DE3888085D1 - Bipolartransistor mit Heteroübergang. - Google Patents

Bipolartransistor mit Heteroübergang.

Info

Publication number
DE3888085D1
DE3888085D1 DE88113410T DE3888085T DE3888085D1 DE 3888085 D1 DE3888085 D1 DE 3888085D1 DE 88113410 T DE88113410 T DE 88113410T DE 3888085 T DE3888085 T DE 3888085T DE 3888085 D1 DE3888085 D1 DE 3888085D1
Authority
DE
Germany
Prior art keywords
heterojunction
bipolar transistor
bipolar
transistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE88113410T
Other languages
English (en)
Other versions
DE3888085T2 (de
Inventor
David J Frank
Ronald F Marks
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE3888085D1 publication Critical patent/DE3888085D1/de
Publication of DE3888085T2 publication Critical patent/DE3888085T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/72Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/73Bipolar junction transistors
    • H01L29/737Hetero-junction transistors
    • H01L29/7371Vertical transistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Bipolar Transistors (AREA)
DE3888085T 1987-10-30 1988-08-18 Bipolartransistor mit Heteroübergang. Expired - Fee Related DE3888085T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/115,778 US4821082A (en) 1987-10-30 1987-10-30 Heterojunction bipolar transistor with substantially aligned energy levels

Publications (2)

Publication Number Publication Date
DE3888085D1 true DE3888085D1 (de) 1994-04-07
DE3888085T2 DE3888085T2 (de) 1994-09-15

Family

ID=22363335

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3888085T Expired - Fee Related DE3888085T2 (de) 1987-10-30 1988-08-18 Bipolartransistor mit Heteroübergang.

Country Status (4)

Country Link
US (1) US4821082A (de)
EP (1) EP0313749B1 (de)
JP (1) JP2501625B2 (de)
DE (1) DE3888085T2 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2630445B2 (ja) * 1988-10-08 1997-07-16 富士通株式会社 半導体装置
US5164800A (en) * 1990-08-30 1992-11-17 Sumitomo Electric Industries, Ltd. Semiconductor device
US5027182A (en) * 1990-10-11 1991-06-25 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration High-gain AlGaAs/GaAs double heterojunction Darlington phototransistors for optical neural networks
JPH0766984B2 (ja) * 1992-02-13 1995-07-19 インターナショナル・ビジネス・マシーンズ・コーポレイション ヘテロ超格子pn接合
JPH05243256A (ja) * 1992-03-02 1993-09-21 Matsushita Electric Ind Co Ltd ヘテロ接合バイポーラトランジスタおよびその製造方法
US5631477A (en) * 1995-06-02 1997-05-20 Trw Inc. Quaternary collector InAlAs-InGaAlAs heterojunction bipolar transistor
US5610086A (en) * 1995-06-06 1997-03-11 Hughes Aircraft Company Method of making an AlPSb/InP single heterojunction bipolar transistor on InP substrate for high-speed, high-power applications
JP3628873B2 (ja) * 1998-04-28 2005-03-16 富士通株式会社 半導体装置及びその製造方法
WO2000079600A1 (en) * 1999-06-22 2000-12-28 Hrl Laboratories, Llc SINGLE HETEROJUNCTION InP-COLLECTOR BJT DEVICE AND METHOD
US6670653B1 (en) * 1999-07-30 2003-12-30 Hrl Laboratories, Llc InP collector InGaAsSb base DHBT device and method of forming same
US6762480B2 (en) 2001-02-27 2004-07-13 Agilent Technologies, Inc. Thin gallium-arsenide-antimonide base heterojunction bipolar transistor (HBT) having improved gain
US6696710B2 (en) 2001-02-27 2004-02-24 Agilent Technologies, Inc. Heterojunction bipolar transistor (HBT) having an improved emitter-base junction
WO2003009396A2 (en) * 2001-07-20 2003-01-30 Microlink Devices, Inc. Algaas or ingap low turn-on voltage gaas-based heterojunction bipolar transistor
US6992337B2 (en) * 2004-04-02 2006-01-31 Agilent Technologies, Inc. Gallium arsenide antimonide (GaAsSB)/indium phosphide (InP) heterojunction bipolar transistor (HBT) having reduced tunneling probability
CA2529595C (en) * 2004-07-01 2013-02-26 Nippon Telegraph And Telephone Corporation Heterostructure bipolar transistor
JP5098193B2 (ja) * 2005-03-23 2012-12-12 ソニー株式会社 ヘテロ接合バイポーラトランジスタ
JP2006303222A (ja) * 2005-04-21 2006-11-02 Mitsubishi Electric Corp ヘテロ接合バイポーラトランジスタおよびそれを備える増幅器
US7868335B1 (en) * 2008-08-18 2011-01-11 Hrl Laboratories, Llc Modulation doped super-lattice sub-collector for high-performance HBTs and BJTs
US9040929B2 (en) * 2012-07-30 2015-05-26 International Business Machines Corporation Charge sensors using inverted lateral bipolar junction transistors
US9530708B1 (en) 2013-05-31 2016-12-27 Hrl Laboratories, Llc Flexible electronic circuit and method for manufacturing same
US9548408B2 (en) 2014-04-15 2017-01-17 L-3 Communications Cincinnati Electronics Corporation Tunneling barrier infrared detector devices

