DE3882393D1 - Laser-markierungs-vorrichtung und verfahren. - Google Patents
Laser-markierungs-vorrichtung und verfahren.Info
- Publication number
- DE3882393D1 DE3882393D1 DE8888103066T DE3882393T DE3882393D1 DE 3882393 D1 DE3882393 D1 DE 3882393D1 DE 8888103066 T DE8888103066 T DE 8888103066T DE 3882393 T DE3882393 T DE 3882393T DE 3882393 D1 DE3882393 D1 DE 3882393D1
- Authority
- DE
- Germany
- Prior art keywords
- marking device
- laser marking
- laser
- marking
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67282—Marking devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44B—MACHINES, APPARATUS OR TOOLS FOR ARTISTIC WORK, e.g. FOR SCULPTURING, GUILLOCHING, CARVING, BRANDING, INLAYING
- B44B7/00—Machines, apparatus or hand tools for branding, e.g. using radiant energy such as laser beams
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1313—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells specially adapted for a particular application
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/1065—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using liquid crystals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/007—Marks, e.g. trade marks
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Electromagnetism (AREA)
- Plasma & Fusion (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Liquid Crystal (AREA)
- Laser Beam Processing (AREA)
- Laser Beam Printer (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4525187 | 1987-03-02 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3882393D1 true DE3882393D1 (de) | 1993-08-26 |
DE3882393T2 DE3882393T2 (de) | 1994-02-03 |
Family
ID=12714052
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE88103066T Expired - Fee Related DE3882393T2 (de) | 1987-03-02 | 1988-03-01 | Laser-Markierungs-Vorrichtung und Verfahren. |
Country Status (3)
Country | Link |
---|---|
US (1) | US4818835A (de) |
EP (1) | EP0281068B1 (de) |
DE (1) | DE3882393T2 (de) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2652480B1 (fr) * | 1989-09-22 | 1994-05-06 | Merlin Gerin | Procede et dispositif de marquage laser de boitiers moules d'appareillages electriques. |
JPH03248784A (ja) * | 1990-02-28 | 1991-11-06 | Hitachi Ltd | レーザマーキングシステム |
US5231263A (en) * | 1990-03-09 | 1993-07-27 | Hitachi, Ltd. | Liquid crystal mask type laser marking system |
JP3150322B2 (ja) * | 1990-05-18 | 2001-03-26 | 株式会社日立製作所 | レーザによる配線切断加工方法及びレーザ加工装置 |
JP2526717B2 (ja) * | 1990-06-21 | 1996-08-21 | 日本電気株式会社 | レ―ザ加工装置 |
JP3126368B2 (ja) * | 1990-06-22 | 2001-01-22 | 株式会社日立製作所 | 画像縮小拡大投影装置 |
JPH0484686A (ja) * | 1990-07-27 | 1992-03-17 | Advantest Corp | レーザ加工装置 |
TW225050B (de) * | 1990-11-30 | 1994-06-11 | Hitachi Ltd | |
WO1992021050A1 (en) * | 1991-05-21 | 1992-11-26 | Seiko Epson Corporation | Optical device and optical machining system using the optical device |
TW245844B (de) * | 1993-01-29 | 1995-04-21 | Komatsu Mfg Co Ltd | |
US5463200A (en) * | 1993-02-11 | 1995-10-31 | Lumonics Inc. | Marking of a workpiece by light energy |
US5896163A (en) * | 1993-05-07 | 1999-04-20 | Kabushiki Kaisha Komatsu Seisakusho | Laser liquid crystal marker and method for judging deterioration of liquid crystal |
KR960704672A (ko) * | 1993-09-30 | 1996-10-09 | 안자키 사토루 | 투과형 액정마스크마커(transmission type liqutd crystal mask marker) |
JP3263516B2 (ja) * | 1994-02-08 | 2002-03-04 | 株式会社小松製作所 | 液晶マスクマーカの画像表示方法 |
JP3263517B2 (ja) * | 1994-02-08 | 2002-03-04 | 株式会社小松製作所 | 液晶マスクマーカの駆動方法 |
US5937270A (en) * | 1996-01-24 | 1999-08-10 | Micron Electronics, Inc. | Method of efficiently laser marking singulated semiconductor devices |
JPH09277069A (ja) * | 1996-04-12 | 1997-10-28 | Komatsu Ltd | 液晶マスク、液晶式レーザマーカ及びそれを用いた刻印方法 |
US5986805A (en) * | 1998-02-12 | 1999-11-16 | Trw Inc. | Polarizer/modulator assembly for lasers |
NL1009359C2 (nl) * | 1998-06-10 | 1999-12-13 | Rudolf Jacobus Antonius Marie | Werkwijze en inrichting voor het aanbrengen van een patroon van informatie-kenmerken in een materiaaloppervlak met behulp van een laserbundel. |
US6417484B1 (en) | 1998-12-21 | 2002-07-09 | Micron Electronics, Inc. | Laser marking system for dice carried in trays and method of operation |
US6262388B1 (en) | 1998-12-21 | 2001-07-17 | Micron Electronics, Inc. | Laser marking station with enclosure and method of operation |
JP3429463B2 (ja) * | 1999-10-22 | 2003-07-22 | サンクス株式会社 | レーザマーカ |
JP2001212797A (ja) * | 2000-02-03 | 2001-08-07 | Canon Inc | 露光装置およびレーザ加工方法 |
US6528760B1 (en) | 2000-07-14 | 2003-03-04 | Micron Technology, Inc. | Apparatus and method using rotational indexing for laser marking IC packages carried in trays |
US6524881B1 (en) * | 2000-08-25 | 2003-02-25 | Micron Technology, Inc. | Method and apparatus for marking a bare semiconductor die |
US7169685B2 (en) | 2002-02-25 | 2007-01-30 | Micron Technology, Inc. | Wafer back side coating to balance stress from passivation layer on front of wafer and be used as die attach adhesive |
JP6720156B2 (ja) * | 2014-07-01 | 2020-07-08 | キオヴァ | 材料をパターニングするためのマイクロマシニング方法及びシステム、並びに1つのこのようなマイクロマシニングシステムを使用する方法。 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4734558A (en) * | 1983-05-16 | 1988-03-29 | Nec Corporation | Laser machining apparatus with controllable mask |
US4614954A (en) * | 1984-01-23 | 1986-09-30 | Casio Computer Co., Ltd. | Recording apparatus |
US4559546A (en) * | 1984-09-04 | 1985-12-17 | Xerox Corporation | Intensity control for the imaging beam of a raster scanner |
-
1988
- 1988-02-26 US US07/160,829 patent/US4818835A/en not_active Expired - Lifetime
- 1988-03-01 DE DE88103066T patent/DE3882393T2/de not_active Expired - Fee Related
- 1988-03-01 EP EP88103066A patent/EP0281068B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE3882393T2 (de) | 1994-02-03 |
EP0281068A3 (en) | 1989-12-13 |
US4818835A (en) | 1989-04-04 |
EP0281068B1 (de) | 1993-07-21 |
EP0281068A2 (de) | 1988-09-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |