and apparatus for filtering an optical beam
US6856632B1 (en) 1999-09-20 2005-02-15 Iolon, Inc. Widely tunable laser
US6847661B2 (en) 1999-09-20 2005-01-25 Iolon, Inc. Tunable laser with microactuator
US6667804B1 (en) 1999-10-12 2003-12-23 Lambda Physik Ag Temperature compensation method for wavemeters
US6553050B1 (en) 1999-11-18 2003-04-22 Lambda Physik Ag Narrow band excimer or molecular fluorine laser having an output coupling interferometer
US6603788B1 (en) 1999-11-23 2003-08-05 Lambda Physik Ag Resonator for single line selection
US6628682B1 (en) * 1999-11-29 2003-09-30 Komatsu Ltd. Wavelength detection device for line-narrowed laser apparatus and ultra line-narrowed fluorine laser apparatus
JP4197816B2 (ja) * 1999-12-07 2008-12-17 株式会社小松製作所 波長検出装置
US6364872B1 (en) * 1999-12-06 2002-04-02 Candela Corporation Multipulse dye laser
US7075963B2 (en) 2000-01-27 2006-07-11 Lambda Physik Ag Tunable laser with stabilized grating
US6597462B2 (en) 2000-03-01 2003-07-22 Lambda Physik Ag Laser wavelength and bandwidth monitor
JP4497650B2 (ja) * 2000-04-26 2010-07-07 キヤノン株式会社 レーザ発振装置、露光装置および半導体デバイス製造方法
US7209498B1 (en) 2000-05-04 2007-04-24 Intel Corporation Method and apparatus for tuning a laser
US6807205B1 (en) 2000-07-14 2004-10-19 Lambda Physik Ag Precise monitor etalon calibration technique
US7120176B2 (en) 2000-07-27 2006-10-10 Intel Corporation Wavelength reference apparatus and method
US6747741B1 (en) 2000-10-12 2004-06-08 Lambda Physik Ag Multiple-pass interferometric device
US6839372B2 (en) * 2000-11-17 2005-01-04 Cymer, Inc. Gas discharge ultraviolet laser with enclosed beam path with added oxidizer
US6744793B2 (en) 2000-12-21 2004-06-01 The Charles Stark Draper Laboratory, Inc. Method and apparatus for stabilizing a broadband source
US6934033B2 (en) * 2000-12-28 2005-08-23 Coretek, Inc. Single-etalon, multi-point wavelength calibration reference
JP2002217487A (ja) * 2001-01-18 2002-08-02 Oki Electric Ind Co Ltd 光波長安定化装置および光波長監視装置
US6658031B2 (en) 2001-07-06 2003-12-02 Intel Corporation Laser apparatus with active thermal tuning of external cavity
US6724797B2 (en) 2001-07-06 2004-04-20 Intel Corporation External cavity laser with selective thermal control
US6901088B2 (en) 2001-07-06 2005-05-31 Intel Corporation External cavity laser apparatus with orthogonal tuning of laser wavelength and cavity optical pathlength
US6804278B2 (en) 2001-07-06 2004-10-12 Intel Corporation Evaluation and adjustment of laser losses according to voltage across gain medium
US6822979B2 (en) 2001-07-06 2004-11-23 Intel Corporation External cavity laser with continuous tuning of grid generator
US7154928B2 (en) 2004-06-23 2006-12-26 Cymer Inc. Laser output beam wavefront splitter for bandwidth spectrum control
US7088758B2 (en) 2001-07-27 2006-08-08 Cymer, Inc. Relax gas discharge laser lithography light source
JP4154144B2 (ja) * 2001-11-13 2008-09-24 キヤノン株式会社 露光装置、発光制御方法、およびデバイス製造方法
US7230959B2 (en) 2002-02-22 2007-06-12 Intel Corporation Tunable laser with magnetically coupled filter
US6804273B1 (en) * 2002-03-19 2004-10-12 Ciena Corporation Method and system for compensating a frequency stabilized optical source
US7317536B2 (en) * 2005-06-27 2008-01-08 Cymer, Inc. Spectral bandwidth metrology for high repetition rate gas discharge lasers
US8379687B2 (en) 2005-06-30 2013-02-19 Cymer, Inc. Gas discharge laser line narrowing module
US7321607B2 (en) * 2005-11-01 2008-01-22 Cymer, Inc. External optics and chamber support system
US20120075577A1 (en) 2006-03-20 2012-03-29 Ishak Andrew W High performance selective light wavelength filtering providing improved contrast sensitivity
US8882267B2 (en) 2006-03-20 2014-11-11 High Performance Optics, Inc. High energy visible light filter systems with yellowness index values
US9377569B2 (en) * 2006-03-20 2016-06-28 High Performance Optics, Inc. Photochromic ophthalmic systems that selectively filter specific blue light wavelengths
US8113651B2 (en) 2006-03-20 2012-02-14 High Performance Optics, Inc. High performance corneal inlay
US8613741B1 (en) 2006-10-11 2013-12-24 Candela Corporation Voltage bucking circuit for driving flashlamp-pumped lasers for treating skin
US8879589B2 (en) * 2012-03-20 2014-11-04 Jds Uniphase Corporation Stabilizing beam pointing of a frequency-converted laser system
WO2014156407A1 (ja) * 2013-03-27 2014-10-02 ギガフォトン株式会社 レーザ光の波長を制御する方法およびレーザ装置
US9798163B2 (en) 2013-05-05 2017-10-24 High Performance Optics, Inc. Selective wavelength filtering with reduced overall light transmission
US9683102B2 (en) 2014-05-05 2017-06-20 Frontier Scientific, Inc. Photo-stable and thermally-stable dye compounds for selective blue light filtered optic
CN107111255B (zh) * 2014-12-29 2018-11-13 Asml控股股份有限公司 对准***的反馈控制***
CN105115700B (zh) * 2015-07-28 2017-12-19 武汉光迅科技股份有限公司 一种多通道可调激光器的性能测试装置
KR20220048938A (ko) * 2020-10-13 2022-04-20 가부시기가이샤 디스코 레이저 가공 장치