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4195305A (en) * 1978-09-25 1980-03-25 Varian Associates, Inc. Lattice constant grading in the Aly Ga1-y As1-x Sbx alloy system
FR2493047A1 (fr) * 1980-10-28 1982-04-30 Thomson Csf Transistor emetteur-recepteur de lumiere pour telecommunications a l'alternat sur fibre optique
US4573064A (en) * 1981-11-02 1986-02-25 Texas Instruments Incorporated GaAs/GaAlAs Heterojunction bipolar integrated circuit devices
US4538165A (en) * 1982-03-08 1985-08-27 International Business Machines Corporation FET With heterojunction induced channel
DE3380047D1 (en) * 1982-09-17 1989-07-13 France Etat Ballistic heterojunction bipolar transistor
US4672404A (en) * 1982-09-17 1987-06-09 Cornell Research Foundation, Inc. Ballistic heterojunction bipolar transistor
US4728616A (en) * 1982-09-17 1988-03-01 Cornell Research Foundation, Inc. Ballistic heterojunction bipolar transistor
US4583105A (en) * 1982-12-30 1986-04-15 International Business Machines Corporation Double heterojunction FET with ohmic semiconductor gate and controllable low threshold voltage
US4529996A (en) * 1983-04-14 1985-07-16 Allied Coporation Indium phosphide-boron phosphide heterojunction bipolar transistor
JPS59211268A (ja) * 1983-05-17 1984-11-30 Toshiba Corp ヘテロ接合バイポ−ラトランジスタ
US4593305A (en) * 1983-05-17 1986-06-03 Kabushiki Kaisha Toshiba Heterostructure bipolar transistor
US4617724A (en) * 1983-06-30 1986-10-21 Fujitsu Limited Process for fabricating heterojunction bipolar transistor with low base resistance
US4586071A (en) * 1984-05-11 1986-04-29 International Business Machines Corporation Heterostructure bipolar transistor
US4581621A (en) * 1984-07-02 1986-04-08 Texas Instruments Incorporated Quantum device output switch
US4559696A (en) * 1984-07-11 1985-12-24 Fairchild Camera & Instrument Corporation Ion implantation to increase emitter energy gap in bipolar transistors
JPS61107758A (ja) * 1984-10-31 1986-05-26 Fujitsu Ltd GaAs集積回路及びその製造方法
JPH0763065B2 (ja) * 1984-12-25 1995-07-05 日本電気株式会社 低閾値電圧のバイポーラトランジスタ
JPS61203675A (ja) * 1985-03-07 1986-09-09 Nec Corp 半導体装置
JPH088350B2 (ja) * 1985-04-08 1996-01-29 日本電気株式会社 半導体装置
JPH0621591A (ja) * 1992-07-06 1994-01-28 Mitsubishi Electric Corp プリント配線板

Also Published As

Publication number Publication date
US4821082A (en) 1989-04-11
JP2501625B2 (ja) 1996-05-29
EP0313749B1 (de) 1994-03-02
JPH01136368A (ja) 1989-05-29
EP0313749A3 (en) 1990-05-16
DE3888085T2 (de) 1994-09-15
EP0313749A2 (de) 1989-05-03

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee