DE69227092T2 - Druckentlastende membranabdeckung - Google Patents

Druckentlastende membranabdeckung

Info

Publication number: DE69227092T2
Authority: DE; Germany
Prior art keywords: pressure release; membrane cover; release membrane; cover; pressure
Prior art date: 1991-05-17
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

DE69227092T

Other languages

English (en)

Other versions

DE69227092D1 (de

Inventor

Glenn Storm

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Micro Lithography Inc

Original Assignee

DuPont Photomasks Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1991-05-17

Filing date

1992-04-28

Publication date

1999-05-20

Family has litigation

First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=24820283&utm_source=***_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69227092(T2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.

1992-04-28 Application filed by DuPont Photomasks Inc filed Critical DuPont Photomasks Inc

1998-10-29 Application granted granted Critical

1998-10-29 Publication of DE69227092D1 publication Critical patent/DE69227092D1/de

1999-05-20 Publication of DE69227092T2 publication Critical patent/DE69227092T2/de

2012-04-29 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Links

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Health & Medical Sciences (AREA)
Life Sciences & Earth Sciences (AREA)
Atmospheric Sciences (AREA)
Toxicology (AREA)
Engineering & Computer Science (AREA)
Environmental & Geological Engineering (AREA)
Epidemiology (AREA)
Public Health (AREA)
Preparing Plates And Mask In Photomechanical Process (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

DE69227092T 1991-05-17 1992-04-28 Druckentlastende membranabdeckung Expired - Fee Related DE69227092T2 (de)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
US70221491A	1991-05-17	1991-05-17
PCT/US1992/003315 WO1992021066A1 (en)	1991-05-17	1992-04-28	Pressure relieving pellicle

Publications (2)

Publication Number	Publication Date
DE69227092D1 DE69227092D1 (de)	1998-10-29
DE69227092T2 true DE69227092T2 (de)	1999-05-20

Family

ID=24820283

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE69227092T Expired - Fee Related DE69227092T2 (de)	1991-05-17	1992-04-28	Druckentlastende membranabdeckung

Country Status (7)

Country	Link
US (1)	US6103427A (de)
EP (1)	EP0548312B1 (de)
JP (1)	JP2992585B2 (de)
KR (1)	KR960003908B1 (de)
DE (1)	DE69227092T2 (de)
SG (1)	SG63629A1 (de)
WO (1)	WO1992021066A1 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH098103A (ja) *	1995-06-19	1997-01-10	Nikon Corp	投影露光装置及び投影露光方法
DE69727782T2 (de) *	1996-07-17	2004-12-09	Mitsui Chemicals, Inc.	Maskenschutzvorrichtung
US6264773B1 (en) *	1998-09-01	2001-07-24	Mark Damian Cerio	Apparatus and method for temporary and permanent attachment of pellicle frame to photomask substrate
JP2003504861A (ja) *	1999-07-01	2003-02-04	エイエスエムエルネザランドズベスローテンフエンノートシャップ	空間濾波による画像向上装置および方法
US6300019B1 (en) *	1999-10-13	2001-10-09	Oki Electric Industry Co., Ltd.	Pellicle
TW480372B (en) *	1999-11-05	2002-03-21	Asm Lithography Bv	Lithographic projection apparatus, method of manufacturing a device using the apparatus, and device manufactured according to the method
US20020089656A1 (en) *	2001-01-09	2002-07-11	Cheng Guo	Containers for lithography mask and method of use
US6911283B1 (en)	2001-02-07	2005-06-28	Dupont Photomasks, Inc.	Method and apparatus for coupling a pellicle to a photomask using a non-distorting mechanism
US6689219B2 (en)	2001-03-15	2004-02-10	Michael Antoine Birmingham	Apparatus and method for dispensing viscous liquid material
US6841312B1 (en) *	2001-04-11	2005-01-11	Dupont Photomasks, Inc.	Method and apparatus for coupling a pellicle assembly to a photomask
US6662718B2 (en)	2001-06-29	2003-12-16	International Business Machines Corporation	Screening mask having a stress-relieving area
US6841317B2 (en)	2002-08-27	2005-01-11	Micro Lithography, Inc.	Vent for an optical pellicle system
JP2006504996A (ja) *	2002-10-29	2006-02-09	トッパン、フォウタマスクス、インク	フォトマスク・アセンブリ、およびリソグラフィ工程中に生成される汚染物からそれを保護する方法
EP1429186A3 (de) *	2002-12-09	2006-06-07	ASML Holding N.V.	Rahmen mit porösen Einsätzen oder erhöhten Haftflächen für eine Abdeckungsmembran
US7205074B2 (en) *	2002-12-31	2007-04-17	Intel Corporation	Venting of pellicle cavity for a mask
JP4286194B2 (ja) *	2004-08-18	2009-06-24	信越化学工業株式会社	ペリクルフレーム、および該フレームを用いたフォトリソグラフィー用ペリクル
JP6519190B2 (ja) *	2015-01-16	2019-05-29	日本軽金属株式会社	ペリクル用支持枠
JP2016139103A (ja) *	2015-01-29	2016-08-04	日本軽金属株式会社	ペリクル用支持枠
JP6395320B2 (ja) *	2015-03-30	2018-09-26	信越化学工業株式会社	ペリクル
US9835940B2 (en) *	2015-09-18	2017-12-05	Taiwan Semiconductor Manufacturing Company, Ltd.	Method to fabricate mask-pellicle system
US10126644B2 (en)	2016-02-09	2018-11-13	Taiwan Semiconductor Manufacturing Company, Ltd.	Pellicle for advanced lithography
US10843454B2 (en) *	2018-01-16	2020-11-24	Jsmd Key Products, Llc	Endurance fabric mesh panel for silk screening

