DE3855322D1 - Anordnung zur Detektion von Magnetismus - Google Patents
Anordnung zur Detektion von MagnetismusInfo
- Publication number
- DE3855322D1 DE3855322D1 DE3855322T DE3855322T DE3855322D1 DE 3855322 D1 DE3855322 D1 DE 3855322D1 DE 3855322 T DE3855322 T DE 3855322T DE 3855322 T DE3855322 T DE 3855322T DE 3855322 D1 DE3855322 D1 DE 3855322D1
- Authority
- DE
- Germany
- Prior art keywords
- magnetism
- arrangement
- detection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001514 detection method Methods 0.000 title 1
- 230000005389 magnetism Effects 0.000 title 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/09—Magnetoresistive devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B61/00—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/10—Magnetoresistive devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N59/00—Integrated devices, or assemblies of multiple devices, comprising at least one galvanomagnetic or Hall-effect element covered by groups H10N50/00 - H10N52/00
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Hall/Mr Elements (AREA)
- Measuring Magnetic Variables (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20883287 | 1987-08-21 | ||
JP10851888 | 1988-04-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3855322D1 true DE3855322D1 (de) | 1996-07-04 |
DE3855322T2 DE3855322T2 (de) | 1996-10-10 |
Family
ID=26448375
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE3855322T Expired - Lifetime DE3855322T2 (de) | 1987-08-21 | 1988-08-17 | Anordnung zur Detektion von Magnetismus |
Country Status (4)
Country | Link |
---|---|
US (1) | US5005064A (de) |
EP (1) | EP0304280B1 (de) |
KR (1) | KR910007387B1 (de) |
DE (1) | DE3855322T2 (de) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5686835A (en) * | 1989-01-18 | 1997-11-11 | Nippondenso Co., Ltd | Physical quantity detection device for converting a physical quantity into a corresponding time interval |
US5262666A (en) * | 1989-05-15 | 1993-11-16 | Nippondenso Co., Ltd. | Semiconductor device with a nickel alloy protective resistor |
JP2868266B2 (ja) * | 1990-01-25 | 1999-03-10 | 株式会社日本自動車部品総合研究所 | 信号位相差検出回路及び信号位相差検出方法 |
JP3483895B2 (ja) * | 1990-11-01 | 2004-01-06 | 株式会社東芝 | 磁気抵抗効果膜 |
EP0490327B1 (de) * | 1990-12-10 | 1994-12-28 | Hitachi, Ltd. | Mehrsicht Film mit magnetoresistiven Effekt und magnetoresitives Element |
JP2690623B2 (ja) * | 1991-02-04 | 1997-12-10 | 松下電器産業株式会社 | 磁気抵抗効果素子 |
US5406116A (en) * | 1991-03-11 | 1995-04-11 | Texas Instruments Incorporated | Dopant implant for conductive charge leakage layer for use with voltage contrast |
US5321283A (en) * | 1991-07-30 | 1994-06-14 | Microwave Technology, Inc. | High frequency JFET |
JPH0677557A (ja) * | 1992-07-30 | 1994-03-18 | Mitsubishi Electric Corp | 混成集積回路装置 |
US5486804A (en) * | 1993-12-03 | 1996-01-23 | Hughes Aircraft Company | Integrated magnetoresistive sensor fabrication method and apparatus |
US5667879A (en) * | 1995-09-13 | 1997-09-16 | Honeywell Inc. | TaN/NiFe/TaN anisotropic magnetic sensor element |
US6153318A (en) * | 1996-04-30 | 2000-11-28 | Rothberg; Gerald M. | Layered material having properties that are variable by an applied electric field |
US5831426A (en) * | 1996-08-16 | 1998-11-03 | Nonvolatile Electronics, Incorporated | Magnetic current sensor |
DE19857275A1 (de) * | 1998-12-11 | 2000-06-15 | Johannes V Kluge | Integrierbarer Magnetfeldsensor aus Halbleitermaterial |
US6429640B1 (en) | 2000-08-21 | 2002-08-06 | The United States Of America As Represented By The Secretary Of The Air Force | GMR high current, wide dynamic range sensor |
JP3565268B2 (ja) * | 2001-06-22 | 2004-09-15 | 株式会社東芝 | 磁気抵抗効果素子、磁気ヘッド及び磁気再生装置 |
KR100590211B1 (ko) * | 2002-11-21 | 2006-06-15 | 가부시키가이샤 덴소 | 자기 임피던스 소자, 그를 이용한 센서 장치 및 그 제조방법 |
CN100438011C (zh) * | 2004-03-24 | 2008-11-26 | 雅马哈株式会社 | 半导体装置、磁传感器和磁传感器单元 |
US7557562B2 (en) * | 2004-09-17 | 2009-07-07 | Nve Corporation | Inverted magnetic isolator |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4036723A (en) * | 1975-08-21 | 1977-07-19 | International Business Machines Corporation | RF bias sputtering method for producing insulating films free of surface irregularities |
JPS6045804B2 (ja) * | 1978-02-28 | 1985-10-12 | 日本電気株式会社 | 角度検出器 |
JPS55111184A (en) * | 1979-02-20 | 1980-08-27 | Pioneer Electronic Corp | Reluctance unit and manufacturing method thereof |
CH651152A5 (de) * | 1979-11-27 | 1985-08-30 | Landis & Gyr Ag | Messwandler zum messen eines insbesondere von einem messstrom erzeugten magnetfeldes. |
JPS5816580A (ja) * | 1981-07-22 | 1983-01-31 | Sharp Corp | 磁気抵抗効果素子のバイアス磁界印加方法 |
JPS601514A (ja) * | 1983-06-17 | 1985-01-07 | Copal Co Ltd | 変位量検出器 |
JPS6021976A (ja) * | 1983-07-14 | 1985-02-04 | ユニチカ株式会社 | 事故防止外衣用ポリエステル織物の製造方法 |
JPH0719923B2 (ja) * | 1984-12-14 | 1995-03-06 | 日本電装株式会社 | 位置検出装置 |
JPS61226982A (ja) * | 1985-04-01 | 1986-10-08 | Asahi Chem Ind Co Ltd | ハイブリツド・ホ−ルic |
JPS61241993A (ja) * | 1985-04-19 | 1986-10-28 | Hitachi Ltd | 複合磁気抵抗効果素子 |
JPS62174968A (ja) * | 1986-01-29 | 1987-07-31 | Hitachi Ltd | 半導体装置 |
US5019461A (en) * | 1986-12-08 | 1991-05-28 | Honeywell Inc. | Resistive overlayer for thin film devices |
DE8704192U1 (de) * | 1987-03-20 | 1988-07-14 | Robert Bosch Gmbh, 70469 Stuttgart | Sensor |
-
1988
- 1988-08-17 EP EP88307613A patent/EP0304280B1/de not_active Expired - Lifetime
- 1988-08-17 DE DE3855322T patent/DE3855322T2/de not_active Expired - Lifetime
- 1988-08-18 US US07/233,431 patent/US5005064A/en not_active Expired - Lifetime
- 1988-08-22 KR KR1019880010644A patent/KR910007387B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0304280A2 (de) | 1989-02-22 |
KR890004174A (ko) | 1989-04-20 |
EP0304280A3 (en) | 1990-06-27 |
KR910007387B1 (ko) | 1991-09-25 |
EP0304280B1 (de) | 1996-05-29 |
US5005064A (en) | 1991-04-02 |
DE3855322T2 (de) | 1996-10-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8320 | Willingness to grant licences declared (paragraph 23) |