Citations (2)

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US4103254A (en) * 1976-11-10 1978-07-25 Chikami Leslie F Tunable frequency laser
JPS63229888A (ja) * 1987-03-19 1988-09-26 Komatsu Ltd レーザの波長制御装置および方法

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JPS5040550B1 (de) * 1970-03-26 1975-12-25
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JPS63107177A (ja) * 1986-10-24 1988-05-12 Komatsu Ltd レ−ザ光の波長検出装置
DE3744323C2 (de) * 1987-12-28 1999-03-11 Lambda Physik Forschung Verfahren und Vorrichtung zum Stabilisieren der Frequenz eines Laserstrahles
JP2781987B2 (ja) * 1989-05-23 1998-07-30 株式会社小松製作所 波長検出装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4103254A (en) * 1976-11-10 1978-07-25 Chikami Leslie F Tunable frequency laser
JPS63229888A (ja) * 1987-03-19 1988-09-26 Komatsu Ltd レーザの波長制御装置および方法

Non-Patent Citations (2)

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Title
HENDERSON, T., RIEGER, H.: Wavelength stabiliza- tion system for a pulsed or ow laser. In GB-Z.: Optics and Laser Technology, No. 4, August 1986, S. 187-189 *
MEISEL, G.. Die Stabilisierung und Durchstimmung von Dauerstrich-Farbstofflasern, Teil II. In DE-Z.: Laser und Optoelektronik, Nr. 3, 1983, S. 245-251 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3832636A1 (de) * 1987-09-26 1989-04-13 Mitsubishi Electric Corp Verfahren und vorrichtung zur stabilisierung der wellenlaenge eines laserstrahls
DE4139032A1 (de) * 1990-11-28 1992-06-17 Mitsubishi Electric Corp Wellenlaengenstabilisator fuer schmalbandlaser

Also Published As

Publication number Publication date
US5373515A (en) 1994-12-13
WO1989000779A1 (en) 1989-01-26

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
8139 Disposal/non-payment of the annual fee