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB2036367A (en) *	1978-10-17	1980-06-25	Censor Patent Versuch	Masks for the Projection Exposure of Semiconductor Substrates
DE2845147B1 (de) *	1978-10-17	1980-01-17	Censor Patent Versuch	Projektionsmaske
US4833051A (en) *	1984-08-20	1989-05-23	Nippon Kogaku K.K.	Protective device for photographic masks
JP2535971B2 (ja) *	1987-11-05	1996-09-18	三井石油化学工業株式会社	ペリクル
JPH02250055A (ja) *	1988-12-09	1990-10-05	Seiko Epson Corp	フォトマスク及び半導体装置の製造方法
JPH02287355A (ja) *	1989-04-27	1990-11-27	Seiko Epson Corp	保護部材つきガラスマスク構造
JP3652029B2 (ja) *	1996-10-16	2005-05-25	積水化学工業株式会社	高感度免疫測定法

1992
- 1992-04-28 DE DE69227092T patent/DE69227092T2/de not_active Expired - Fee Related
- 1992-04-28 WO PCT/US1992/003315 patent/WO1992021066A1/en active IP Right Grant
- 1992-04-28 JP JP5500046A patent/JP2992585B2/ja not_active Expired - Fee Related
- 1992-04-28 EP EP92913957A patent/EP0548312B1/de not_active Expired - Lifetime
- 1992-04-28 SG SG1996008222A patent/SG63629A1/en unknown
- 1992-04-28 KR KR1019930700137A patent/KR960003908B1/ko not_active IP Right Cessation
1993
- 1993-04-13 US US08/046,470 patent/US6103427A/en not_active Expired - Fee Related

Also Published As

Publication number	Publication date
JP2992585B2 (ja)	1999-12-20
KR960003908B1 (ko)	1996-03-23
EP0548312A1 (de)	1993-06-30
US6103427A (en)	2000-08-15
SG63629A1 (en)	1999-03-30
WO1992021066A1 (en)	1992-11-26
EP0548312B1 (de)	1998-09-23
JPH05508487A (ja)	1993-11-25
DE69227092D1 (de)	1998-10-29

Legal Events

Date	Code	Title	Description
1999-10-21	8364	No opposition during term of opposition
2004-11-04	8327	Change in the person/name/address of the patent owner	Owner name: MICRO LITHOGRAPHY, INC., SUNNYVALE, CALIF., US
2007-02-15	8339	Ceased/non-payment of the annual fee

Publication	Publication Date	Title
DE69227092D1 (de)	1998-10-29	Druckentlastende membranabdeckung
BR9103775A (pt)	1992-05-19	Sensor de pressao
BR9103485A (pt)	1992-05-12	Botao de pressao
DE69207708D1 (de)	1996-02-29	Drucksensor
DE69130879T2 (de)	1999-07-29	Polyvinylidenmembrane
DK0546003T3 (da)	1995-05-29	Trykomskifter
DE69306019D1 (de)	1997-01-02	Drucksensor
DE69108305D1 (de)	1995-04-27	Druckgerät.
DE69306476D1 (de)	1997-01-23	Druckgerät
DE69203172D1 (de)	1995-08-03	Trennmembran.
BR9202126A (pt)	1993-01-19	Botao de pressao
DE59208178D1 (de)	1997-04-17	Polyacrylnitrilmembran
ATA109790A (de)	1991-10-15	Membranventil
DE69214211D1 (de)	1996-11-07	Druckwandler
NO308921B1 (no)	2000-11-13	Trykkføler
DE69330763D1 (de)	2001-10-18	Membranstempel
KR930006584U (ko)	1993-04-23	부압부스터
DE69112251D1 (de)	1995-09-28	Membransensor.
DE69301053D1 (de)	1996-02-01	Drucksensor
DE59207797D1 (de)	1997-02-13	Druckbehälter
BR9107022A (pt)	1993-08-17	Conversor de pressao
DE69111783D1 (de)	1995-09-07	Druckbegrenzungsvorrichtung.
DE59201876D1 (de)	1995-05-18	Druckausgleichsmembrane.
DE59108755D1 (de)	1997-07-31	Bremsdruckregelvorrichtung
DE69311602D1 (de)	1997-07-24	Druckgerät