DE3883707D1 - Membranabdeckung. - Google Patents

Membranabdeckung.

Info

Publication number
DE3883707D1
DE3883707D1 DE88310357T DE3883707T DE3883707D1 DE 3883707 D1 DE3883707 D1 DE 3883707D1 DE 88310357 T DE88310357 T DE 88310357T DE 3883707 T DE3883707 T DE 3883707T DE 3883707 D1 DE3883707 D1 DE 3883707D1
Authority
DE
Germany
Prior art keywords
membrane cover
membrane
cover
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE88310357T
Other languages
English (en)
Other versions
DE3883707T2 (de
Inventor
Hiroaki Nakagawa
Hitomi Matsuzaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Chemicals Inc
Original Assignee
Mitsui Petrochemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Petrochemical Industries Ltd filed Critical Mitsui Petrochemical Industries Ltd
Publication of DE3883707D1 publication Critical patent/DE3883707D1/de
Application granted granted Critical
Publication of DE3883707T2 publication Critical patent/DE3883707T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0002Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/28Web or sheet containing structurally defined element or component and having an adhesive outermost layer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/3154Of fluorinated addition polymer from unsaturated monomers
    • Y10T428/31544Addition polymer is perhalogenated
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31855Of addition polymer from unsaturated monomers
    • Y10T428/3188Next to cellulosic
    • Y10T428/31884Regenerated or modified cellulose
    • Y10T428/31888Addition polymer of hydrocarbon[s] only

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
DE88310357T 1987-11-05 1988-11-03 Membranabdeckung. Expired - Fee Related DE3883707T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP27962787A JP2535971B2 (ja) 1987-11-05 1987-11-05 ペリクル
SG48394A SG48394G (en) 1987-11-05 1994-04-09 Pellicle

Publications (2)

Publication Number Publication Date
DE3883707D1 true DE3883707D1 (de) 1993-10-07
DE3883707T2 DE3883707T2 (de) 1993-12-16

Family

ID=26553411

Family Applications (1)

Application Number Title Priority Date Filing Date
DE88310357T Expired - Fee Related DE3883707T2 (de) 1987-11-05 1988-11-03 Membranabdeckung.

Country Status (6)

Country Link
US (1) US4996106A (de)
EP (1) EP0315450B1 (de)
JP (1) JP2535971B2 (de)
DE (1) DE3883707T2 (de)
HK (1) HK84494A (de)
SG (1) SG48394G (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5573930A (en) * 1985-02-05 1996-11-12 Cetus Oncology Corporation DNA encoding various forms of colony stimulating factor-1
US6146851A (en) * 1985-02-05 2000-11-14 Chiron Corporation DNA encoding NV2 (long form) and carboxy truncated fragments thereof
US6156300A (en) * 1985-02-05 2000-12-05 Chiron Corporation Point mutants of N∇2 CSF-1 and carboxy truncated fragments thereof
US5339197A (en) * 1989-03-31 1994-08-16 Yen Yung Tsai Optical pellicle with controlled transmission peaking
US4970099A (en) * 1989-05-19 1990-11-13 E. I. Du Pont De Nemours And Company Perfluoropolymer coated pellicles
JP2714450B2 (ja) * 1989-08-10 1998-02-16 ダイセル化学工業株式会社 防塵膜
KR950002949B1 (ko) * 1990-10-16 1995-03-28 미쓰이세끼유 가가꾸고오교오 가부시끼가이샤 고광선 투과성 방진막, 그 제조방법 및 방진체
JP3037745B2 (ja) * 1990-11-29 2000-05-08 三井化学株式会社 ペリクル構造体
DE69227092T2 (de) * 1991-05-17 1999-05-20 Du Pont Photomasks, Inc., Round Rocks, Tex. Druckentlastende membranabdeckung
JP2938636B2 (ja) * 1991-09-26 1999-08-23 信越化学工業株式会社 リソグラフィ−用ペリクル
JP2945201B2 (ja) * 1992-01-31 1999-09-06 信越化学工業株式会社 ペリクル
US5422704A (en) * 1992-07-13 1995-06-06 Intel Corporation Pellicle frame
KR970003593B1 (en) * 1992-09-03 1997-03-20 Samsung Electronics Co Ltd Projection exposure method and device using mask
JP3027073B2 (ja) * 1993-07-28 2000-03-27 信越化学工業株式会社 ペリクル
US5741576A (en) * 1995-09-06 1998-04-21 Inko Industrial Corporation Optical pellicle with controlled transmission peaks and anti-reflective coatings
TW337002B (en) * 1996-11-19 1998-07-21 Mitsui Kagaku Kk Pellicle
JP4011687B2 (ja) * 1997-10-01 2007-11-21 キヤノン株式会社 マスク構造体、該マスク構造体を用いた露光装置、該マスク構造体を用いた半導体デバイス製造方法
JP3434731B2 (ja) * 1999-06-09 2003-08-11 Necエレクトロニクス株式会社 ペリクル及びそのケース
US6524754B2 (en) 2001-01-22 2003-02-25 Photronics, Inc. Fused silica pellicle
US7351503B2 (en) * 2001-01-22 2008-04-01 Photronics, Inc. Fused silica pellicle in intimate contact with the surface of a photomask
KR20100049445A (ko) * 2008-11-03 2010-05-12 (주)엠에스티테크놀로지 리소그래피용 펠리클
WO2014020912A1 (ja) * 2012-08-02 2014-02-06 三井化学株式会社 ペリクル
EP3472887A1 (de) * 2016-06-20 2019-04-24 Solvay SA Fluorpolymerfolie

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4470508A (en) * 1983-08-19 1984-09-11 Micro Lithography, Inc. Dustfree packaging container and method
JPS6057841A (ja) * 1983-09-09 1985-04-03 Hitachi Ltd 異物固定方法及び装置
JPS60237450A (ja) * 1984-05-11 1985-11-26 Asahi Chem Ind Co Ltd 非反射性フオトマスク・レチクル用防塵カバ−体及びその製造方法
US4833051A (en) * 1984-08-20 1989-05-23 Nippon Kogaku K.K. Protective device for photographic masks
EP0252574A2 (de) * 1986-07-07 1988-01-13 YEN, Yung-Tsai Verfahren und Vorrichtung zur Herabsetzung von Staubpartikeln auf Photomasken
JP2642637B2 (ja) * 1987-08-18 1997-08-20 三井石油化学工業 株式会社 防塵膜

Also Published As

Publication number Publication date
HK84494A (en) 1994-08-26
DE3883707T2 (de) 1993-12-16
US4996106A (en) 1991-02-26
EP0315450B1 (de) 1993-09-01
EP0315450A2 (de) 1989-05-10
SG48394G (en) 1995-03-17
EP0315450A3 (en) 1989-11-15
JPH01120555A (ja) 1989-05-12
JP2535971B2 (ja) 1996-09-18

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: MITSUI CHEMICALS, INC., TOKIO/TOKYO, JP

8339 Ceased/non-payment of the annual fee