DE3783507D1 - Zusammengesetztes halbleiterbauelement. - Google Patents

Zusammengesetztes halbleiterbauelement.

Info

Publication number
DE3783507D1
DE3783507D1 DE8787106250T DE3783507T DE3783507D1 DE 3783507 D1 DE3783507 D1 DE 3783507D1 DE 8787106250 T DE8787106250 T DE 8787106250T DE 3783507 T DE3783507 T DE 3783507T DE 3783507 D1 DE3783507 D1 DE 3783507D1
Authority
DE
Germany
Prior art keywords
semiconductor component
composed semiconductor
component
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8787106250T
Other languages
English (en)
Other versions
DE3783507T2 (de
Inventor
Yuichi C O Osaka Works Matsui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Application granted granted Critical
Publication of DE3783507D1 publication Critical patent/DE3783507D1/de
Publication of DE3783507T2 publication Critical patent/DE3783507T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/45Ohmic electrodes
    • H01L29/452Ohmic electrodes on AIII-BV compounds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/285Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
    • H01L21/28506Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
    • H01L21/28575Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising AIIIBV compounds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/15Structures with periodic or quasi periodic potential variation, e.g. multiple quantum wells, superlattices
    • H01L29/151Compositional structures
    • H01L29/152Compositional structures with quantum effects only in vertical direction, i.e. layered structures with quantum effects solely resulting from vertical potential variation
    • H01L29/155Comprising only semiconductor materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/778Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface
    • H01L29/7782Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with confinement of carriers by at least two heterojunctions, e.g. DHHEMT, quantum well HEMT, DHMODFET
    • H01L29/7783Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with confinement of carriers by at least two heterojunctions, e.g. DHHEMT, quantum well HEMT, DHMODFET using III-V semiconductor material

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
DE8787106250T 1986-04-30 1987-04-29 Zusammengesetztes halbleiterbauelement. Expired - Fee Related DE3783507T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61099928A JPS62256478A (ja) 1986-04-30 1986-04-30 化合物半導体装置

Publications (2)

Publication Number Publication Date
DE3783507D1 true DE3783507D1 (de) 1993-02-25
DE3783507T2 DE3783507T2 (de) 1993-07-29

Family

ID=14260410

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8787106250T Expired - Fee Related DE3783507T2 (de) 1986-04-30 1987-04-29 Zusammengesetztes halbleiterbauelement.

Country Status (6)

Country Link
US (1) US4894691A (de)
EP (1) EP0243953B1 (de)
JP (1) JPS62256478A (de)
AU (1) AU602143B2 (de)
CA (1) CA1277440C (de)
DE (1) DE3783507T2 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5227644A (en) * 1989-07-06 1993-07-13 Nec Corporation Heterojunction field effect transistor with improve carrier density and mobility
US5633512A (en) * 1990-05-23 1997-05-27 Canon Kabushiki Kaisha Semiconductor device for varying the mobility of electrons by light irradiation
JP2919581B2 (ja) * 1990-08-31 1999-07-12 三洋電機株式会社 速度変調トランジスタ
GB2248966A (en) * 1990-10-19 1992-04-22 Philips Electronic Associated Field effect semiconductor devices
JP2786327B2 (ja) * 1990-10-25 1998-08-13 三菱電機株式会社 ヘテロ接合電界効果トランジスタ
CA2078540A1 (en) * 1991-09-17 1993-03-18 So Tanaka Superconducting thin film formed of oxide superconductor material, superconducting device utilizing the superconducting thin film
US5274246A (en) * 1992-05-04 1993-12-28 The United States Of America As Represented By The Secretary Of The Air Force Optical modulation and switching with enhanced third order nonlinearity multiple quantum well effects
NZ286025A (en) * 1995-03-01 1997-04-24 Colgate Palmolive Co Laundry detergent concentrates; contains nonionic surfactant and water insoluble oil with a hydrophilic polar group, converts to liquid crystal phase dispersion on dilution
JP3141838B2 (ja) * 1998-03-12 2001-03-07 日本電気株式会社 電界効果トランジスタ
US7033437B2 (en) * 2003-06-26 2006-04-25 Rj Mears, Llc Method for making semiconductor device including band-engineered superlattice
US6897472B2 (en) * 2003-06-26 2005-05-24 Rj Mears, Llc Semiconductor device including MOSFET having band-engineered superlattice
TWI404209B (zh) * 2009-12-31 2013-08-01 Univ Nat Chiao Tung 高電子遷移率電晶體及其製作方法
US8690134B1 (en) 2012-06-06 2014-04-08 Ben J. Saam Equipment support rack assembly
KR20150038217A (ko) * 2012-07-24 2015-04-08 스미또모 가가꾸 가부시키가이샤 반도체 기판, 반도체 기판의 제조 방법 및 복합 기판의 제조 방법

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4194935A (en) * 1978-04-24 1980-03-25 Bell Telephone Laboratories, Incorporated Method of making high mobility multilayered heterojunction devices employing modulated doping
JPS58178572A (ja) * 1982-04-14 1983-10-19 Hiroyuki Sakaki 移動度変調形電界効果トランジスタ
US4797716A (en) * 1984-04-04 1989-01-10 The United States Of America As Represented By The United States Department Of Energy Field-effect transistor having a superlattice channel and high carrier velocities at high applied fields
JPS61172381A (ja) * 1984-12-22 1986-08-04 Fujitsu Ltd InP系化合物半導体装置
US4697197A (en) * 1985-10-11 1987-09-29 Rca Corp. Transistor having a superlattice
JP2557373B2 (ja) * 1986-04-05 1996-11-27 住友電気工業株式会社 化合物半導体装置

Also Published As

Publication number Publication date
JPS62256478A (ja) 1987-11-09
EP0243953A3 (en) 1990-04-25
DE3783507T2 (de) 1993-07-29
CA1277440C (en) 1990-12-04
AU602143B2 (en) 1990-10-04
EP0243953B1 (de) 1993-01-13
AU7265387A (en) 1987-11-05
US4894691A (en) 1990-01-16
EP0243953A2 (de) 1987-11-04
JPH0354854B2 (de) 1991-08-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Free format text: BARZ, P., DIPL.-CHEM. DR.RER.NAT., PAT.-ANW., 80803 MUENCHEN

8339 Ceased/non-payment of the annual fee